Exhaust system

Abstract

Efficiently treating hydrogen gas emitted from an EUV lithography device. The exhaust system is an exhaust system for exhausting hydrogen discharged from an EUV lithography device, and comprises a hydrogen pump module for a light source unit having a vacuum pump unit for sucking hydrogen discharged from a light source unit of the EUV lithography device, a first oxygen sensor module for measuring the oxygen concentration of gas discharged from the hydrogen pump module for the light source unit, a hydrogen pump module for an exposure unit having a vacuum pump unit for sucking hydrogen discharged from an exposure unit of the EUV lithography device, a second oxygen sensor module for measuring the oxygen concentration of gas discharged from the hydrogen pump module for the exposure unit, a hydrogen treatment module for treating hydrogen gas discharged from the first and second oxygen sensor modules, a utility module for supplying cooling water and / or nitrogen gas to each module, and a control module for supplying power to each module and controlling each module.

Description

Technology Field

[0001] The present invention relates to an exhaust system for exhausting hydrogen or nitrogen emitted from an EUV exposure device. Background Technology

[0002] In recent years, EUV (Extreme Ultra Violet) lithography devices, which perform photolithography of substrates such as wafers using extremely short wavelengths, have been commercialized. EUV lithography devices are ultra-precision instruments, and their performance deteriorates rapidly, particularly due to the entry of foreign substances into the optical system. An EUV lithography device consists of a light source unit that generates EUV and an exposure unit that performs photolithography of the substrate using the EUV generated by the light source unit. Tin (Sn) oxides generated by laser irradiation of a target in the light source unit, and organic materials detached from the photosensitive material (resist) in the exposure unit, are known as representative sources of contamination, respectively.

[0003] As a pollution control measure for these substances, there is a method using hydrogen gas. In the light source section, hundreds of liters of hydrogen gas are used to remove tin oxides as gaseous hydrides, and in the exposure section, tens of liters of hydrogen gas are used in the same way to gasify and remove organic materials. Although most of the used hydrogen gas is unreacted, it is discharged from the device as a carrier of the removed contaminants. Consequently, exhaust gas containing a large volume of hydrogen gas—hundreds of liters per minute—is emitted from the EUV exposure device.

[0004] An exhaust system is known as a device for treating hydrogen gas emitted from an EUV lithography device, wherein the hydrogen gas emitted from the EUV lithography device is exhausted by a dry vacuum pump, and the exhausted hydrogen is safely treated by a hydrogen treatment device (see Patent Document 1). Prior art literature

[0005] Japanese Patent Publication No. 2022-42602

[0006] [1] The exhaust system regarding one mode is,

[0007] It is an exhaust system for exhausting hydrogen or nitrogen emitted from an EUV lithography device, and

[0008] A hydrogen pump module for a light source unit having a vacuum pump unit for sucking hydrogen discharged from the light source unit of the above-mentioned EUV exposure device, and

[0009] A first oxygen sensor module for measuring the oxygen concentration of gas discharged from the hydrogen pump module for the light source unit, and

[0010] A hydrogen pump module for an exposure unit having a vacuum pump unit for sucking hydrogen discharged from the exposure unit of the above-mentioned EUV exposure device, and

[0011] A second oxygen sensor module for measuring the oxygen concentration of the gas discharged from the hydrogen pump module for the exposure unit, and

[0012] A hydrogen treatment module for treating hydrogen gas emitted from the first and second oxygen sensor modules, and

[0013] A utility module for supplying cooling water and / or nitrogen gas to each module, and

[0014] A control module for supplying power to each of the above modules and controlling each of the above modules.

[0015] Equipped with

[0016] [2] An exhaust system for one embodiment, in the above [1],

[0017] The above hydrogen treatment module includes a hydrogen dilution device for diluting the hydrogen gas, and

[0018] The air exhausted from the housing from each of the above modules is supplied to the hydrogen dilution device as dilution air.

[0019] [3] An exhaust system for one embodiment, in the above [1] or [2],

[0020] The above hydrogen treatment module includes a combustion type exhaust gas treatment device that processes the hydrogen gas by combustion.

