A preservative for topical skin preparations containing caprylhydroxamic acid, 4'-hydroxyacetophenone, and a polyol, and a cosmetic composition containing the same.

Abstract

The present application relates to a preservative for external skin preparations, comprising caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP) and a polyol, and uses thereof. The preservative for external skin preparations according to one embodiment exhibits excellent antibacterial or antiseptic effects against bacteria and fungi. In particular, the preservative for external skin preparations according to one embodiment contains 4'-hydroxyacetophenone and caprylyl glycol as active ingredients, and when applied to a cosmetic composition containing a surfactant, the antibacterial or antiseptic effects against bacteria and fungi are not reduced, and a significantly excellent antibacterial or antiseptic effect is maintained. Thus, the preservative for external skin preparations according to one embodiment can be usefully used to perform antibacterial, preservative or antiseptic treatment on various cosmetic compositions or external skin preparations, including cleansing products.

Description

Technical Field

[0001] The present invention relates to a preservative for external skin preparations containing caprylic hydroxamic acid, 4'-hydroxyacetophenone and polyol, and a cosmetic composition containing the same.

[0002] This patent application claims priority to Korean Patent Application No. 10-2022-0028224, filed with the Korean Intellectual Property Office on March 4, 2022, and the disclosure of the said patent application is incorporated herein by reference.

Background Art

[0003] In the manufacture of cosmetic products, preservatives that can improve the preservative power of the products are essential because it is impossible to avoid contamination by microorganisms during the manufacturing process or use process. Widely used such preservatives include parabens preservatives, imidazolidinyl urea, phenoxyethanol, etc. However, although the aforementioned preservatives have the advantages of strong antibacterial power and very excellent preservative power, they are also widely known to have disadvantages such as inducing toxicity, skin irritation, allergies, etc. Therefore, there is a need to develop a safe preservative that does not induce skin irritation and has strong preservative power.

[0004] As part of such research, the development of preservatives using relatively safe ingredients such as acetophenone derivatives and caprylyl glycol has been continued (Korean Registered Patent No. 10-2262467), but the inventors have found that acetophenone derivatives and caprylyl glycol have significantly reduced antibacterial power in an environment where surfactants are present, and there are limitations in applying them as preservatives or preservatives to external skin preparations (for example, cleansing cosmetic compositions) containing the said surfactant. Therefore, in order to apply acetophenone derivatives and caprylyl glycol as preservatives or preservatives, it is necessary to maintain excellent antibacterial power even in an environment where the said surfactant is present, but there is still a lack of research in this regard.

Summary of the Invention

[0005] To solve the aforementioned problems, the inventors of the present invention developed a preservative for topical skin preparations containing caprylhydroxamic acid, 4'-hydroxyacetophenone, and a polyol, and completed the present invention by confirming that when the said preservative is applied to cosmetic compositions containing surfactants, excellent antibacterial and antiseptic properties are exhibited.

[0006] One object of the present invention is to provide a preservative for topical skin preparations comprising caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol.

[0007] Another object of the present invention is to provide a cosmetic composition containing the aforementioned preservative for topical skin preparations.

[0008] A further object of the present invention is to provide a method for producing a preservative for topical skin preparations, comprising the step of mixing caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol.

[0009] Another object of the present invention is to provide a method for producing a cosmetic composition, which includes the step of adding the aforementioned preservative for topical skin preparations.

[0010] Another object of the present invention is to provide a method for antimicrobial, preservative, or antiseptic treatment of a cosmetic composition, which includes the step of adding the aforementioned preservative for topical skin preparations.

[0011] A further object of the present invention is to provide a composition comprising caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol for use in antimicrobial, preservative, or antiseptic treatment of topical skin preparations or cosmetic compositions.

[0012] A further object of the present invention is to provide a composition comprising caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol for use in the production of preservatives for topical skin preparations, or cosmetic compositions for antimicrobial or antiseptic purposes.

[0013] However, the technical problems that this invention aims to solve are not limited to those mentioned above, and other problems not mentioned will be clearly understood by those with ordinary skill in the art from the following description. [Means for solving the problem]

[0014] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by skilled professionals in the art to which this invention pertains. Generally, the nomenclature used herein is widely known and commonly used in the art.

[0015] One embodiment provides a preservative for topical skin preparations comprising caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol.

[0016] The aforementioned preservative for topical skin preparations may further contain one or more polyols selected from the group consisting of glycerin, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, pentylene glycol, hexylene glycol, ethoxydiglycol, and alkanediols having 3 to 12 carbon atoms. The alkanediols having 3 to 12 carbon atoms may be, but are not limited to, octanediol, decanediol, propanediol, butanediol, pentanediol, hexanediol, heptanediol, undecanediol, dodecanediol, or combinations thereof. Preferably, the aforementioned preservative for topical skin preparations may further contain dipropylene glycol.

[0017] In one specific example, in the case of a preservative for topical skin preparations containing two selected from caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol, while it may exhibit antibacterial effects in a general environment, its antibacterial and preservative effects are significantly reduced in an environment where surfactants are present. However, one embodiment of a preservative for topical skin preparations containing caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol overcomes these problems and can exhibit excellent antibacterial and preservative effects against both bacteria and fungi (yeast and mold) even in cosmetic compositions containing various surfactants.

[0018] The aforementioned preservative for topical skin preparations may contain caprylhydroxamic acid in an amount of about 5 to 15% by weight relative to the total weight. Specifically, the aforementioned preservative for topical skin preparations may contain caprylhydroxamic acid in an amount of about 5 to 10% by weight, or about 10 to 15% by weight, relative to the total weight. In one specific example, if the aforementioned preservative for topical skin preparations contains caprylhydroxamic acid in an amount outside the aforementioned numerical range relative to the total weight, the antibacterial or antiseptic effect may be reduced, or a decrease in stability such as solidification, precipitation, decreased solubility, decreased emulsifying or solubilizing ability may occur, or skin irritation may be induced, leading to a decrease in safety.

