Abstract Patterned Hat Made from Plastic Waste Pieces and Genuine Leather

IDA00202604115S1Pending Publication Date: 2026-07-17POLITEKNIK NEGERI SAMARINDA
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Patent Information

Authority / Receiving Office
ID · ID
Patent Type
Designs
Current Assignee / Owner
POLITEKNIK NEGERI SAMARINDA
Filing Date
2026-06-30
Publication Date
2026-07-17

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Abstract

protects the head and face from sunlight, dust and light rain, while providing style Casual, relaxed and trendy with patterns from plastic waste.
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