Evaluation apparatus and evaluation system for gas sensor elements

Abstract

The object of this disclosure is to provide an evaluation apparatus for gas sensor elements that can evaluate the characteristics of the gas sensor element under stable conditions. [Solution] The gas sensor element evaluation device 1 comprises a plurality of injectors 711, a mixer 651, an element holder 130, and a gas detector 140. Each of the plurality of injectors 711 prepares a mixed gas by mixing a sample substance into a carrier gas. The mixer 651 prepares a sample gas by mixing the plurality of mixed gases prepared by the plurality of injectors 711. The element holder 130 detachably holds the gas sensor element 110, and the sample gas is supplied to the gas sensor element 110. The gas detector 140 receives the sample gas and generates a signal according to the composition of the sample gas.

Description

[Technical Field]

[0001] The present disclosure relates to an evaluation apparatus for a gas sensor element and an evaluation system for a gas sensor element, and more particularly to an evaluation apparatus for a gas sensor element and an evaluation system for a gas sensor element for evaluating a gas sensor element based on a signal generated by the gas sensor element when a sample gas is supplied to the gas sensor element. [Background Art]

[0002] Patent Document 1 discloses a gas sensor performance inspection method for inspecting the performance of gas sensors, comprising: recovering a plurality of gas sensors installed in a monitoring target area, each of which detects the same type of target gas; arranging each of the plurality of recovered gas sensors in a closed container having an inspection gas atmosphere at the site of the monitoring target area; simultaneously measuring the concentration of the target gas in the inspection gas atmosphere by each of the gas sensors; and determining whether an output value of each gas sensor falls within a set allowable range. [Prior Art Literature] [Patent Literature]

[0003] [Patent Document 1] Japanese Unexamined Patent Application Publication No. 2015-210149 [Summary of the Invention] [Problem to be Solved by the Invention]

[0004] When evaluating a gas sensor, particularly when evaluating a gas sensor sensitive to a plurality of types of substances, it is difficult to stably maintain conditions such as the composition of the gas used for evaluation, and therefore it is not easy to accurately evaluate the gas sensor.

[0005] An object of the present disclosure is to provide an evaluation apparatus for a gas sensor element and an evaluation system for a gas sensor element that can evaluate the characteristics of the gas sensor element under stable conditions. [Means for Solving the Problem]

[0006] An evaluation apparatus for a gas sensor element according to one aspect of the present disclosure comprises a plurality of injectors, a mixer, an element holder, and a gas detector. Each of the plurality of injectors prepares an injector gas by mixing a sample substance into a carrier gas. The mixer prepares a sample gas by mixing the plurality of injectors. The element holder detachably holds a gas sensor element, and the sample gas is supplied to the gas sensor element. The gas detector receives the sample gas and generates a signal corresponding to the composition of the sample gas.

[0007] An evaluation system for a gas sensor element according to one aspect of the present disclosure comprises an evaluation device for a gas sensor element and a control unit that generates an evaluation result based on a signal generated by the gas sensor element while it is held in the element holder. [Effects of the Invention]

[0008] According to one aspect of this disclosure, the actual composition of the sample gas supplied to the gas sensor element can be confirmed based on the signal generated by the gas detector, thereby enabling evaluation of the characteristics of the gas sensor element under stable conditions. [Brief explanation of the drawing]

[0009] [Figure 1] Figure 1 is a plan view of an example of a gas sensor element used in an embodiment of the present disclosure. [Figure 2] Figure 2 is a cross-sectional view of the sensing portion of the gas sensor element shown above. [Figure 3] Figure 3 is a cross-sectional view of the sensing portion of the gas sensor element shown above. [Figure 4] Figure 4 is a schematic diagram of an evaluation apparatus for a gas sensor element according to the first embodiment of this disclosure. [Figure 5] Figure 5 is a cross-sectional view of the mixing device and trap section in the first embodiment described above. [Figure 6] Figure 6 is a block diagram of the evaluation system for gas sensor elements according to the first and second embodiments of this disclosure. [Figure 7] Figure 7 is a flowchart showing the operation of the control unit in the gas sensor element evaluation system of the first and second embodiments of this disclosure. [Figure 8] Figure 8 is a schematic diagram of an evaluation apparatus for a gas sensor element according to a second embodiment of the present disclosure. [Figure 9] Figure 9 is a schematic diagram of a vent valve in a modified example of the present disclosure. [Figure 10] Figure 10 is a schematic diagram of a vent valve in a modified example of the present disclosure. [Modes for carrying out the invention]

[0010] Embodiments and modifications will be described below with reference to the drawings. Note that the embodiments and modifications described below are only a part of the various embodiments of this disclosure. Furthermore, the embodiments and modifications described below can be modified in various ways depending on the design, etc., as long as the objectives of this disclosure are achieved. It is also possible to combine the configurations of the embodiments and modifications as appropriate. The figures referenced below are all schematic diagrams, and the dimensional ratios of the components shown in the figures do not necessarily reflect the actual dimensional ratios.

[0011] 1. Overview The gas sensor element evaluation apparatus of this embodiment (hereinafter also referred to as evaluation apparatus 1) comprises a plurality of injectors 711, a mixer (primary mixer) 651, an element holder 130, and a gas detector 140. Each of the plurality of injectors 711 prepares an injector gas by mixing a sample substance into a carrier gas. The primary mixer 651 prepares a sample gas by mixing the plurality of injectors 711 with the respective injector gases. The element holder 130 detachably holds the gas sensor element 110, and the sample gas is supplied to the gas sensor element 110. The gas detector 140 receives the sample gas and generates a signal corresponding to the composition of the sample gas.

[0012] Further, the evaluation system for a gas sensor element according to the embodiment comprises an evaluation device 1 and a control unit 80 that generates an evaluation result based on a signal generated by the gas sensor element 110 held by an element holding unit 130.

[0013] Therefore, according to the embodiment, the gas sensor element 110 can be evaluated based on a signal generated by the gas sensor element 110 when a sample gas is supplied to the gas sensor element 110. In addition, since the actual composition of the sample gas supplied to the gas sensor element 110 can be confirmed based on a signal generated by the gas detector 140, the characteristics of the gas sensor element 110 can be evaluated under stable conditions.

[0014] 2. Gas Sensor Element First, the gas sensor element 110, which is the object to be evaluated by the evaluation device 1 and the evaluation system, will be described.

[0015] The gas sensor element 110 is an element that is sensitive to at least one substance contained in gas and generates a signal corresponding to the type and concentration of the substance. The gas sensor element 110 in the embodiment is preferably an element that is sensitive to a plurality of types of substances contained in gas and generates signals corresponding to the types and concentrations of these substances.

[0016] An example of the gas sensor element 110 is shown in FIG. 1. This gas sensor element 110 comprises an insulating substrate 115, conductor wirings 114, and a plurality of sensitive units 111.

[0017] The conductor wirings 114 are arranged on a surface of the insulating substrate 115. The conductor wirings 114 have a first electrode 114A and a second electrode 114B corresponding to each of the plurality of sensitive units 111 (see FIG. 2).

[0018] The gas sensor element 110 shown in Figure 1 comprises 16 sensing elements 111. These sensing elements 111 are arranged in a 4x4 matrix on the surface of the insulating substrate 115. Each sensing element 111 is electrically connected to the first electrode 114A and the second electrode 114B. Note that the number of sensing elements 111 and their arrangement are not limited to those described above.

[0019] Each sensing element 111 is a chemoresistic sensor or chemosensitive resistor, comprising a receiving material capable of adsorbing and swelling at least one substance in the gas, and conductive particles 113. The sensing element 111 has a structure in which conductive particles 113 are dispersed in a matrix 112 formed from the receiving material (see Figure 2).

[0020] When the sensing element 111 is exposed to a gas containing a substance to which the receptor substance can adsorb, the receptor substance adsorbs molecules 150 of the substance in the gas and swells, thereby increasing the volume of the matrix 112 (see Figures 2 and 3). This increases the distance between the conductive particles 113 in the sensing element 111 (see Figure 3). As a result, the electrical resistivity of the sensing element 111 increases, and consequently, the electrical resistance between the first electrode 114A and the second electrode 114B increases. The degree of increase in the volume of the matrix 112 depends on the type and amount of molecules 150 of the substance adsorbed by the receptor substance. Therefore, the type and concentration of the substance in the gas can be detected by the change in the electrical resistance between the first electrode 114A and the second electrode 114B.

[0021] The multiple sensing parts 111 have different sensing characteristics from each other. That is, the multiple sensing parts 111 differ from each other in at least one of the types of substances they can detect and their detection sensitivity to substances. If the composition of the receptor material in the matrix 112 differs from each other among the multiple sensing parts 111, the multiple sensing parts 111 may have different sensing characteristics from each other.

[0022] The acceptor is, for example, an organic material capable of adsorbing and swelling at least one substance. The acceptor includes, for example, OV-17, OV-22, OV-25, OV-225, OV-330, SILAR-5CP, SILAR-7CP, and OV-275, manufactured by Shinwa Chemical Co., Ltd., which are column packing materials for chromatography, and at least one selected from the group consisting of polystyrene, poly(4-tert-butylstyrene), poly(isobutyl methacrylate), poly(butyl methacrylate), polyvinyl formal, poly(ethylene succinate), low molecular weight poly(vinylidene fluoride), and high molecular weight poly(vinylidene fluoride). The acceptor is not limited to the above.

[0023] The conductive particles 113 include, for example, at least one material selected from the group consisting of carbon materials, conductive polymers, metals, metal oxides, semiconductors, superconductors, and complex compounds.

[0024] When multiple sensing elements 111 are exposed to gas, the combination of signals generated by each of the multiple sensing elements 111 is the signal generated by the gas sensor element 110. Using this gas sensor element 110, it is possible to accurately detect multiple types of substances contained in the gas. Furthermore, if the substance is an odor component that stimulates the human sense of smell, the odor of the gas can also be determined based on the detection results from the gas sensor element 110.

[0025] The configuration of the gas sensor element 110 is not limited to the above, as long as it is sensitive to at least one substance in the gas. For example, the gas sensor element 110 may be a quartz crystal oscillator type sensor element, an oxide semiconductor type sensor element, an organic film semiconductor type sensor element, a surface acoustic wave type sensor element, a photoacoustic type sensor element, or an ion mobility type sensor element, etc.

[0026] 3. First Embodiment The evaluation apparatus 1 and evaluation system of the first embodiment will be described below.

