Structure for increasing reliability of metal connecting line
A metal connection and reliability technology, applied in the direction of electrical components, electrical solid devices, circuits, etc., can solve the problem of insufficient capture rate of conductive particles
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[0031] Please also refer to figure 2 and image 3 , figure 2 A plan view illustrating a preferred embodiment of the structure of the present invention for increasing the reliability of metal wiring. image 3 is along figure 2 The 3-3' section view. A plurality of metal bumps 202 are located on a first substrate 204 such as a semiconductor substrate. In this preferred embodiment, the semiconductor substrate 204 is a silicon chip, and the metal bumps 202 are preferably composed of gold, which is formed on silicon Metal electrodes (not shown) of the chip are connected to the chip 204 , and the metal bump 202 has a plurality of grooves 206 on the other surface adjacent to the first substrate 204 . The grooves 206 are preferably rectangular or square, and arranged in a matrix to form a grid-like metal bump 202 . It should be noted that the shortest side of the rectangular groove 206 needs to be longer than the diameter of the conductive particles 208 of the anisotropic cond...
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