Electroplating cell with improved plating efficiency
Patent Information
- Application Number
- CN202521847306.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-28
- Publication Date
- 2026-07-24
- Estimated Expiration
- 2035-08-28
AI Technical Summary
In existing electroplating technologies, uneven stirring leads to low electroplating efficiency and uneven coating, especially in areas with complex shapes where insufficient ion supply results in uneven coating thickness and roughness.
The cathode plate adopts a multi-dimensional motion design, combining a horizontal reciprocating mechanism and a lifting reciprocating mechanism to achieve composite motion of the cathode plate. Dynamic stirring optimizes the solution environment and enhances ion exchange and stirring effects.
It accelerates ion exchange during the electroplating process, improves electroplating efficiency and coating uniformity, shortens the electroplating cycle, and is suitable for high-requirement coating production.
Smart Images

Figure CN224548599U_ABST