Inverted pressure vessel with horizontal through loading
A pressure vessel, open type technology, applied in the field of pressure vessels, can solve the problems of pollution of the processing environment, limited production speed of pressure vessels, poor integration of pressure vessels, etc., and achieves the effect of reducing pollution and safe operation.
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[0036] The present invention can have many variations. Accordingly, the illustrations and description of the preferred embodiments are disclosed as illustrations of the invention and are not to be construed as limiting.
[0037] Preferred embodiments are for use in the semiconductor industry for photoresist stripping, particle removal, dry resist development, wafer cleaning, drying of MEMS structures, and other high pressure processes not detailed herein Application of reagents (process reagents are gaseous, liquid, or supercritical) with or without possible modifiers. These processes often require a high degree of cleaning and must be suitable for automatic loading and unloading in order to facilitate high throughput.
[0038] see figure 2 and image 3 , the first preferred embodiment uses an inverted pressure vessel mounted strictly on the upper end of the support frame 6 of the stationary assembly. Not shown are channels and ports for introducing and removing process f...
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