[0019] The aforementioned preservative for topical skin preparations may contain 4'-hydroxyacetophenone in an amount of about 25 to 30% by weight relative to the total weight. Specifically, the aforementioned preservative for topical skin preparations may contain 4'-hydroxyacetophenone in an amount of about 25 to 27% by weight, or about 27 to 30% by weight, relative to the total weight. In one specific example, if the aforementioned preservative for topical skin preparations contains 4'-hydroxyacetophenone in an amount outside the aforementioned numerical range relative to the total weight, the antibacterial or antiseptic effect may be reduced, or stability may be reduced, such as solidification, precipitation, decreased solubility, decreased emulsifying or solubilizing ability, or skin irritation may be induced, leading to a decrease in safety.

[0020] The aforementioned preservative for topical skin preparations may contain caprylyl glycol in an amount of about 13 to 15% by weight relative to the total weight. Specifically, the aforementioned preservative for topical skin preparations may contain caprylyl glycol in an amount of about 13 to 14% by weight, or about 14 to 15% by weight, relative to the total weight. In one specific example, if the aforementioned preservative for topical skin preparations contains caprylyl glycol in an amount outside the aforementioned numerical range relative to the total weight, the antibacterial or antiseptic effect may be reduced, or a decrease in stability such as solidification, precipitation, decreased solubility, decreased emulsifying or solubilizing ability may occur, or skin irritation may be induced, leading to a decrease in safety.

[0021] The preservative for topical skin preparations may contain, by weight, about 5 to 15%, 5 to 10%, or 10 to 15% of the caprylhydroxamic acid, about 25 to 30%, 25 to 27%, or 27 to 30% of the 4'-hydroxyacetophenone, and about 13 to 15%, 13 to 14%, or 14 to 15% of the caprylyl glycol, and preferably, the preservative for topical skin preparations may contain, by weight, about 5 to 15% of the caprylhydroxamic acid, about 25 to 30% of the 4'-hydroxyacetophenone, and about 13 to 15% of the caprylyl glycol.

[0022] The weight ratio of caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol contained in the preservative for topical skin preparations may be about 5 to 15, 5 to 10, or 10 to 15:25 to 30, 25 to 27, or 27 to 30:13 to 15, 13 to 14, or 14 to 15, and preferably the weight ratio of caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol contained in the preservative for topical skin preparations may be about 5 to 15:25 to 30:13 to 15.

[0023] In one specific example, when the weight percentage or weight ratio of the caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol contained in the preservative for topical skin preparations is within the numerical range, the cosmetic composition containing various surfactants exhibits excellent antibacterial and antiseptic effects against both bacteria and fungi (yeast and mold). When the weight percentage or weight ratio of the caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol contained in the preservative for topical skin preparations is outside the numerical range, the antibacterial and antiseptic effects against bacteria and fungi (yeast and mold) (especially the antibacterial and antiseptic effects against mold) in the cosmetic composition containing various surfactants may be significantly reduced.

[0024] The preservative for the external preparation for skin contains, based on the total weight, one or more polyols selected from the group consisting of glycerin, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, pentylene glycol, hexylene glycol, ethoxydiglycol, and alkanediols having 3 to 12 carbon atoms, in an amount of about 38 to 57% by weight, 38 to 55% by weight, 38 to 50% by weight, 38 to 45% by weight, 38 to 40% by weight, 40 to 57% by weight, 40 to 55% by weight, 40 to 50% by weight, 40 to 45% by weight, 45 to 57% by weight, 45 to 55% by weight, 45 to 50% by weight, 50 to 57% by weight, 50 to 55% by weight, or 55 to 57% by weight. According to one specific example, when the preservative for the external preparation for skin contains the polyol in an amount outside the above numerical range, the antibacterial or antiseptic effect is reduced, or stability reduction such as solidification, precipitation, reduction in dissolution power, reduction in emulsifying power or solubilizing power is caused, or skin irritation etc. is induced, which may cause reduction in safety.

[0025] The preservative for the external preparation for skin contains, based on the total weight, about 5 to 15% by weight, 5 to 10% by weight, or 10 to 15% by weight of caprylic hydroxamic acid, about 25 to 30% by weight, 25 to 27% by weight, or 27 to 30% by weight of 4'-hydroxyacetophenone, about 13 to 15% by weight, 13 to 14% by weight, or 14 to 15% by weight of caprylyl glycol, and about 38 to 57% by weight, 40 to 55% by weight, or 4 at 5 to 50% by weight of the polyol. Desirably, the preservative for the external preparation for skin contains, based on the total weight, about 5 to 15% by weight of caprylic hydroxamic acid, about 25 to 30% by weight of 4'-hydroxyacetophenone, about 13 to 15% by weight of caprylyl glycol, and about 38 to 57% by weight of the polyol.

[0026] The weight ratio of the caprylic hydroxamic acid, the 4'-hydroxyacetophenone, the caprylyl glycol and the polyol contained in the preservative for external skin preparations is about 5 to 15, 5 to 10, or 10 to 15: 25 to 30, 25 to 27, or 27 to 30: 13 to 15, 13 to 14, or 14 to 15: 38 to 57, 40 to 55, or 45 to 50, and preferably, the weight ratio of the caprylic hydroxamic acid, the 4'-hydroxyacetophenone, the caprylyl glycol and the polyol contained in the preservative for external skin preparations is about 5 to 15: 25 to 30: 13 to 15: 38 to 57.

[0027] The preservative for external skin preparations may further contain disodium ethylenediaminetetraacetate (EDTA 2Na).

[0028] According to one specific example, when EDTA 2Na is additionally contained in the preservative for external skin preparations according to one aspect, in a cosmetic composition containing various surfactants, it can exhibit the most excellent antibacterial and antiseptic effects against both bacteria and fungi (yeasts and molds).

[0029] The preservative for external skin preparations may contain the EDTA 2Na at about 0.5 to 10% by weight, 0.5 to 8% by weight, 0.5 to 5% by weight, 0.5 to 3% by weight, 0.5 to 1% by weight, 1 to 10% by weight, 1 to 8% by weight, 1 to 5% by weight, 1 to 3% by weight, 3 to 10% by weight, 3 to 8% by weight, 3 to 5% by weight, 5 to 10% by weight, 5 to 8% by weight, or 8 to 10% by weight based on the total weight.

