Substrate cleaning system

Abstract

In one embodiment, the substrate cleaning system comprises: a base; a plurality of support structures arranged parallel to each other on the base; a plurality of support frames each rotatably connected to each of the plurality of support structures about a first axis and including a frame body and a guide rail formed in the height direction on the frame body; a plurality of upper brackets connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; a plurality of lower brackets arranged below the plurality of upper brackets and connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; an upper brush for cleaning the upper surface of a substrate, rotatably connected to the plurality of upper brackets about a first rotation axis parallel to the first axis; a lower brush for cleaning the lower surface of a substrate, rotatably connected to the plurality of lower brackets about a second rotation axis parallel to the first axis; a rotary actuator connected to the upper brush and the lower brush; an upper load cell connected to the upper bracket; an upper stopper connected to the frame body of the support frame so as to be located below the upper load cell; a lower load cell arranged on the base; and the support It may include a hinge portion connected to the frame body of the frame and pressing the lower load cell when the support frame rotates in a first rotational direction. Various other embodiments may be possible.

Description

Technology Field

[0001] The disclosure relates to a substrate cleaning system. Background Technology

[0002] Generally, semiconductors are manufactured by repeatedly performing a series of processes such as lithography, deposition, and etching. Due to these repetitive processes, contaminants such as various particles, metal impurities, or organic materials remain on the surface of the substrate constituting these semiconductors. Since contaminants remaining on the substrate degrade the reliability of the manufactured semiconductor, a process of cleaning or buffing the substrate is required during the semiconductor manufacturing process to improve this. The substrate cleaning process can be performed by a brush, and research and development are continuously being conducted to control the pressure applied by the brush to the substrate during the cleaning process and to prevent or reduce the tilting phenomenon in which the brush tilts left or right.

[0003] However, the foregoing shall not be interpreted as the applicant acknowledging it as prior art regarding the content described in this document, but shall be interpreted only as related art to the invention described in this document. The problem to be solved

[0004] The objective according to one embodiment is to provide a substrate cleaning system comprising an upper load cell and an upper stopper for controlling the pressure of a brush.

[0005] The objective according to one embodiment is to provide a substrate cleaning system comprising a hinge portion, a lower load cell, and a lower stopper for preventing or reducing the tilting phenomenon of a brush.

[0006] The problems to be solved by the substrate cleaning system according to one embodiment are not limited to those mentioned above, and other problems not mentioned will be clearly understood by a person skilled in the art from the description below. means of solving the problem

[0007] In one embodiment, the substrate cleaning system comprises: a base; a plurality of support structures arranged parallel to each other on the base; a plurality of support frames each rotatably connected to each of the plurality of support structures about a first axis and including a frame body and a guide rail formed in the height direction on the frame body; a plurality of upper brackets connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; a plurality of lower brackets arranged below the plurality of upper brackets and connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; an upper brush for cleaning the upper surface of a substrate, rotatably connected to the plurality of upper brackets about a first rotation axis parallel to the first axis; a lower brush for cleaning the lower surface of a substrate, rotatably connected to the plurality of lower brackets about a second rotation axis parallel to the first axis; a rotary actuator connected to the upper brush and the lower brush; an upper load cell connected to the upper bracket; an upper stopper connected to the frame body of the support frame so as to be located below the upper load cell; a lower load cell arranged on the base; and the support It may include a hinge portion connected to the frame body of the frame and pressing the lower load cell when the support frame rotates in a first rotational direction.

[0008] In one embodiment, the upper load cell can detect the pressure applied by the upper stopper when the upper bracket moves downward along the height direction on the guide rail.

[0009] In one embodiment, the substrate cleaning system further includes a control unit, and the control unit, based on the pressure information of the detected upper load cell, can move the upper bracket and the lower bracket so as to move away from each other when the pressure is greater than a set range, and move the upper bracket and the lower bracket so as to move closer to each other when the pressure is less than a set range.