[0027] 3.1. Evaluation device for gas sensor elements Figure 4 shows an overview of the evaluation apparatus of the first embodiment. The evaluation apparatus comprises a gas path which is the path through which the gas flows, a gas supply source 3, a plurality of flow regulators 41, 42, 43, 46, a plurality of injectors 711, a mixer (primary mixer) 651, a secondary mixer 652, a gas detector 140, an element holder 130, a plurality of on-off valves 511, 512, 52, 53, 56, two control valves 57, 58, a plurality of check valves 611, 612, a three-way valve 49 which is a supply switching means, two vent valves 653, 642, a first constant temperature chamber 71, and a second constant temperature chamber 72.

[0028] Gas supply source 3 supplies carrier gas to the gas path. The carrier gas is an inert gas, such as nitrogen. Gas supply source 3 includes, for example, a cylinder for storing the carrier gas. The initial pressure of gas supply source 3 is, for example, 0.1 MPa or more and 0.2 MPa or less, but is not limited to this.

[0029] The gas path consists of, for example, piping through which the gas flows. The material of the piping is, for example, fluororesin, metal, or metal with an inactivation treatment applied to its surface, but is not limited to these. The gas path includes a starting point path 20, a plurality of mixing paths 21, a primary dilution path 22, a secondary dilution path 23, a reference path 24, a mixing path 25, a dilution exhaust path 26, a vent path 27, an inspection path 28, and a supply path 29.

[0030] The starting end of the starting-side path 20 is connected to the gas supply source 3. Multiple mixing paths 21, a primary dilution path 22, a secondary dilution path 23, and a reference path 24 branch off from the starting-side path 20. The ends of each of the multiple mixing paths 21 and the end of the primary dilution path 22 merge and connect to the starting end of the mixing path 25. The end of the mixing path 25 and the end of the reference path 24 merge and connect to the starting end of the supply path 29. The end of the supply path 29 is connected to the element holding section 130. Along the mixing path 25, in order from the starting end, the starting end of the dilution exhaust path 26, the end of the secondary dilution path 23, and the starting end of the vent path 27 are connected. Along the vent path 27, the starting end of the inspection path 28 is connected. A gas detector 140 is located in the inspection path 28.

[0031] Each of the multiple mixing pathways 21 is a pathway for preparing a mixed gas containing the sample substance and supplying this mixed gas to the primary mixer 651. The multiple mixing pathways 21 supply mixed gases containing different types of sample substances to the primary mixer 651.

[0032] In the first embodiment, the plurality of contamination routes 21 include a first contamination route 21A, a second contamination route 21B, a third contamination route 21C, a fourth contamination route 21D, and a fifth contamination route 21E.

[0033] Each of the multiple mixing paths 21 is equipped with, in order from the starting end, a flow regulator 41, an on-off valve (first on-off valve) 511, a check valve (first check valve) 611, a mixing device 711, a check valve (second check valve) 612, and an on-off valve (second on-off valve) 512.

[0034] The flow regulator 41 variably adjusts the flow rate of the carrier gas that flows from the gas supply source 3 into the mixing path 21 and is supplied to the injector 711. Variable flow rate adjustment means that the regulator can operate to maintain a set flow rate, and that the set flow rate can be changed. The flow regulator 41 is, for example, a mass flow controller, but is not limited to this.

[0035] The flow regulator 41 may include a plurality of flow regulators 411, 412 with different full-scale flow rates. In the first embodiment, the flow regulator 41 includes a high-flow regulator 411 and a low-flow regulator 412 with a lower full-scale flow rate than the high-flow regulator 411. For example, the high-flow regulator 411 is a mass flow meter with a full-scale flow rate of 1 SLM (1 L / min), and the low-flow regulator 412 is a mass flow controller with a full-scale flow rate of 10 SCCM (10 cc / min). In this case, the accuracy of gas flow rate adjustment can be improved by adjusting the gas flow rate with the high-flow regulator 411 when the set flow rate is relatively high, and by adjusting the gas flow rate with the low-flow regulator 412 when the set flow rate is relatively low.

[0036] Each of the multiple injectors 711 is configured to prepare a mixed gas by mixing the sample substance into the carrier gas flowing through the mixing path 21. That is, when the carrier gas is supplied, the injector 711 is configured to prepare a mixed gas containing the carrier gas and the sample substance by mixing the sample substance into the carrier gas. In the first embodiment, the injector 711 is configured to hold a sample body 120 containing the sample substance and to vaporize the sample substance from the sample body 120 and mix it into the carrier gas. The sample body 120 may be liquid or solid, but in the first embodiment, the sample body 120 is liquid. The liquid sample body 120 may be a liquid sample substance, or it may be a solution containing a solvent and the sample substance dissolved in the solvent. Each of the multiple injectors 711 holds a sample body 120 containing different types of sample substances.

[0037] In the first embodiment, the injector 711 is a bubbling container that holds a liquid sample 120, as shown in Figure 5. The injector 711 comprises a container body 713 having an opening at the top and a lid 714 that closes the opening of the container body 713. The container body 713 is made of, for example, glass or metal, but the material of the container body 713 is not limited to the above. The lid 714 has an inlet through hole 715 and an outlet through hole 716 that allow the inside and outside of the container body 713 to pass through.

[0038] The mixing path 21 is separated into an inlet pipe 211 at the starting end and an outlet pipe 212 at the terminal end at the location where the mixing device 711 is positioned.

[0039] The inlet pipe 211 is guided from the outside to the inside of the container body 713 through the inlet through hole 715. The end 201 of the inlet pipe 211 is located inside the container body 713, preferably near the bottom of the container body 713. The end 201 of the inlet pipe 211 has an opening that leads into the inlet pipe 211. The end 201 of the inlet pipe 211 is needle-shaped and has a diagonally cut shape. As a result, the opening area of ​​the end 201 is formed to be large. A porous member 205, such as an air stone, is placed inside the inlet pipe 211 near the end 201. The porous member 205, such as an air stone, is located on the gas path from the inlet pipe 211 through the opening of the end 201 to the injector 711, and it is sufficient that the porous member 205 can come into contact with the sample body 120 inside the injector 711. Therefore, the position and shape of the porous member 205 are not limited to the form shown in Figure 5. For example, a porous member 205 having a larger diameter than the inlet pipe 211 may cover the outer surface of the end of the inlet pipe 211 on the terminal 201 side so as to close the opening of the terminal 201.

[0040] The outflow pipe 212 is drawn out from the inside to the outside of the container body 713 through the outflow hole 716. The starting end 202 of the outflow pipe 212 is located inside the container body 713 above the end 201 of the inflow pipe 211, preferably near the upper opening of the container body 713. The starting end 202 of the outflow pipe 212 has an opening that leads to the inside of the outflow pipe 212.

[0041] The liquid sample 120 is held inside the container body 713. The end 201 of the inlet pipe 211 is positioned inside the sample 120. The start end 202 of the outlet pipe 212 is positioned in the space (headspace) above the liquid surface of the sample 120 inside the container body 713.

[0042] When the injector 711 is a trap container, the capacity of the injector 711 is, for example, 100 mL, but is not limited to this. Also, in this case, the amount of sample body 120 placed in the injector 711 is, for example, 40 mL or more and 60 mL or less, but is not limited to this.

[0043] As shown in Figure 4, the first contamination path 21A may include a trap section 712 attached to the contaminant 711 in the contamination path 21. The trap section 712 is located in the middle of the outlet pipe 212, on the terminal side of the contaminant 711.

[0044] In the first embodiment, the trap section 712 is a trap container, as shown in Figure 5. The trap section 712 comprises a container body 717 having an opening at the top, and a lid 718 that closes the opening of the container body 717. The container body 717 is made of, for example, glass or metal, but the material of the container body 717 is not limited to the above. The lid 718 has an inlet through hole 719 and an outlet through hole 7110 that allow the inside and outside of the container body 717 to pass through.

[0045] The outflow pipe 212 is separated into a secondary inflow pipe 2121 at the starting end and a secondary outflow pipe 2122 at the ending end at the location where the trap section 712 is positioned.

[0046] The secondary inlet pipe 2121 is led from the outside to the inside of the container body 717 through the inlet hole 719. The end 203 of the secondary inlet pipe 2121 is located inside the container body 717, preferably near the bottom of the container body 717. The end 203 of the secondary inlet pipe 2121 has an opening that leads into the secondary inlet pipe 2121.

[0047] The secondary outflow pipe 2122 is drawn out from the inside to the outside of the container body 717 through the outflow hole 7110. The starting end 204 of the secondary outflow pipe 2122 is located inside the container body 717 above the end 203 of the secondary inflow pipe 2121, and is preferably located near the opening at the top of the container body 717.

[0048] When the injector 711 is configured as described above, when carrier gas is supplied to the injection path 21, the carrier gas is supplied to the injector 711 by the inlet pipe 211. The carrier gas supplied to the injector 711 is ejected as bubbles into the sample body 120 from the opening of the end 201 of the inlet pipe 211 and sent to the headspace. As a result, the sample substance in the sample body 120 vaporizes due to the bubbling action and mixes with the carrier gas, creating mixed gas in the headspace. At this time, because the end 201 of the inlet pipe 211 has a needle-like, diagonally cut shape, the opening of the end 201 is formed to be large, which can promote the ejection of carrier gas into the sample body 120. In addition, the bubbles of the carrier gas can be refined by the porous member 205. As a result, the mixing of sample substance into the carrier gas is promoted.

[0049] The mixed gas in the headspace is supplied to the outlet pipe 212 from its starting end 202 and sent to the primary mixer 651. If the inlet 711 is equipped with a trap section 712, the mixed gas in the headspace is supplied to the auxiliary inlet pipe 2121 from its starting end 202 in the outlet pipe 212 before being sent to the primary mixer 651, and then supplied from the auxiliary inlet pipe 2121 to the trap section 712. The mixed gas flows into the trap section 712 from the opening at the end 203 of the auxiliary inlet pipe 2121 and temporarily remains in the trap section 712. Subsequently, the mixed gas is supplied to the auxiliary outlet pipe 2122 from the opening at its starting end 204 and sent to the primary mixer 651. While the mixed gas remains in the trap section 712, if the partial pressure of the sample substance in the mixed gas is close to or higher than the saturated vapor pressure, some of the sample substance in the mixed gas may liquefy or solidify and adhere to the inner surface of the trap section 712. Therefore, the liquefaction or solidification of the sample substance in the gas path beyond the trap section 712 is suppressed, and contamination of the gas path can be suppressed.

[0050] Furthermore, a trap unit 712 may be placed in any one of the multiple contamination routes 21, or a trap unit 712 may be placed in each of two or more contamination routes 21, or a trap unit 712 may be placed in each of all contamination routes 21. A trap unit 712 may not be placed in any of the multiple contamination routes 21.