[0030] In one specific example, the preservative for topical skin preparations may exhibit excellent antibacterial or antiseptic effects against a variety of microorganisms (specifically, contaminating microorganisms). Specifically, the preservative for topical skin preparations may inhibit the growth of or kill gram-positive bacteria, gram-negative bacteria, and fungi (e.g., yeast, mold, etc.). More specifically, the preservative for topical skin preparations exhibits excellent antibacterial or antiseptic effects against, but is not limited to, Escherichia coli, Pseudomonas aeruginosa, Staphylococcus aureus, Candida albicans, and Aspergillus brasiliensis.

[0031] As used herein, the term "topical skin preparation" is a comprehensive concept encompassing all compositions applied to the skin, including, for example, various cosmetics such as basic cosmetics, makeup cosmetics, and hair cosmetics; and pharmaceutical compositions for topical administration, including pharmaceuticals and quasi-drugs such as ointments, creams, and lotions.

[0032] In one specific example, the topical skin preparation may contain a surfactant. That is, the preservative for topical skin preparations may be used or applied to a topical skin preparation containing a surfactant, in which case it may exhibit remarkably excellent antibacterial and antiseptic effects against both bacteria and fungi (yeast and mold). In other words, the preservative for topical skin preparations may have the use of antibacterial or antiseptic treatment for a topical skin preparation containing a surfactant. The surfactant may be a natural surfactant, a synthetic surfactant, or a combination thereof. The surfactant may be a cationic surfactant, a nonionic surfactant, an anionic surfactant, an amphoteric surfactant, or a combination thereof. The surfactant may be, but is not limited to, coco-betaine (CAS No. 68424-94-2), lauryl glucoside, sodium laureth sulfate, cocamidopropyl betaine, or a combination thereof.

[0033] In one specific example, the topical skin preparation may contain the surfactant in an amount of about 0.5 to 70% by weight relative to the total weight, but is not limited thereto. Preferably, it may contain about 1 to 50% by weight, 10 to 40% by weight, or 20 to 40% by weight.

[0034] The aforementioned topical skin preparation may be a cleansing cosmetic composition.

[0035] The aforementioned cleansing cosmetic composition may include, but is not limited to, shampoo, conditioner, scalp cleanser, foaming cleanser, soap, cleansing oil, cleansing cream, face cleanser, body cleanser, toothpaste, oral cleanser, etc.

[0036] In this specification, the term "preservative for topical skin preparations" may be used interchangeably with terms such as "antibacterial agent," "antimicrobial agent," "antimicrobial preservative," "antimicrobial preservative," "antimicrobial composition," "antimicrobial or antimicrobial composition," "antimicrobial cosmetic composition," "antimicrobial cosmetic composition," and "antimicrobial or antimicrobial cosmetic composition."

[0037] In this specification, the term "antimicrobial" means resistance to all contaminating microorganisms such as bacteria, molds, and yeasts; "antimicrobial power" or "antimicrobial effect" means the ability or effect of protection against such contaminating microorganisms; and "preservative power" or "preservative effect" means the ability or effect of protection against spoilage caused by microbial contamination, and is a concept that includes antimicrobial power or antimicrobial effect.

[0038] In this specification, the term "preservative" means a substance that has antiseptic or antioxidant properties that prevents deterioration of a product for a long period of time and maintains its original state, and "preservative power" means the protective power that prevents deterioration of a product for a long period of time and maintains its original state.

[0039] The aforementioned preservative for topical skin preparations may further contain additives such as purified water, carriers, emulsifiers, moisturizers, skin conditioning agents, surfactants, chelating agents, antioxidants, preservatives, bactericides, stabilizers, preservatives, pH adjusters, lubricants, solubilizers, and solvents. Furthermore, the aforementioned preservative for topical skin preparations may further contain substances that can supplementally provide essential nutrients to the skin, or substances that improve skin condition, such as functional substances that have an effect on wrinkles or on improving skin whitening. Furthermore, the aforementioned preservative for topical skin preparations may further contain auxiliary agents that include, but are not limited to, natural fragrances, cosmetic fragrances, or plant extracts.

[0040] Another embodiment provides a cosmetic composition containing the aforementioned preservative for topical skin preparations.

[0041] In one specific example, the cosmetic composition may contain a surfactant. That is, the preservative for topical skin preparations may be used or applied to a cosmetic composition containing a surfactant, in which case it may exhibit remarkably excellent antibacterial and antiseptic effects against both bacteria and fungi (yeast and mold). In other words, the preservative for topical skin preparations may have the use of antibacterial or antiseptic treatment for a cosmetic composition containing a surfactant. The surfactant may be a natural surfactant, a synthetic surfactant, or a combination thereof. The surfactant may be a cationic surfactant, a nonionic surfactant, an anionic surfactant, an amphoteric surfactant, or a combination thereof. The surfactant may also be, but is not limited to, coco-betaine (CAS No. 68424-94-2), lauryl glucoside, sodium laureth sulfate, cocamidopropyl betaine, or a combination thereof.

[0042] In one specific example, the cosmetic composition may contain the surfactant in an amount of about 0.5 to 70% by weight relative to the total weight, but is not limited thereto. Preferably, it may contain about 1 to 50% by weight, 10 to 40% by weight, or 20 to 40% by weight.

[0043] The aforementioned cosmetic composition may be a cleansing cosmetic composition.

[0044] The aforementioned cleansing cosmetic composition may include, but is not limited to, shampoo, conditioner, scalp cleanser, foaming cleanser, soap, cleansing oil, cleansing cream, face cleanser, body cleanser, toothpaste, oral cleanser, etc.

[0045] The cosmetic composition may contain the preservative for topical skin preparations in an amount of about 0.0001 to 50% by weight relative to the total weight of the cosmetic composition. Specifically, the cosmetic composition may contain the preservative for topical skin preparations in an amount of about 0.0001 to 0.001% by weight, 0.001 to 0.01% by weight, 0.01 to 0.1% by weight, 0.1 to 1% by weight, 1 to 10% by weight, 10 to 20% by weight, 20 to 30% by weight, 30 to 40% by weight, or 40 to 50% by weight relative to the total weight of the cosmetic composition. In one specific example, if the cosmetic composition contains the preservative for topical skin preparations in an amount of less than approximately 0.0001% by weight of the total weight of the cosmetic composition, the antibacterial or antiseptic effect is reduced, and if the preservative for topical skin preparations contains an amount exceeding approximately 50% by weight of the total weight of the cosmetic composition, it may cause a decrease in stability, such as solidification, precipitation, decreased dissolving power, or decreased emulsifying or solubilizing power.

