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Preparation method of high-temperature-resistant polyimide film with low thermal expansion coefficient

A technology of polyimide film and low thermal expansion coefficient, which is applied in the preparation and application field of polyimide, and can solve the problems of easy peeling or falling off of thin film devices, so as to improve the degree of linearization, increase the distance and increase the space The effect of steric hindrance

Pending Publication Date: 2022-04-22
奥克控股集团股份公司 +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Moreover, when electronic components containing inorganic materials and organic thin films are compositely processed, due to the obvious difference in thermal expansion coefficients between the inorganic materials and the organic thin films, the formed thin film devices are easy to peel off or fall off during processing or bending.
This requires polyimide materials to have high heat resistance and high dimensional stability, but at this stage, traditional polyimide materials are difficult to meet the requirements of high heat resistance and low thermal expansion.

Method used

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  • Preparation method of high-temperature-resistant polyimide film with low thermal expansion coefficient
  • Preparation method of high-temperature-resistant polyimide film with low thermal expansion coefficient
  • Preparation method of high-temperature-resistant polyimide film with low thermal expansion coefficient

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preparation example Construction

[0020] A kind of preparation method of the high temperature resistant polyimide film of low coefficient of thermal expansion, comprises the following steps:

[0021] 1) Carrying out amidation reaction of diamine monomer and dianhydride monomer in an aprotonated solvent to obtain a polyamic acid solution;

[0022] Wherein, the ratio of the amount of the input substance of the diamine monomer to the dianhydride monomer is 1:0.5-1:2;

[0023] The dianhydride monomer is more than one of the following three compounds:

[0024]

[0025] The diamine monomer is more than one of the following five compounds:

[0026]

[0027] 2) after defoaming the obtained polyamic acid solution, a uniform liquid film is made by coating or casting;

[0028] 3) Gradient temperature rise to carry out thermal imidization reaction, and after film formation, the polyimide film is obtained.

[0029] Gradient heating is as follows: the liquid film is heated at a heating rate of 1-10°C / min to 60°C-40...

Embodiment 1

[0031] In a 100ml three-necked flask, add p-phenylenediamine C 6 h 8 N 2 2.1628g (0.020mol), first add 25g N,N-dimethylacetamide to dissolve the diamine, then add 4,4'-(hexafluoroisopropylene) diphthalic anhydride C 19 h 6 f 6 o 6 )8.8848g (0.020mol), then add 20.9639gN,N-dimethylacetamide C 4 h 9 NO, the reaction was stirred at room temperature for 24 h to obtain a polyamic acid (PAA) solution.

[0032] Coating the polyamic acid solution to obtain a polyamic acid film, then raising the temperature at a heating rate of 2-8°C / min, keeping it at 120-140°C for 0.5min, and then raising the temperature to 160-180°C at the same heating rate 0.5min, then raise the temperature to 250-270°C and keep it for 0.5min, then raise the temperature to 330-350°C and keep it for 0.5min. After gradient imidization, a high-temperature-resistant polyimide film with low thermal expansion coefficient is obtained. The measured CTE was 35 ppm / K.

Embodiment 2

[0034] In 100ml there-necked flask, add 2-(4-aminophenyl)-5-aminobenzimidazole (C 13 h 12 N 4 ) 4.4854g (0.020mol), first add 25g N,N-dimethylacetamide to dissolve the diamine, then add 4,4'-(hexafluoroisopropylene) diphthalic anhydride (C 19 h 6 f 6 o 6 ) 8.8848g (0.020mol), and then add 28.4808g N,N-dimethylacetamide, stir and react at room temperature for 24h to obtain a polyamic acid (PAA) solution.

[0035] Coat the polyamic acid solution to obtain a polyamic acid film, then raise the temperature at a heating rate of 2-8°C / min, keep it at 120-140°C for 0.5min, then raise the temperature to 160-180°C and keep it for 0.5min, then raise the temperature Keep the temperature at 250-270°C for 0.5min, then raise the temperature to 330-350°C and keep it for 0.5min. After gradient imidization, a high-temperature-resistant polyimide film with low thermal expansion coefficient is obtained. The measured CTE was 10 ppm / K.

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Abstract

The invention relates to a preparation method of a high-temperature-resistant polyimide film with a low thermal expansion coefficient, which comprises the following steps: 1) carrying out amidation reaction on a diamine monomer and a dianhydride monomer in an aprotic solvent to obtain a polyamide acid solution; 2) defoaming the obtained polyamide acid solution, and then preparing a uniform liquid film by a coating or curtain coating method; and 3) carrying out gradient heating to carry out thermal imidization reaction, and obtaining the polyimide film after film formation. The method has the advantages that biphenyl structure diamine and dianhydride are selected, so that the straight chain degree of a molecular chain can be effectively improved, and the thermal expansion coefficient of the polymer is reduced. The methyl and trifluoromethyl functional groups are added, so that the steric hindrance is increased, the distance between chains is increased, the thermal expansion coefficient of the polymer is further reduced, and the linear thermal expansion coefficient is 2-35ppm / K.

Description

technical field [0001] The invention belongs to the field of preparation and application of polyimide, and in particular relates to a preparation method of a high-temperature-resistant polyimide film with low thermal expansion coefficient. Background technique [0002] In industries such as optoelectronic display, polyimide films are usually used instead of glass materials, which can realize the characteristics of thinner, lighter and foldable screens. Polyimide films are often used in combination with inorganic materials, which are subjected to high heat during processing. Moreover, when electronic components containing inorganic materials and organic thin films are compositely processed, due to the obvious difference in thermal expansion coefficients between the inorganic materials and the organic thin films, the formed thin film devices are easy to peel or fall off during processing or bending. This requires polyimide materials to have high heat resistance and high dimen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G73/10C08J5/18C08L79/08
CPCC08G73/1067C08G73/1039C08J5/18C08G73/1085C08J2379/08
Inventor 胡知之朱建民刘兆滨宋恩军富扬赵洪斌马可李鹤鸣邰振辉宫聿泽
Owner 奥克控股集团股份公司