High-pressure cleaning device and method for operating a high-pressure cleaning device

The high-pressure cleaning device adjusts liquid and additive flow rates using a control signal, simplifying design and reducing costs while maintaining consistent additive concentration, addressing the complexity and expense of existing systems.

EP4763367A1Pending Publication Date: 2026-06-24ANDREAS STIHL AG & CO KG
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Patent Information

Application Number
EP2025224321
Authority / Receiving Office
EP · EP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-20
Filing Date
2025-12-17
Publication Date
2026-06-24

AI Technical Summary

Technical Problem

Existing high-pressure cleaning devices require complex and expensive pressure gauges to adjust the additive flow rate to the liquid flow rate, making it difficult to maintain a constant additive concentration with varying liquid flow rates.

Method used

A high-pressure cleaning device that adjusts both the liquid and additive flow rates using a control signal, eliminating the need for pressure gauges by interdependently controlling these flows based on the control element's actuation, allowing for quasi-continuous adjustment of fluid flow rates and maintaining constant additive concentration.

Benefits of technology

Simplifies the design, reduces costs, and ensures a constant additive concentration regardless of liquid flow rate variations, without the need for complex pump output control or expensive components.

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Abstract

The invention relates to a high-pressure cleaning device (1) comprising a main line (5) through which liquid can be pumped by means of a high-pressure pump (3), a control element (42) with which the volumetric flow rate of the liquid in the main line (5) can be influenced based on a control signal generated by the control element (42), and an additive device (80) with which an additive (81) can be supplied to the liquid at an additive flow rate. The additive device (80) adjusts the volumetric flow rate of the additive based on the control signal.
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Citation Information

Patent Citations

  • LIQUID DISPENSER FOR A HIGH-PRESSURE CLEANER AND METHOD FOR CONTROLLING A HIGH-PRESSURE CLEANER BY MEANS OF A LIQUID DISPENSER

    DE102021101033A1

  • High-pressure cleaning device

    EP4389296A1

  • High-pressure cleaning device

    WO2016102075A1