[0046] The cosmetic composition may also contain, but is not limited to, additives selected from the group consisting of purified water, carriers, emulsifiers, humectants, skin conditioning agents, surfactants, chelating agents, antioxidants, preservatives, bactericides, stabilizers, preservatives, pH adjusters, lubricants, solubilizers, solvents, and combinations thereof. Furthermore, the cosmetic composition may further contain substances that can supplementally provide essential nutrients to the skin, or substances that improve skin condition, such as functional substances that have an effect on wrinkles or on improving skin whitening. The cosmetic composition may contain, but is not limited to, natural fragrances, cosmetic fragrances, or plant extracts, and may further contain auxiliary agents.

[0047] The cosmetic composition may be manufactured in any dosage form commonly produced in the industry. Specifically, the cosmetic composition may be, but is not limited to, a solution, emulsion, suspension, softening lotion, nourishing lotion, massage cream, nourishing cream, pack, gel, cleanser, foaming cleanser, cleansing oil, cleansing cream, skin-adhesive cosmetic, lipstick, powder, makeup base, foundation, shampoo, conditioner, scalp cleanser, scalp lotion, scalp cream, scalp pack, scalp gel, scalp ointment, scalp gel, face cleanser, body cleanser, soap, toothpaste, mouthwash, paste, lotion, ointment, gel, cream, patch, spray or atomizer.

[0048] The carriers contained in the cosmetic composition may be used selectively depending on the dosage form of the cosmetic. For example, when manufacturing ointment, paste, cream, or gel-type cosmetics, waxes, paraffin, starch, tracant, cellulose derivatives, polyethylene glycol, silicone, bentonite, silica, talc, zinc oxide, etc., may be used as carrier components, either alone or in combination. When manufacturing powder or spray-type cosmetics, lactose, talc, silica, aluminum hydroxide, calcium silicate, polyamide powder, chlorofluorohydrocarbon, propane / butane, dimethyl ether, etc., may be used as carrier components, either alone or in combination. When manufacturing cosmetics in solution or emulsion form, the carrier components may include water, ethanol, isopropanol, ethyl carbonate, ethyl acetate, benzyl alcohol, benzyl benzoate, propylene glycol, 1,3-butyl glycol oil, cottonseed oil, peanut oil, corn germ oil, olive oil, castor oil, sesame oil, glycerol aliphatic esters, polyethylene glycol, or sorbitan fatty acid esters, either alone or in combination. When manufacturing cosmetics in suspension form, the carrier components may include water, ethanol or propylene glycol, ethoxylated isostearyl alcohol, polyoxyethylene sorbitol ester, polyoxyethylene sorbitan ester, microcrystalline cellulose, aluminum methhydroxyl, bentonite, agar, tracant, either alone or in combination. When manufacturing soap-type cosmetics, alkali metal salts of fatty acids, fatty acid hemiester salts, fatty acid protein hydrolysates, isethionates, lanolin derivatives, aliphatic alcohols, vegetable oils, glycerol, sugars, etc., can be used as carrier components, either individually or in combination.

[0049] Of the terms or elements mentioned in the aforementioned cosmetic composition, those mentioned in the description relating to the aforementioned preservative for topical skin preparations are understood to be the same as those mentioned in the description relating to the aforementioned preservative for topical skin preparations.

[0050] Another embodiment provides a method for producing a preservative for topical skin preparations, comprising the step of mixing caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol.

[0051] The above method may further include the step of adding and mixing one or more polyols selected from the group consisting of glycerin, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, pentylene glycol, hexylene glycol, ethoxydiglycol, and alkanediols having 3 to 12 carbon atoms.

[0052] The above method may further include the step of adding and mixing EDTA 2Na.

[0053] Another embodiment provides a method for producing a cosmetic composition, which includes the step of adding the preservative for topical skin preparations.

[0054] Another embodiment provides a method for subjecting a cosmetic composition, which includes the step of adding the aforementioned preservative for topical skin preparations, to antimicrobial treatment, preservative treatment, or antiseptic treatment.

[0055] In the above method, the mixed weight ratio or weight % of each component is as described in the description of the preservative for topical skin preparations.

[0056] In the aforementioned method, the specific conditions and procedures are based on, but are not limited to, those of the common practice in this industry.

[0057] Of the terms or elements mentioned in the method described above, those mentioned in the description of the preservative for topical skin preparations or cosmetic compositions are understood to be the same as those mentioned above in the description of the preservative for topical skin preparations or cosmetic compositions.

[0058] Further embodiments provide a composition containing caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol for use in antimicrobial, preservative, or antiseptic treatment of topical skin preparations or cosmetic compositions.

[0059] Further embodiments provide uses for compositions comprising caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol for the manufacture of preservatives for topical skin preparations, or for the production of antimicrobial or antiseptic cosmetic compositions.

[0060] The composition may further comprise one or more polyols selected from the group consisting of glycerin, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, pentylene glycol, hexylene glycol, ethoxydiglycol, and alkanediols having 3 to 12 carbon atoms.

[0061] The aforementioned composition may further contain EDTA 2Na.

[0062] The mixed weight ratio or weight % of each of the above components is as mentioned in the description of the preservative for topical skin preparations.

[0063] Of the terms or elements mentioned in the aforementioned uses, those mentioned in the description of the aforementioned preservatives for topical skin preparations, cosmetic compositions or methods are understood to be the same as those mentioned in the aforementioned description of the aforementioned preservatives for topical skin preparations, cosmetic compositions or methods. [Effects of the Invention]

[0064] One embodiment of a preservative for topical skin preparations exhibits excellent antibacterial or antiseptic effects against bacteria and fungi, and in particular, when applied to cosmetic compositions containing surfactants, the antibacterial or antiseptic effects against bacteria and fungi are not diminished, and the preservative exhibits remarkably excellent antibacterial or antiseptic effects. [Modes for carrying out the invention]

[0065] The present invention will be described in more detail below through examples and experimental examples. However, these examples and experimental examples are for illustrative purposes only, and the scope of the present invention is not limited to these examples and experimental examples.

[0066] 1. Manufacturing and evaluation of preservatives for topical skin preparations Examples 1 to 10: Manufacture of preservatives for topical skin preparations In this example, a preservative for topical skin preparations containing caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol was prepared.