[0051] The first on-off valve 511 in each mixing path 21 opens and closes the flow of carrier gas between the gas supply source 3 and the mixing device 711. That is, the first on-off valve 511 switches the mixing device 711 between a state where carrier gas is supplied and a state where it is not supplied. The first on-off valve 511 may also be a control valve that adjusts the flow rate of carrier gas when the flow of carrier gas is open. In that case, the flow rate of carrier gas supplied to the mixing device 711 can be adjusted by the flow regulator 41 and the first on-off valve 511.

[0052] The first check valve 611 in each mixing path 21 prevents gas from flowing back from the mixing device 711 to the flow regulator 41 side between the flow regulator 41 and the mixing device 711.

[0053] The second on-off valve 512 in each mixing path 21 opens and closes the flow of mixed gas between the injector 711 (including the trap section 712 attached to the injector 711) and the primary mixer 651. In other words, the second on-off valve 512 switches the primary mixer 651 between a state in which mixed gas is supplied and a state in which it is not supplied. The second on-off valve 512 may also be a control valve that adjusts the flow rate of mixed gas when the flow of mixed gas is open. In that case, the flow rate of mixed gas flowing to the primary mixer 651 can be adjusted by the second on-off valve 512.

[0054] In each mixing path 21, the second check valve 612 prevents gas from flowing back from the primary mixer 651 to the mixing device 711 side between the mixing device 711 (including the trap section 712 attached to the mixing device 711) and the primary mixer 651.

[0055] The primary dilution path 22 is a path for selectively supplying carrier gas as dilution gas (primary dilution gas) to the primary mixer 651. In the primary dilution path 22, a flow regulator 42 and an on-off valve 52 are arranged in order from the starting end.

[0056] The flow regulator 42 variably adjusts the flow rate of the primary dilution gas flowing into the primary dilution path 22. The flow regulator 42 is, for example, a mass flow controller, but is not limited to this.

[0057] The on-off valve 52 in the primary dilution path 22 opens and closes the flow of primary dilution gas between the gas supply source 3 and the primary mixer 651. That is, the on-off valve 52 switches the primary mixer 651 between a state where primary dilution gas is supplied and a state where it is not supplied. The on-off valve 52 may also be a control valve that adjusts the flow rate of primary dilution gas when the flow of primary dilution gas is open. In that case, the flow rate of primary dilution gas supplied to the primary mixer 651 can be adjusted by the flow regulator 42 and the on-off valve 52.

[0058] The secondary dilution path 23 is a path for supplying carrier gas as a dilution gas (secondary dilution gas) to the secondary mixer 652 when diluting the sample gas. The secondary dilution path 23 has a flow regulator 43, an on-off valve 53, and a check valve 63 arranged in order from the starting end.

[0059] The flow regulator 43 variably adjusts the flow rate of the secondary dilution gas that flows into the secondary dilution path 23 and is supplied to the secondary mixer 652. The flow regulator 43 is, for example, a mass flow controller, but is not limited to this.

[0060] The on-off valve 53 opens and closes the flow of secondary dilution gas between the gas supply source 3 and the secondary mixer 652. In other words, the on-off valve 53 switches the secondary mixer 652 between a state where secondary dilution gas is supplied and a state where it is not supplied. The on-off valve 53 may also be a control valve that adjusts the flow rate of secondary dilution gas when the flow of secondary dilution gas is open. In that case, the flow rate of secondary dilution gas supplied to the secondary mixer 652 can be adjusted by the flow regulator 43 and the on-off valve 53.

[0061] The check valve 63 prevents gas from flowing back from the secondary mixer 652 to the flow regulator 43 side between the flow regulator 43 and the secondary mixer 652.

[0062] The mixing path 25 is a path for preparing a sample gas from the mixed gas and supplying this sample gas to the element holding section 130.

[0063] The mixing path 25 is configured, in order from the starting end, with a primary mixer 651, a secondary mixer 652, and a vent valve 653.

[0064] The primary mixer 651 is configured to mix the gas supplied to it. The primary mixer 651 is supplied with mixed gas from at least one of the multiple mixing paths 21, or with primary dilution gas supplied from the primary dilution path 22.

[0065] The primary mixer 651 is, for example, a container or pipeline with a suitable capacity for temporarily holding the gas. In this case, the gas can be mixed by the diffusion of substances in the gas within the primary mixer 651. The primary mixer 651 may also include a mixer that mixes the gas by agitation. The mixer is, for example, a static mixer or an inline mixer, but is not limited to these.

[0066] The secondary mixer 652 is configured to mix the gas supplied to it. The secondary mixer 652 is supplied with the sample gas after it has been mixed by the primary mixer 651, or with secondary dilution gas supplied from the secondary dilution path 23.

[0067] The secondary mixer 652 is, for example, a container for temporarily holding gas. In this case, the gas can be mixed by the diffusion of substances in the gas within the secondary mixer 652. The secondary mixer 652 may also be equipped with a mixer that mixes the gas by agitation. The mixer is, for example, a static mixer or an inline mixer, but is not limited to these.

[0068] The vent valve 653 operates to maintain the flow rate of the sample gas supplied from the mixing path 25 to the element holder 130 at a specific value by discharging a portion of the sample gas from the mixing path 25 when the flow rate of the sample gas flowing through the mixing path 25 exceeds a specific value. This specific value is, for example, 1000 mL / min, but is not limited to this.

[0069] The dilution exhaust path 26 is a path for adjusting the amount of sample gas supplied to the secondary mixer 652 by exhausting a portion of the sample gas from the mixing path 25 before it is supplied to the secondary mixer 652, when dilution gas is supplied from the secondary dilution path 23 to the secondary mixer 652.

[0070] In the dilution exhaust path 26, a flow regulator 46 and an on-off valve 56 are arranged in order from the starting end.

[0071] The flow regulator 46 variably adjusts the flow rate of the sample gas discharged from the mixing path 25. The flow regulator 46 is, for example, a mass flow controller, but is not limited to this.

[0072] The on-off valve 56 opens and closes the flow of sample gas in the dilution exhaust path 26. That is, the on-off valve 56 switches the secondary mixer 652 between a state in which some of the sample gas is exhausted before being supplied, and a state in which some of the sample gas is supplied without being exhausted. The on-off valve 56 may also be a control valve that adjusts the flow rate of the sample gas when the flow of the sample gas is open. In that case, the flow rate regulator 46 and the on-off valve 56 can adjust the flow rate of the sample gas that is exhausted before being supplied to the secondary mixer 652.

[0073] The vent path 27 is the path through which the sample gas, exhausted from the mixing path 25 through the vent valve 653, flows. The sample gas flowing through the vent path 27 is released into the environment, for example, outdoors. In addition, a treatment facility may be provided at the end of the vent path 27 to perform adsorption treatment on the sample gas using activated carbon or a cooling trap. In that case, the sample gas can be purified before being released into the environment.

[0074] The inspection path 28 is a path for supplying a sample gas with the same composition as the sample gas sent to the element holding unit 130 to the gas detector 140. In the first embodiment, the inspection path 28 supplies a portion of the sample gas exhausted from the mixing path 25 through the vent valve 653 to the gas detector 140.

[0075] A control valve 57 is located in the vent path 27, on the terminal side of the point where the inspection path 28 branches off from the vent path 27. Similarly, a control valve 58 is located in the inspection path 28, on the terminal side of the point where the inspection path 28 branches off from the vent path 27. By adjusting control valves 57 and 58, the flow rate of the sample gas flowing from the inspection path 28 to the inspection path 28 can be adjusted. In other words, by adjusting control valves 57 and 58, the amount of sample gas supplied to the gas detector 140 can be adjusted, thereby adjusting the detection conditions of the sample gas in the gas detector 140.

[0076] The gas detector 140 generates detection results corresponding to the sample gas supplied to the gas detector 140. The gas detector 140 includes, for example, a temperature and humidity sensor that generates detection results corresponding to the temperature and humidity of the sample gas, and a gas measuring instrument that generates detection results corresponding to the composition of the sample gas. The gas measuring instrument is, for example, a gas chromatograph, or a VOC measuring instrument such as a PID (photoionization) or hot-wire semiconductor type.

[0077] The inspection path 28 may include a dehumidifying filter to dehumidify the sample gas before it is detected by the gas detector 140. The inspection path 28 may also be thermally stabilized. In these cases, particularly if the gas detector 140 is equipped with a gas chromatograph, stable measurements by the gas detector 140 can be achieved.

[0078] In the first embodiment, the mixing path 25, vent valve 653, vent path 27, and inspection path 28 constitute a distribution means for distributing and sending the sample gas to the element holding unit 130 and the gas detector 140.

[0079] The reference path 24 is a path for supplying the carrier gas, which serves as the reference gas, to the element holding section 130.

[0080] In the reference path 24, a flow meter 641 and a vent valve 642 are arranged in order from the starting end.

[0081] The flow meter 641 measures the flow rate of the reference gas that flows through the reference path 24 and is supplied to the element holding section 130, and outputs the measurement result.

[0082] The vent valve 642 operates to maintain the flow rate of the sample gas supplied from the reference path 24 to the element holder 130 at a specific value by venting a portion of the reference gas from the reference path 24 when the flow rate of the reference gas flowing through the reference path 24 exceeds a specific value. This specific value is, for example, 1000 mL / min, but is not limited to this.

[0083] Furthermore, the vent valves 653 and 642 are configured to have, for example, two internal pipelines with different flow resistances, so that the gas flowing into the vent valves 653 and 642 branches off into the two pipelines and flows out.

[0084] The supply path 29 is a path for supplying the sample gas supplied from the end of the mixing path 25 and the reference gas supplied from the end of the reference path 24, or any other gas that is selectively selected, to the element holding section 130.

[0085] The three-way valve 49, which is a supply switching means, operates to supply the supply path 29 with a gas that is selectively selected from the sample gas supplied from the end of the mixing path 25 and the reference gas supplied from the end of the reference path 24. In other words, the state of the three-way valve 49 can be switched between a state in which only the end of the mixing path 25 and the beginning of the supply path 29 are allowed to pass, and a state in which only the end of the reference path 24 and the beginning of the supply path 29 are allowed to pass. The supply switching means can also be said to switch the element holding unit 130 between a state in which the sample gas is supplied and a state in which the reference gas is supplied.

[0086] The element holder 130 detachably holds the gas sensor element 110. The element holder 130 is configured to expose the gas sensor element 110 to gas supplied to the element holder 130 through the supply path 29. The element holder 130 is also configured to output a signal generated by the gas sensor element 110 when exposed to the gas. The element holder 130 may, if necessary, include a converter that performs A / D conversion on the signal generated by the gas sensor element 110 before outputting it, and a control circuit such as a microcomputer that controls the converter.