[0010] In one embodiment, the substrate cleaning system may further include a lower stopper disposed on the base so as to come into contact with the hinge portion when the support frame rotates in a second rotation direction opposite to the first rotation direction.

[0011] In one embodiment, the hinge portion may include a hinge body connected to the frame body, a first flange extending from the hinge body and pressing the lower load cell, and a second flange extending from the hinge body and pressing the lower stopper.

[0012] In one embodiment, the lower load cell can detect the pressure applied by the first flange of the hinge portion when the support frame rotates in the first rotational direction.

[0013] In one embodiment, the substrate cleaning system further includes a torque detection unit for detecting the rotational torque of the rotary actuator and a control unit, wherein the control unit detects the frictional force between the substrate and the lower brush based on pressure information detected by the lower load cell and rotational torque information detected by the torque detection unit, and controls the operation of the rotary actuator based on the detected frictional force information.

[0014] In one embodiment, the upper bracket may include a first upper bracket portion connected to the upper brush, a second upper bracket portion extending from the first upper bracket portion and connected to the support frame, and a third upper bracket portion extending from the second upper bracket portion and connected to the upper load cell.

[0015] In one embodiment, the lower bracket may include a first lower bracket portion connected to the lower brush, and a second lower bracket portion extending from the first lower bracket portion and connected to the support frame. Effects of the invention

[0016] A substrate cleaning system according to one embodiment can detect the pressure applied by a brush to a substrate through an upper load cell and an upper stopper, and can feedback-adjust the pressure applied by the brush based on the detected pressure information of the brush.

[0017] A substrate cleaning system according to one embodiment can prevent or reduce the tilting phenomenon in which the left and right inclination of the brush changes through a hinge part, a lower load cell, and a lower stopper.

[0018] A substrate cleaning system according to one embodiment can detect frictional force between a substrate and a brush by comparing the pressure of a hinge part detected by a lower load cell with the rotational torque of a rotary actuator that rotates a brush, analyze frictional characteristics between the brush and the surface of the substrate, and increase the efficiency of the substrate cleaning process based on the analyzed frictional characteristics.

[0019] The effects of the substrate cleaning system according to one embodiment are not limited to those mentioned above, and other unmentioned effects will be clearly understood by a person skilled in the art from the description below. Brief explanation of the drawing

[0020] The following drawings attached to this specification illustrate a preferred embodiment of the present invention and serve to further enhance understanding of the technical concept of the present invention together with the detailed description of the invention; therefore, the present invention should not be interpreted as being limited only to the matters described in such drawings. FIG. 1 is a perspective view of a substrate cleaning system according to one embodiment. FIG. 2 is a drawing showing one side of a substrate cleaning system to show in detail the upper load cell, upper stopper, lower load cell, lower stopper, and hinge part of a substrate cleaning system according to one embodiment. FIG. 3 is a front view of a substrate cleaning system according to one embodiment. FIG. 4 is a right side view of a substrate cleaning system according to one embodiment. FIG. 5 is a left side view of a substrate cleaning system according to one embodiment. Specific details for implementing the invention

[0021] Hereinafter, embodiments are described in detail with reference to the attached drawings. However, various modifications may be made to the embodiments, and thus the scope of the patent application is not limited or restricted by these embodiments. It should be understood that all modifications, equivalents, and substitutions to the embodiments are included within the scope of the rights.

[0022] The terms used in the embodiments are for illustrative purposes only and should not be interpreted as intended to be limiting. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0023] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by those skilled in the art to which the embodiments pertain. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in this application.

[0024] In addition, when describing with reference to the attached drawings, identical components are assigned the same reference numeral regardless of the drawing symbols, and redundant descriptions thereof are omitted. When describing embodiments, if it is determined that a detailed description of related prior art could unnecessarily obscure the essence of the embodiment, such detailed description is omitted. The singular form of a noun corresponding to an item may include one or more of the said item unless the relevant context clearly indicates otherwise. In this document, each of phrases such as "A or B," "at least one of A and B," "at least one of A or B," "A, B or C," "at least one of A, B and C," and "at least one of A, B, or C" may include any one of the items listed together in the corresponding phrase, or all possible combinations thereof.

[0025] In addition, terms such as first, second, A, B, (a), (b), etc., may be used when describing the components of the embodiments. These terms are intended merely to distinguish the components from other components, and the nature, order, or sequence of the components is not limited by these terms. Where it is stated that a component is "connected," "combined," or "connected" to another component, it should be understood that while the component may be directly connected or connected to the other component, another component may also be "connected," "combined," or "connected" between each component.

[0026] In this document, terms such as “substantially,” “approximately,” “generally,” and “about” used to refer to a given parameter, attribute, or condition may include the extent to which a person skilled in the art can understand that the given parameter, attribute, or condition is satisfied with a small degree of variance, such as within acceptable manufacturing tolerances. For example, any specific parameter that is substantially satisfied may be satisfied by at least 90%, at least 95%, or at least 99%.

[0027] Components included in any one embodiment and components having common functions shall be described using the same names in other embodiments. Unless otherwise stated, the description in any one embodiment may also apply to other embodiments, and specific descriptions shall be omitted to the extent of overlap.

[0029] FIG. 1 is a perspective view of a substrate cleaning system according to one embodiment. FIG. 2 is a drawing showing one side of a substrate cleaning system to show in detail the upper load cell, upper stopper, lower load cell, lower stopper, and hinge portion of the substrate cleaning system according to one embodiment. FIG. 3 is a front view of a substrate cleaning system according to one embodiment. FIG. 4 is a right side view of a substrate cleaning system according to one embodiment. FIG. 5 is a left side view of a substrate cleaning system according to one embodiment. In the following description of the substrate cleaning system, unless otherwise stated, the right side refers to the -X-axis direction with respect to the direction shown in the drawings, and the left side refers to the +X-axis direction. Additionally, the upper or upper side may be understood to refer to the +Z-axis direction, and the lower or lower side to refer to the -Z-axis direction.

[0030] Referring to FIGS. 1 to 5, a substrate cleaning system (1) according to one embodiment can clean a substrate (W). For example, the substrate cleaning system (1) can clean a cleaned, buffed, or polished substrate (W), particularly the surface of the substrate (W). The substrate cleaning system (1) can support the substrate (W). The substrate cleaning system (1) can clean the supported substrate (W) through a plurality of brushes. In one embodiment, the substrate cleaning system (1) may include a base (B), a plurality of support structures (10), a plurality of support frames (11), a plurality of upper brackets (12), a plurality of lower brackets (13), an upper brush (14), a lower brush (15), a rotary actuator (16), an upper load cell (LC1), an upper stopper (S1), a lower load cell (LC2), a lower stopper (S2), a hinge part (17), a control part, a torque detection part and / or a displacement sensor (18).

[0031] In one embodiment, the base (B) may form the lower part of the substrate cleaning system (1). The base (B) may be a member in contact with the ground or the ground itself. That is, the shape of the base (B) is not fixed to any single object and may be formed in any shape in which other components of the substrate cleaning system (1) described later are placed or supported. The base (B) may be placed on the ground to support other components of the substrate cleaning system (1) (e.g., a plurality of support structures (10)).

[0032] In one embodiment, a plurality of support structures (10) may be disposed on a base (B). The support structures (10) may be provided as a plurality of support structures (e.g., a plurality of support structures (101, 102) of FIG. 1) disposed on the base (B). The support structures (10) may be disposed facing each other in directions parallel to each other (e.g., directions parallel to the X-axis direction) on the base (B). Each support structure (10) may include a hinge bearing (100) that is rotatably provided around a first axis (X1). A support frame (11), described later, may be rotatably connected to the hinge bearing (100). Although the number of support structures (10) is illustrated as two, the number of support structures (10) is not limited thereto. The following description will be based on the premise that the number of support structures (10) is two.

[0033] In one embodiment, a support frame (11) may be rotatably connected to a support structure (10) disposed on a base (B). A plurality of support frames (11) may be provided (e.g., support frames (111, 112) of FIG. 3). Each of the plurality of support frames (11) may be rotatably connected to each of the support structures (10). Each of the plurality of support frames (11) may rotate about a first axis (X1). Each of the support frames (11) may support other components of the substrate cleaning system (1) described later (e.g., upper bracket (12) and / or lower bracket (13)). In one embodiment, the support frame (11) may include a frame body (11a) and a guide rail (11b). The frame body (11a) may be a part corresponding to the body of the support frame (11). The guide rail (11b) may be formed on the frame body (11a). The guide rail (11b) can form a movement path in which the upper bracket (12) and / or lower bracket (13), described later, can move up and down along the height direction (e.g., Z-axis direction). In one embodiment, the number of support frames (11) is shown as two, but is not limited thereto, and the number of support frames (11) may be equal to the number of support structures (10) when the number of support structures (10) is provided in excess of two.

[0034] In one embodiment, the upper bracket (12) may be connected to the support frame (11). The number of upper brackets (12) may be provided in multiple numbers. For example, each of the multiple upper brackets (12) (121, 122) may be connected to each of the multiple support frames (11) (111, 112). That is, one upper bracket (12) may be connected to one support frame (11). The upper bracket (12) may be located above the lower bracket (13) when compared to the lower bracket (13) described later. The upper bracket (12) may be connected to the support frame (11) so that it can move along the height direction of the support frame (11) along the guide rail (11b) formed on the support frame (11). The upper bracket (12) may include a first upper bracket portion (12a), a second upper bracket portion (12b), and a third upper bracket portion (12c). An upper brush (14), described later, may be connected to the first upper bracket portion (12a). A support frame (11) may be connected to the second upper bracket portion (12b). An upper load cell (LC1), described later, may be connected to the third upper bracket portion (12c). The second upper bracket portion (12b) may extend from one end of the first upper bracket portion (12a), and the third upper bracket portion (12c) may extend from one end of the second upper bracket portion (12b). For example, the second upper bracket portion (12b) may be positioned extending from the first upper bracket portion (12a) in a first direction (e.g., -X-axis direction). The third upper bracket portion (12c) may be positioned extending from the second upper bracket portion (12b) in a second direction (e.g., +Z-axis direction) different from the first direction. The extension directions of the first upper bracket portion (12a), the second upper bracket portion (12b), and the third upper bracket portion (12c) are formed in a first direction and a second direction different from each other, thereby increasing space utilization.In addition, by extending in different directions, interference between the first upper bracket part (12a), the second upper bracket part (12b), and the third upper bracket part (12c) can be prevented or reduced as they move along the height direction of the support frame (11).

[0035] In one embodiment, the lower bracket (13) may be connected to the support frame (11). The lower bracket (13) may be provided in multiple numbers. For example, referring to FIG. 3, each of the multiple lower brackets (13) (131, 132) may be connected to each of the multiple support frames (11) (111, 112). That is, one lower bracket (13) may be connected to one support frame (11). The lower bracket (13) may be located below the upper bracket (12) on the support frame (11). The lower bracket (13) may be connected to the support frame (11) so as to be movable in the height direction along the guide rail (11b) of the support frame (11). The lower bracket (13) may include a first lower bracket portion (13a) and a second lower bracket portion (13b). A lower brush (15), described later, may be connected to the first lower bracket portion (13a). A support frame (11) may be connected to the second lower bracket portion (13b). The second lower bracket portion (13b) may extend from one end of the first lower bracket portion (13a). For example, the second lower bracket portion (13b) may be positioned extending from the first lower bracket portion (13a) in a first direction (e.g., -X-axis direction). In one embodiment, an upper bracket (12) and a lower bracket (13) connected to a single support frame (11) may be positioned parallel to each other along the height direction. For example, the first upper bracket portion (12a) of the upper bracket (12) and the first lower bracket portion (13a) of the lower bracket (13) may be positioned side by side along the height direction (e.g., Z-axis direction), and the second upper bracket portion (12b) and the second lower bracket portion (13b) may be positioned side by side along the height direction.

[0036] In one embodiment, the upper brush (14) is positioned to contact the surface of the substrate (W), particularly the upper surface of the substrate (W) (e.g., the surface of the substrate (W) facing the +Z axis direction), so as to clean the surface of the substrate (W). The upper brush (14) may be connected to the upper bracket (12) so as to be rotatable about a first rotation axis (Y1). The upper brush (14) connected to the upper bracket (12) may be configured to be movable along the height direction together with the upper bracket (12) as the upper bracket (12) moves along the guide rail (11b) in the height direction. The first rotation axis (Y1) of the upper brush (14) may be parallel to the first axis (X1) of the support frame (11).

[0037] In one embodiment, the lower brush (15) is positioned to contact the lower surface of the substrate (W) (e.g., the surface of the substrate (W) facing the -Z axis direction) so as to clean the surface of the substrate (W). The lower brush (15) may be connected to the lower bracket (13) so as to be rotatable around a second rotation axis (Y2). The lower brush (15) connected to the lower bracket (13) may be configured to move along the height direction together with the lower bracket (13) as the lower bracket (13) moves along the guide rail (11b) in the height direction. The lower brush (15) may be positioned parallel to the upper brush (14) with the substrate (W) in between. When the upper brush (14) and the lower brush (15) are positioned parallel to each other, they press on the same area of ​​the surface of the substrate (W) when viewed in the height direction, and by canceling out each other's pressing forces, the tilting of the surface of the substrate (W) can be prevented or reduced.

[0038] In one embodiment, the rotary actuator (16) is connected to the upper brush (14) and the lower brush (15) to provide rotational power to each of the upper brush (14) and the lower brush (15). For example, the rotary actuator (16) can generate rotational power and transmit rotational power to the upper brush (14) and the lower brush (15). The upper brush (14) and the lower brush (15), powered by the rotary actuator (16), rotate in the same direction and can clean the surface of the substrate (W). Although the rotary actuator (16) is depicted in the drawing as being composed of a first rotary actuator (161) connected to the upper brush (14) and a second rotary actuator (162) connected to the lower brush (15), the rotary actuator (16) may be a single component. For example, the first rotary actuator (161) and the second rotary actuator (162) may be formed integrally with each other, and a single rotary actuator (16) may be connected to both the upper brush (14) and the lower brush (15). The amount of rotational torque generated by the first rotary actuator (161) and the amount of rotational torque generated by the second rotary actuator (162) will generally be the same, but the amount of rotational torque may differ as needed through feedback control by the control unit described later.

[0039] Below, we will explain the mechanism by which the pressure of the brush acting on the substrate (W) is detected by the upper load cell (LC1) and the upper stopper (S1).

[0040] In one embodiment, the upper load cell (LC1) may be connected to the upper bracket (12). The number of upper load cells (LC1) may be provided in multiple numbers. For example, each of the multiple upper load cells (LC1) (LC11, LC12) may be connected to each of the multiple upper brackets (12) (121, 122). The upper load cell (LC1) may be connected to the third upper bracket portion (12c) of the upper bracket (12). In the process of the upper brush (14) and the lower brush (15) each approaching the surface of the substrate (W) to clean the surface of the substrate (W), the upper brush (14) and the lower brush (15) may apply weak pressure to the surface of the substrate (W). In this process, the upper bracket (12) and the upper brush (14) may move together, and the lower bracket (13) and the lower brush (15) may move together. That is, the upper bracket (12) can move downward (e.g., -Z-axis direction) along the height direction (e.g., Z-axis direction in FIG. 1) of the support frame (11) during the cleaning process of the substrate (W). When the upper bracket (12) moves downward, the upper load cell (LC1) connected to the upper bracket (12) can also move downward together with the upper bracket (12).