[0067] Specifically, caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), caprylyl glycol, and dipropylene glycol were mixed, and then stirred while being heated to approximately 60 to 70°C to produce a preservative for topical skin preparations, yielding eight types of preservatives for topical skin preparations with different weight percentages of each mixed component (Examples 1 to 8). In addition, ethylenediaminetetraacetate disodium (EDTA 2Na) was added and mixed, and then stirred while being heated to approximately 60 to 70°C to produce a preservative for topical skin preparations, yielding two types of preservatives for topical skin preparations with different weight percentages of each mixed component (Examples 9 to 10). Furthermore, three comparative examples (Comparative Examples 1 to 3) were obtained, each containing two components selected from caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol, and dipropylene glycol. This yielded five comparative examples (Comparative Examples 4 to 8) containing caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), caprylyl glycol, and dipropylene glycol, with the content of each component differing from that of the preservative for topical skin preparations in the above-mentioned examples. These comparative examples were manufactured by the same method as the manufacturing method in the examples. The manufactured Examples 1 to 10 and Comparative Examples 1 to 8 are shown in Tables 1 and 2 below.

[0068] [Table 1]

[0069] [Table 2]

[0070] Experimental Example 1. Confirmation of the antibacterial effect of a preservative for topical skin preparations in the presence of a cationic surfactant. The antibacterial effect of the preservatives for topical skin preparations produced in Examples 1 to 10 was confirmed in the presence of a cationic surfactant. As the cationic surfactant, cocobetaine (CAS No. 68424-94-2), the most commonly used cationic surfactant in the cosmetics field, was used.

[0071] Specifically, as shown in Tables 3 and 4 below, each of the preservatives for topical skin preparations produced in Examples 1 to 10 was mixed with a cationic surfactant, and the antibacterial effect of the mixture against bacteria, yeast, and fungi was confirmed. To confirm the antibacterial effect against bacteria, culture solutions of Escherichia coli (ATCC 8739), Pseudomonas aeruginosa (ATCC 9027), and Staphylococcus aureus (ATCC 6538) were mixed in a 1:1:1 ratio, and the mixed culture solutions were inoculated into the mixtures shown in Tables 3 and 4 below, respectively. At this time, the number of inoculum was approximately 10. 6 Inoculation was performed to achieve a CFU / g level. To confirm the antimicrobial effect against yeast, the culture solution of Candida albicans (ATCC 10231) was inoculated into the mixtures shown in Tables 3 and 4 below, respectively. At this time, the number of inoculum was approximately 10. 5 Inoculation was performed to achieve a CFU / g level. To confirm the antibacterial effect against fungi, the culture solution of Aspergillus brasiliensis (ATCC 16404) was inoculated into the mixtures shown in Tables 3 and 4 below, respectively. At this time, the number of inoculum was approximately 10 5 The samples were inoculated to a CFU / g ratio. After inoculation, they were stored at room temperature (approximately 25°C) for 7 days. The number of viable bacteria in each sample was then measured, and the final bacterial mortality rate (%) was analyzed. The results are shown in Table 5 below. The bacterial mortality rate (%) was calculated using the following formula:

[0072]

number

[0073] The mortality rate (%) of preservatives for topical skin preparations from Examples 1 to 10 and Comparative Examples 1 to 8 was measured in aqueous solutions containing only cationic surfactants at a concentration of approximately 30%, without any addition of the aforementioned preservatives, and this was used as control group 1. Furthermore, the mortality rate (%) of preservatives for topical skin preparations from Comparative Example 1 was measured in aqueous solutions containing only the aforementioned preservative at a concentration of approximately 1%, without any addition of the cationic surfactant, and this was used as control group 2. In addition, the mortality rate (%) of mixtures obtained by mixing each of the aforementioned preservatives for topical skin preparations from Comparative Examples 1 to 8 with cationic surfactants was measured and these were used as control groups 3 to 10.

[0074] [Table 3]

[0075] [Table 4]

[0076] As a result, as shown in Table 5, it was confirmed that in the presence of only cationic surfactants (control group 1), the antibacterial effect against both bacteria and fungi (yeast and mold) was significantly low. In Comparative Example 1, which contained 4'-hydroxyacetophenone (4'-HAP) and caprylyl glycol, it showed some antibacterial effect in an environment without surfactants (control group 2), but it was confirmed that the antibacterial effect was significantly reduced in an environment with cationic surfactants (control group 3). Furthermore, in Examples 1 to 10, which further contained caprylhydroxamic acid (CHA) in addition to Comparative Example 1, it was confirmed that even in an environment with cationic surfactants (experimental groups 1 to 10), it showed a kill effect of over 99% against both bacteria and fungi (yeast and mold), demonstrating a remarkably excellent antibacterial effect. In particular, in Examples 9 and 10, which further included ethylenediaminetetraacetate disodium (EDTA 2Na), it was confirmed that they exhibited the most superior antibacterial effect, killing approximately 99.99% of both bacteria and fungi (yeast and mold) even in the presence of cationic surfactants (experimental groups 9 and 10). Furthermore, in Comparative Examples 2 and 3, which included caprylhydroxamic acid (CHA) but also contained either 4'-hydroxyacetophenone (4'-HAP) or caprylyl glycol, it was confirmed that the antibacterial effect was significantly reduced in the presence of cationic surfactants (control groups 4 and 5) (in particular, the antibacterial effect against fungi (yeast and mold) was significantly reduced).

[0077] Furthermore, as shown in Table 5, it was confirmed that only when caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol are included in specific concentrations, excellent antibacterial effects are observed against both bacteria and fungi (yeast and mold) even in the presence of cationic surfactants. Specifically, only the preservative for topical skin preparations in the examples containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol were confirmed to exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in the presence of cationic surfactants. Furthermore, in comparative examples where the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, it was confirmed that the antibacterial effect is significantly reduced in the presence of cationic surfactants (in particular, the antibacterial effect against fungi (yeast and mold) is significantly reduced).

[0078] [Table 5]

[0079] Experimental Example 2. Confirmation of the antibacterial effect of preservatives for topical skin preparations in the presence of nonionic surfactants. The antibacterial effect of the preservatives for topical skin preparations produced in Examples 1 to 10 was confirmed in the presence of a nonionic surfactant. As the nonionic surfactant, lauryl glucoside, the most commonly used nonionic surfactant in the cosmetics field, was used.

