How to evaluate flux or resist substrates

JP2024002837A5Active Publication Date: 2025-04-28QUALTEC CO LTD
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Patent Information

Application Number
JP2022102280
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2022-06-25
Publication Date
2025-04-28
Estimated Expiration
2042-06-25

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Abstract

To solve the problem that if a line / space of a wiring pattern is narrow, migration is generated, but a relation between the line / space and the migration generation is not quantified.SOLUTION: A wiring board 102 is immersed in water 202, and thereby copper ions are eluted in the water 202 by a copper wiring pattern 104, and an ion component of flux is eluted. The eluted copper ions are adsorbed by an ion exchange resin 203. The ion exchange resin 203 adsorbing the copper ions is immersed in a regenerant 204, and makes the copper ions eluted in the regenerant 204. After the regenerant 204 has been neutralized by a neutralization liquid 205, reagent bathocuproine is dropped to develop a color. The colored regenerant measures absorbance (Abs) by a wavelength spectral device, and quantifies a copper ion amount. The ion component of the flux is quantified by a conductivity meter.SELECTED DRAWING: Figure 1
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