[0087] The first constant temperature incubator 71 is configured to adjust the temperature of multiple injectors 711, each located in one of the multiple injection paths 21. That is, the first constant temperature incubator 71 is configured to allow the setting value to be changed and to operate in a manner that maintains the temperature of the injectors 711 at the set value. The first constant temperature incubator 71 is configured to operate in a manner that maintains the temperature of the trap section 712 attached to the injectors 711 at the set value. The first constant temperature incubator 71 is, for example, a constant temperature bath or a block incubator, but is not limited to these.

[0088] In the first embodiment, the temperatures of multiple injectors 711 are controlled by a single first constant temperature incubator 71. That is, the temperatures of all injectors 711 are controlled to be the same by the first constant temperature incubator 71.

[0089] The second constant temperature chamber 72 is configured to adjust the temperatures of the primary mixer 651 and the secondary mixer 652 (or the temperature of the primary mixer 651 if the evaluation device 1 does not have a secondary mixer 652). In other words, the second constant temperature chamber 72 is configured to allow the setting value to be changed and to operate in a manner that maintains the temperatures of the primary mixer 651 and the secondary mixer 652 (or the temperature of the primary mixer 651 if the evaluation device 1 does not have a secondary mixer 652) at the set value. In addition, in the first embodiment, the second constant temperature chamber 72 is configured to operate in a manner that maintains the temperature of the element holding section 130 at the set value.

[0090] In the first embodiment, the second constant temperature chamber 72 is configured to adjust the temperature of each of the multiple mixing paths 21 on the terminal side of the mixing device 711 (or on the terminal side of the trap section 712 if the mixing device 711 is equipped with a trap section 712), the temperature of the mixing path 25, and the temperature of the supply path 29. In the first embodiment, the second constant temperature chamber 72 is configured to adjust the temperature of the element holding section 130.

[0091] The second constant temperature incubator 72 is, for example, a constant temperature bath or a block incubator, but is not limited to these.

[0092] 3.2. Evaluation System for Gas Sensor Elements Figure 6 shows an overview of the evaluation system of the first embodiment.

[0093] The evaluation system comprises an evaluation device 1 and a control unit 80 that generates evaluation results based on signals generated by a gas sensor element 110 held in an element holding unit 130. The evaluation system further comprises a storage unit 81.

[0094] The control unit 80 comprises a flow rate control unit 82, a valve control unit 83, and a temperature control unit 84. Note that the flow rate control unit 82, valve control unit 83, and temperature control unit 84 do not necessarily represent actual physical components, but rather indicate functions realized by the control unit 80.

[0095] The control unit 80 can be implemented, for example, by a computer system including one or more processors (microprocessors) and one or more memories. In other words, the control unit 80 functions by one or more processors executing one or more programs (applications) stored in one or more memories. The programs are pre-recorded in each memory or storage unit 81 of the control unit 80, but they may also be provided via telecommunication lines such as the Internet, or by being recorded on a non-temporary recording medium such as a memory card. More specifically, the control unit 80 includes a computer system. The computer system mainly consists of a processor and memory as hardware. The evaluation system functions by the processor executing programs recorded in the computer system's memory. The programs may be pre-recorded in the computer system's memory (such as the storage unit 81), provided via telecommunication lines, or recorded on a non-temporary recording medium such as a memory card, optical disk, or hard disk drive that can be read by the computer system. The processor of the computer system consists of one or more electronic circuits including semiconductor integrated circuits (ICs) or large-scale integrated circuits (LSIs). The integrated circuits referred to here, such as ICs or LSIs, are named differently depending on the degree of integration, and include integrated circuits called system LSIs, VLSIs (Very Large Scale Integration), or ULSIs (Ultra Large Scale Integration). Furthermore, FPGAs (Field-Programmable Gate Arrays) that are programmed after the manufacture of the LSI, or logic devices that allow for the reconfiguration of junction relationships or circuit compartments within the LSI, can also be used as processors. Multiple electronic circuits may be integrated onto a single chip or distributed across multiple chips. Multiple chips may be integrated into a single device or distributed across multiple devices. The computer system referred to here includes a microcontroller having one or more processors and one or more memories.Therefore, the microcontroller also consists of one or more electronic circuits, including semiconductor integrated circuits or large-scale integrated circuits.

[0096] The memory unit 81 includes one or more storage devices. These storage devices are, for example, RAM, ROM, or EEPROM. The memory unit 81 stores a recipe file that defines, for example, the relationship between the target composition of the sample gas and the operating conditions of valves, flow regulators, and thermostats, etc., required to achieve this target composition.

[0097] The flow control unit 82 controls the operation of the flow regulators in the evaluation device 1. In the first embodiment, the flow regulators are the flow regulators 41 in each of the multiple mixing paths 21, the flow regulator 42 in the primary dilution path 22, the flow regulator 43 in the secondary dilution path 23, and the flow regulator 46 in the dilution exhaust path 26.

[0098] The valve control unit 83 controls the operation of the valves (drive valves) in the evaluation device 1. In the first embodiment, the drive valves are the first on-off valve 511 and the second on-off valve 512 in each of the multiple mixing paths 21, the on-off valve 52 in the primary dilution path 22, the on-off valve 53 in the secondary dilution path 23, the on-off valve 56 in the dilution exhaust path 26, the regulating valve 57 in the vent path 27, the regulating valve 58 in the inspection path 28, and the three-way valve 49 which is a supply switching means.

[0099] The temperature control unit 84 controls the operation of the thermostats in the evaluation device 1. In the first embodiment, the thermostats are the first thermostat 71 and the second thermostat 72.

[0100] Furthermore, the control unit 80 receives the detection result output by the gas detector 140 and the signal output by the element holding unit 130.

[0101] 3.3. Operation of the Gas Sensor Element Evaluation Apparatus and Gas Sensor Element Evaluation System The operation of the evaluation device 1 and the evaluation system equipped with this evaluation device 1 will be explained with reference to Figure 7.

[0102] When the evaluation system starts operating (S1), the control unit 80 first performs preparatory operations (S2).

[0103] During the preparation phase, the gas pathways are cleaned. Specifically, the valve control unit 83 closes all of the first and second on-off valves 511 and 512 in the multiple mixing pathways 21, opens the on-off valve 52 in the primary dilution pathway 22, and operates the three-way valve 49, which is a supply switching means, to allow passage only between the end of the mixing pathway 25 and the beginning of the supply pathway 29. At this time, the valve control unit 83 may open or close the on-off valve 53 in the secondary dilution pathway 23. The valve control unit 83 may also open or close the on-off valve 56 in the dilution exhaust pathway 26. In this state, carrier gas is supplied from the gas supply source 3 to the gas pathways.

[0104] During the preparation process, a carrier gas that does not contain the sample substance flows through the primary dilution path 22 to the mixing path 25 and the supply path 29, and then further into the element holding section 130. Therefore, if any sample substance remains in the mixing path 25, the supply path 29, or the element holding section 130, it can be removed. This can improve the accuracy of the evaluation of the gas sensor element 110.

[0105] In addition, during the preparation operation, the valve control unit 83 may operate the three-way valve 49, which is a supply switching means, to alternately switch between a state in which only the end of the reference path 24 and the beginning of the supply path 29 are allowed to pass, and a state in which only the end of the mixing path 25 and the beginning of the supply path 29 are allowed to pass. In this case, when the three-way valve 49 is in a state in which only the end of the reference path 24 and the beginning of the supply path 29 are allowed to pass, the gas sensor element 110 located in the element holding unit 130 detects the reference gas flowing from the reference path 24 to the supply path 29, thereby obtaining the detection result of the reference gas by the gas sensor element 110 in a state in which the sample substance is not present. Furthermore, when the three-way valve 49 is in a state in which only the end of the mixing path 25 and the beginning of the supply path 29 are allowed to pass, if the sample substance is adhering to or remaining in the mixing path 25, supply path 29 and element holding unit 130 as described above, the sample substance can be removed. Furthermore, the gas flowing from the mixing path 25 to the supply path 29 can be detected by the gas sensor element 110 located in the element holding section 130. The control unit compares this detection result with the detection result of the reference gas by the gas sensor element 110 and can determine whether or not to continue cleaning based on the result.

[0106] Next, the evaluation system performs the following operation for reference gas detection (S3). The valve control unit 83 operates the three-way valve 49, which is a supply switching means, to allow gas to pass only between the end of the reference path 24 and the beginning of the supply path 29. In this state, carrier gas is supplied from the gas supply source 3 to the gas path.

[0107] When the valve is controlled in this manner, the carrier gas, acting as the reference gas, flows into the supply path 29 through the reference path 24, and further into the element holding unit 130. The flow rate of the reference gas flowing into the element holding unit 130 is maintained at a specific value by the action of the vent valve 642. The gas sensor element 110 held in the element holding unit 130 generates a signal corresponding to the reference gas, and this signal is output from the element holding unit 130 and sent to the control unit 80. The control unit 80 acquires this signal as a detection result for reference and stores it in the storage unit 81.

[0108] During the operation for detecting the reference gas, the valve control unit 83 may control the first on-off valve 511 and the second on-off valve 512 in the multiple mixing paths 21, the on-off valve 52 in the primary dilution path 22, the on-off valve 53 in the secondary dilution path 23, and the on-off valve 56 in the dilution exhaust path 26 to either open or close. When the valve control unit 83 operates to open these valves, the sample gas is prepared in the mixing path 25, and all of this sample gas flows from the vent valve 653 to the vent path 27. As a result, the mixing path 25 is filled with the sample gas, which conditions the piping constituting the mixing path 25 (i.e., makes the gas adsorption and desorption state constant). This conditioning stabilizes the composition of the sample gas in the mixing path 25, which can stabilize the measurement of the sample gas by the gas sensor element 110.

[0109] In the reference gas detection operation, the measurement result output by the flow meter 641 may be sent to the control unit 80. In this case, the control unit 80 may monitor the flow rate of the reference gas based on the measurement result, and if the value of this flow rate deviates from a specific range, it may determine that an abnormality has occurred and stop the operation of the evaluation system. The flow meter 641 may be an electrically uncontrolled flow meter such as a float type, in which case the person using or managing the evaluation device 1 or evaluation system can confirm the operating status of the evaluation device 1 or evaluation system by checking the measurement result from the flow meter 641.

[0110] Next, the evaluation system performs the following operations for sample gas supply (S4).

[0111] The temperature control unit 84 sets the respective set temperatures of the first thermostat 71 and the second thermostat 72 according to the recipe file stored in the storage unit 81, and then operates the first thermostat 71 and the second thermostat 72.

[0112] Furthermore, in the control unit 80, the valve control unit 83 operates to ensure that the three-way valve 49, which is a supply switching means, is only accessible between the end of the mixing path 25 and the beginning of the supply path 29.