[0021] [4] An exhaust system relating to one embodiment, in any one of [1] to [3] above,

[0022] The above hydrogen gas is recovered, and the hydrogen recovery module for reusing the hydrogen gas in the EUV lithography device is further provided.

[0023] The above hydrogen recovery module includes a hydrogen purification device for purifying the recovered hydrogen gas.

[0024] [5] An exhaust system relating to one embodiment, in any one of [1] to [4] above,

[0025] A fuel cell module for generating power using the above hydrogen gas is further provided.

[0026] [6] An exhaust system relating to one embodiment, in any one of [1] to [5] above,

[0027] The above vacuum pump unit has a main pump, a first booster pump, and a second booster pump, and a caster is provided at the bottom.

[0028] [7] An exhaust system relating to one embodiment, in any one of [1] to [6] above,

[0029] A non-hydrogen pump module is further provided for exhausting gases other than hydrogen gas emitted from a device other than the above-mentioned EUV exposure device. Brief explanation of the drawing

[0030] FIG. 1 is a drawing illustrating an example of a schematic configuration of an exhaust system according to a first embodiment. FIG. 2 is a drawing illustrating an example of a schematic configuration of a pump module according to the present embodiment. FIG. 3 is a drawing illustrating the installation method of a pump unit according to the present embodiment. FIG. 4 is a drawing illustrating an example of a schematic configuration of an exhaust system according to a second embodiment. FIG. 5 is a drawing illustrating an example of a schematic configuration of an exhaust system according to a third embodiment. Specific details for implementing the invention

[0031] Hereinafter, each embodiment will be described with reference to the drawings. However, descriptions that are more detailed than necessary may be omitted. For example, detailed descriptions of well-known matters or redundant descriptions of substantially identical configurations may be omitted. This is to avoid making the following description unnecessarily long and to facilitate understanding for those skilled in the art.

[0032] <First Embodiment>

[0033] Hereinafter, the present embodiment will be described with reference to the drawings. The exhaust system (10) according to the embodiment described below is used to process hydrogen used in an extreme ultraviolet exposure device (1) (hereinafter referred to as an EUV (Extreme Ultra Violet) exposure device). The EUV exposure device (1) generally comprises a light source unit (2) that generates extreme ultraviolet rays (EUV) and an exposure unit (3) that performs exposure of a workpiece, such as a substrate, wafer, or panel, using the extreme ultraviolet rays (EUV) generated by the light source unit (2). As described above, a large amount of hydrogen gas is used in the light source unit (2) and the exposure unit (3). This hydrogen gas is sent to the exhaust system (10) described below and processed therein.

[0034] (Composition of the exhaust system)

[0035] FIG. 1 is a drawing illustrating an example of the schematic configuration of an exhaust system (10). As shown in FIG. 1, the exhaust system (10) according to the present embodiment is composed of a plurality of modules, and the number and type of each module can be changed according to the user's requirements. As an example, the exhaust system (10) of the present embodiment comprises a group of hydrogen pump modules (11) for a light source unit (11) for sucking in hydrogen gas discharged from a light source unit (2) of an EUV exposure device (not shown) (consisting of at least one hydrogen pump module. As an example, composed of n hydrogen pump modules (11-1 to 11-n)), a first oxygen sensor module (12) for measuring the oxygen concentration of the hydrogen gas discharged from the group of hydrogen pump modules (11) for the light source unit, a utility module (13), a control module (14) for controlling the entire exhaust system (10), a non-hydrogen pump module (15) for exhausting non-hydrogen gases (air and nitrogen), and a group of hydrogen pump modules (16) for an exposure unit (16) for sucking in hydrogen gas discharged from an exposure unit (3) of an EUV exposure device (1) (consisting of at least one hydrogen pump module. As an example, composed of n hydrogen pump modules (16-1 to 16-n) It is equipped with a hydrogen pump module group (16) for the light source and a second oxygen sensor module (17) for measuring the oxygen concentration of hydrogen gas discharged from the hydrogen pump module group (16) for the light source and a first hydrogen treatment module (18) and a second hydrogen treatment module (19) for treating hydrogen gas discharged from the hydrogen pump module group (11) for the light source and the hydrogen pump module group (16) for the light source. Additionally, the hydrogen pump module group (11) for the light source and the hydrogen pump module group (16) for the light source are basically configured in the same way.