[0041] In one embodiment, the upper stopper (S1) may be connected to the frame body (11a) of the support frame (11) so as to be located at the bottom of the upper load cell (LC1). The number of upper stoppers (S1) may be provided in multiple numbers. For example, each of the multiple upper stoppers (S1) (S11, S12) may be connected to the frame body (11a) of each of the multiple support frames (11) (111, 112). The upper stopper (S1) may restrict the downward movement of the upper load cell (LC1) moving in the downward direction together with the upper bracket (12). The upper stopper (S1) may be configured to come into contact with the upper load cell (LC1) moving in the downward direction. In one embodiment, when the upper load cell (LC1) comes into contact with the upper stopper (S1), it may detect the pressure applied by the upper stopper (S1). The pressure information detected by the upper load cell (LC1) can be transmitted to the control unit described later.

[0042] In one embodiment, a control unit (not shown) can feedback adjust the distance in the height direction (e.g., distance in the Z-axis direction) between the upper bracket (12) and the lower bracket (13) based on the pressure information of the detected upper load cell (LC1). For example, if the pressure of the detected upper load cell (LC1) is greater than the set range, the control unit can move the upper bracket (12) and the lower bracket (13) apart from each other, that is, move the upper bracket (12) in the upward direction (e.g., +Z-axis direction) and move the lower bracket (13) in the downward direction (e.g., -Z-axis direction). A pressure of the upper load cell (LC1) being greater than the set range may mean that the upper brush (14) is pressing the substrate (W) with an excessive force compared to the pressure of the set range. At this time, the control unit can prevent or reduce excessive pressure applied to the substrate (W) by the brush by widening the distance between the upper bracket (12) and the lower bracket (13). When the pressure applied by the detected upper load cell (LC1) is less than the set range, the control unit can move the upper bracket (12) and the lower bracket (13) closer to each other, that is, move the upper bracket (12) downward and the lower bracket (13) upward. A pressure applied by the upper load cell (LC1) being less than the set range may mean that the upper brush (14) is applying pressure to the substrate (W) weakly compared to the pressure applied in the set range, and thus the surface cleaning of the substrate (W) is not sufficiently performed. At this time, the control unit can ensure that the substrate (W) is sufficiently pressured by the brush by narrowing the distance between the upper bracket (12) and the lower bracket (13), thereby ensuring that the surface cleaning of the substrate (W) is sufficiently performed. As described above, the control unit can increase the efficiency of the substrate cleaning process by feedback adjusting the distance between the upper bracket (12) and the lower bracket (13) based on the pressure information of the detected upper load cell (LC1).

[0043] Below, a mechanism for detecting the frictional force between the substrate (W) and the brush generated by the rotation of the brush by means of the hinge part (17), the lower load cell (LC2), and the lower stopper (S2) will be described.

[0044] In one embodiment, the hinge portion (17) may be connected to the frame body (11a) of the support frame (11). The hinge portion (17) may be provided in multiple numbers. For example, each of the multiple hinge portions (17) (171, 172) may be connected to the frame body (11a) of each of the multiple support frames (11) (111, 112). As the support frame (11) is rotatably connected to the support structure (10), when the support frame (11) rotates in a first rotational direction (R1) around a first axis (X1) with respect to the support structure (10), the hinge portion (17) may also rotate in the first rotational direction (R1) together with the support frame (11). When the support frame (11) rotates in a second rotation direction (R2) opposite to the first rotation direction (R1) around the first axis (X1), the hinge portion (17) can also rotate in the second rotation direction (R2) together with the support frame (11). In one embodiment, the hinge portion (17) may include a hinge body (17a) and a first flange (17b) and a second flange (17c) extending in both directions from the hinge body (17a). The hinge body (17a) may refer to the body of the hinge portion (17) connected to the frame body (11a) of the support frame (11).