[0080] Specifically, as shown in Tables 6 and 7 below, each of the preservatives for topical skin preparations produced in Examples 1 to 10 was mixed with a nonionic surfactant, and the antibacterial effect of the mixture against bacteria, yeast, and mold was confirmed. The specific experimental method was the same as that performed in Experimental Example 1.

[0081] Control group 11 consisted of aqueous solutions containing only a nonionic surfactant at a concentration of approximately 30%, without any addition of the preservatives for topical skin preparations manufactured in Examples 1 to 10 and Comparative Examples 1 to 8. Control group 12 consisted of aqueous solutions containing only the preservative for topical skin preparations manufactured in Comparative Example 1 at a concentration of approximately 1%, without any addition of a nonionic surfactant. Furthermore, mixtures obtained by mixing each of the preservatives for topical skin preparations manufactured in Comparative Examples 1 to 8 with a nonionic surfactant were used as control groups 13 to 20.

[0082] [Table 6]

[0083] [Table 7]

[0084] As a result, as shown in Table 8, it was confirmed that when only nonionic surfactants were present (control group 11), the antibacterial effect against both bacteria and fungi (yeast and mold) was significantly low. In Comparative Example 1, which contained 4'-hydroxyacetophenone (4'-HAP) and caprylyl glycol, it showed some antibacterial effect in an environment without surfactants (control group 12), but it was confirmed that the antibacterial effect was significantly reduced in an environment with nonionic surfactants (control group 13). Furthermore, in Examples 1 to 10, which further contained caprylhydroxamic acid (CHA) in Comparative Example 1, it was confirmed that even in an environment with nonionic surfactants (experimental groups 11 to 20), it showed a kill effect of over 99% against both bacteria and fungi (yeast and mold), demonstrating a remarkably excellent antibacterial effect. In particular, in Examples 9 and 10, which further included ethylenediaminetetraacetate disodium (EDTA 2Na), it was confirmed that they exhibited the most excellent antibacterial effect, killing approximately 99.99% of both bacteria and fungi (yeast and mold) even in environments where nonionic surfactants were present (experimental groups 19 and 20). Furthermore, in Comparative Examples 2 and 3, which included caprylhydroxamic acid (CHA) but also contained either 4'-hydroxyacetophenone (4'-HAP) or caprylyl glycol, it was confirmed that the antibacterial effect was significantly reduced in environments where nonionic surfactants were present (control groups 14 and 15) (in particular, the antibacterial effect against fungi (yeast and mold) was significantly reduced).

[0085] Furthermore, as shown in Table 8, it was confirmed that only when caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol are included in specific concentrations, they exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in the presence of nonionic surfactants. Specifically, only the preservative for topical skin preparations in the examples containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol were confirmed to exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in the presence of nonionic surfactants. Furthermore, in comparative examples where the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, it was confirmed that the antibacterial effect is significantly reduced in the presence of nonionic surfactants (in particular, the antibacterial effect against fungi (yeast and mold) is significantly reduced).

[0086] [Table 8]

[0087] Experimental Example 3. Confirmation of the antibacterial effect of a preservative for topical skin preparations in the presence of anionic surfactants. The antibacterial effect of the preservatives for topical skin preparations produced in Examples 1 to 10 was confirmed in the presence of an anionic surfactant. Sodium laureth sulfate, the most commonly used anionic surfactant in the cosmetics field, was used as the anionic surfactant.

[0088] Specifically, as shown in Tables 9 and 10 below, each of the preservatives for topical skin preparations produced in Examples 1 to 10 was mixed with an anionic surfactant, and the antibacterial effect of the mixture against bacteria, yeast, and fungi was confirmed. The specific experimental method was the same as that performed in Experimental Example 1.

[0089] As control group 21, aqueous solutions containing only anionic surfactants at a concentration of approximately 30%, without any of the preservatives for topical skin preparations manufactured in Examples 1 to 10 and Comparative Examples 1 to 8, were used. As control group 22, aqueous solutions containing only the preservative for topical skin preparations manufactured in Comparative Example 1 at a concentration of approximately 1%, without any of the anionic surfactants, were used. Furthermore, mixtures obtained by mixing each of the preservatives for topical skin preparations manufactured in Comparative Examples 1 to 8 with anionic surfactants were used as control groups 23 to 30.

[0090] [Table 9]

[0091] [Table 10]

[0092] As a result, as shown in Table 11, it was confirmed that when only anionic surfactants were present (control group 21), the antibacterial effect against both bacteria and fungi (yeast and mold) was significantly low. In Comparative Example 1, which contained 4'-hydroxyacetophenone (4'-HAP) and caprylyl glycol, it showed some antibacterial effect in an environment without surfactants (control group 22), but it was confirmed that the antibacterial effect was significantly reduced in an environment with anionic surfactants (control group 23). In contrast, in Examples 1 to 10, which further contained caprylhydroxamic acid (CHA) in addition to Comparative Example 1, it was confirmed that it showed a significantly superior antibacterial effect, killing over 99% of both bacteria and fungi (yeast and mold) even in an environment with anionic surfactants (experimental groups 21 to 30). In particular, in Examples 9 and 10, which further included ethylenediaminetetraacetate disodium (EDTA 2Na), it was confirmed that they exhibited the most superior antibacterial effect, killing approximately 99.99% of both bacteria and fungi (yeast and mold) even in environments where anionic surfactants were present (experimental groups 29 to 30). Furthermore, in Comparative Examples 2 and 3, which contained caprylhydroxamic acid (CHA) but also contained either 4'-hydroxyacetophenone (4'-HAP) or caprylyl glycol, it was confirmed that the antibacterial effect was significantly reduced in environments where anionic surfactants were present (control groups 24 and 25).

[0093] Furthermore, as shown in Table 11, it was confirmed that only when caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol are included in specific concentrations, excellent antibacterial effects are observed against both bacteria and fungi (yeast and mold) even in environments where anionic surfactants are present. Specifically, only the preservative for topical skin preparations in the examples containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol were confirmed to exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in environments where anionic surfactants are present. In contrast, in comparative examples where the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, it was confirmed that the antibacterial effect is significantly reduced in an environment where anionic surfactants are present.

