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Nonvolatile capacitor of a semiconductor memory device, and method of operating the same

A technology of capacitors and semiconductors, applied in semiconductor devices, semiconductor/solid-state device manufacturing, capacitors, etc., can solve the problems of low integration and working speed of DRAM

Active Publication Date: 2005-07-13
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Flash memory is non-volatile compared to DRAM, but has lower integration and operating speed than DRAM

Method used

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  • Nonvolatile capacitor of a semiconductor memory device, and method of operating the same
  • Nonvolatile capacitor of a semiconductor memory device, and method of operating the same
  • Nonvolatile capacitor of a semiconductor memory device, and method of operating the same

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Embodiment Construction

[0027] The present invention will now be described more fully with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. The thicknesses of layers and regions shown in all figures are exaggerated for clarity.

[0028] refer to figure 1 , the nonvolatile capacitor C of the semiconductor device according to the embodiment of the present invention includes a lower electrode 40 , a dielectric layer 42 and an upper electrode 44 . Here, the lower electrode 40 may be a platinum electrode. The upper electrode 44 may be a ruthenium electrode. The lower electrode 40 and the upper electrode 44 may be made of different materials from each other, and the materials of the lower and upper electrodes 40 and 44 are generally determined by the properties of the dielectric layer 42 . The dielectric layer 42 includes a first insulating layer 42a, a phase change layer 42b stacked on the first insulating layer 42a, and a second insulating layer 42c st...

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Abstract

Provided are a capacitor of a semiconductor device, a semiconductor storage device including the capacitor, and an operating method of the semiconductor storage device. The capacitor includes: a lower electrode; a dielectric layer laminated on the lower electrode and including a phase change layer showing two remarkably different resistance characteristics after its insulating property is changed; and a dielectric layer laminated on the dielectric layer. layer on the top electrode. A semiconductor memory device including the capacitor is as fast in operation as a dynamic random access memory and has the same non-volatility as a flash memory device.

Description

technical field [0001] The present invention relates to a semiconductor device and a semiconductor memory device including the semiconductor device, and more particularly, to a nonvolatile capacitor of the semiconductor device, a semiconductor memory device including the capacitor, and an operating method of the memory device. Background technique [0002] Semiconductor memory devices mainly include transistors and capacitors. In recent years, various storage media have been developed to replace capacitors. Among them, representative is a magnetic tunnel junction (MTJ) cell included in a magnetic memory device. [0003] It is desired that semiconductor memory devices have a high degree of integration, a high operating speed, and excellent non-volatility sufficient not to lose data stored therein even after power is turned off. [0004] Among widely used semiconductor memory devices, Dynamic Random Access Memory (DRAM) has the advantages of high integration and high operati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/10G11C16/02H01L21/02H01L29/92H01L45/00H01L49/02H10B12/00H10B20/00H10B69/00
CPCB82Y10/00G11C13/0004H01L28/40H10B63/30H10N70/20H10N70/8833H10N70/826H10B12/033H10B20/00H10B69/00H01L27/10
Inventor 李正贤朴星昊李明宰朴永洙
Owner SAMSUNG ELECTRONICS CO LTD