Pipeline flexible adaptation device and immersion type photoetching machine
A pipeline and flexible technology, applied in the field of lithography machines, can solve problems such as interference, error, and reduce the precision of lithography machines, so as to achieve the effect of reducing force and improving precision
Pending Publication Date: 2022-07-01
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, during the actual operation of the immersion head module, the pipeline connected to the immersion head will generate a pulling force on the immersion head, which will affect the servo movement of the immersion head and bring errors to it; at the same time, the tight pipeline will also The vibration of the gas-liquid separation device is transmitted to the immersion head module, which affects the stability of the immersion head; moreover, the vibration generated by the pipeline will also be transmitted to the gas-liquid separation device, which will interfere with the substrate connected to the gas-liquid separation device. Will reduce the accuracy of the lithography machine
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0030] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved more clearly, the technical solutions of the embodiments of the present invention will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are only the present invention. Some examples, but not all examples. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts shall fall within the protection scope of the present invention.
[0031] In the description of the present invention, unless otherwise expressly specified and limited, the terms "connected", "connected" and "fixed" should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to the technical field of photoetching machines, and discloses a pipeline flexible adapting device and an immersed photoetching machine.The pipeline flexible adapting device comprises a flexible connecting device comprising a connecting reed and a vibration isolation structure, one end of the connecting reed is connected to a gas-liquid separation device through the vibration isolation structure, the other end of the connecting reed is freely released, and the other end of the connecting reed is connected to the gas-liquid separation device through the vibration isolation structure; the connecting reed is arranged along the height direction of the gas-liquid separation device; the immersion flow field pipeline comprises a recovery pipeline and an injection pipeline, the two ends of the recovery pipeline communicate with the immersion head and the gas-liquid separation device correspondingly, one end of the injection pipeline communicates with the immersion head, and the part, away from the immersion head, of the injection pipeline is connected to the connecting reed and arranged in the height direction of the connecting reed; the parts, close to the immersion head, of the injection pipeline and the recovery pipeline are arranged on the same horizontal plane. With the adoption of the structure, the pipeline flexible adaptation device can reduce the influence of the pipeline on the immersion head and the gas-liquid separation device, and is beneficial to improving the precision of the immersion photoetching machine.
Description
technical field [0001] The present invention relates to the technical field of lithography machines, and in particular, to a pipeline flexibility adapting device and an immersion lithography machine. Background technique [0002] Immersion lithography machine is a key equipment in the semiconductor industry. The lithography machine has extremely high precision requirements and a very complex structure. The immersion head of the immersion lithography machine is arranged between the lower surface of the bottom lens of the objective lens and the upper surface of the chuck. The immersion head realizes the maintenance and stability of the immersion liquid field through pipes of different materials and different diameters. Some of the pipelines are connected between the immersion head and the gas-liquid separation device through the pagoda joint, and some of the pipelines are arranged along the height direction of the gas-liquid separation device. [0003] Due to the needs of the...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2041G03F7/70341G03F7/709
Inventor 陈言亭于宁
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD