Dynamic management method and system for interface controls, and semiconductor process device

Abstract

The invention provides an interface dynamic management method and system, a computer readable storage medium and semiconductor process equipment, belongs to the technical field of semiconductor preparation, and can solve the problems that an existing interface generation method is low in efficiency and poor in expandability. The interface control dynamic management method comprises the following steps: reading a configuration file; the configuration file comprises at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponds to one cavity; analyzing the configuration file, and according to the interface path identifier, positioning an initial view architecture of a chamber corresponding to the interface path identifier as a to-be-modified initial view structure; according to control operation information corresponding to the interface path identifier, executing corresponding operation on the initial view architecture to be modified, and generating a target view architecture of the chamber; and presenting an interface of each chamber based on the target view architecture of each chamber. The method disclosed by the invention has the advantages of high efficiency, high expandability and high maintainability.

Description

(19) State Intellectual Property Office (12) Invention Patent Application (10) Application Publication Number (43) Application Publication Date (21) Application Number 202511783776.X (22) Application Date 2025.11.28 (71) Applicant Beijing North Huachuang Microelectronics Equipment Co., Ltd. Address 100176 No.8 Wenchang Avenue, Beijing Economic and Technological Development Zone, Daxing District, Beijing (72) Inventor Xu Zhenzhen (74) Patent Agency Beijing Tianhao United Intellectual Property Agency Co., Ltd. 11112 Patent Attorney Peng Ruixin Li Yingya (51) Int.Cl. G06F 3 / 0481 (2022.01) G06F 9 / 451 (2018.01) G06F 9 / 445 (2018.01) (54) Invention Title Interface Control Dynamic Management Method and System, Semiconductor Process Equipment (57) Abstract This disclosure provides an interface dynamic management method and system, Computer-readable storage media and semiconductor process equipment belong to the field of semiconductor fabrication technology and can solve the problems of low efficiency and poor scalability of existing interface generation methods. The dynamic management method for interface controls disclosed herein includes: reading a configuration file; the configuration file includes at least one interface path identifier and the corresponding control operation information; one interface path identifier corresponds to one chamber; parsing the configuration file, locating the initial view architecture of the chamber corresponding to the interface path identifier based on the interface path identifier, as the initial view structure to be modified; and performing corresponding operations on the initial view architecture to be modified based on the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber; and presenting the interface of each chamber based on the target view architecture of each chamber. The method disclosed herein has the advantages of high efficiency, scalability, and maintainability. Claims (3 pages), Description (12 pages), Drawings (6 pages), CN 121578906 A, 2026.02.27, CN 1 21 57 89 06 A. 1. A method for dynamic management of interface controls, applied to semiconductor process equipment, the semiconductor process equipment including multiple chambers; characterized in that the method includes: reading a configuration file; the configuration file includes at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponds to one chamber; parsing the configuration file, locating the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier, generating the target view architecture of the chamber; presenting the interface of each chamber based on the target view architecture of each chamber.2. The method according to claim 1, wherein both the initial view architecture and the target view architecture include a view layer, a view model, and a data model; the view layer includes multiple controls; the view model includes attributes corresponding to each control; and the data model is configured to store data corresponding to each attribute. 3. The method according to claim 2, wherein the control operation information includes deleting a first control; when the control operation information includes deleting a first control, performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: locating the first control in the view layer of the initial view structure to be modified and removing the first control; obtaining the view layer in the target view architecture; finding the attribute corresponding to the first control in the view model of the initial view structure to be modified and removing the attribute; obtaining the view model in the target view architecture. 4. The method according to claim 3, wherein finding the attribute corresponding to the first control and removing the attribute also includes: acquiring a data subscription channel related to the attribute corresponding to the first control and closing the data subscription channel; the data subscription channel is a communication link for acquiring lower-level machine data from the server and storing it in the data model. 5. The method according to claim 2, wherein the view model has a change notification interface, and at least some of the attributes in the view model have a get accessor and a set accessor; the get accessor is configured to get the current value of the attribute stored in the data model, and the set accessor is configured to update the value of the attribute when the received attribute value is different from the current value, and trigger an attribute change event defined by the change notification interface to send an attribute change notification to the view layer to update the control corresponding to the attribute in the view layer.6. The method according to claim 5, wherein the control operation information includes modifying the attribute value of the corresponding attribute of the second control; when the control operation information includes modifying the attribute value of the corresponding attribute of the second control, the step of performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: locating the second control in the view layer of the initial view structure to be modified; finding the attribute corresponding to the second control in the view model of the initial view structure to be modified; obtaining the type of the attribute corresponding to the second control, denoted as the first type; converting the data type of the attribute value of the attribute corresponding to the second control in the control operation information to the first type, and assigning a value to the attribute corresponding to the second control to modify the attribute value of the attribute corresponding to the second control, thereby obtaining the view model in the target view architecture; simultaneously triggering the attribute change event defined by the change notification interface, sending an attribute change notification to the view layer of the initial view structure to be modified, so that the view layer of the initial view structure to be modified is updated, thereby obtaining the view layer in the target view architecture. 7. The method according to claim 6, characterized in that, modifying the attribute value of the second control includes changing the attribute value of the second control from a first attribute value to a second attribute value; when the attribute value of the second control is the first attribute value, it indicates that the second control is displayed; when the attribute value of the second control is the second attribute value, it indicates that the second control is hidden; when modifying the attribute value of the second control is changing the attribute value of the second control from a first attribute value to a second attribute value, while modifying the attribute value of the corresponding attribute of the second control, it further includes: acquiring a data subscription channel related to the attribute corresponding to the second control, and closing the data subscription channel; the data subscription channel is a communication link for acquiring lower-level machine data from the server and storing it in the data model. 8. The method according to claim 6, characterized in that, modifying the attribute value of the second control includes changing the attribute value of the second control from a second attribute value to a first attribute value; when the attribute value of the second control is the first attribute value, it indicates that the second control is displayed; when the attribute value of the second control is the second attribute value, it indicates that the second control is hidden; when modifying the attribute value of the second control is changing the attribute value of the second control from a second attribute value to a first attribute value, while modifying the attribute value of the corresponding attribute of the second control, it further includes: obtaining a data subscription channel related to the attribute corresponding to the second control, and opening the data subscription channel; the data subscription channel is a communication link for obtaining lower-level machine data from the server and storing it in the data model.9. A computer-readable storage medium, characterized in that a computer program is stored on the computer-readable storage medium, and the computer program, when executed by a processor, implements the interface control dynamic management method according to any one of claims 1-8. 10. A semiconductor process apparatus, characterized in that it comprises: a processor and a memory; the memory stores a computer program, and the computer program, when executed by the processor, implements the interface control dynamic management method according to any one of claims 1-8. 11. A dynamic management system for interface controls, characterized in that it is used to implement the method of any one of claims 1-8, the system comprising: a server; the server storing at least a configuration file corresponding to a semiconductor process device, the semiconductor process device including multiple chambers; the configuration file including at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponding to one chamber; and a device; the device comprising: an initialization module configured to construct an initial view architecture for each chamber; a reading module configured to download and read the configuration file from the server; an update module configured to parse the configuration file, locate the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and perform corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier, generating a target view architecture for the chamber; and a presentation module configured to present the interface of each chamber based on the target view architecture. 12. The system according to claim 11, characterized in that the update module comprises: a parsing unit configured to parse the configuration file; a positioning unit configured to locate the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and an editing unit configured to perform corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier, and generate the target view architecture of the chamber.

[0001] This disclosure belongs to the field of semiconductor production control technology, specifically relating to a dynamic management method for interface controls, a computer-readable storage medium, semiconductor process equipment, and a dynamic management system for interface controls. Background Art

[0002] Semiconductor process equipment plays a crucial role in the contemporary information industry, and its process level directly affects the yield and efficiency of chips.Typically, semiconductor process equipment includes multiple independent process chambers (such as pre-cleaning chambers, deposition chambers, cooling chambers, etc.), and the operating status of these chambers needs to be monitored and controlled through the interactive interface of the semiconductor process equipment. Since each chamber is responsible for a specific process step, the interactive interface corresponding to different chambers has specific page controls closely related to the function of that chamber. For example, the interface of the pre-cleaning chamber needs to include controls such as plasma power and process gas flow rate, while the interface of the deposition chamber focuses on controls related to parameters such as sputtering rake power, deposition rate, and film thickness.

[0003] Currently, the interactive interfaces of semiconductor industrial equipment are mostly implemented based on the traditional Winform method. In this method, data binding relies on an event-driven mechanism. When the data source changes, the property values ​​of the controls need to be manually updated through the event handler to achieve synchronous data updates. For different types of semiconductor process equipment, or different chambers of the same semiconductor process equipment, the hardware configuration and process steps of each equipment or chamber are different, and the required interfaces are different. The interface layout and controls of the interactive interface implemented based on the Winform method are statically defined at compile time, which is difficult to cope with the flexible needs of different equipment or different chambers for dynamic management of interface controls.

[0004] Therefore, there is an urgent need to provide a dynamic management method for interface controls to adapt to the different needs of different semiconductor process equipment or different chambers of the same semiconductor process equipment for interface controls. Summary of the Invention

[0005] This invention aims to at least solve one of the technical problems existing in the prior art. On the one hand, it provides a dynamic management method for interface controls, applied to semiconductor process equipment, the semiconductor process equipment including multiple chambers; the method includes: reading a configuration file; the configuration file includes at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponds to one chamber; parsing the configuration file, locating the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber; and presenting the interface of each chamber based on the target view architecture.

[0006] In some optional embodiments, both the initial view architecture and the target view architecture include a view layer, a view model, and a data model; the view layer includes multiple controls; the view model includes attributes corresponding to each of the controls; and the data model is configured to store data corresponding to each of the attributes.

[0007] In some optional embodiments, the control operation information includes deleting the first control; when the control operation information includes deleting the first control, the step of performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: locating the first control in the view layer of the initial view structure to be modified, and removing the first control; obtaining the view layer in the target view architecture; finding the attribute corresponding to the first control in the view model of the initial view structure to be modified and removing the attribute; obtaining the view model in the target view architecture.

[0008] In some optional embodiments, while finding the attribute corresponding to the first control and removing the attribute, the step also includes: obtaining a data subscription channel related to the attribute corresponding to the first control and closing the data subscription channel; the data subscription channel is a communication link for obtaining lower-level machine data from the server and storing it in the data model.

[0009] In some optional embodiments, the view model has a change notification interface, and at least some of the attributes in the view model have a get accessor and a set accessor; the get accessor is configured to get the current value of the attribute stored in the data model, and the set accessor is configured to update the value of the attribute when the received attribute value is different from the current value, and trigger the attribute change event defined by the change notification interface to send an attribute change notification to the view layer to update the control in the view layer corresponding to the attribute.

[0010] In some optional embodiments, the control operation information includes modifying the attribute value of the attribute corresponding to the second control; when the control operation information includes modifying the attribute value of the attribute corresponding to the second control, the step of performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: locating the second control in the view layer of the initial view structure to be modified; finding the attribute corresponding to the second control in the view model of the initial view structure to be modified; obtaining the type of the attribute corresponding to the second control, denoted as the first type; converting the data type of the attribute value of the attribute corresponding to the second control in the control operation information to the first type, and assigning a value to the attribute corresponding to the second control to modify the attribute value of the attribute corresponding to the second control, thereby obtaining the view model in the target view architecture; simultaneously triggering the attribute change event defined by the change notification interface, sending an attribute change notification to the view layer of the initial view structure to be modified, so that the view layer of the initial view structure to be modified is updated, thereby obtaining the view layer in the target view architecture.

[0011] In some optional embodiments, modifying the attribute value of the second control includes changing the attribute value of the second control from a first attribute value to a second attribute value. When the attribute value of the second control is the first attribute value, it indicates that the second control is displayed; when the attribute value of the second control is the second attribute value, it indicates that the second control is hidden. When modifying the attribute value of the second control is changing the attribute value of the second control from a first attribute value to a second attribute value, while modifying the attribute value of the attribute corresponding to the second control, it also includes: obtaining a data subscription channel related to the attribute corresponding to the second control and closing the data subscription channel; the data subscription channel is a communication link for obtaining lower-level machine data from the server and storing it in the data model.

[0012] In some optional embodiments, modifying the attribute value of the second control includes changing the attribute value of the second control from a second attribute value to a first attribute value. When the attribute value of the second control is the first attribute value, it indicates that the second control is displayed; when the attribute value of the second control is the second attribute value, it indicates that the second control is hidden. When modifying the attribute value of the second control is changing the attribute value of the second control from a second attribute value to a first attribute value, while modifying the attribute value of the attribute corresponding to the second control, it also includes: obtaining a data subscription channel related to the attribute corresponding to the second control and opening the data subscription channel; the data subscription channel is a communication link for obtaining lower-level machine data from the server and storing it in the data model.

[0013] Based on the same inventive concept, in a second aspect, the present invention provides a computer-readable storage medium on which a computer program is stored, and when the computer program is executed by a processor, it implements the interface control dynamic management method described in any of the embodiments of the first aspect above.

[0014] Based on the same inventive concept, in a third aspect, the present invention provides a semiconductor process apparatus, comprising: a processor and a memory; wherein the memory stores a computer program, and the computer program, when executed by the processor, implements the interface control dynamic management method described in any of the embodiments of the first aspect.

[0015] Based on the same inventive concept, in a fourth aspect, the present invention provides a dynamic interface control management system for implementing the method described in any embodiment of the first aspect above. The system includes: a server; the server at least stores a configuration file corresponding to a semiconductor process device, the semiconductor process device including multiple chambers; the configuration file including at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponds to one chamber; and a device; the device includes: an initialization module configured to construct an initial view architecture for each chamber; a reading module configured to download and read the configuration file from the server; an update module configured to parse the configuration file, locate the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and perform corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier to generate a target view architecture for the chamber; and a presentation module configured to present the interface of each chamber based on the target view architecture.

[0016] In some optional embodiments, the update module includes: a parsing unit configured to parse the configuration file; a locating unit configured to locate the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, as the initial view structure to be modified; and an editing unit configured to perform corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier, thereby generating the target view architecture of the chamber.

[0017] In the interface control dynamic management method provided in this disclosure, the configuration file and MVVM architecture are deeply integrated. By modifying the configuration file, the program can quickly manage the controls in each interface according to the control operation information of different interfaces in the configuration file, flexibly adapting to the different interface requirements of different semiconductor process equipment or different chambers of the same semiconductor process equipment. Furthermore, the MVVM architecture completely decouples the view layer and view model, and the interface controls and data source are bidirectionally bound in a data-driven manner. Under this architecture, when the value of the data source changes, the control will automatically update. Similarly, when the user operates the control, the data source will also automatically update. This automated synchronous update can avoid manually writing code to update data, which can greatly improve work efficiency. At the same time, the completely decoupled view layer and view model are easier to maintain and extend.

[0018] Figure 1 is a local schematic diagram of the semiconductor process equipment interface.

[0019] Figure 2 is a flowchart of the dynamic management method for interface controls provided in this disclosure.

[0020] Figure 3 is a flowchart illustrating the bidirectional binding process between the view layer and view model.

[0021] Figure 4 is a schematic diagram of bidirectional notification between the view layer and view model.

[0022] Figure 5 is a flowchart illustrating the deletion of the first control.

[0023] Figure 6 is a flowchart illustrating the modification of the attribute value of the corresponding attribute of the second control.

[0024] Figure 7 is the interface structure of chamber 1 and chamber 2 of the semiconductor process equipment.

[0025] Figure 8 is a structural diagram of the interface control dynamic management system provided in this disclosure. Detailed Description

[0026] To enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Specification 3 / 12 pages 7 CN 121578906 A

[0027] Unless otherwise defined, the technical or scientific terms used in this disclosure should have the ordinary meaning understood by those skilled in the art to which this disclosure pertains. The terms "first," "second," and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Similarly, the terms "a," "one," or "the," etc., do not indicate a quantity limitation, but indicate the presence of at least one. Words such as “include” or “contain” mean that the element or object preceding the word covers the element or object listed after the word and its equivalents, without excluding other elements or objects. Words such as “connected” or “linked” are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. “Up,” “down,” “left,” “right,” etc., are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described object changes.

[0028] As used herein, “parallel” and “perpendicular” include the situation described and situations similar to the situation described, within an acceptable deviation range, which is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, “parallel” includes absolute parallelism and approximate parallelism, where the acceptable deviation range for approximate parallelism may be, for example, within 5°; “perpendicular” includes absolute perpendicularity and approximate perpendicularity, where the acceptable deviation range for approximate perpendicularity may also be, for example, within 5°.

[0029] It should be understood that when a layer or element is referred to as being on another layer or substrate, it may mean that the layer or element is directly on the other layer or substrate, or that there is an intermediate layer between the layer or element and the other layer or substrate.

[0030] In this document, "electrical connection" includes the case where constituent elements are connected together by an element having some electrical function. There is no particular limitation on the term "electrical function" as long as it enables the transmission and reception of electrical signals between the connected constituent elements.Examples of “elements having some electrical function” include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other elements with various functions.

[0031] Exemplary embodiments are described herein with reference to cross-sectional views and / or plan views as idealized exemplary drawings. In the drawings, the thickness of layers and regions is enlarged for clarity. Therefore, variations in shape relative to the drawings are conceivable due to, for example, manufacturing techniques and / or tolerances. Therefore, exemplary embodiments should not be construed as being limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of the regions of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0032] The interface of a semiconductor process device is its “human-machine dialogue” window, and its design needs to be combined with specific process and operating logic. Different types of devices, and even different chambers of the same device, have different interfaces.

[0033] Taking the AlPad machine for manufacturing the top aluminum pads of a chip as an example, it includes multiple process chambers, such as a pre-cleaning chamber, an aluminum physical vapor deposition chamber, an etching chamber, and an annealing chamber. The host computer corresponding to this equipment will have an overview interface, which integrates button controls for each chamber. Clicking the button of a certain chamber will enter the sub-interface corresponding to that chamber. Different chambers have different sub-interfaces due to different process objectives and hardware configurations.

[0034] The process objective of the pre-cleaning chamber is to remove the natural oxides and contaminants on the surface of the silicon wafer using plasma before aluminum deposition, ensuring the cleanliness of the silicon wafer surface. Therefore, its interactive interface needs to highlight the cleaning steps and key parameters in the cleaning process, such as RF bias power, cleaning time, and gas flow rate. The process objective of the aluminum physical vapor deposition chamber is to uniformly sputter aluminum material onto the surface of the silicon wafer in an ultra-high vacuum environment. Its interactive interface needs to highlight the vacuum level of the chamber and the key parameters of the sputtering process (sputtering power, reactive gas flow rate, substrate stage temperature, and deposition time, etc.). The process objective of the etching chamber is to etch the deposited aluminum film into the desired pad pattern. The key interface specification (page 4 / 12, CN 121578906 A) displays the etching gas flow rate, RF power, pressure, etc. The process objective of the annealing chamber is to repair the aluminum film lattice through heating, thereby reducing resistance and enabling good ohmic contact with the underlying metal. Therefore, the key interface element is the temperature profile.

[0035] In general, the pre-cleaning chamber, the aluminum physical vapor deposition chamber, and the etching chamber all require plasma generation via radio frequency (RF), so their interfaces all involve RF bias power-related components; while the annealing chamber only involves a pure heat treatment process and is not connected to an RF power supply, so the annealing chamber interface does not involve the RF bias power component at all. It is evident that the interface components of different chambers vary depending on the chamber's process objectives and hardware configuration.

[0036] Currently, the interactive interface of semiconductor process equipment is implemented using Winform. This method heavily relies on event-driven data binding. Whenever the underlying data source (e.g., sensor monitoring data) changes, developers need to write a large number of event handlers to manually find and update the corresponding interface control properties. This update method not only involves a large amount of code and low development efficiency, but may also lead to interface response delays. This is because in real-time monitoring scenarios with high-frequency data changes, the interface thread is easily blocked, causing data display lag and even affecting critical alarms and timely prompts. This tightly coupled architecture severely affects the maintainability and scalability of the program. Because data logic and interface presentation are coupled, any modification to one will cause modifications to multiple scattered code sections, increasing the difficulty of development and debugging. More importantly, it fundamentally hinders the modular reuse of code. For example, for the AlPad machine mentioned above, the interface components of different chambers are different, but for the Winform method, it is impossible to construct a component that can be reused in different chambers because the relevant logic is tightly bound to a specific interface. Therefore, the current model is difficult to meet the goals of modularity, high maintainability, and easy expansion of semiconductor process equipment. Therefore, it is necessary to provide a dynamic management method for page components to adapt to the different interface requirements of different chambers.

[0037] In order to solve at least one of the above technical problems, on the one hand, this disclosure provides a dynamic management method for interface controls, applied to semiconductor process equipment, which includes multiple chambers.

[0038] Before introducing the technical solution of this disclosure in detail, as necessary technical groundwork, the following terms and concepts are explained.

[0039] MVVM architecture: namely Model-View-ViewModel architecture, it is a product of Microsoft WPF (Windows Presentation Foundation) technology, combining the MVP (Model-View-Presenter) pattern and WPF technology. The core idea is to abstract the state and behavior in the View (view layer), and separate the interface and business logic through Binding technology, thus realizing a data-driven architecture.

[0040] As the name suggests, the MVVM architecture includes three major components: View, ViewModel (view model), and Model (data model).Among them, View is the interface that the user can interact with. View is usually defined by XAML (eXtensible Application Markup Language) and includes the controls that the interface needs to display. ViewModel is an abstraction of View and is responsible for loading data logic. View and ViewModel bind controls and properties through the DataBinding mechanism, so that when the controls of View change, the changes are directly passed to ViewModel, and the properties of ViewModel change accordingly; when the properties of ViewModel change, View is notified, so that the controls of View are updated. Model is responsible for implementing the underlying business logic and does not interact directly with View. It is used to store the data corresponding to the properties of ViewModel and usually includes one or more classes, which are directly called by ViewModel. In other words, ViewModel is the bridge between View and Model.

[0041] Interface control: refers to the visual operation elements in the graphical user interface that allow users to interact with devices, software, or applications. For example, common interface controls include: buttons, links, text boxes, lists, sliders, progress bars, etc. Figure 1 is a local schematic diagram of the semiconductor process equipment interface. As shown in Figure 1, the buttons corresponding to "Status", "Recipe", "Source", etc., the input box corresponding to parameter a1, the list corresponding to parameter a3, etc., are all controls in the interface specification page 5 / 12 9 CN 121578906 A.

[0042] Interface component: refers to a composite unit composed of multiple interface controls, which is equivalent to a container that can hold multiple interface controls. Referring to Figure 1 again, the functional area where "Bias RF" is located is an interface component, which can display the relevant parameters of the RF power supply, such as parameter a1, parameter a2, and parameter a3; similarly, the functional area where "Source DC" is located is also an interface component, which can include the relevant parameters of the DC power supply; both of the above interface components include multiple controls such as title bar, text box, and list.

[0043] Interface: refers to the sum of all interface components. A complete interface has multiple interface components laid out.

[0044] Relationship between interface, view, and viewmodel: The view corresponding to the interface is the code unit that carries the interface. This code unit can define the function and effect of the interface. Commonly, a View is a code file in .xaml, .vue, or .axml format, while the user interface is how the View is presented after the program runs. The user interface corresponds to the View, and the controls in the user interface or View correspond to and are bound to the properties of the ViewModel.

[0045] Relationship between interface components and sub-ViewModels: The interface includes multiple interface components, and correspondingly, the ViewModel includes multiple sub-ViewModels corresponding to the interface components; furthermore, each interface control in the interface component corresponds to an attribute in the sub-ViewModel.

[0046] For ease of understanding, this document uniformly refers to View as the view layer, ViewModel as the view model, and Model as the data model.

[0047] Figure 2 is a flowchart of the dynamic management method for interface controls provided in this disclosure. As shown in Figure 2, the dynamic management method for interface controls includes:

[0048] Step S1: Construct the initial view architecture for each chamber.

[0049] Wherein, the initial view architecture is an MVVM architecture, including a view layer, a view model, and a data model. Wherein, as mentioned above, the view layer includes multiple controls, the view model includes attributes corresponding to each control, and the data model is configured to store the data corresponding to each attribute.

[0050] It can be understood that before constructing the initial view architecture for each chamber, it is necessary to design the view layer, view model, and data model for each chamber according to the functional requirements of the interface of each chamber in the semiconductor process equipment. Of course, the view layers of each chamber can be different or the same. When the view layers of each chamber are the same, the view layer should include the controls that each chamber needs to display, that is, it should cover as many elements as possible to adapt to the needs of different chambers. When the view layers of each chamber are the same, the amount of design work in the early stage can be reduced.

[0051] The steps of designing the view layer and view model include:

[0052] Design the view model independently according to the functional requirements of the view layer. The design of the view model includes designing the attributes therein. For example, according to "what information the interface needs to display", design the data attributes in the view model; according to "what operations the user can perform", design the command attributes in the view model; according to "what state changes the interface has", design the state attributes in the view model.

[0053] Design the view layer according to the designed view model, including designing the various control elements in the view layer. For example, for data attributes, a list can be used to display; for command attributes, a button can be used to trigger; for state attributes, a progress bar can be used to display.

[0054] After designing the view layer and view model, it is necessary to use the MVVM design pattern to achieve two-way binding between the view layer and the view model.

[0055] Figure 3 is a schematic diagram of the process of bidirectionally binding the view layer and the view model. As shown in Figure 3, the steps of bidirectional binding between the view layer and the view model include: Specification 6 / 12 pages 10 CN 121578906 A

[0056] Step S001: Add a change notification interface (INotifyPropertyChanged) to the view model.This step specifically includes: a) declaring a property change event (PropertyChanged) to send a property change notification when a property changes; b) creating a property change method (OnPropertyChanged) to trigger the property change event and receive the name and value of the changed property.

[0057] Step S002: In the view model, declare one or more properties with get accessors and set accessors. The get accessor is configured to get the current value of the property stored in the data model, and the set accessor is configured to call the property change method. When the received property value is different from the current value, update the property value and pass in the property name to trigger the property change event defined by the change notification interface and send the property change notification to the view layer.

[0058] Step S003: In the view layer, use binding expressions to bind the controls in the view layer to the properties corresponding to the controls in the view model. At the same time, the binding expression mode is set to bidirectional, so that the data flow has two directions. That is, when the control changes due to user interaction, the property corresponding to the control in the view model is notified and updated. When the property value of the view model changes, the view layer is notified so that the control in it can be updated.

[0059] For example, suppose there is a button (Button Command) in the view layer. The function of the button is "search command". The view model has a property corresponding to the button - SearchCommand. In step S003, the binding expression is used to bind the control in the view layer and the property corresponding to the control in the view model. In fact, the following code is added to the .xaml file of the view layer:

[0060] <button command=""{Binding" searchcommand}”content=""搜索”">

[0061] After designing the view layer, view model, and model, and binding the view layer and view model bidirectionally, an application environment is created. After starting the application, the initial view architecture of each chamber is constructed. In other words, constructing the initial view architecture refers to instantiating the view model and instantiating the view layer.

[0062] Figure 4 is a schematic diagram of bidirectional notification between the view layer and the view model. As shown in Figure 4, when the interface control changes, the attribute change event in the view model is triggered, the set accessor of the corresponding attribute of the control is executed, so that the attribute receives the notification and updates, and stores the updated value in the data model. When the attribute in the view model changes, the changed value is stored in the data model at the same time. The set accessor of the attribute will trigger the attribute change event in the view model, send an attribute change notification to the view layer, so that the interface control responds to the notification and updates.

[0063] This disclosure achieves data synchronization between the view layer and the view model by adopting the MVVM architecture and through the data binding mechanism. When the attribute changes, the control will automatically update. At the same time, when the control changes, the attribute will also automatically change accordingly. Compared to the Winform approach, this method completely decouples the view layer and view model, separating data logic from page logic. This allows developers to independently test the view model without relying on the view layer code, improving code maintainability and testability, and reducing development and maintenance costs. Furthermore, it eliminates the need to manually trigger events to update data or UI controls; synchronization between the view layer and view model is ensured through a notification interface, significantly improving control management efficiency and editing speed.

[0064] Step S2: Read the configuration file. The configuration file includes at least one interface path identifier and the corresponding control operation information. One interface path identifier corresponds to one chamber.

[0065] For example, the configuration file is stored in the server's system directory in XML file format. Before the application starts, developers or users can write the configuration file according to the different requirements of each chamber for UI controls.

[0066] The configuration file can be defined with reference to the following example code.

[0067] <controlconfigs>Instruction manual, page 7 / 12, 11 CN 121578906 A

[0068] <screenpath name="Service.Chamber.Ch1"> / / The interface path is identified as chamber 1

[0069] <deletecontrols> / / Delete the specified control

[0070] <control name="RFControl" / > / / The control name is Radio Frequency Control

[0071] <control name="CollimatorControl" / > / / The control name is Collimator Control

[0072] <control name="Emag1Control" / >

[0073] <control name="Emag2Control" / >

[0074] < / deletecontrols>

[0075] <editcontrols> / / Edit the properties of the specified control

[0076] <control name="ChamberControl">

[0077] <attribute name="SourceDCVisibility" value="true" / > / / Change the attribute value of "Visibility of DC Source" to "Display"

[0078] <attribute name="BiasRFVisibility" value="false" / > / / Change the value of the attribute "Visibility of RF source" to hidden

[0079] <attribute name="CoilRFVisibility" value="false" / >

[0080] < / control>

[0081] < / editcontrols>

[0082] < / screenpath>

[0083] <screenpath name="Service.Chamber.Ch2"> / / The interface path is identified as chamber 2

[0084] <deletecontrols> / / Delete the specified control

[0085] <control name="CollimatorControl" / > / / The control name is Collimator Control

[0086] <control name="Emag1Control" / >

[0087] <control name="Emag2Control" / >

[0088] < / deletecontrols>

[0089] <editcontrols> / / Edit the properties of the specified control

[0090] <control name="ChamberControl">

[0091] <attribute name="SourceDCVisibility" value="true" / > / / Change the attribute value of "Visibility of DC source" to display

[0092] <attribute name="BiasRFVisibility" value="true" / > / / Change the attribute value of "Visibility of RF Power Supply" to "Display"

[0093] <attribute name="CoilRFVisibility" value=" true " / >

[0094] < / control>

[0095] < / editcontrols>

[0096] < / screenpath>

[0097]

[0098] Wherein, ScreenPath name is the interface path identifier, Service.Chamber.Ch1 is chamber 1. When ScreenPath name="Service.Chamber.Ch1" is parsed, the initial view architecture corresponding to chamber 1 will be located. The content below ScreenPath name="Service.Chamber.Ch1" is the control operation information, which includes in the above example. <deletecontrols>as well as <eidtcontrols>, respectively, represent deleting the specified control and editing the properties of the specified control. Specification 8 / 12 page 12 CN 121578906 A

[0099] For example, the above exemplary code represents that, for chamber 1, the "RF", "Collimator", "Emag1" and "Emag2" controls in its interface need to be deleted. At the same time, "SourceDC" under "Chamber" in the interface is displayed, and "BiasRF" and "CoilRF" are hidden. For chamber 2, the "Collimator", "Emag1" and "Emag2" controls in its interface need to be deleted. At the same time, "SourceDC", "BiasRF" and "CoilRF" under "Chamber" in the interface are all displayed. The above configuration file means that in each chamber of this semiconductor process equipment, chamber 1 is not connected to the RF power supply, therefore the "RF" control is not needed, nor is it necessary to display "BiasRF" related content; while chamber 2 is connected to both the DC power supply and the RF power supply, therefore it is necessary to display "BiasRF" related content.

[0100] It is understood that the above configuration file only shows the control operation information of two chambers. In specific implementation, the configuration file may include the control operation information of each chamber. Of course, the control operation information is not limited to deleting controls and editing control attributes, but may also include modifying control names and interface layouts, etc.

