Unlock instant, AI-driven research and patent intelligence for your innovation.

Wafer-level gas sensor chip detection method based on infrared thermal analysis

A sensor chip, gas sensor technology, applied in neural learning methods, image analysis, scientific instruments, etc., can solve the problems of chip pollution, low power consumption, cumbersome process, etc., and achieve the effect of rapid acquisition

Pending Publication Date: 2022-05-13
NORTHEASTERN UNIV
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Gas sensors play a vital role in modern life, and the demand for gas sensors is increasing day by day; traditional gas detection relies on chromatography and spectroscopy; the instruments used in these methods are bulky, expensive, and complicated to operate, which limits on-site detection applications; micro-nano gas sensors have the advantages of high sensitivity, low cost, and good portability; micro-nano gas sensors are widely used in hazardous chemical detection, air quality monitoring, human health monitoring, chemical production processes, and agricultural intelligent systems and other fields; In micro-nano gas sensors, gas sensor chips based on MEMS technology are widely used in the field of gas detection due to their small size and low power consumption; for gas sensor detection chips, the existing methods use wire bonding testing and microscopic observation of chips Quality screening, rejecting unqualified chips; the existing method is inefficient, the process is cumbersome, and it is easy to cause chip contamination when transferred to a microscope for observation;

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer-level gas sensor chip detection method based on infrared thermal analysis
  • Wafer-level gas sensor chip detection method based on infrared thermal analysis
  • Wafer-level gas sensor chip detection method based on infrared thermal analysis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Below in conjunction with accompanying drawing and embodiment, the specific embodiment of the present invention is described in further detail;

[0025] This embodiment adopts a wafer-level gas sensor chip detection system based on infrared thermal analysis, such as figure 1 As shown, including host computer, infrared camera, chuck, motor, power module.

[0026] The infrared camera is used to photograph the sensor chip to acquire surface temperature distribution images.

[0027] The upper computer is used for displaying and processing the temperature distribution image on the surface of the sensor chip captured by the infrared camera.

[0028] The chuck is used to fix the sensor chip wafer to be tested.

[0029] The motor is used to drive the chuck to rotate.

[0030] The power supply module is used for the power supply of the infrared camera, the sensor chip wafer to be tested, and the motor.

[0031] A method for detecting a wafer-level gas sensor chip based on in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a wafer-level gas sensor chip detection method based on infrared thermal analysis, and relates to the field of sensor chip detection. The detected gas is utilized to oxidize or reduce the surface of the metal oxide semiconductor, so that the resistance value of the sensor is changed, the output circuit converts the resistance of the sensor into voltage and outputs the voltage, and gas concentration detection and type identification are realized; the reaction of detected gas and a gas-sensitive material usually needs to be carried out at 200-400 DEG C, a semiconductor type gas sensor needs a heating electrode to provide heat for the sensor, and a micro-hot plate type gas sensor is manufactured based on an MEMS (Micro Electro Mechanical System) process and is generally manufactured based on a wafer-level chip. The surface of each wafer is provided with tens of thousands of micro hot plate chips, the micro hot plate chips are provided with heating electrodes, the temperature distribution of the surfaces of the micro hot plates can be obtained by electrifying the micro hot plate chips, and supercooling and superheating points can appear on the surfaces of the chips with faults; and in combination with image acquisition, identification and processing technologies, a fault chip is determined, so that detection of the wafer-level sensor chip is realized.

Description

technical field [0001] The invention relates to the field of sensor chip detection, in particular to a wafer-level gas sensor chip detection method based on infrared thermal analysis. Background technique [0002] Gas sensors play a vital role in modern life, and the demand for gas sensors is increasing day by day; traditional gas detection relies on chromatography and spectroscopy; the instruments used in these methods are bulky, expensive, and complicated to operate, which limits on-site detection applications; micro-nano gas sensors have the advantages of high sensitivity, low cost, and good portability; micro-nano gas sensors are widely used in hazardous chemical detection, air quality monitoring, human health monitoring, chemical production processes, and agricultural intelligent systems and other fields; In the micro-nano gas sensor, the gas sensor chip based on MEMS technology is widely used in the field of gas detection because of its small size and low power consump...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06T7/00G06T7/11G06N3/04G06N3/08G01J5/48
CPCG06T7/0004G06T7/11G06N3/08G01J5/0007G06T2207/10048G06T2207/20081G06T2207/20084G06T2207/30148G01J2005/0077G06N3/045
Inventor 苑振宇杨帆孟凡利李毓东张津赫
Owner NORTHEASTERN UNIV