Evaluation method, search method, and search system

JP7874129B2Active Publication Date: 2026-06-15HITACHI HIGH TECH CORP
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Patent Information

Application Number
JP2024099529
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2023-06-28
Filing Date
2024-06-20
Publication Date
2026-06-15
Estimated Expiration
2044-06-20

AI Technical Summary

Technical Problem

Existing methods for evaluating the shape of patterns in microscopic images, such as those used in semiconductor manufacturing, are subjective and lack accuracy due to reliance on manual grading and qualitative assessments, which are not suitable for machine learning analysis.

Method used

A method involving two quantitative approaches, the area and distance methods, to evaluate the shape of cross-sectional images by comparing them to a normalized template, using dimensionless indices to quantify the difference between the target and ideal shapes.

Benefits of technology

Enables accurate, objective evaluation of cross-sectional shapes, allowing for efficient machine learning applications and reducing the complexity of optimizing processing conditions.

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Abstract

To provide a technique for evaluating a shape that appears in a cross-sectional image.SOLUTION: One of the typical evaluation methods of the present invention evaluates a difference between a target shape and a cross-sectional shape of an electron microscopic image, and includes: a first step of measuring a characteristic dimension of the cross-sectional shape; after the first step, a second step of creating a template of the target shape in the cross-sectional shape obtained from the dimension; and a third step of comparing a difference between the template and the cross-sectional shape using a normalized index.SELECTED DRAWING: Figure 4
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Citation Information

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