Methods for generating and amplifying laser pulses, methods for generating a plasma emitting secondary radiation, methods for manufacturing microchips or semiconductor intermediates and optical arrangements

DE102025100893A1Undetermined Publication Date: 2026-07-16TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE
View PDF 3 Cites 0 Cited by

Patent Information

Application Number
DE102025100893
Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-01-13
Publication Date
2026-07-16

Smart Images

  • Figure 00000000_0000_ABST
    Figure 00000000_0000_ABST
Patent Text Reader

Abstract

A method for generating and amplifying laser pulses (12, 14) using an optical amplifier (32), wherein the optical amplifier (32) comprises a laser-active solid (34) for amplifying the laser pulses (12, 14). The method comprises: generating a laser pulse of the first kind (12); generating a laser pulse of the second kind (14); generating a population inversion in the laser-active solid (34); and amplifying the laser pulse of the first kind (12) and the laser pulse of the second kind (14) using the optical amplifier (32) by having the laser pulse of the first kind (12) and the laser pulse of the second kind (14) pass through the laser-active solid (34) while the laser-active solid (34) exhibits the population inversion. The laser pulse of the first kind (12) and the laser pulse of the second kind (14) differ in their wavelength.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Method and laser system for generating amplified pulse-on-demand output laser pulses and associated computer program product

    DE102020203928A1

  • EUV driver laser for generating an EUV light-emitting plasma, system for irradiating semiconductor substrates coated with a photosensitive coating with EUV light

    DE202024101153U1

  • Wavelength-based optical filtering

    US20180081280A1