[0036] (Housing Exhaust 1: When the hydrogen treatment module includes a hydrogen dilution device)

[0037] First, housing exhaust is described in the case where the first hydrogen treatment module (18) and the second hydrogen treatment module (19) include a hydrogen dilution device. The hydrogen pump module group (11) for the light source unit and the hydrogen pump module group (16) for the exposure unit, the first oxygen sensor module (12) and the second oxygen sensor module (17), the utility module (13), the control module (14), and the non-hydrogen pump module (15) are provided with an exhaust port to which a housing exhaust pipe (not shown) is appropriately connected, and an air intake port (not shown). The air exhausted from the housing from each of these modules can be used as dilution air for diluting hydrogen in the hydrogen dilution device described later. Therefore, the user of the exhaust system (10) does not need to prepare a separate housing exhaust for the purpose of diluting hydrogen.

[0038] In addition, the suction pressure (airflow) is high at the housing exhaust points close to the hydrogen treatment modules (18 and 19), and is low at the points far away due to the influence of conductance. Therefore, a damper is provided at each exhaust port to balance the airflow of each housing exhaust.

[0039] In addition, if particles or iron are introduced into the hydrogen treatment module, and the particles are charged, static electricity may be generated in the hydrogen treatment module (18 and 19) and become a source of ignition. Therefore, a filter is provided in each housing exhaust port to prevent particles from entering the hydrogen treatment module (18 and 19).

[0040] In addition, if the air exhausted from the housing from each module is exhausted only through the hydrogen dilution device, for example, if the hydrogen dilution device (main and spare) fails and stops during hydrogen exhaust from the exposure device, housing exhaust cannot be performed. Under such circumstances, if there is a hydrogen leak within any of the modules, the hydrogen will remain within the modules. To prevent this, the housing exhaust pipe may be connected to at least one factory exhaust pipe. In this way, hydrogen within the housing can be safely exhausted even in the aforementioned situation.

[0041] (Housing Exhaust 2: If the hydrogen treatment module does not include a hydrogen dilution device)

[0042] Next, housing exhaust is described in the case where the first hydrogen treatment module (18) and the second hydrogen treatment module (19) do not include a hydrogen dilution device. The hydrogen pump module group (11) for the light source unit and the hydrogen pump module group (16) for the exposure unit, the first oxygen sensor module (12) and the second oxygen sensor module (17), the utility module (13), the control module (14), and the non-hydrogen pump module (15) are provided with an exhaust port to which a housing exhaust pipe (not shown) is appropriately connected, and an air intake port (not shown). Air within each module is discharged through the housing exhaust pipe. The housing exhaust pipe is connected to the factory's exhaust equipment (not shown), and negative pressure is formed inside the housing and inside the housing exhaust pipe. Therefore, even if hydrogen leaks inside the housing, hydrogen leakage to the outside of the exhaust system is prevented. Furthermore, even if the housing exhaust pipe is damaged, hydrogen gas leakage from the housing exhaust pipe is prevented.

[0043] (Hydrogen pump module for light source)

[0044] Hydrogen gas discharged from the light source unit (2) of an EUV exposure device (not shown) is sucked into a hydrogen pump module for the light source unit (first hydrogen pump module) (11) through a manifold. The group of hydrogen pump modules for the light source unit (11) is equipped with a vacuum pump unit (VP) that sucks in hydrogen gas discharged from the light source unit of the EUV exposure device (not shown). The vacuum pump mounted on this vacuum pump unit (VP) is, for example, a positive displacement dry vacuum pump, but the specific configuration is not particularly limited. The exhaust system (10) of the present embodiment is configured to suck in hydrogen gas discharged from the light source unit (2) of the EUV exposure device (1) by the group of hydrogen pump modules for the light source unit (11). In addition, the group of hydrogen pump modules for the light source unit (11) may be composed of a plurality of hydrogen pump modules (in the example shown in FIG. 1, it is composed of n hydrogen pump modules, 11-1 to 11-n). Accordingly, even if the operation of one hydrogen pump module is stopped for maintenance or the like, hydrogen gas can be continuously sucked in by the other hydrogen pump module. Therefore, maintenance of the hydrogen pump module is possible without stopping the operation of the EUV exposure device (1).

