Titanium dioxide transparent conductive glass as well as preparation method and application thereof
A technology of transparent conductive glass and titanium dioxide, applied in cable/conductor manufacturing, conductive layer on insulating carrier, circuit, etc., can solve problems such as long production cycle, and achieve the effect of improving production efficiency and shortening production cycle
Pending Publication Date: 2022-07-01
PEKING UNIV SHENZHEN GRADUATE SCHOOL
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Problems solved by technology
However, in production practice, the patented method still has the shortcoming of a long production cycle
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[0050] In this example, an anatase phase microcrystalline layer is prepared on an amorphous substrate in advance, and then a high-speed magnetron sputtering titania film is performed on the anatase phase microcrystalline layer, such as figure 1 As mentioned above, the final annealing treatment crystallizes the thin film to obtain an anatase phase (004) oriented titania thin film to form the titania transparent conductive glass of this example.
[0051] The specific preparation method is as follows:
[0052] (1) The niobium-doped anatase phase microcrystalline layer was prepared by magnetron sputtering. The doping amount of niobium was 1% of the total weight of the anatase phase microcrystalline layer. The specific process parameters included, the sputtering chamber pressure was 1Pa, the sputtering chamber atmosphere is argon, the substrate is glass, the substrate temperature is 50°C, and the sputtering power is 1W / cm 2 , the deposition rate is 10 nm / min, the sputtering time i...
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Abstract
The invention discloses titanium dioxide transparent conductive glass as well as a preparation method and application thereof. The preparation method of the titanium dioxide transparent conductive glass comprises the following steps: firstly, preparing an anatase phase microcrystalline layer on an amorphous substrate, then carrying out high-speed magnetron sputtering on a titanium dioxide film on the anatase phase microcrystalline layer at a deposition rate of 0.1-500nm / min, and finally, carrying out annealing treatment to crystallize the film so as to obtain an anatase phase (004) oriented titanium dioxide film, the titanium dioxide transparent conductive glass is formed. According to the preparation method of the titanium dioxide transparent conductive glass, the anatase phase microcrystalline layer is prepared in advance, so that the titanium dioxide film can be quickly and efficiently sputtered, the production period is shortened, and the production efficiency is improved. Moreover, the preparation method provided by the invention can regulate and control the preferred orientation degree of the anatase phase (004) so as to meet different use requirements.
Description
technical field [0001] The present application relates to the technical field of transparent conductive glass, in particular to a titanium dioxide transparent conductive glass and a preparation method and application thereof. Background technique [0002] Transparent conductive oxide (TCO) glass substrate is an important optoelectronic material. TCO films in existing production applications mainly include ITO, FTO, etc. Among them, the ITO film uses a large amount of rare metal indium, resulting in the rising price of indium, and the ITO film is unstable under high temperature and plasma conditions. On the other hand, FTO films have low transmittance in the UV-Vis spectral range and are less conductive than ITO. [0003] In order to further reduce the cost, avoid the use of rare metal indium, and not reduce the performance of the conductive film, and make TCO more competitive in production, the material of the transparent conductive film needs to be solved as a key issue. ...
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IPC IPC(8): H01B13/00H01B5/14C03C17/245
CPCH01B13/00H01B5/14C03C17/2456C03C2217/24C03C2218/156C03C2218/32
Inventor 潘锋梁军
Owner PEKING UNIV SHENZHEN GRADUATE SCHOOL