Beam blanking apparatus for multi-beamlet charged particle beam apparatus
A technology of charged particle beam and multiple beamlets, applied in the field of electron beam equipment and charged particle beam equipment, can solve the problems of non-blanking beam/beam being deflected, deteriorating sample analysis results, etc.
Active Publication Date: 2022-07-12
ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUER HALBLEITERPRUEFTECHNIK GMBH
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[0018] In the following, embodiments are described. The embodiments and parts thereof may be combined in any manner. For example, any aspect of the embodiments described herein can be combined with any other aspect of any other embodiment to form a further embodiment. The detailed description of the embodiments is provided for illustration. The drawings are not necessarily to true scale or angle, and may be exaggerated in large part for illustration. The same or similar parts in the figures may have the same reference numerals, and in principle only the differences between the figures are described.
[0019] According to an embodiment, a beam blanking apparatus for a multi-beam charged particle beam apparatus is provided. As used herein, the term "multiple beamlets" includes multiple beams originating from separate charged particle beam sources as well as multiple beams originating from a single charged particle beam source (eg, formed from an aperture plate illuminated by ...
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A beam blanking apparatus for a multi-beamlet charged particle beam apparatus is provided. The beam blanking device includes a first blanking unit, a second blanking unit, and a third blanking unit. The first blanking unit comprises a first blanking electrode and a first hole. The second blanking unit comprises a second blanking electrode and a second hole. The third blanking unit comprises a third blanking electrode and a third hole. The beam blanking device includes common electrodes forming a first counter electrode for the first blanking electrode, a second counter electrode for the second blanking electrode, and a third counter electrode for the third blanking electrode. The first blanking unit, the second blanking unit, and the third blanking unit are arranged in the planar array and define a plane of the planar array. The first blanking electrode is arranged to generate a first electric field in the first aperture between the first blanking electrode and the common electrode to deflect a first beamlet of the multi-beamlet charged particle beam device to a first deflection direction. The second blanking electrode is arranged to generate a second electric field in the second aperture between the second blanking electrode and the common electrode to deflect a second beamlet of the multi-beamlet charged particle beam device to a second deflection direction. The third blanking electrode is arranged to generate a third electric field in the third aperture between the third blanking electrode and the common electrode to deflect a third beamlet of the multi-beamlet charged particle beam device to a third deflection direction. A partition plane intersecting the planar array separates the first blanking unit from the second blanking unit and the third blanking unit, wherein the first deflection direction, the second deflection direction, and the third deflection direction are directed away from the partition plane.
Description
technical field [0001] The present disclosure relates to the field of charged particle beam equipment, such as the field of electron beam equipment. Embodiments relate to beam blanking apparatus for such charged particle beam apparatus, and to methods of operating the beam blanking apparatus. More specifically, a beam blanking apparatus and corresponding method of operation are provided for blanking beamlets of a multi-beamlet charged particle beam apparatus. Background technique [0002] To analyze a sample, eg, to detect defects on a wafer or the like, a charged particle beam apparatus, such as an electron beam apparatus for electron beam inspection (EBI), may be used. To reduce the time required to analyze the sample, multiple beams / sub-beams can be used to examine different parts of the sample simultaneously. Advantages are obtained if such beams / beamlets can be blanked, and beam blanking arrangements for multi-beamlet charged particle devices can be used for this purp...
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IPC IPC(8): H01J37/04
CPCH01J37/045H01J2237/0435H01J2237/0437H01J37/147H01J37/244H01J2237/043
Inventor B·J·库克E·霍根
Owner ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUER HALBLEITERPRUEFTECHNIK GMBH