[0045] FIG. 2 is a diagram illustrating an example of the schematic configuration of a hydrogen pump module included in the hydrogen pump module group (11) for the light source of the present embodiment. Additionally, as an example, a hydrogen pump module (11-2) included in the hydrogen pump module group (11) for the light source is described, but the basic configuration is the same for other hydrogen pump modules included in the hydrogen pump module group (11) for the light source and hydrogen pump modules (16-1 to 16-n) included in the hydrogen pump module group (16) for the exposure unit.

[0046] As shown in FIG. 2, a vacuum pump unit (VP) equipped with a caster (C) is housed in the hydrogen pump module (11-2). Power is supplied to this vacuum pump unit (VP) from a power busbar (11a).

[0047] The vacuum pump unit (VP) is composed of three vacuum pumps (main pump (MP), first booster pump (BP1), and second booster pump (BP2)). By operating the three vacuum pumps of the vacuum pump unit (VP), hydrogen gas is drawn into the vacuum pump unit (VP) from the light source unit (2) of the EUV exposure device (1) through the intake pipe (11b) connected to the intake port. The intake pipe (11b) is provided with an air-driven valve (11c) and a manual valve (11d). When replacing any of the vacuum pumps of the vacuum pump unit (VP), the air-driven valve (11c) is controlled to close automatically, but a manual valve (11d) is also provided so that work can be performed safely even if the air-driven valve (11c) malfunctions. In addition, instead of installing a manual valve (11d), a locking mechanism may be provided in the air-driven valve (11c) so that the valve position does not change physically even if there is an incorrect air-driven operation.

[0048] Hydrogen gas drawn in by the vacuum pump unit (VP) is exhausted through the exhaust pipe (11e), joins with hydrogen gas exhausted from the upstream adjacent module (hydrogen pump module (11-3)), and is exhausted to the downstream adjacent module (hydrogen pump module (11-1)). An air-driven valve (11c) and a manual valve (11d) are also provided in this exhaust pipe (11e).

[0049] Additionally, the hydrogen pump module (11-2) is provided with an air intake port (11f), an exhaust port (11g), and a pump (P). Therefore, when the pump (P) is operated, air is introduced into the housing of the hydrogen pump module (11-2) from the outside through the air intake port (11f) and is exhausted from the housing through the exhaust port (11g). As a result, even if hydrogen gas leaks from the vacuum pump unit (VP), intake pipe (11b), exhaust pipe (11e), etc., such gas is exhausted from the housing together with the air introduced into the housing of the hydrogen pump module (11-2), so that hydrogen gas leaks into the factory.

[0050] Additionally, a hydrogen sensor (H) is provided within the housing of the hydrogen pump module (11-2) to detect the leakage of hydrogen gas from the vacuum pump unit (VP), intake pipe (11b), exhaust pipe (11e), etc. When the hydrogen sensor (H) (hydrogen detector) detects a hydrogen leak, a detection signal is sent to the control module (14). The control module (14) outputs a signal notifying the user of an abnormal condition. For example, the user may be notified of the hydrogen leak through a display unit or speaker provided in at least one module of the exhaust system (10).

[0051] In addition, it is possible to control the hydrogen supply to the EUV exposure device (1) to be cut off for safety based on the detection signal output from the hydrogen sensor (H) or the notification signal output from the control module (14). In addition, regarding the exhaust system (10), the exhaust system (10) can be safely stopped by closing the automatic valve (air-driven valve) installed upstream of all vacuum pumps for safety based on the said signal to stop the hydrogen supply to the exhaust system (10).

[0052] Additionally, the number of hydrogen pump modules included in the hydrogen pump module group (11) for the light source of the exhaust system (10) can be changed according to the user's requirements. For example, after the exhaust system (10) is installed once, if the user's requirements change and a larger exhaust speed is required, it is possible to add hydrogen pump modules later. For example, 3 to 8 hydrogen pump modules may be provided as hydrogen pump modules for the light source.