[0045] In one embodiment, the lower load cell (LC2) may be placed on the base (B) so as to be adjacent to the hinge portion (17). The number of lower load cells (LC2) may be provided in multiple numbers. Each of the multiple lower load cells (LC2) (LC21, LC22) may be placed on the base (B) so as to face each other. The lower load cell (LC2) may be pressed by the first flange (17b) of the hinge portion (17). For example, when the hinge portion (17) rotates in the first rotation direction (R1) according to the rotation of the support frame (11), the first flange (17b) of the hinge portion (17) may press the lower load cell (LC2). At this time, the lower load cell (LC2) may detect the pressing force applied by the first flange (17b). The lower load cell (LC2) can transmit or send the detected pressure information of the first flange (17b) to the control unit described later.

[0046] In one embodiment, a torque detection unit (not shown) can detect the rotational torque of a rotary actuator (16). The torque detection unit can transmit or send information regarding the detected rotational torque of the rotary actuator (16) to a control unit described later.

[0047] In one embodiment, a control unit (not shown) can detect the frictional force between the substrate (W) and the lower brush (15) based on pressure information detected by the lower load cell (LC2) and rotational torque information detected by the torque detection unit. For example, the torque value of the rotational actuator (16) When saying that, the frictional force between the substrate (W) and the lower brush (15) Is It can be proportional to. In one embodiment, the pressure of the first flange (17b) detected by the lower load cell (LC2) When saying, This may be caused by the reaction of the frictional force between the lower brush (15) and the substrate (W). That is, class They can be proportional to each other. Therefore, the control unit [is] the torque value of the rotary actuator (16). and the pressure of the first flange (17b) detected by the lower load cell (LC2) Receive or transmit information regarding, and through It can detect the magnitude or pattern of change of. In addition, the control unit [describes] the torque value of the rotary motor Friction force calculated using Wow, the pressure of the first flange (17b) detected by the lower load cell (LC2) By comparing the values, the friction characteristics between the lower brush (15) and the substrate (W) can be analyzed. For example, the control unit detects the magnitude of the friction force between the lower brush (15) and the substrate (W), and if the magnitude of the friction force is greater than the set range, it can reduce the power of the rotary actuator (16) to reduce the friction force between the brush and the substrate (W), and if the magnitude of the friction force is smaller than the set range, it can increase the power of the rotary actuator (16) to increase the friction force between the brush and the substrate (W). In addition, the control unit can analyze the change in the magnitude of the friction force between the lower brush (15) and the substrate (W) to analyze information regarding foreign substances on the surface of the substrate (W) or surface roughness.

[0048] In one embodiment, the lower stopper (S2) may be positioned on the base (B) so as to be adjacent to the hinge portion (17). The lower stopper (S2) may be provided in multiple numbers. For example, each of the multiple lower stoppers (S2) (S21, S22) may be positioned on the base (B) so as to face each other. The lower stopper (S2) may be pressed by the second flange (17c) of the hinge portion (17). For example, when the hinge portion (17) rotates in the second rotation direction (R2) according to the rotation of the support frame (11), the second flange (17c) of the hinge portion (17) may press the lower stopper (S2). At this time, the lower stopper (S2) may restrict the rotational movement of the second flange (17c) that intends to rotate in the second rotation direction (R2). For example, the lower stopper (S2) may be located at substantially the same height as the bottom surface of the second flange (17c) of the hinge portion (17) based on the length in the height direction (e.g., +Z-axis direction) relative to the ground. That is, the lower stopper (S2) can restrict the rotation of the second flange (17c) of the hinge portion (17) in the second rotation direction (R2), thereby restricting the rotation of the support frame (11) to which the hinge portion (17) is connected in the second rotation direction (R2). The lower stopper (S2) can prevent or reduce the release of the substrate cleaning state by the support frame (11) rotating in the second rotation direction (R2). The lower stopper (S2) can ensure uniformity of substrate cleaning efficiency by maintaining the substrate cleaning state.

