Design and structure of planar light waveguide polarizer
A planar optical waveguide and polarizer technology, applied in the coupling of optical waveguides, polarizing elements, etc., can solve problems such as impracticality, and achieve the effects of high extinction ratio, simple process, and excellent transmission characteristics.
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Embodiment 1
[0028] According to the aforementioned method, the period of the high-reflection film is taken as 3, and the working wavelength λ0 is 1.3 μm. Polycrystalline Si (0.11 μm) / amorphous SiO2 (0.25 μm) is prepared on a clean silicon substrate by double target wheel sputtering technology. , the thickness of the middle core layer is 1.16 μm, and the number of periods is 8. The optical waveguide polarizer with this structure has good transmission characteristics and high extinction ratio through computer simulation and experiments.
Embodiment 2
[0030] The period of the high reflection film is taken as 18, and the working wavelength λ0 is 1.55 μm. Polycrystalline Si (0.131 μm) / amorphous SiO 2 (0.30μm), middle core layer thickness 1.38μm, polycrystalline Si / amorphous SiO 2 The repetition period is 18. After testing, the polarizer with this structure has also obtained satisfactory results.
Embodiment 3
[0032] The period of the high reflection film is taken as 18, and the working wavelength λ0 is 5.0 μm. Polycrystalline Si (0.4μm) / amorphous SiO was prepared 2 (1.0 μm), the thickness of the core layer is 4.5 μm, and the number of repetition cycles is 10, and a waveguide polarizer with good performance is also obtained.
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