[0101] Step S3: Parse the configuration file, locate the initial view architecture of the chamber corresponding to the interface path identifier according to the interface path identifier, and use it as the initial view structure to be modified; and perform corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber.

[0102] Continuing with the above exemplary configuration file, step S3 will be briefly described.

[0103] When ScreenPath name="Service.Chamber.Ch1" is parsed, the initial view architecture corresponding to chamber 1 is located as the initial view architecture to be modified. Then, according to the control operation information of chamber 1, the corresponding operation is performed on the initial view architecture to be modified to generate the target view architecture of chamber 1. The purpose is to delete the "RF", "Collimator", "Emag1" and "Emag2" controls, and at the same time, display "SourceDC" under "Chamber" and hide "BiasRF" and "CoilRF".

[0104] When ScreenPath name="Service.Chamber.Ch2" is parsed, the initial view architecture corresponding to chamber 2 is located as the initial view architecture to be modified. Then, according to the control operation information of chamber 2, the target view architecture to be modified is generated.The initial view architecture performs corresponding operations to generate the target view architecture of chamber 2. The purpose is to delete the "Collimator", "Emag1" and "Emag2" controls of chamber 2, and at the same time, display "SourceDC", "BiasRF" and "CoilRF" under "Chamber".

[0105] The target view architecture is also an MVVM architecture, which also includes a view layer, view model and data model. However, the target view architecture is obtained by modifying and editing the initial target architecture according to the configuration file. Therefore, the contents of the view layer, view model and data model of the two are different.

[0106] Step S4: Based on the target view architecture of each chamber, present the interface of each chamber.

[0107] It can be understood that even if the initial view architecture of each chamber is the same, that is, the view layer, view model and model are the same, after the above steps S2 and S3, the target view architecture of each chamber may change (whether it changes is determined by the configuration file), so that the interface of each chamber is different, so as to quickly realize the difference of the interface of each chamber to adapt to the functional requirements of different chambers.

[0108] The dynamic management method for interface controls provided in this disclosure deeply integrates the configuration file and the MVVM architecture. By modifying the configuration file, the program can quickly manage the controls in each interface according to the control operation information of different interfaces in the configuration file, flexibly adapting to the different interface requirements of different semiconductor process equipment or different chambers of the same semiconductor process equipment. In addition, the MVVM architecture completely decouples the view layer and the view model. The interface controls and the data source are bidirectionally bound in a data-driven manner. Under this architecture, when the value of the data source changes, the control will automatically update. Similarly, when the user operates the control, the data source will also automatically update. This kind of automatic synchronous update can avoid manually writing code to update data, which can greatly improve work efficiency. At the same time, the completely decoupled view layer and view model are easier to maintain and expand.

[0109] Continuing with the above exemplary configuration file, the specific process of deleting controls and editing control properties will be introduced.

[0110] Figure 5 is a schematic diagram of the process of deleting the first control. As shown in Figure 5, when the control operation information includes deleting the first control, in step S3, according to the control operation information corresponding to the interface path identifier, the corresponding operation is performed on the initial view architecture to be modified, including:

[0111] Step SS1: In the view layer of the initial view structure to be modified, locate the first control and remove the first control; obtain the view layer in the target view architecture.

[0112] Step SS2: In the view model of the initial view structure to be modified, find the attribute corresponding to the first control and remove the attribute; obtain the view model in the target view architecture.

[0113] In some other examples, the control operation information is to delete the first component, which includes multiple controls and has a corresponding subview model. In this example, deleting the first component includes:

[0114] In the view layer of the initial view structure to be modified, locate the first component and remove the first component from its parent container; obtain the view layer in the target view architecture.

[0115] In the view model of the initial view structure to be modified, use reflection to find the subview model corresponding to the first component and remove the subview model; obtain the view model in the target view architecture.

[0116] The reflection mechanism refers to the fact that the program can obtain the subview model corresponding to the component at runtime and execute the "remove subview model" method to delete the subview model.

[0117] It can be understood that when deleting a control (the smallest element in the interface), it is necessary to find the corresponding attribute of the control in the view model and delete it together; when deleting a component (including multiple controls), it is necessary to find the corresponding subview model of the component in the view model and delete it together.

[0118] Further, while finding and removing the attribute corresponding to the first control, the method also includes: obtaining the data subscription channel related to the attribute corresponding to the first control, and closing the data subscription channel.

[0119] Wherein, the data subscription channel is the communication link for obtaining lower-level machine data from the server and storing it in the data model. When the first control is deleted, the attribute corresponding to the first control in the view model is removed. At the same time, the channel for obtaining data for the attribute is closed, so that the data related to the attribute cannot occupy the communication link for transmission. This can effectively reduce system resource overhead and reduce communication and computing resources.

[0120] Continuing with the above exemplary configuration file, when the cavity 1 is located, deleting the first control means deleting any one or more of "RF", "Collimator", "Emag1" and "Emag2" in the cavity 1 interface; when the cavity 2 is located, deleting the first control means deleting any one or more of "Collimator", "Emag1" and "Emag2" in the cavity 2 interface.

[0121] Figure 6 is a flowchart of modifying the attribute value of the attribute corresponding to the second control. As shown in Figure 6, when the control operation information includes modifying the attribute value of the corresponding attribute of the second control, in step S3, according to the control operation information corresponding to the interface path identifier, the corresponding operation is performed on the initial view structure to be modified, including:

[0122] Step SA1: Locate the second control in the view layer of the initial view structure to be modified.

[0123] Continuing with the above exemplary configuration file, the second control is, for example, SourceDC, BiasRF, CoilRF, etc.

[0124] Step SA2: In the view model of the initial view structure to be modified, find the attribute corresponding to the second control.

[0125] When the second control is Source DC, Bias RF, or Coil RF, its corresponding attributes are SourceDCVisibility, BiasRFVisibility, and CoilRFVisibility, respectively. (Instruction manual, page 10 / 12, CN 121578906 A)

[0126] Step SA3: Obtain the type of the attribute corresponding to the second control, denoted as the first type.

[0127] Typically, the type refers to whether the data is a string, boolean, or numerical value, etc. For example, the type of the attribute corresponding to the second control is boolean.

[0128] Step SA4: After converting the data type of the attribute value of the attribute corresponding to the second control in the control operation information to the first type, assign a value to the attribute corresponding to the second control to modify the attribute value of the attribute corresponding to the second control, thereby obtaining the view model in the target view architecture; simultaneously, trigger the attribute change event defined by the change notification interface, send an attribute change notification to the view layer of the initial view structure to be modified, so that the view layer of the initial view structure to be modified is updated, thereby obtaining the view layer in the target view architecture.