[0053] FIG. 3 is a diagram illustrating the method of installing a vacuum pump unit (VP) in a hydrogen pump module. As an example, a hydrogen pump module (11-2) included in a hydrogen pump module group (11) for a light source is described, and the same applies to other hydrogen pump modules included in the hydrogen pump module group (11) for a light source and the hydrogen pump module group (16) for an exposure unit.

[0054] As shown in FIG. 3, the vacuum pump unit (VP) of the present embodiment is provided with casters (wheels) (C). Conventionally, multiple vacuum pumps were not configured as a single unit, but were configured as two units, for example, a first unit having a first booster pump (BP1) and a second unit having a second booster pump (BP2) and a main pump (MP). Because of this, a jig was required to lift each unit up to the height of the installation position of the housing, which caused a problem of requiring time for the installation of the vacuum pumps.

[0055] Meanwhile, in the vacuum pump unit of the present embodiment, a plurality of vacuum pumps (first booster pump (BP1), second booster pump (BP2), and main pump (MP)) are configured as one unit (pump unit), and since a caster (C) is provided on the vacuum pump unit (VP), it is possible to easily install the vacuum pump unit (VP) within the hydrogen pump module simply by moving it horizontally. As a result, the time required for the installation of the vacuum pump unit (VP) can be significantly reduced.

[0056] Returning to Fig. 1, hydrogen gas discharged from each vacuum pump unit of the hydrogen pump module group (11) for the light source is transferred to the first oxygen sensor module (12) through the pump exhaust pipe.

[0057] (1st oxygen sensor module)

[0058] The first oxygen sensor module (12) is provided downstream of the hydrogen pump module group (11) for the light source and monitors the oxygen concentration of the gas inside the pump exhaust pipe. The gas inside the pump exhaust pipe is basically composed of hydrogen gas, but there may be cases where air from the outside is introduced due to damage to the manifold or the pump exhaust pipe. Therefore, the first oxygen sensor module (12) is configured to constantly measure the oxygen concentration of the gas inside the pump exhaust pipe and to generate an alarm signal according to the measured oxygen concentration. Specifically, the first oxygen sensor module (12) is equipped with at least one oxygen sensor (12a) installed on a branch line branching from the pump exhaust pipe and an oxygen concentration monitoring device (not shown) that generates an alarm signal when the oxygen concentration measured by the oxygen sensor (12a) is higher than a threshold. The measured value of the oxygen concentration is sent to the oxygen concentration monitoring device. The oxygen concentration monitoring device compares the measured oxygen concentration with a preset threshold, and if it is higher than the threshold, it generates an alarm signal. This alarm signal is sent to the user's equipment of the EUV exposure device (1) and exhaust system (10), and the supply of hydrogen to the EUV exposure device (1) is stopped. Specifically, the valve supplying hydrogen to the EUV exposure device (1) is closed, and the supply of hydrogen to the EUV exposure device is stopped.

[0059] The gas in the pump exhaust pipe that has passed through the first oxygen sensor module (12) enters the first and second hydrogen processing modules (18 and 19) via the utility module (13), control module (14), non-hydrogen pump module (15), hydrogen pump module group for exposure unit (16), and second oxygen sensor module (17).

[0060] (Utility Module)

[0061] The utility module (13) is a module for receiving cooling water and nitrogen gas (N2) from the factory and distributing them to each module. The utility module (13) supplies the cooling water supplied from the factory side to each vacuum pump unit of the hydrogen pump module group (11) for the light source section, the hydrogen pump module group (16) for the exposure section, and the non-hydrogen pump module (15).

[0062] Cooling water is used to cool the casing or motor of each vacuum pump unit (VP), and then is recovered from the utility module (13) and drained through the factory's drainage line (not shown).

[0063] Additionally, the utility module (13) supplies nitrogen gas (N2) supplied from the factory side to the hydrogen pump module group (11) for the light source unit, the hydrogen pump module group (16) for the exposure unit, the non-hydrogen pump module (15), the first oxygen sensor module (12), and the second oxygen sensor module (17).

