CHALKOGENOSILACYCLOPENTANE
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- GELEST INC MORRISVILLE
- Filing Date
- 2020-03-23
- Publication Date
- 2026-07-08
AI Technical Summary
Existing thin film deposition technologies, such as ALD, face slow growth rates in the initial stages due to substrate reactivity issues, particularly in cadmium selenide, cadmium telluride, and germanium-antimony-tellurium thin films, necessitating efficient substrate initiation for deposition processes.
Development of chalcogenosilacyclopentanes, specifically selenosilacyclopentanes and tellurosilacyclopentanes, which undergo ring-opening reactions with protic functionalities, modifying substrates to enhance thin film deposition technologies like ALD and CVD.
The chalcogenosilacyclopentanes facilitate efficient initiation of thin film deposition by enhancing substrate reactivity, leading to cleaner film growth and improved deposition rates.