[0129] Since the data type of the attribute value obtained from the server is usually the string "True" or "False", while the type of the attribute corresponding to the second control is Boolean, it is necessary to convert the string "True" or "False" to the Boolean type "true" or "false" before assigning the value. After the type is matched, the attribute corresponding to the second control is assigned a value to modify the attribute value of the attribute corresponding to the second control and obtain the view model in the target view architecture.

[0130] Continuing with the above exemplary configuration file, when the chamber 1 is located, modifying the attribute value of the attribute corresponding to the second control means modifying "SourceDCVisibility" under "Chamber" to True, and modifying "BiasRFVisibility" and "CoilRFVisibility" to False. When the chamber 2 is located, modifying the attribute value of the attribute corresponding to the second control means modifying "SourceDCVisibility", "BiasRFVisibility" and "CoilRFVisibility" under "Chamber" to True. It is understandable that True means visible, i.e., displayed, and False means invisible, i.e., hidden.

[0131] Further, modifying the attribute value of the second control includes changing the attribute value of the second control from the first attribute value to the second attribute value, or changing the attribute value of the second control from the second attribute value to the first attribute value. In this document, the firstThe attribute value is True, and the second attribute value is False. When the attribute value of the second control is the first attribute value, it indicates that the second control is displayed. When the attribute value of the second control is the second attribute value, it indicates that the second control is hidden.

[0132] When the attribute value of the second control is modified from True to False, the above step SA4, while modifying the attribute value of the corresponding attribute of the second control, also includes: obtaining the data subscription channel related to the attribute of the second control and closing the data subscription channel. The data subscription channel is a communication link for obtaining lower-level machine data from the server and storing it in the data model. That is, when the second control is hidden, the data transmission channel related to the attribute of the second control can be closed at the same time, which can reduce system resource overhead.

[0133] Conversely, when the attribute value of the second control is modified from False to True, the above step SA4, while modifying the attribute value of the corresponding attribute of the second control, also includes: obtaining the data subscription channel related to the attribute of the second control and opening the data subscription channel. That is, when the second control needs to be displayed, it is necessary to ensure that the data channel of the corresponding attribute of the second control is opened, so as to ensure the normal operation and display of the control.

[0134] In order to clearly demonstrate the effect of the present disclosure, Figure 7 shows the interface structure of the semiconductor process equipment chamber 1 and chamber 2. The configuration file used is still the above-mentioned exemplary configuration file. That is, the RF control is deleted in chamber 1 and the BiasRF is hidden, while chamber 2 retains both BiasRF and SourceDC. As shown in Figure 7(a), in the interface of chamber 1, only SourceDC is under the Chamber→Source tab, and there is no BiasRF; while as shown in Figure 7(b), in the interface of chamber 2, not only SourceDC but also BiasRF is under the Chamber→Source tab. In other words, only the configuration file needs to be modified to independently modify the controls of different chambers, so as to adapt to the different needs of different chambers.

[0135] In a second aspect, based on the same inventive concept, this disclosure provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the interface control dynamic management method described in the first aspect above.

[0136] In a third aspect, based on the same inventive concept, this disclosure provides a semiconductor process apparatus, comprising: a processor and a memory; the memory having a computer program stored thereon, which, when executed by a processor, implements the interface control dynamic management method described in the first aspect above.

[0137] In a fourth aspect, based on the same inventive concept, this disclosure provides an interface control dynamic management system, which is used for...The above-described method for dynamic management of interface controls is implemented.

[0138] Figure 8 is a schematic diagram of the structure of the dynamic management system for interface controls provided in this disclosure. As shown in Figure 8, the system includes a server and a device. The server stores at least a configuration file corresponding to a semiconductor process device. The semiconductor process device includes multiple chambers. The configuration file includes at least one interface path identifier and control operation information corresponding to the interface path identifier. One interface path identifier corresponds to one chamber. In addition, the server also stores a database and lower-level machine data. The device includes an initialization module, a reading module, an update module, and a presentation module. The initialization module is configured to build an initial view architecture for each chamber. The initialization architecture is an MVVM architecture. The process of building the initialization architecture can refer to step S1 above, which will not be repeated here. The reading module is configured to download and read the configuration file from the server. Specifically, the server's storage list can store configuration files for different semiconductor process devices. The reading module needs to download the corresponding configuration file from the server's storage list according to the model of the semiconductor process device it is in. The update module is configured to parse the configuration file, locate the initial view architecture of the chamber corresponding to the interface path identifier based on the interface path identifier, use it as the initial view structure to be modified, and perform corresponding operations on the initial view architecture to be modified based on the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber. The specific working process of the update module can be referred to step S3 above, and will not be repeated here. The presentation module is configured to present the interface of each chamber based on the target view architecture.

[0139] Specifically, the update module includes: a parsing unit, a positioning unit, and an editing unit. Among them, the parsing unit is configured to parse the configuration file; the positioning unit is configured to locate the initial view architecture of the chamber corresponding to the interface path identifier based on the interface path identifier, use it as the initial view structure to be modified. The editing unit is configured to perform corresponding operations on the initial view architecture to be modified based on the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber.

[0140] The interface control dynamic management system provided in this disclosure deeply integrates configuration files and the MVVM architecture. By modifying the configuration file, the program can quickly manage the controls in each interface based on the control operation information of different interfaces in the configuration file, flexibly adapting to the different interface requirements of different semiconductor process equipment or different chambers of the same semiconductor process equipment. In addition, the MVVM architecture completely decouples the view layer and the view model, and the interface controls and the data source are bidirectionally bound in a data-driven manner. Under this architecture, when the value of the data source changes, the control will automatically update. Similarly, when the user operates the control, the data source will also automatically update. This kind of automatic synchronous update can avoid manual programming.Updating data through code can significantly improve work efficiency, while the completely decoupled view layer and view model are easier to maintain and extend.