[0064] Nitrogen supplied from the utility module (13) (one supply port) is branched and supplied to the hydrogen pump module group (11) for the light source unit, the hydrogen pump module group (16) for the exposure unit, the non-hydrogen pump module (15), the first and second oxygen sensor modules (12, 17), and the solenoid valve (air-driven valve) for driving the valve of each module. The nitrogen gas supplied to the vacuum pump unit (VP) is used for purging and shaft sealing.

[0065] Additionally, the nitrogen gas supplied from the utility module (13) to the non-hydrogen pump module (15) is used as a shaft seal for the vacuum pump unit (VP).

[0066] In addition, the nitrogen gas supplied from the utility module (13) to the first and second oxygen sensor modules (12, 17) is used as a standard gas to accurately measure the oxygen concentration.

[0067] The nitrogen gas used in the hydrogen pump module group (11) for the light source, the hydrogen pump module group (16) for the exposure unit, the non-hydrogen pump module (15), and the first and second oxygen sensor modules (12, 17) joins the hydrogen gas pump exhaust pipe and is exhausted to the hydrogen treatment module (18) together with the hydrogen gas.

[0068] (Control Module)

[0069] The control module (14) supplies power supplied from the factory to each module and controls pumps or sensors included in each module.

[0070] (Non-hydrogen pump module)

[0071] The non-hydrogen pump module (15) is a module for exhausting air or nitrogen gas other than hydrogen gas from a vacuum section (vacuum robot section / reticle stage section) other than the light source section (2) and exposure section (3) of the EUV exposure device (1).

[0072] Specifically, the non-hydrogen pump module (15) is equipped with a vacuum pump (VP1) that sucks in gas exhausted from the vacuum robot section, a vacuum pump (VP2) that sucks in gas exhausted from the reticle stage section, and a vacuum pump (VP3) (not shown) as a spare pump in case the vacuum pump (VP1) or vacuum pump (VP2) cannot be operated for any reason. If either of the vacuum pumps (VP1 and VP2) fails, the faulty pump can be replaced without stopping the operation of the vacuum robot section and the reticle stage section by switching to the spare vacuum pump (VP3).

[0073] In addition, the non-hydrogen pump module (15) of the present embodiment is configured to share a spare pump (vacuum pump (VP3)) between the vacuum pump (VP1) for the vacuum robot and the vacuum pump (VP2) for the reticle stage, so the size of the non-hydrogen pump module (15) can be made smaller compared to the case where one spare pump is provided for each of the vacuum pump (VP1) and the vacuum pump (VP2).

[0074] The gas discharged from the vacuum pumps (VP1 to VP3) of the non-hydrogen pump module (15) is exhausted outside the factory (into the atmosphere) through a factory exhaust pipe (not shown).

[0075] (Hydrogen pump module for lithography)

[0076] Hydrogen gas discharged from the exposure unit (3) of the EUV exposure device (1) is sucked into the hydrogen pump module group (16) for the exposure unit through a manifold. The basic configuration of the hydrogen pump modules (16-1 to 16-n) included in this hydrogen pump module group (16) for the exposure unit is the same as that of the hydrogen pump modules (11-1 to 11-n) included in the hydrogen pump module group (11) for the light source unit.

[0077] The hydrogen pump module group (16) for the exposure unit is each equipped with a vacuum pump unit (VP) that sucks in hydrogen gas discharged from the exposure unit (3) of the EUV exposure device (1). The vacuum pump mounted on this vacuum pump unit (VP) is, for example, a positive displacement dry vacuum pump, but the specific configuration is not particularly limited. The exhaust system (10) of the present embodiment is configured to suck in hydrogen gas discharged from the exposure unit (3) of the EUV exposure device (1) by the hydrogen pump module group (16) for the exposure unit. In addition, the hydrogen pump module group (16) for the exposure unit may be composed of a plurality of hydrogen pump modules (in the example shown in FIG. 1, it is composed of n hydrogen pump modules from 16-1 to 16-n). By doing so, even if the operation of one hydrogen pump module is stopped for maintenance or the like, the sucking of hydrogen gas can continue by the other hydrogen pump module. Therefore, maintenance of the hydrogen pump module is possible without stopping the operation of the EUV lithography device (1).

