Dosage-controlled voltage contrast inspection in charged-particle beam systems and methods thereof
Patent Information
- Application Number
- IL330823
- Authority / Receiving Office
- IL · IL
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-01-29
- Filing Date
- 2025-01-06
- Publication Date
- 2026-09-01
AI Technical Summary
Existing voltage contrast inspection techniques in charged-particle beam systems suffer from low defect sensitivity, particularly in detecting high-resistance defects, and are inadequate in classifying defect types, impacting defect capture rate and inspection throughput in complex integrated circuit manufacturing.
A method involving incremental dosage of charged particles to switch the polarity of a sample region, forming inspection images based on gray level values to detect and classify defects, using a charged-particle beam apparatus.
Enhances defect detection sensitivity and classification accuracy, allowing for precise identification of defect types and locations in layered or stacked structures, improving inspection efficiency and throughput.
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