Device and method for the simultaneous deposition of layers onto substrates

Abstract

The invention relates to a device for the simultaneous deposition of layers onto substrates in a first and at least one second reactor chamber, comprising a common exhaust gas disposal device to which the first and the second reactor chamber (1, 1') are each connected to a gas outlet line (12) with an exhaust gas pump (14), comprising a pressure gauge for determining a total pressure in the first reactor chamber (1), comprising a differential pressure gauge (10) for determining a difference in the total pressure in the first reactor chamber (1) and the second reactor chamber (1'), comprising at least one pressure regulating valve, and comprising a control device for pressure regulation using measured values ​​provided by the pressure gauge (9) and the differential pressure gauge (10), and by varying a valve position of the pressure regulating valve, wherein at least the differential pressure gauge (10) is connected to a pressure measuring line (19) connecting the two reactor chambers (1, 1').19') is arranged, which is different from the gas outlet lines (12, 13).

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