Composition for film formation

JP7765297B2Active Publication Date: 2025-11-06SAKATA INX
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Patent Information

Application Number
JP2022013163
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-01-31
Publication Date
2025-11-06
Estimated Expiration
2042-01-31

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Abstract

To provide a coat-forming composition that can form a coat well, the coat to have a low refractive index and alkali solubility and to react with a photopolymerizable compound with an active energy ray.SOLUTION: A coat-forming composition comprises: a siloxane polymer with the content of a tetraalkoxysilane compound-derived constitutional unit being 25-35 mass%, the content of a fluoroalkoxysilane compound-derived constitutional unit being 5-40 mass%, and the total content of a trialkoxysilane compound-derived constitutional unit and a vinyl alkoxysilane compound-derived constitutional unit being 30-66 mass%; and an organic solvent.SELECTED DRAWING: None
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Citation Information

Patent Citations

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    JP2000275403A

  • Low refractive index composition and optical multilayer film made thereof

    JP2002069426A

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    JP2012203059A

  • Radiation-sensitive composition, and cured film and formation method thereof

    JP2012212114A