[0141] It is understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and substance of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention. Instruction Manual 12 / 12 Page 16 CN 121578906 A Figure 1 Instruction Manual Appendix 1 / 6 Page 17 CN 121578906 A Figure 2 Figure 3 Instruction Manual Appendix 2 / 6 Page 18 CN 121578906 A Figure 4 Figure 5 Instruction Manual Appendix 3 / 6 Page 19 CN 121578906 A Figure 6 Instruction Manual Appendix 4 / 6 Page 20 CN 121578906 A Figure 7 Instruction Manual Appendix 5 / 6 Page 21 CN 121578906 A Figure 8 Instruction Manual Appendix 6 / 6 Page 22 CN 121578906 A Abstract The present disclosure provides an interface dynamic management method and system, a computer-readable storage medium, and a semiconductor process device, belonging to the field of semiconductor manufacturing technology, and can solve the problems of low efficiency and poor scalability of existing interface generation methods. The dynamic management method for interface controls in the present disclosure includes: reading a configuration file, the configuration file including at least one interface path identification and control operation informationcorresponding to the interface path identification, and one interface path identification corresponding to one chamber; analyzing the configuration file, and based on the interface path identification, positioning an initial view architecture of a chamber corresponding to the interface path identification as a to-be-modified initial view architecture; based on the control operation information corresponding to the interface path identification, performing a corresponding operation on the to-be-modified initial view architecture to generate a target view architecture of the chamber; presenting an interface of each chamber based on the target view architecture of each chamber. The method provided in the present disclosure has the advantages of high efficiency, high expandability, and high maintainability.< / eidtcontrols> < / deletecontrols> < / controlconfigs> < / button>

Claims

1. A method for dynamic management of interface controls, applied to semiconductor process equipment, the semiconductor process equipment comprising multiple chambers; characterized in that, The method includes: Read the configuration file; the configuration file includes at least one interface path identifier and control operation information corresponding to the interface path identifier; one interface path identifier corresponds to one chamber; The configuration file is parsed, and the initial view architecture of the chamber corresponding to the interface path identifier is located according to the interface path identifier, which is used as the initial view structure to be modified; and the corresponding operation is performed on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber. Based on the target view architecture of each chamber, the interface of each chamber is presented.

2. The method according to claim 1, characterized in that, Both the initial view architecture and the target view architecture include a view layer, a view model, and a data model; the view layer includes multiple controls; the view model includes attributes corresponding to each control; and the data model is configured to store data corresponding to each attribute.

3. The method according to claim 2, characterized in that, The control operation information includes deleting the first control; when the control operation information includes deleting the first control, the step of performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: In the view layer of the initial view structure to be modified, the first control is located and removed; thus, the view layer in the target view architecture is obtained. In the view model of the initial view structure to be modified, find the attribute corresponding to the first control and remove the attribute; thus obtaining the view model in the target view architecture.

4. The method according to claim 3, characterized in that, The process of finding and removing the attribute corresponding to the first control also includes: Obtain the data subscription channel related to the attribute corresponding to the first control, and close the data subscription channel; The data subscription channel is a communication link that obtains lower-level machine data from the server and stores it in the data model.

5. The method according to claim 2, characterized in that, The view model has a change notification interface, and at least some of the attributes in the view model have get accessors and set accessors; The accessor is configured to retrieve the current value of the attribute stored in the data model, and the accessor is configured to update the value of the attribute and trigger the attribute change event defined by the change notification interface when the received attribute value is different from the current value, so as to send an attribute change notification to the view layer to update the control corresponding to the attribute in the view layer.

6. The method according to claim 5, characterized in that, The control operation information includes modifying the attribute value of the corresponding property of the second control; When the control operation information includes modifying the attribute value of the corresponding attribute of the second control, the step of performing corresponding operations on the initial view architecture to be modified according to the control operation information corresponding to the interface path identifier includes: In the view layer of the initial view structure to be modified, position the second control; In the view model of the initial view structure to be modified, find the attribute corresponding to the second control; Obtain the type of the corresponding property of the second control, and denote it as the first type; After converting the data type of the attribute value of the second control corresponding to the control operation information to the first type, the attribute corresponding to the second control is assigned a value to modify the attribute value of the second control corresponding to the attribute, thereby obtaining the view model in the target view architecture; at the same time, the attribute change event defined by the change notification interface is triggered, and an attribute change notification is sent to the view layer of the initial view structure to be modified, so that the view layer of the initial view structure to be modified is updated, thereby obtaining the view layer in the target view architecture.

7. The method according to claim 6, characterized in that, Modifying the attribute value of the second control includes changing the attribute value of the second control from a first attribute value to a second attribute value. When the attribute value of the second control is the first attribute value, it indicates that the second control is displayed. When the attribute value of the second control is the second attribute value, it indicates that the second control is hidden. When modifying the property value of the second control by changing its property value from the first property value to the second property value, the modification also includes: Obtain the data subscription channel related to the attribute corresponding to the second control, and close the data subscription channel; The data subscription channel is a communication link that obtains lower-level machine data from the server and stores it in the data model.

8. The method according to claim 6, characterized in that, Modifying the attribute value of the second control includes changing the attribute value of the second control from a second attribute value to a first attribute value. When the attribute value of the second control is the first attribute value, it indicates that the second control is displayed. When the attribute value of the second control is the second attribute value, it indicates that the second control is hidden. When modifying the property value of the second control by changing its property value from the second property value to the first property value, the modification also includes: Obtain the data subscription channel related to the attribute corresponding to the second control, and open the data subscription channel; The data subscription channel is a communication link that obtains lower-level machine data from the server and stores it in the data model.

9. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program, which, when executed by a processor, implements the interface control dynamic management method according to any one of claims 1-8.

10. A semiconductor process apparatus, characterized in that, include: Processor and memory; The memory stores a computer program, which, when executed by the processor, implements the interface control dynamic management method according to any one of claims 1-8.

11. A dynamic management system for interface controls, characterized in that, The system for implementing the method of any one of claims 1-8 comprises: The server-side configuration file stores at least a configuration file corresponding to the semiconductor process equipment, which includes multiple chambers. The configuration file includes at least one interface path identifier and control operation information corresponding to the interface path identifier. One interface path identifier corresponds to one chamber. The device end; the device end includes: The initialization module is configured to construct the initial view architecture for each of the chambers; The reading module is configured to download and read the configuration file from the server. The update module is configured to parse the configuration file, locate the initial view architecture of the chamber corresponding to the interface path identifier based on the interface path identifier, and use it as the initial view structure to be modified; and perform corresponding operations on the initial view architecture to be modified based on the control operation information corresponding to the interface path identifier to generate the target view architecture of the chamber. The presentation module is configured to present the interface of each of the chambers based on the target view architecture.

12. The system according to claim 11, characterized in that, The update module includes: The parsing unit is configured to parse the configuration file; The positioning unit is configured to locate the initial view structure of the chamber corresponding to the interface path identifier based on the interface path identifier, as the initial view structure to be modified. The editing unit is configured to perform corresponding operations on the initial view architecture to be modified based on the control operation information corresponding to the interface path identifier, and generate the target view architecture of the chamber.

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