[0113] Furthermore, the control unit 80 operates valves, flow regulators, and thermostats, etc., according to the recipe file stored in the memory unit 81, so that the composition of the sample gas supplied to the element holding unit 130 matches the target composition.

[0114] Specifically, for example, the valve control unit 83 operates to open the first on-off valve 511 and the second on-off valve 512 in the mixing path 21 where the injector 711 holding the sample body 120 containing the sample substance included in the target composition is located, and to close the first on-off valve 511 and the second on-off valve 512 in the mixing path 21 where the injector 711 holding the sample body 120 containing the sample substance not included in the target composition is located. Furthermore, the flow rate control unit 82 operates the flow rate regulator 41 in the mixing path 21 where the injector 711 holding the sample body 120 containing the sample substance included in the target composition is located, by setting the flow rate setting value of the flow rate regulator 41 so that the ratio of the content of the sample substance contained in the sample gas matches the ratio of the content of the sample substance included in the target composition.

[0115] Furthermore, the control unit 80 selectively supplies a primary dilution gas that does not contain the sample substance to the primary mixer 651. That is, when a primary dilution gas is needed to adjust the concentration of the sample gas, the valve control unit 83 operates to open the on-off valve 52 in the primary dilution path 22. In addition, the flow rate control unit 82 sets the flow rate setting of the flow rate regulator 42 so that the concentration of the sample substance contained in the sample gas matches the concentration of the sample substance contained in the target composition, and operates the flow rate regulator 42. On the other hand, when a primary dilution gas is not needed to adjust the concentration of the sample gas, the valve control unit 83 operates to close the on-off valve 52 in the primary dilution path 22.

[0116] Furthermore, if a secondary dilution gas is required to adjust the concentration of the sample gas, the valve control unit 83 operates to open the on-off valve 53 in the secondary dilution path 23 and the on-off valve 56 in the dilution exhaust path 26. In addition, the flow rate control unit 82 sets the flow rate settings of the flow rate regulator 43 in the secondary dilution path 23 and the flow rate regulator 46 in the dilution exhaust path 26, respectively, so that the concentration of the sample substance contained in the sample gas matches the concentration of the sample substance contained in the target composition, and operates the flow rate regulators 43 and 46. On the other hand, if a secondary dilution gas is not required to adjust the concentration of the sample gas, the valve control unit 83 operates to close the on-off valve 53 in the secondary dilution path 23 and the on-off valve 56 in the dilution exhaust path 26.

[0117] When the valve, flow regulator, and thermostat are controlled in this manner, the carrier gas is supplied from the gas supply source 3 to each of the mixing paths 21 corresponding to the sample substance contained in the target composition. In the mixing path 21 to which the carrier gas is supplied, the sample substance is mixed into the carrier gas in the injector 711 to adjust the mixed gas, and this mixed gas is sent to the mixing path 25 at a flow rate adjusted by the flow regulator 41.

[0118] In this case, even if the internal pressure of the injector 711 increases due to an abnormality in the internal pressure of the injection path 21, the backflow of the injection gas and sample 120 from the injector 711 to the starting end is suppressed by the first check valve 611. Furthermore, even if the internal pressure of the injection path 21 becomes lower than the internal pressure of the primary mixer 651 due to an abnormality in the internal pressure of the injection path 21, the backflow of the sample gas from the primary mixer 651 to the injection path 21 can be suppressed by the second check valve 612. As a result, contamination of the gas path can be suppressed.

[0119] In the mixing path 25, the sample gas supplied to the mixing path 25 is mixed in the primary mixer 651 to prepare the sample gas. The sample gas is then sent toward the end of the mixing path 25.

[0120] Here, the primary mixer 651 selectively mixes the primary dilution gas, which does not contain the sample substance, with the mixed gas to prepare the sample gas. That is, when the primary dilution gas is used, the carrier gas as the primary dilution gas is supplied from the gas supply source 3 to the primary dilution path 22 and sent to the mixing path 25 at a flow rate adjusted by the flow regulator 42. In the primary mixer 651, the sample gas and the primary dilution gas are mixed to prepare the sample gas.

[0121] When a secondary dilution gas is used, in the mixing path 25, a portion of the sample gas flowing out from the primary mixer 651 flows into the dilution exhaust path 26 at a flow rate adjusted by the flow regulator 46, and is then discharged from the mixing path 25. In addition, a carrier gas as the secondary dilution gas is supplied from the gas supply source 3 to the secondary dilution path 23 and sent to the mixing path 25 at a flow rate adjusted by the flow regulator 43. As a result, the sample gas and the secondary dilution gas are supplied to the secondary mixer 652 with the secondary dilution gas mixed in. In the secondary mixer 652, the sample gas and the secondary dilution gas are mixed, and the sample gas is diluted by the secondary dilution gas before being sent to the end of the mixing path 25. The flow rate settings in the flow regulator 46 and the flow rate settings in the flow regulator 43 are set so that the concentration of the sample substance in the sample gas diluted by the secondary dilution gas is equal to the concentration of the sample substance at the target composition.

[0122] As the prepared sample gas passes through the vent valve 653, the vent valve 653 exhausts a portion of the sample gas from the mixing path 25 to the vent path 27 so that the flow rate of the sample gas flowing through the mixing path 25 becomes a specific value. As a result, the sample gas is sent to the end of the mixing path 25 at a specific flow rate, and is then supplied to the supply path 29 via the three-way valve 49, and further supplied from the supply path 29 to the element holding section 130.

[0123] A portion of the sample gas exhausted to the vent path 27 is supplied to the gas detector 140 through the inspection path 28. This ensures that the gas detector 140 receives sample gas with the same composition as the sample gas supplied to the element holder 130. The amount of sample gas supplied to the gas detector 140 is controlled by the control valves 57 and 58. In the first embodiment, the supply conditions for the sample gas to the mixing path 25 are adjusted so that the pressure of the sample gas flowing into the vent path 27 is higher than atmospheric pressure. In this case, the sample gas can be supplied to the gas detector 140 without the need to pump it to the gas detector 140.

[0124] The gas detector 140 generates a signal corresponding to the composition of the sample gas as a detection result and sends this detection result to the control unit 80.

[0125] The control unit 80 performs feedback control to adjust the composition of the sample gas based on the detection results from the gas detector 140. That is, the control unit 80 compares the detection results from the gas detector 140 with the target composition and determines whether the state of the sample gas is appropriate or not (S8). For example, if the composition of the sample gas is within an acceptable range that includes the target composition, it is determined that the state of the sample gas is appropriate; if it is outside the acceptable range, it is determined that the state of the sample gas is inappropriate.

[0126] If the inspection results indicate that the sample gas is not in an appropriate state, the control unit 80 adjusts the gas supply conditions in the gas path so that the sample gas is in an appropriate state.

[0127] For example, if the concentration of a specific sample substance in the sample gas differs from the concentration in the target composition, the control unit 80 controls the flow regulator 41 to change the flow rate of the carrier gas supplied to the injector 711. That is, the flow control unit 82 increases or decreases the set value of the flow regulator 41 in the injection path 21 corresponding to the sample substance whose concentration differs from that of the target composition.

[0128] Furthermore, if the concentration of the sample substance in the sample gas is generally high or generally low, the flow rate control unit 82 increases or decreases the flow rate setting of the flow rate regulator 42 in the primary dilution path 22. Alternatively, the flow rate control unit 82 increases or decreases the flow rate setting of the flow rate regulator 43 in the secondary dilution path 23, and decreases or increases the flow rate setting of the flow rate regulator 46 in the dilution exhaust path 26. Alternatively, the temperature control unit 84 decreases the saturated vapor pressure of the sample substance in the injector 711 by lowering the temperature setting of the first constant temperature oven 71, thereby decreasing the amount of sample substance mixed into the carrier gas, or increases the saturated vapor pressure of the sample substance in the injector 711 by raising the temperature setting of the first constant temperature oven 71, thereby increasing the amount of sample substance mixed into the carrier gas. Two or more of the above operations may be combined.

[0129] The control unit 80 repeatedly adjusts the supply conditions (S7), inspects the sample gas (S5), and determines the state of the sample gas (S6) until it determines that the state of the sample gas is appropriate.

[0130] In the determination of the state of the sample gas (S6), if it is determined that the state of the sample gas is appropriate, the control unit 80 detects the sample gas using the gas sensor element 110 held in the element holder 130 (S8). That is, the control unit 80 maintains the state of the evaluation system in the state in which the state of the sample gas is determined to be appropriate, and in this state, acquires the signal generated by the gas sensor element 110 and output from the element holder 130 as the detection result for evaluation.

[0131] The control unit 80 evaluates the gas sensor element 110 based on the detection results for evaluation (S9). For example, the control unit 80 stores the detection results for evaluation directly in the storage unit 81 as the evaluation result of the gas sensor element 110. Alternatively, the control unit 80 may compare the detection results for evaluation with the reference detection results stored in the storage unit 81, generate a difference between the two, and store this difference in the storage unit 81 as the evaluation result. The control unit 80 may also store the evaluation results in the storage unit 81 in association with a target composition.

[0132] Furthermore, the control unit 80 may determine, based on the evaluation results, whether or not the gas sensor element 110 has the correct performance. In this case, the storage unit 81 stores in advance the acceptable range of the evaluation results corresponding to the target composition. The control unit 80 determines that the gas sensor element 110 has the correct performance if the evaluation result is within the acceptable range, and determines that the gas sensor element 110 does not have the correct performance if it is outside the acceptable range. The control unit 80 stores this determination result in the storage unit 81. Once such a determination is made, a quality check of the gas sensor element 110 can be performed.

[0133] Furthermore, based on the detection results obtained by gas detection using the gas sensor element 110, gas component analysis or odor determination may be performed using a trained model, which is a product of machine learning. In this case, the evaluation results from the evaluation system can also be used as training data for machine learning.

[0134] After evaluating the gas sensor element 110 (S9), the control unit 80 terminates the operation of the evaluation system (S10).

[0135] Furthermore, after evaluating the gas sensor element 110 (S9), the control unit 80 may perform the same operation as the preparation operation (S2) before ending its operation to clean the gas path.

[0136] Furthermore, after performing the evaluation of the gas sensor element 110 (S9), the control unit 80 may repeat the series of operations for evaluating the gas sensor element 110 without terminating its operation. That is, after performing the evaluation of the gas sensor element 110 (S9), the control unit 80 may again perform the series of operations from the preparation operation (S2) to the evaluation of the gas sensor element 110 (S9). In this case, for example, the control unit 80 may terminate its operation (S10) after repeating the series of operations for evaluating the gas sensor element 110 a specified number of times. Also, the storage unit 81 may store multiple recipe files corresponding to multiple target compositions, and the control unit 80 may switch the type of recipe file used each time it performs the series of operations for evaluating the gas sensor element 110. In that case, the gas sensor element 110 can be evaluated for each of the multiple target compositions.

