Electrostatic chuck with light heating structure

The electrostatic chuck with a photoheating structure addresses temperature uniformity issues by using laser or LED light to heat the dielectric layer, ensuring precise local control and improved manufacturing outcomes.

JP2026116785APending Publication Date: 2026-07-13VM INC
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Patent Information

Application Number
JP2025178318
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-31
Filing Date
2025-10-23
Publication Date
2026-07-13

AI Technical Summary

Technical Problem

Existing electrostatic chucks face challenges in achieving uniform temperature control due to space constraints and variability in heating methods, leading to potential defects in semiconductor and LCD substrate manufacturing processes.

Method used

An electrostatic chuck with a photoheating structure that uses laser or LED light to heat the dielectric layer, allowing for localized temperature control through an optical induction path and independent control of light-emitting elements.

Benefits of technology

Enhances temperature uniformity, simplifies design, and prevents defects by enabling precise local heating and temperature adjustment, suitable for advanced semiconductor processes.

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Abstract

To provide an electrostatic chuck with a light-heating structure. [Solution] The present invention relates to an electrostatic chuck with a light heating structure. The electrostatic chuck with a light heating structure includes a body block 11; a dielectric layer 12 coupled to the upper surface of the body block 11; a heater 13 for heating the dielectric layer; and a light emission module 14 for inducing light to the lower surface of the dielectric layer 12 to heat the dielectric layer 12.
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Citation Information

Patent Citations

  • Electrostatic chuck

    KR1020140034687A

  • Multi zone heating and cooling ESC for plasma process chamber

    US20150366004A1