[0094] [Table 11]

[0095] Experimental Example 4. Confirmation of the antibacterial effect of preservatives for topical skin preparations in the presence of amphoteric surfactants. The antibacterial effect of the preservatives for topical skin preparations produced in Examples 1 to 10 was confirmed in the presence of an amphoteric surfactant. Cocamidopropyl betaine, the most commonly used amphoteric surfactant in the cosmetics field, was used as the amphoteric surfactant.

[0096] Specifically, as shown in Tables 12 and 13 below, each of the preservatives for topical skin preparations produced in Examples 1 to 10 was mixed with an amphoteric surfactant, and the antibacterial effect of the mixture against bacteria, yeast, and fungi was confirmed. The specific experimental method was the same as that performed in Experimental Example 1.

[0097] As control group 31, aqueous solutions containing only amphoteric surfactants at a concentration of approximately 30%, without any of the preservatives for topical skin preparations manufactured in Examples 1 to 10 and Comparative Examples 1 to 8, were used. As control group 32, aqueous solutions containing only the preservative for topical skin preparations manufactured in Comparative Example 1 at a concentration of approximately 1%, without any amphoteric surfactants, were used. Furthermore, mixtures obtained by mixing each of the preservatives for topical skin preparations manufactured in Comparative Examples 1 to 8 with amphoteric surfactants were used as control groups 33 to 40.

[0098] [Table 12]

[0099] [Table 13]

[0100] As a result, as shown in Table 14, when only amphoteric surfactants were present (control group 31), it was confirmed that the antibacterial effect against both bacteria and fungi (yeast and mold) was significantly low. In Comparative Example 1, which contained 4'-hydroxyacetophenone (4'-HAP) and caprylyl glycol, it showed some antibacterial effect in an environment without surfactants (control group 32), but it was confirmed that the antibacterial effect was significantly reduced in an environment with amphoteric surfactants (control group 33). Furthermore, in Examples 1 to 10, which further contained caprylhydroxamic acid (CHA) in addition to Comparative Example 1, it was confirmed that even in an environment with amphoteric surfactants (experimental groups 31 to 40), it showed a kill effect of over 99% against both bacteria and fungi (yeast and mold), demonstrating a remarkably excellent antibacterial effect. In particular, in Examples 9 and 10, which further included ethylenediaminetetraacetate disodium (EDTA 2Na), it was confirmed that they exhibited the most superior antibacterial effect, killing approximately 99.99% of both bacteria and fungi (yeast and mold) even in environments where amphoteric surfactants were present (experimental groups 39 to 40). Furthermore, in Comparative Examples 2 and 3, which included caprylhydroxamic acid (CHA) but also contained either 4'-hydroxyacetophenone (4'-HAP) or caprylyl glycol, it was confirmed that the antibacterial effect was significantly reduced in environments where amphoteric surfactants were present (control groups 34 and 35) (in particular, the antibacterial effect against fungi (yeast and mold) was significantly reduced).

[0101] Furthermore, as shown in Table 14, it was confirmed that only when caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol are included in specific concentrations, they exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in environments where amphoteric surfactants are present. Specifically, it was confirmed that only the preservatives for topical skin preparations in the examples containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol exhibit excellent antibacterial effects against both bacteria and fungi (yeast and mold) even in environments where amphoteric surfactants are present. Furthermore, in comparative examples where the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, it was confirmed that the antibacterial effect is significantly reduced in the presence of amphoteric surfactants (in particular, the antibacterial effect against fungi (yeast and mold) is significantly reduced).

[0102] [Table 14]

[0103] 2. Manufacturing and evaluation of cosmetic compositions containing preservatives for topical skin preparations. Examples 11-20: Manufacture of cosmetic compositions containing preservatives for topical skin preparations. In this embodiment, a shampoo-type cosmetic composition was produced that included the preservatives for topical skin preparations manufactured in Examples 1 to 10, with the addition of a surfactant and other cosmetic ingredients.

[0104] Specifically, each of the preservatives for topical skin preparations produced in Examples 1 to 10 was mixed with a surfactant and other cosmetic ingredients, and then stirred to obtain a shampoo-type cosmetic composition. The components and weight percentages of the preservatives for topical skin preparations, surfactants, and other cosmetic ingredients are shown in Table 15 below. Furthermore, as shown in Table 16 below, a shampoo-type cosmetic composition was prepared containing one of the preservatives for topical skin preparations produced in Comparative Examples 1 to 8, with the addition of a surfactant and other cosmetic ingredients, and this was used as a comparison group.

[0105] [Table 15]

[0106] [Table 16]

[0107] Experimental Example 5. Confirmation of the preservative activity of cosmetic compositions containing preservatives for topical skin preparations. To evaluate the preservative activity of the skin preservatives manufactured in Examples 1 to 10, a certain number of bacteria were inoculated into the shampoo-type cosmetic compositions of Examples 11 to 20, which contain the skin preservatives, and the number of surviving bacteria was confirmed. The cosmetic compositions of Comparative Examples 9 to 16 were used as a comparison group.

[0108] Specifically, the cosmetic compositions of Examples 11 to 20 and Comparative Examples 9 to 16, which were manufactured as described above, were inoculated with a mixed culture solution obtained by mixing bacterial culture solutions, namely Escherichia coli (ATCC 8739), Pseudomonas aeruginosa (ATCC 9027), and Staphylococcus aureus (ATCC 6538) in a ratio of 1:1:1. At this time, the initial concentration of bacteria in each sample was approximately 10 6The sample was adjusted to CFU / g. Then, each sample was cultured in a constant temperature bath at approximately 25°C for about 4 weeks, and approximately 1 g of each sample was taken at approximately 7-day intervals to measure the number of viable bacteria.

[0109] Furthermore, each of the cosmetic compositions of Examples 11 to 20 and Comparative Examples 9 to 16 produced above was inoculated with yeast culture solution, i.e., Candida albicans (ATCC 10231) culture solution, at which time the initial concentration of the bacteria in each sample was approximately 10 5 The sample was adjusted to CFU / g. Then, each sample was cultured in a constant temperature bath at approximately 25°C for about 4 weeks, and approximately 1 g of each sample was taken at intervals of about 7 days to measure the number of viable bacteria.