[0050] Although the embodiments described above have been explained with reference to limited drawings, those skilled in the art can apply various technical modifications and variations based on the above. For example, appropriate results can be achieved even if the described techniques are performed in a different order than described, and / or the components of the described system, structure, device, circuit, etc. are combined or assembled in a form different from described, or replaced or substituted by other components or equivalents.

[0051] Therefore, other implementations, other embodiments, and equivalents to the claims also fall within the scope of the claims set forth below.

Claims

Claim 1 A substrate cleaning system comprises: a base; a plurality of support structures arranged parallel to each other on the base; a plurality of support frames each rotatably connected to each of the plurality of support structures around a first axis and including a frame body and a guide rail formed in the height direction on the frame body; a plurality of upper brackets connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; a plurality of lower brackets disposed below the plurality of upper brackets and connected to each of the plurality of support frames so as to be movable in the height direction along the guide rail; an upper brush for cleaning the upper surface of a substrate, rotatably connected to the plurality of upper brackets around a first rotation axis parallel to the first axis; a lower brush for cleaning the lower surface of a substrate, rotatably connected to the plurality of lower brackets around a second rotation axis parallel to the first axis; a rotary actuator connected to the upper brush and the lower brush; an upper load cell connected to the upper bracket; an upper stopper connected to the frame body of the support frame so as to be located below the upper load cell; and a lower load cell disposed on the base. A substrate cleaning system comprising a hinge portion connected to the frame body of the support frame and pressing the lower load cell when the support frame rotates in a first rotational direction. Claim 2 A substrate cleaning system according to claim 1, wherein the upper load cell contacts the upper stopper when the upper bracket moves downward along the height direction on the guide rail, and detects the pressure applied by the upper stopper. Claim 3 In paragraph 2, the substrate cleaning system further comprises a control unit, wherein the control unit, based on the pressure information of the detected upper load cell, moves the upper bracket and the lower bracket so as to move away from each other when the pressure is greater than a set range, and moves the upper bracket and the lower bracket so as to move closer to each other when the pressure is less than a set range. Claim 4 A substrate cleaning system according to claim 1, further comprising a lower stopper disposed on the base such that it contacts the hinge portion when the support frame rotates in a second rotational direction opposite to the first rotational direction. Claim 5 In claim 4, the hinge portion comprises: a hinge body connected to the frame body; a first flange extending from the hinge body and pressing the lower load cell; and a second flange extending from the hinge body and pressing the lower stopper, forming a substrate cleaning system. Claim 6 In claim 5, the lower load cell detects the pressure applied by the first flange of the hinge portion when the support frame rotates in the first rotational direction, in a substrate cleaning system. Claim 7 In claim 6, the substrate cleaning system further comprises a torque detection unit for detecting the rotational torque of the rotary actuator; and a control unit, wherein the control unit detects the frictional force between the substrate and the lower brush based on pressure information detected by the lower load cell and rotational torque information detected by the torque detection unit, and controls the operation of the rotary actuator based on the detected frictional force information. Claim 8 A substrate cleaning system according to claim 1, wherein the upper bracket comprises: a first upper bracket portion connected to the upper brush; a second upper bracket portion extending from the first upper bracket portion and connected to the support frame; and a third upper bracket portion extending from the second upper bracket portion and connected to the upper load cell. Claim 9 A substrate cleaning system according to claim 1, wherein the lower bracket comprises: a first lower bracket portion connected to the lower brush; and a second lower bracket portion extending from the first lower bracket portion and connected to the support frame.

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