Semiconductor device
A technology for semiconductors and components, applied in the field of light-emitting components, can solve the problem of ineffective light emission, and achieve the effect of improving light utilization efficiency
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Embodiment 1
[0093]In this embodiment, an n-type conductive nitride semiconductor layer 102 (n-type conductive semiconductor layer), an active layer 103, and a p-type conductive nitride semiconductor layer 104 (p-type conductive semiconductor layer) are laminated on a substrate 101 such as sapphire. layer) structure. Such as figure 1 (stereo view) and figure 2 As shown in (plan view from above), in this semiconductor element, p-type conductivity nitride semiconductor layer 104, active layer 103, and part of n-type conductivity nitride semiconductor layer 102 are removed in specific regions, and the n-type conductivity The surface for forming electrodes is exposed on the nitride semiconductor layer 102 .
[0094] If the outer shape of the surface of the p-type conductivity nitride semiconductor layer 104 of the semiconductor element is taken, the entire surface of the exposed n-type conductivity nitride semiconductor layer 102 is coated with a resist, and the entire surface is formed by...
Embodiment 2
[0102] In this embodiment, an n-type conductive nitride semiconductor layer 102 (n-type conductive semiconductor layer), an active layer 103, and a p-type conductive nitride semiconductor layer 104 (p-type conductive semiconductor layer) are stacked on a substrate 101 such as sapphire. ) structure. Such as image 3 As shown, the semiconductor element removes the p-type conductivity nitride semiconductor layer 104, the active layer 103 and a part of the n-type conductivity nitride semiconductor layer 102 in a specific area, and the n-type conductivity nitride semiconductor layer 102 Exposing the surface for forming electrodes.
[0103] Next, a resist is applied to the entire surface of the p-type conductive nitride semiconductor layer 104 and the n-type conductive nitride semiconductor layer 102 other than the second electrode formation portion, and the second electrode 2 is formed by sputtering. The second electrode 2 is formed by removing the resist. At this time, the seco...
Embodiment 3
[0108] In the light-emitting element of Example 1, such as Figure 4 As shown, between the first electrode 1 and the second electrode 2, the first electrode has a part width of 0.3 μm and a length of 0.8 μm extending toward the outside of the surface of the p-type conductive nitride semiconductor layer, and the conduction of the second electrode is provided. Part 1a. At this time, the conductive portion 1 a of the first electrode 1 is formed so that a part of the tip (for example, a width of 0.3 μm and a length of 0.3 μm) covers the upper portion of the second electrode 2 . When the light-emitting element is connected to the first electrode 1 and the second electrode 2 as the positive pole, and the n-side electrode 3 as the negative pole, and the electrodes are applied to make it emit light, the light extraction efficiency is about the same as that of Example 1, and the observation is roughly the same. to glowing spots.
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