Monitoring device, monitoring procedure and program
DE112024003255T5Undetermined Publication Date: 2026-07-23MITSUBISHI HEAVY INDUSTIES COMPRESSOR CORP
3 Cites 0 Cited by
Patent Information
- Application Number
- DE112024003255
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-05-07
- Filing Date
- 2024-05-07
- Publication Date
- 2026-07-23
Abstract
The purpose of the present invention is to provide a monitoring device capable of preventing excessive anomaly detection by increasing monitoring accuracy using a MD value. The monitoring device includes: computational means configured to calculate an MD value based on a process value of a rotating machine; computational means configured to calculate a gap value, which represents the ratio of a difference between a measured value of the process value and the estimated value of the process value, with respect to a difference between a threshold for detecting an anomaly of the process value and an estimated value of the process value; and detection means configured to determine an operating state of the rotating machine based on the MD value and the gap value.
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Condition monitoring device
JP2020201683A
Bearing abnormality prediction device and bearing abnormality prediction method
JP2021018106A
Document placement detection device, image reading device, image forming apparatus, method, and program
JP2023130132A