[0137] As described above, while the evaluation device 1 and evaluation system are operating, the first constant temperature chamber 71 operates to maintain the temperatures of the multiple injectors 711 at set values. Therefore, even if the ambient temperature around the evaluation device 1 fluctuates or if heat of vaporization is absorbed when the sample substance vaporizes in the injector 711, fluctuations in the temperature of the injector 711 are suppressed, and thus fluctuations in the saturated vapor pressure of the sample substance contained in the sample body 120 in the injector 711 can be suppressed. As a result, fluctuations in the amount of sample substance mixed into the carrier gas in the injector 711 are suppressed, and fluctuations in the concentration of the sample substance in the mixed gas and the sample gas can be suppressed. This allows the characteristics of the gas sensor element 110 to be evaluated under stable conditions.

[0138] Furthermore, when adjusting the gas supply conditions in the gas path, changing the set temperature of the first constant temperature chamber 71 can change the saturated vapor pressure of the sample substance contained in the sample body 120 in the injector 711, thereby changing the concentration of the sample substance in the mixed gas and the sample gas. Therefore, by adjusting the temperature of the injector 711 using the first constant temperature chamber 71, the concentration of the sample substance in the mixed gas and the sample gas can be adjusted. This allows for adjustment of the concentration of the sample substance in the sample gas over a wide range. In particular, lowering the temperature of the injector 711 using the first constant temperature chamber 71 lowers the saturated vapor pressure of the sample substance, thereby lowering the concentration of the sample substance in the mixed gas and the sample gas. This allows for evaluation of the characteristics of the gas sensor element 110 when the concentration of the sample substance in the sample gas is low.

[0139] Furthermore, while the evaluation device 1 and evaluation system are operating as described above, the second constant temperature chamber 72 operates independently of the first constant temperature chamber 71 to maintain the temperature of the primary mixer 651, or the temperature of the primary mixer 651 and the secondary mixer 652, at a set value. Therefore, even if the temperature of the injector 711 is adjusted to adjust the concentration of the sample substance, fluctuations in the temperature of the sample gas can be suppressed. Also, even if the ambient temperature around the evaluation device 1 fluctuates, fluctuations in the temperature of the sample gas can be suppressed. As a result, the characteristics of the gas sensor element 110 can be evaluated under stable conditions.

[0140] Furthermore, in the first embodiment, the second constant temperature chamber 72 operates in such a way that the temperature of the element holder 130 is also maintained at a set value. Even if the ambient temperature around the evaluation device 1 fluctuates, fluctuations in the temperature of the element holder 130 and the gas sensor element 110 can be suppressed. This allows the characteristics of the gas sensor element 110 to be evaluated under stable conditions.

[0141] The first thermostat 71 and the second thermostat 72 may each adjust the temperatures of the multiple injectors 711 and the mixers (primary mixer 651 and secondary mixer 652) so that the temperature of the mixers (primary mixer 651 and secondary mixer 652) is higher than the temperature of the injectors 711. That is, the temperature control unit 84 of the control unit 80 may control the operation of the first thermostat 71 and the second thermostat 72 so that the set temperature of the second thermostat 72 is higher than the set temperature of the first thermostat 71. In this case, the saturated vapor pressure of the sample substance in the sample gas will be higher than the saturated vapor pressure of the sample substance in the mixed gas. Therefore, it is possible to suppress the liquefaction or condensation of some of the sample substance in the sample gas and its retention in the gas path. Therefore, it is possible to suppress fluctuations in the concentration of the sample substance in the sample gas due to a decrease in the amount of sample substance in the sample gas and the vaporization of sample substance remaining in the gas path and its mixing into the sample gas. This makes it possible to evaluate the characteristics of the gas sensor element 110 under stable conditions.

[0142] It is preferable that the piping and valves constituting the gas path of the evaluation device 1 be replaced periodically. In the first embodiment, contamination of the gas path by the sample substance is suppressed, but if the piping and valves are replaced periodically, the adverse effects of contamination on the evaluation results can be suppressed more reliably.

[0143] 4. Second Embodiment The evaluation apparatus 1 and evaluation system of the second embodiment will be described with reference to Figure 8, and Figures 6 and 7. In Figure 8, elements corresponding to elements in the first embodiment are denoted by the same reference numerals as in the first embodiment. In the following, configurations that differ from the first embodiment will be described in detail, while the same configurations as in the first embodiment will be described or omitted as appropriate.

[0144] 4.1. Evaluation device for gas sensor elements Figure 8 shows an overview of the evaluation device 1 of the second embodiment. The evaluation device 1 includes a gas path which is the path through which the gas flows, a gas supply source 3, a plurality of flow regulators 41, 42, 43, 44, 45, a plurality of injectors 711, a mixer (primary mixer) 651, a secondary mixer 652, a gas detector 140, an element holder 130, a plurality of on-off valves 511, 512, 52, 53, 56, a plurality of check valves 611, 612, a three-way valve 49 which is a supply switching means, two vent valves 653, 642, a first constant temperature chamber 71, a second constant temperature chamber 72, and a pump 160. The evaluation device 1 further includes a third constant temperature chamber 73.

[0145] In the second embodiment, the plurality of contamination routes 21 include a first contamination route 21A, a second contamination route 21B, a third contamination route 21C, a fourth contamination route 21D, and a fifth contamination route 21E.

[0146] In the second embodiment, the plurality of mixing paths 21 include a plurality of mixing paths 21 (first mixing path 21A, second mixing path 21B, third mixing path 21C, and fourth mixing path 21D) whose flow rates are regulated by a common flow regulator 41. The starting ends of these mixing paths 21A, 21B, 21C, and 21D are connected to the common mixing path 21. Each of the mixing paths 21A, 21B, 21C, and 21D is equipped with, in order from the starting end, an on-off valve (first on-off valve) 511, a check valve (first check valve) 611, a mixing device 711, a check valve (second check valve) 612, and an on-off valve (second on-off valve) 512, but no flow regulator 41 is provided. On the other hand, in the fifth mixing path 21E, which is the remaining mixing path 21, the following components are arranged in order from the starting end, similar to the mixing path 21 in the first embodiment: a flow regulator 41, an on-off valve (first on-off valve) 511, a check valve (first check valve) 611, a mixing device 711, a check valve (second check valve) 612, and an on-off valve (second on-off valve) 512.

[0147] Multiple first incubators 71 correspond to multiple mixing paths 21. Each first incubator 71 is configured to adjust the temperature of the corresponding mixing device 711. That is, each first incubator 71 is configured to have a changeable setpoint and to operate in a manner that maintains the temperature of the corresponding mixing device 711 at the setpoint. The first incubator 71 is also configured to operate in a manner that maintains the temperature of the trap section 712 attached to the mixing device 711 at the setpoint. The first incubator 71 is, for example, a constant temperature bath or a block incubator, but is not limited to these.

[0148] In the second embodiment, the temperature of each of the multiple injectors 711 is adjusted independently of each other by the corresponding first constant temperature incubator 71.

[0149] The second constant temperature chamber 72 is configured to adjust the temperatures of the primary mixer 651 and the secondary mixer 652 (or the temperature of the primary mixer 651 if the evaluation device 1 does not have a secondary mixer 652), but the second constant temperature chamber 72 is configured not to adjust the temperature of the element holding section 130.

[0150] The third constant temperature chamber 73 is configured to adjust the temperature of the element holding section 130 independently of the first constant temperature chamber 71 and the second constant temperature chamber 72. That is, the third constant temperature chamber 73 is configured to allow the setting value to be changed and to operate in a manner that maintains the temperature of the element holding section 130 at the set value. The third constant temperature chamber 73 is, for example, a constant temperature bath or a block incubator, but is not limited to these.

[0151] In the second embodiment, the gas path does not have a control valve 57 in the vent path 27 or a control valve 58 in the inspection path 28. In addition, a pump 160 is located in the inspection path 28 and is configured to draw the gas from the vent path 27 into the inspection path 28 toward the gas detector 140. In Figure 8, the pump 160 is located at the terminal end of the inspection path 28 toward the gas detector 140, but the position of the pump 160 is not limited to this.

[0152] In the second embodiment, the reference path 24 does not have a flow meter 641, but instead has a flow regulator 44. That is, the reference path 24 has a flow regulator 44 and a vent valve 642 arranged in order from the starting end. The flow regulator 44 variably adjusts the flow rate of the reference gas flowing from the gas supply source 3 into the reference path 24. The flow regulator 44 is, for example, a mass flow controller, but is not limited to that.

[0153] In the second embodiment, the gas path does not have a flow regulator 46 in the dilution exhaust path 26. Instead, a flow regulator 45 is located between the point where the dilution exhaust path 26 branches off in the mixing path 25 and the point where the end of the secondary dilution path 23 connects in the mixing path 25. The flow regulator 45 variably adjusts the flow rate of the sample gas in the mixing path 25 between the point where the dilution exhaust path 26 branches off and the point where the end of the secondary dilution path 23 connects. The flow regulator 46 is, for example, a mass flow controller, but is not limited to this. When a secondary dilution gas is used, the flow rate of the sample gas supplied to the secondary mixer 652 is adjusted by the flow regulator 46 in the dilution exhaust path 26 in the first embodiment, but in the second embodiment, it may be adjusted by the flow regulator 45 in the mixing path 25.

[0154] Except as stated above, the evaluation apparatus 1 of the second embodiment has the same configuration as the evaluation apparatus 1 of the first embodiment.

[0155] 4.2. Evaluation System for Gas Sensor Elements The evaluation system comprises an evaluation device 1 and a control unit 80 that generates evaluation results based on signals generated by a gas sensor element 110 held in an element holding unit 130. The evaluation system further comprises a storage unit 81. The basic configuration of the evaluation system in the second embodiment is the same as in the first embodiment (see Figure 6). However, since the evaluation device 1 in the second embodiment includes a third thermostat 73, in the second embodiment, the temperature control unit 84 in the control unit 80 controls the operation of the third thermostat 73 in addition to the first thermostat 71 and second thermostat 72 in the evaluation device 1. Also, since the evaluation device 1 in the second embodiment includes a flow regulator 44, in the second embodiment, the flow control unit 82 in the control unit 80 controls the operation of the flow regulator 44. Also, since the evaluation device 1 in the second embodiment includes a pump 160, in the second embodiment, the control unit 80 controls the operation of the pump 160.