[0110] Furthermore, the cosmetic compositions of Examples 11 to 20 and Comparative Examples 9 to 16, each of which were manufactured as described above, were inoculated with a mold culture solution, specifically an Aspergillus brasiliensis (ATCC16404) culture solution, at which time the initial concentration of the fungus in each sample was approximately 10 5 The sample was adjusted to CFU / g. Then, each sample was cultured in a constant temperature bath at approximately 25°C for about 4 weeks, and approximately 1 g of each sample was taken at intervals of about 7 days to measure the number of viable bacteria.

[0111] As a result, as shown in Table 17, the preservatives for topical skin preparations in the examples, containing caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol, were confirmed to exhibit excellent preservative effects against both bacteria and fungi (yeast and mold) in cosmetic composition formulations containing various surfactants. In contrast, the preservatives for topical skin preparations in Comparative Examples 1 to 3, containing two selected from caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol, were confirmed to exhibit significantly reduced preservative effects against bacteria and fungi (yeast and mold) in cosmetic composition formulations containing various surfactants (in particular, significantly reduced preservative effects against mold).

[0112] Furthermore, as shown in Table 17, it was confirmed that cosmetic composition formulations containing various surfactants exhibited excellent preservative effects against both bacteria and fungi (yeast and mold) only when they contained caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol in specific concentrations. Specifically, it was confirmed that only the preservative for topical skin preparations in the example containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol exhibited excellent preservative effects against both bacteria and fungi (yeast and mold) in cosmetic composition formulations containing various surfactants. Furthermore, it was confirmed that in Comparative Examples 4 to 8, the preservatives for topical skin preparations in which the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, the preservative effect against bacteria and fungi (yeast and mold) is significantly reduced in cosmetic composition formulations containing various surfactants (in particular, the preservative effect against mold is significantly reduced).

[0113] [Table 17]

[0114] Through the aforementioned examples and experimental cases, it was confirmed that even preservatives for topical skin preparations containing 4'-hydroxyacetophenone (4'-HAP), caprylyl glycol, and dipropylene glycol exhibit antibacterial effects, but in environments where surfactants are present, the antibacterial and preservative effects are significantly reduced. The preservative for topical skin preparations in the examples overcomes this problem by further including caprylhydroxamic acid (CHA), and it was confirmed that it exhibits excellent antibacterial and preservative effects against both bacteria and fungi (yeast and mold) even in cosmetic compositions containing various surfactants. Furthermore, it was confirmed that the preservative for topical skin preparations in the examples, further including ethylenediaminetetraacetate disodium (EDTA 2Na), exhibits the most excellent antibacterial and preservative effects against both bacteria and fungi (yeast and mold) even in cosmetic compositions containing various surfactants. In particular, it was confirmed that preservatives for topical skin preparations containing caprylhydroxamic acid (CHA) do not unconditionally exhibit excellent antibacterial effects in cosmetic compositions containing surfactants. Only the preservatives for topical skin preparations in the examples containing all of the components caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol exhibit excellent antibacterial and preservative effects against both bacteria and fungi (yeast and mold), even in cosmetic compositions containing various surfactants.

[0115] Furthermore, through the aforementioned examples and experimental examples, it was confirmed that only the preservative for topical skin preparations in the example containing approximately 5 to 15% by weight of caprylhydroxamic acid (CHA), approximately 25 to 30% by weight of 4'-hydroxyacetophenone (4'-HAP), and approximately 13 to 15% by weight of caprylyl glycol showed excellent antibacterial and antiseptic effects against both bacteria and fungi (yeast and mold) in cosmetic compositions containing various surfactants. When the content of caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol falls outside the aforementioned numerical range, the antibacterial and antiseptic effects against bacteria and fungi (yeast and mold) in cosmetic compositions containing various surfactants are significantly reduced (in particular, the antibacterial and antiseptic effects against mold are significantly reduced).

[0116] Therefore, it was confirmed that a preservative for topical skin preparations containing specific components and their content according to one embodiment can be used as a preservative, antiseptic, or preservative adjunct in cosmetic compositions containing various surfactants (for example, cleansing cosmetic compositions) that exhibit excellent antibacterial and antiseptic effects.

[0117] While specific aspects of the present invention have been described in detail above, it will be obvious to those with ordinary skill in the art that such specific technologies are merely desirable embodiments and do not limit the scope of the present invention. Accordingly, the substantial scope of the present invention is defined by the claims and their equivalents.

Claims

1. It contains caprylhydroxamic acid (CHA), 4'-hydroxyacetophenone (4'-HAP), and caprylyl glycol. A preservative for topical skin preparations, wherein the weight ratio of caprylhydroxamic acid, 4'-hydroxyacetophenone, and caprylyl glycol is 5 to 15:25 to 30:13 to 15.

2. The preservative for topical skin preparations according to claim 1, further comprising one or more polyols selected from the group consisting of glycerin, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, pentylene glycol, hexylene glycol, ethoxydiglycol, and alkanediols having 3 to 12 carbon atoms.

3. The preservative for topical skin preparations according to claim 1, wherein the preservative for topical skin preparations contains 5 to 15% by weight of caprylhydroxamic acid based on the total weight.

4. The preservative for topical skin preparations according to claim 1, wherein the preservative for topical skin preparations contains 25 to 30% by weight of 4'-hydroxyacetophenone based on the total weight.

5. The preservative for topical skin preparations according to claim 1, wherein the preservative for topical skin preparations contains 13 to 15% by weight of caprylyl glycol based on the total weight.

6. The preservative for topical skin preparations according to claim 1, further comprising disodium ethylenediaminetetraacetate (EDTA 2Na).

7. The preservative for topical skin preparations according to claim 1, which is used in topical skin preparations containing a surfactant.

8. The preservative for a topical skin preparation according to claim 7, wherein the topical skin preparation is a cleansing cosmetic composition.

9. A cosmetic composition comprising a preservative for topical skin preparations according to any one of claims 1 to 8.

10. The cosmetic composition according to claim 9, further comprising a surfactant.

11. The cosmetic composition according to claim 10, wherein the cosmetic composition is a cleansing cosmetic composition.

12. The cosmetic composition according to claim 9, wherein the cosmetic composition contains the preservative for topical skin preparations in an amount of 0.0001% to 50% by weight based on the total weight.

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