Mirror and system of semiconductor technology

DE102025100291A1Undetermined Publication Date: 2026-07-09CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2025-01-07
Publication Date
2026-07-09

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Abstract

The invention relates to a mirror (1) comprising: a substrate (2) with a mirror surface (2a) onto which a coating (3) for reflecting radiation, in particular for reflecting EUV radiation, is applied, and at least one hollow structure (5) formed in the substrate (2). The hollow structure (5) has at least one preferably straight channel section (7) extending from a side surface (8) of the substrate at an angle (θ) other than 0°. The invention also relates to a semiconductor technology system, in particular an EUV lithography system, comprising at least one such mirror (1).
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Citation Information

Patent Citations

  • Method and device for producing at least one hollow structure, mirror, EUV lithography system, fluid supply device and method for supplying a fluid

    WO2023110816A2

  • Device and method for determining the temperature distribution over the optical surface of an optical element

    DE102018207126A1

  • Component with a hollow structure and optical arrangement

    DE102023205652A1