[0156] 4.3. Operation of the evaluation apparatus and evaluation system for gas sensor elements The operation of the evaluation device 1 and the evaluation system equipped with this evaluation device 1 according to the second embodiment will be described.

[0157] The basic operation flow of the evaluation device 1 and the evaluation system is the same as in the first embodiment (see Figure 7).

[0158] In the second embodiment, when the control unit 80 performs the operation (S3) for detecting the reference gas, it sets the flow rate setting value of the flow regulator 44 in the reference path 24 to a predetermined value stored in the memory unit 81 or the like, and operates the flow regulator 44. This stabilizes the conditions for detecting the reference gas in the gas sensor element 110 held in the element holding unit 130.

[0159] In the second embodiment, when the evaluation system performs the operation for supplying the sample gas (S4), the temperature control unit 84 sets the respective set temperatures of the first incubator 71 and the second incubator 72 according to the recipe file stored in the storage unit 81, as in the first embodiment, and operates the first incubator 71 and the second incubator 72. Furthermore, the temperature control unit 84 sets the set temperature of the third incubator 73 according to the recipe file stored in the storage unit 81 and operates the third incubator 73.

[0160] Furthermore, similar to the first embodiment, the control unit 80 operates in accordance with the recipe file stored in the memory unit 81 so that the composition of the sample gas supplied to the element holding unit 130 matches the target composition. At this time, the valve control unit 83 opens the first on-off valve 511 and the second on-off valve 512 in each of the multiple mixing paths 21A to 21D whose flow rates are adjusted by the common flow regulator 41, for example, in the second embodiment. In addition, the flow control unit 82 can operate the flow regulator 41 by setting the flow rate setting value of the common flow regulator 41 so that the ratio of the content of sample substances contained in the sample gas matches the ratio of the content of sample substances contained in the target composition. In this case, the flow rates of multiple mixing gases can be adjusted at once by the common flow regulator 41.

[0161] If the flow rate is adjusted by a common flow regulator 41, the valve control unit 83 may open the on-off valves (first on-off valve 511 and second on-off valve 512) in one or more of the multiple mixing paths 21A to 21D connected to the flow regulator 41, and close the on-off valves (first on-off valve 511 and second on-off valve 512) in the remaining mixing paths 21. If the on-off valves (first on-off valve 511 and second on-off valve 512) are regulating valves, the valve control unit 83 may further adjust the gas flow rate by the on-off valves (first on-off valve 511 and second on-off valve 512) in one or more of the multiple mixing paths 21A to 21D connected to the flow regulator 41.

[0162] Furthermore, in the second embodiment, when the evaluation system performs the operation (S4) for supplying the sample gas, the control unit 80 operates the pump 160. In the second embodiment, during operation (S4), as in the first embodiment, a portion of the sample gas flows from the vent valve 653 into the vent path 27 so that the flow rate of the sample gas flowing through the mixing path 25 becomes a specific value. When the pump 160 operates, a portion of the sample gas flowing through this vent path 27 flows into the inspection path 28 and is supplied to the gas detector 140. As a result, the sample gas is stably supplied to the gas detector 140, and the inspection (S5) of the sample gas can be stably performed based on the detection results of the gas detector 140. In this case, even if the pressure of the sample gas flowing through the vent path 27 is low, the pressure in the inspection path 28 can be further reduced by using the pump 160, and the sample gas can be stably supplied to the gas detector 140.

[0163] Furthermore, in the second embodiment, the flow regulator 46 in the dilution exhaust path 26 is not provided, but the flow regulator 45 in the mixing path 25 is provided. Therefore, when adjusting the flow rate supply conditions (S7), if the concentration of the sample substance in the sample gas is generally high or generally low, and the amount of secondary dilution gas mixed into the sample gas is to be changed, the flow control unit 82 increases or decreases the set value of the flow regulator 43 in the secondary dilution path 23, and decreases or increases the set value of the flow regulator 45 in the mixing path 25.

[0164] While the evaluation device 1 and evaluation system are operating, the first thermostat 71 operates to maintain the temperature of the injector 711 at a set value, as in the first embodiment. However, in the second embodiment, each of the multiple first thermostats 71 operates to maintain the temperature of the corresponding injector 711 at a set value. The set temperatures of the multiple first thermostats 71 can be set independently of each other. Therefore, the temperatures of the multiple injectors 711 can be controlled independently of each other. Thus, in the second embodiment, the concentration of the sample substance in the mixed gas and sample gas can be adjusted by changing the set temperature of the first thermostat 71 corresponding to each injector 711. This allows for individual adjustment of the concentration of each of the multiple types of sample substances in the sample gas over a wide range.

[0165] Furthermore, in the second embodiment, the temperature of the element holder 130 is regulated by the third constant temperature chamber 73 instead of the second constant temperature chamber 72. The third constant temperature chamber 73 regulates the temperature of the element holder 130 and the gas sensor element 110, and suppresses temperature fluctuations of the element holder 130 and the gas sensor element 110. Therefore, even if the ambient temperature around the evaluation device 1 fluctuates, temperature fluctuations of the element holder 130 and the gas sensor element 110 can be suppressed. As a result, the characteristics of the gas sensor element 110 can be evaluated under stable conditions.

[0166] Furthermore, the third constant temperature chamber 73 allows the temperature of the element holder 130 and the gas sensor element 110 to be adjusted independently of the temperature of the injector 711 and the mixer (primary mixer 651 and secondary mixer 652). Therefore, while adjusting the temperature of the injector 711 with the first constant temperature chamber 71 and adjusting the temperature of the mixer (primary mixer 651 and secondary mixer 652) with the second constant temperature chamber 72, the temperature of the element holder 130 can be adjusted without being affected by these temperatures.

[0167] 5. Variations In the first and second embodiments, the evaluation device 1 does not need to be equipped with either the first on-off valve 511 or the second on-off valve 512. Even in that case, the gas flow in the mixing path 21 can be opened and closed by a single on-off valve. However, if the second on-off valve 512 is located in the mixing path 21, closing the second on-off valve 512 when the mixing path 21 is not in use will further suppress the backflow of sample gas, etc., into the mixing path 21, thereby further suppressing contamination of the mixing path 21.

[0168] Furthermore, in the first and second embodiments, if there is little need to consider problems caused by gas backflow, the evaluation device 1 may not be equipped with one or both of the first check valve 611 and the second check valve 612.

[0169] Furthermore, in the first and second embodiments, if it is not necessary to dilute the sample gas with the primary dilution gas, the evaluation device 1 does not need to include the primary dilution path 22 and the elements located in the dilution path 22.

[0170] Furthermore, in the first and second embodiments, if it is not necessary to dilute the sample gas with a secondary dilution gas, the evaluation device 1 does not need to include a secondary dilution path 23 and elements located in the secondary dilution path 23, a dilution exhaust path 26 and elements located in the dilution exhaust path 26, and a secondary mixer 652.

[0171] Furthermore, in the first and second embodiments, if the detection results of the reference gas are not used for evaluating the gas sensor element 110, the evaluation device 1 does not need to include the reference path 24, the elements arranged in the reference path 24, and the three-way valve 49 which is a supply switching means.

[0172] In the first and second embodiments, the distribution means consists of a mixing path 25, a vent valve 653, a vent path 27, and an inspection path 28. However, the distribution means may have any configuration as long as it can distribute and deliver the sample gas to the element holding unit 130 and the gas detector 140.

[0173] Alternatively, the evaluation device 1 may not have a distribution means, and the element holder 130 and the gas detector 140 may be arranged in series in the gas path. For example, the gas detector 140 may be located on the starting end side of the supply path 29 than the element holder 130. In this case, the sample gas is supplied to the gas detector 140, which generates a signal, and then this sample gas is sent to the element holder 130, where the gas sensor element 110 generates a signal. Alternatively, the sample gas may be supplied to the element holder 130 first, and then supplied from the element holder 130 to the gas detector 140. In this case, the sample gas is sent to the element holder 130, where the gas sensor element 110 generates a signal, and then the sample gas is supplied to the gas detector 140, where the gas detector 140 generates a signal.

[0174] In the first embodiment, if the need for temperature control is low, the evaluation device 1 may not include at least one of the first thermostat 71 and the second thermostat 72. Also, in the second embodiment, if the need for temperature control is low, the evaluation device 1 may not include at least one of the first thermostat 71, the second thermostat 72, and the third thermostat 73.

[0175] Furthermore, in the first embodiment, the evaluation device 1 may include a plurality of first constant temperature chambers 71, as in the second embodiment. In the first embodiment, the evaluation device 1 may include a plurality of mixing paths 21 in which the flow rate of the gas is adjusted by a common flow rate regulator 41, as in the second embodiment. In the first embodiment, the evaluation device 1 may include a third constant temperature chamber 73, as in the second embodiment.

[0176] In the first and second embodiments, the carrier gas is not limited to an inert gas such as nitrogen. The carrier gas may be, for example, dry air. The gas supply source 3 may be configured to select the carrier gas to be supplied to the gas path from among several types of carrier gases. The gas supply source 3 may be equipped with equipment to pre-treat the carrier gas, such as purification. An example of such equipment is a filter equipped with activated carbon or silica gel.

[0177] Furthermore, in the first and second embodiments, various sample bodies 120 can be placed in the injector 711 depending on the expected application and usage environment of the gas sensor element 110. For example, the sample body 120 may be water. In this case, for example, humidity corresponding to the expected usage environment can be imparted to the sample gas. The sample body 120 may also contain substances (such as odor components) present in the expected usage environment as the sample material. In this case, the performance of the gas sensor element 110 when used under the expected usage environment can be evaluated.

[0178] In the first and second embodiments, the injector 711 is not limited to a bubbling container, as long as it can vaporize the sample substance and mix it into the carrier gas. For example, the injector 711 may be configured to vaporize the sample substance by heating the sample body 120 held in the injector 711. In this case, the injector 711 may include, for example, a permeator. In this case, the injector 711 can vaporize the sample substance in the sample body 120 by heating the sample body 120, not only when the sample body 120 is liquid, but also when it is in a solid state such as a powder.

[0179] When the sample 120 is in a solid form such as a powder, the capacity of the injector 711 is, for example, 250 mL and the amount of sample 120 is, for example, 200 mL, but it is not limited to these values.

[0180] In the first and second embodiments, an injector for mixing substances other than the sample substance (additives) into the secondary dilution gas may be provided in the secondary dilution path 23. That is, the secondary dilution gas supplied to the secondary mixer 652 may be a gas prepared by mixing additives into the carrier gas. This injector may have a configuration similar to the injector 711 provided in the mixing path 21. In this case, various substances can be added to the secondary dilution gas depending on the intended use and operating environment of the gas sensor element 110, for example. The additive may be water. In this case, for example, the sample gas can be given humidity according to the intended operating environment. The additive may be a substance (such as an odor component) present in the intended operating environment of the secondary dilution gas. In this case, the performance of the gas sensor element 110 when used under the intended operating environment can be evaluated.

