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High-purity selenium-enriched wheat planting method

A planting method and wheat technology, applied in botany equipment and methods, fertilization methods, horticulture, etc., can solve the problems of soil surface compaction, head water demand is not easy to control artificially, and increase the resistance of seedlings to the top of the soil, so as to achieve the convenience of seedlings The effect of unearthed, improving the emergence rate and quality of seedlings, and preventing compaction

Pending Publication Date: 2022-04-15
江苏农创科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a high-purity selenium-enriched wheat planting method, which solves the problem of headwatering wheat in the above-mentioned background technology in order to increase the water required for plant growth and improve wheat seedling emergence. rate and quality of seedling emergence, but the demand for head water is not easy to control artificially, resulting in the implementation of head water will easily lead to compaction of the soil surface, thereby increasing the resistance of top soil when seedlings emerge

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Embodiment 1: First, deep plow the sandy loamy land every three years, break through the knot layer of the plow bottom, plow at least 20 centimeters deep, and then dig out the seed pit neatly. The depth of the seed pit is 3 cm, and open on both sides of the pit. Plan the groove, the groove is located in the middle of the planting pit, the groove width is 3 cm, the depth is 25 cm, and then the branch pipe of the drip irrigation pipe is buried in the groove, and the drip irrigation water pipe is located on the bottom surface and one end of it is connected to the drip irrigation equipment. The distance between the branch pipes is 10 cm and they are evenly distributed at the bottom of the drip irrigation pipes;

[0059] Then put the wheat seeds into the planting hole during the sowing period, and cover the soil uniformly. The best planting density of wheat is 450,000 plants per mu. Three to four days after sowing, the water body is injected into the irrigation pipe through t...

Embodiment 2

[0061] Embodiment 2: First, the sandy loamy soil is deeply plowed once every three years, breaks through the plow bottom layer, plows at least 24 centimeters deep, and then neatly digs out a seed pit. Plan the trench, the trench is located in the middle of the pits, the width of the trench is 5 cm, and the depth is 30 cm, and then the branch pipe of the drip irrigation pipe is buried in the trench, and the drip irrigation pipe is located on the bottom surface and one end is connected to the drip irrigation equipment. The distance between the branch pipes is 10 cm and they are evenly distributed at the bottom of the drip irrigation pipes;

[0062] Then put the wheat seeds into the planting hole during the sowing period, and cover the soil uniformly. The best planting density of wheat is 450,000 plants per mu. Three to four days after sowing, the water body is injected into the irrigation pipe through the drip irrigation equipment, and from the branch pipe. The seepage at 3 cm b...

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Abstract

The invention discloses a high-purity selenium-enriched wheat planting method, and relates to the technical field of wheat planting. S2, ditching assistance; s3, filling soil into the groove; s4, sowing and earthing; s5, covering with water; s6, spraying a selenium-enriched foliar fertilizer; s7, secondary spraying of the selenium-rich leaf fertilizer; and S8, supplementary spraying of the selenium-rich leaf fertilizer. According to the high-purity selenium-enriched wheat planting method, drip irrigation design is adopted, water saving is facilitated, the water outlet holes are formed in the branch pipes from the top to the lower portion by three centimeters, in other words, water begins to flow out from the underground portion by three centimeters after the branch pipes are buried, water can rapidly approach the positions where seeds are located after permeating into soil, water needed by growth is provided for the seeds, and the yield of the wheat is increased. Only a small amount of water is contained above the seeds at most to prevent the hardening phenomenon, so that the problem that the soil jacking resistance is increased when the seed seedlings come out of the soil due to irrigation of the head covering water is solved, the seedlings come out of the soil conveniently, and the emergence rate and the emergence quality are improved.

Description

technical field [0001] The invention relates to the technical field of wheat planting, in particular to a method for planting high-purity selenium-enriched wheat. Background technique [0002] The key to the production technology of selenium-enriched wheat lies in the spraying of "selenium-enriched foliar fertilizer". Spraying selenium-enriched foliar fertilizer is combined with spraying herbicide after hooded water, spraying "enriched foliar fertilizer", 100ml per mu "Selenium-enriched foliar fertilizer" mixed with 30 kg of water was sprayed on average; the second time was sprayed at the heading stage of wheat, and 100ml of "selenium-enriched foliar fertilizer" was mixed with 45 kg of water and sprayed on average per mu. [0003] The existing function of headwatering wheat is to increase the water required for plant growth, so as to improve the emergence rate and quality of wheat seedlings, but the demand for headwater is not easy to control artificially, resulting in the i...

Claims

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Application Information

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IPC IPC(8): A01G22/20A01G25/06A01C21/00
Inventor 杜小林杨珺李刚
Owner 江苏农创科技有限公司