[0181] In the first and second embodiments, the first constant temperature chamber 71 may be equipped with a temperature and humidity sensor that measures the temperature and humidity of the first constant temperature chamber 71 and sends the results to the control unit 80. In the first and second embodiments, the second constant temperature chamber 72 may be equipped with a temperature and humidity sensor that measures the temperature and humidity of the second constant temperature chamber 72 and sends the results to the control unit 80. In the second embodiment, the third constant temperature chamber 73 may be equipped with a temperature and humidity sensor that measures the temperature and humidity of the third constant temperature chamber 73 and sends the results to the control unit 80. In these cases, the control unit 80 can monitor the measurement results from the temperature and humidity sensors and determine whether or not there is an abnormality in temperature and humidity based on these measurement results.

[0182] In the first and second embodiments, each of the first incubator 71 and the second incubator 72 may be equipped with a mechanism for automatically discharging drain liquid.

[0183] In the first and second embodiments, the supply switching means does not have to be a three-way valve 49, as long as it switches the element holding unit 130 between a state in which sample gas is supplied and a state in which reference gas is supplied. For example, the supply switching means may consist of a six-way valve and a sample loop.

[0184] In the first and second embodiments, the control circuit provided in the element holding unit 130 may perform some of the functions of the control unit 80. In other words, the control circuit provided in the element holding unit 130 may function as part of the control unit 80. For example, the control circuit provided in the element holding unit 130 may control the supply switching means (three-way valve 49, or a six-way valve and sample loop, etc.).

[0185] In the first embodiment, the gas path may not have either the control valve 57 in the vent path 27 or the control valve 58 in the inspection path 28. The amount of sample gas supplied to the gas detector 140 can be adjusted by either the control valve 57 or the control valve 58 alone. If it is not necessary to adjust the amount of sample gas supplied to the gas detector 140, the gas path may not have either the control valve 57 in the vent path 27 or the control valve 58 in the inspection path 28. In the second embodiment, the gas path may have at least one of the control valve 57 in the vent path 27 or the control valve 58 in the inspection path 28.

[0186] In the first and second embodiments, the vent valves 653 and 642 may include control valves 604 and 605 for adjusting the flow rate of gas flowing out of the vent valves 653 and 642, as shown in Figure 9. The vent valves 653 and 642 shown in Figure 9 have an inlet pipe 601 which is the path for gas flowing into the vent valves 653 and 642, and two outlet pipes 602 and 603 which are the paths for gas flowing out of the vent valves 653 and 642. In the vent valve 653, the inlet pipe 601 and the outlet pipe 602 constitute a part of the mixing path 25, with the inlet pipe 601 located at the starting end and the outlet pipe 602 located at the ending end (supply path 29 side), and the outlet pipe 603 connected to the vent path 27. In the vent valve 642, the inlet pipe 601 and the outlet pipe 602 constitute part of the reference path 24, with the inlet pipe 601 located at the starting end and the outlet pipe 602 at the ending end (supply path 29 side). Control valves 604 and 605 are located in the two outlet pipes 602 and 603, respectively. In this case, the control valves 604 and 605 can adjust the flow rate ratio of the gas flowing out of the two outlet pipes 602 and 603. This allows the flow rate of the gas supplied to the element holder 130 to be adjusted.

[0187] In the first and second embodiments, the flow rate of gas supplied to the element holder 130 is adjusted by vent valves 653 and 642. However, this flow rate may be adjusted by means other than vent valves 653 and 642, or by using a combination of vent valves 653 and 642 and means other than vent valves 653 and 642. For example, a pump that draws gas from the supply path 29 towards the element holder 130 may be connected to the element holder 130. In this case, the flow rate of gas supplied to the element holder 130 can be adjusted by adjusting the suction force of the pump. Furthermore, even when the gas pressure is low, such as when the pressure of the gas flowing into the supply path 29 is below atmospheric pressure, the pump can stably supply gas to the element holder 130.

[0188] If a pump is connected to the element holder 130, the vent valves 653 and 642 may be configured such that the gas outflow pressure toward the supply path 29 is low, for example, below atmospheric pressure. In this case, the gas flow rate can be adjusted mainly by the pump to ensure a stable supply of gas to the element holder 130.

[0189] When a pump is connected to the element holder 130, the vent valves 653 and 642 may have the configuration shown in Figure 9. In this case, for example, the gas flow rate ratio is adjusted by the control valves 604 and 605 so that the flow pressure of the gas flowing out of the two outlet pipes 602 and 603 is sufficiently low, for example, below atmospheric pressure.

[0190] When a pump is connected to the element holder 130, the vent valves 653 and 642 may have the structure shown in Figure 10. The vent valves 653 and 642 shown in Figure 10 have an inlet pipe 601 and two outlet pipes 602 and 603, similar to the vent valves 653 and 642 shown in Figure 9. A connecting pipe 607, having a pipe diameter sufficiently smaller than the pipe diameters of the inlet pipe 601 and the two outlet pipes 602 and 603, is connected to the outlet pipe 602, which is located on the supply path 29 side. A sealant 606, such as an adhesive, is filled into the opening at the end of the outlet pipe 602, and the connecting pipe 607 is connected to the outlet pipe 602 so as to penetrate this sealant 606. In this case, the flow pressure of the gas flowing out from the vent valves 653 and 642 to the supply path 29 side can be sufficiently low, for example, below atmospheric pressure.

[0191] 6. Appearance As shown in the above implementation values ​​and modifications, this disclosure includes the following aspects.

[0192] The first embodiment of the gas sensor element evaluation apparatus (1) comprises a plurality of injectors (711), a mixer (651), an element holder (130), and a gas detector (140).

[0193] Each of the multiple injectors (711) prepares a mixed gas by mixing the sample substance into the carrier gas. The mixer (651) prepares a sample gas by mixing the multiple mixed gases prepared by the multiple injectors (711). The element holder (130) detachably holds the gas sensor element (110), and the sample gas is supplied to the gas sensor element (110). The gas detector (140) receives the sample gas and generates a signal according to the composition of the sample gas.

[0194] According to this embodiment, the gas sensor element (110) can be evaluated based on the signal generated by the gas sensor element (110) when a sample gas is supplied to the gas sensor element (110). Furthermore, since the actual composition of the sample gas supplied to the gas sensor element (110) can be confirmed based on the signal generated by the gas detector (140), the characteristics of the gas sensor element (110) can be evaluated under stable conditions.

[0195] In a second embodiment, in the first embodiment, at least one of the plurality of mixing devices (711) is equipped with a bubbling container that holds a liquid sample body (120) containing the sample substance.

[0196] In this embodiment, the sample substance in the sample body (120) can be vaporized by bubbling action in the injector (711) and mixed into the carrier gas.

[0197] In a third embodiment, the device further includes a supply switching means for switching the element holding portion (130) between a state in which a sample gas is supplied and a state in which a reference gas is supplied, as in the first or second embodiment.

[0198] According to this embodiment, the signal generated by the gas sensor element (110) when a reference gas is supplied to the gas sensor element (110) can be used for evaluation of the gas sensor element (110).

[0199] The fourth embodiment of the evaluation system for gas sensor elements comprises an evaluation device (1) for gas sensor elements according to any one of the first to third embodiments, and a control unit (80) that generates an evaluation result based on a signal generated by a gas sensor element (110) held in an element holding unit (130).

[0200] According to this embodiment, the gas sensor element (110) can be evaluated based on the signal generated by the gas sensor element (110) when a sample gas is supplied to the gas sensor element (110). Furthermore, since the actual composition of the sample gas supplied to the gas sensor element (110) can be confirmed based on the signal generated by the gas detector (140), the characteristics of the gas sensor element (110) can be evaluated under stable conditions.

[0201] In the fifth embodiment, as in the fourth embodiment, the control unit (80) performs feedback control to adjust the composition of the sample gas based on the detection result from the gas detector (140).

[0202] According to this embodiment, the gas sensor element (110) can be evaluated after adjusting the composition of the sample gas to the target composition, so that the characteristics of the gas sensor element (110) can be evaluated under stable conditions.

[0203] In the sixth aspect, in the fifth aspect, the evaluation device (1) for the gas sensor element further includes a flow regulator (41) for adjusting the flow rate of the carrier gas supplied to the injector (711). The control unit (80) controls the flow regulator (41) to change the flow rate of the carrier gas supplied to the injector (711) when performing feedback control to adjust the composition of the sample gas.

[0204] According to this embodiment, the control unit (80) can adjust the composition of the sample gas by changing the flow rate of the carrier gas supplied to the injector (711). [Explanation of symbols]

[0205] 1. Evaluation device for gas sensor elements 120 sample bodies 130 Element holding part 140 Gas detectors 41 Flow regulator 49. Three-way valve (supply switching means) 651 Mixer (primary mixer) 711 Mixer 80 Control Unit

Claims

1. It comprises multiple injectors, a mixer, an element holder, and a gas detector. Each of the multiple injectors prepares a mixed gas by mixing the sample substance into the carrier gas. The mixer prepares a sample gas by mixing the multiple mixed gases prepared in the multiple mixed gases, each prepared in the multiple mixed gases. The element holding portion detachably holds the gas sensor element, and the sample gas is supplied to the gas sensor element. The gas detector is supplied with the sample gas and generates a signal corresponding to the composition of the sample gas. Evaluation device for gas sensor elements.

2. At least one of the plurality of mixing devices comprises a bubbling container for holding a liquid sample body containing the sample substance. The evaluation apparatus for gas sensor elements according to claim 1.

3. The element holding section further includes a supply switching means for switching between a state in which the sample gas is supplied and a state in which the reference gas is supplied. The evaluation apparatus for gas sensor elements according to claim 1.

4. An evaluation apparatus for a gas sensor element according to any one of claims 1 to 3, The system includes a control unit that generates an evaluation result based on a signal generated by the gas sensor element while it is held in the element holding unit, Evaluation system for gas sensor elements.

5. The control unit performs feedback control to adjust the composition of the sample gas based on the detection result from the gas detector. The evaluation system for gas sensor elements according to claim 4.

6. The evaluation device for the gas sensor element further includes a flow regulator for adjusting the flow rate of the carrier gas supplied to the injector, The control unit, in performing feedback control to adjust the composition of the sample gas, controls the flow rate regulator to change the flow rate of the carrier gas supplied to the injector. The evaluation system for gas sensor elements according to claim 5.

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