[0078] The hydrogen gas discharged from the vacuum pump unit (VP) of the hydrogen pump module group (16) for the exposure unit is transferred to the second oxygen sensor module (17) through the pump exhaust pipe.

[0079] (2nd oxygen sensor module)

[0080] The second oxygen sensor module (17) is provided downstream of the hydrogen pump module group (16) for the exposure unit and monitors the oxygen concentration of the gas inside the pump exhaust pipe. The gas inside the pump exhaust pipe is basically composed of hydrogen gas, but there may be cases where air from the outside is introduced due to damage to the manifold or the pump exhaust pipe. Therefore, the second oxygen sensor module (17) is configured to constantly measure the oxygen concentration of the gas inside the pump exhaust pipe and to generate an alarm signal according to the measured oxygen concentration. Specifically, the second oxygen sensor module (17) is equipped with at least one oxygen sensor (17a) installed on a branch line branching from the pump exhaust pipe and an oxygen concentration monitoring device (not shown) that generates an alarm signal when the oxygen concentration measured by at least one of the oxygen sensors (17a) is higher than a threshold. The measured value of the oxygen concentration is sent to the oxygen concentration monitoring device. The oxygen concentration monitoring device compares the measured oxygen concentration with a preset threshold, and if it is higher than the threshold, it generates an alarm signal. The alarm signal is sent to the upstream EUV exposure device (1), and the hydrogen supply to the EUV exposure device (1) is stopped.

[0081] The gas in the pump exhaust pipe that has passed through the second oxygen sensor module is transferred to the first and second hydrogen treatment modules.

[0082] (Hydrogen processing module)

[0083] The hydrogen treatment modules (first and second hydrogen treatment modules (18, 19)) are devices for treating hydrogen gas discharged from the light source unit (2) side (hydrogen pump module group (11) for the light source unit) and the exposure unit (3) side (hydrogen pump module group (16) for the exposure unit) of the EUV exposure device (1). Specifically, the first and second hydrogen treatment modules (18, 19) are equipped with a hydrogen dilution device that dilutes the hydrogen gas until the concentration is below the explosion lower limit, or a combustion type exhaust gas treatment device (combustion decompression device) that treats the hydrogen gas by contacting it with a flame for combustion. When the first hydrogen treatment module (18) and / or the second hydrogen treatment module (19) are used as hydrogen dilution devices, the air exhausted from the housing from each module is used as dilution air. Accordingly, the user of the exhaust system (10) does not need to separately provide equipment for supplying dilution air to the hydrogen dilution device.

[0084] The first and second hydrogen treatment modules (18, 19) have the first hydrogen treatment module (18) as the main hydrogen treatment module for processing hydrogen gas, and when the first hydrogen treatment module (18) cannot be operated for any reason, the second hydrogen treatment module (19) processes hydrogen gas as a backup in place of the first hydrogen treatment module (18). If the second hydrogen treatment module (19) also cannot be operated for any reason, the hydrogen gas is exhausted out of the factory (into the atmosphere) through a factory exhaust pipe (not shown). Additionally, hydrogen gas may be processed by both the first and second hydrogen treatment modules (18, 19) at all times.

[0085] The gas processed in the first hydrogen treatment module (18) and / or the second hydrogen treatment module (19) is exhausted outside the factory (into the atmosphere) through a factory exhaust pipe (not shown).

[0086] As such, the exhaust system (10) according to the present embodiment is configured such that each module (a hydrogen pump module group for the light source unit (11), a first oxygen sensor module (12), a utility module (13), a control module (14), a non-hydrogen pump module (15), a hydrogen pump module group for the exposure unit (16), a second oxygen sensor module (17), a first hydrogen treatment module (18), and a second hydrogen treatment module (19)) is configured as a separable module, so it is possible to increase or decrease each module according to the user's requirements of the exhaust system (10).

[0087] <Second Embodiment>

[0088] Next, the exhaust system (10A) according to the second embodiment will be described. In the exhaust system (10) according to the first embodiment, hydrogen gas discharged from the EUV exposure device is treated by the first and second hydrogen treatment modules. In contrast, the exhaust system (10A) according to the second embodiment is different in that it is equipped with a hydrogen recovery module (20) for recovering hydrogen gas discharged from the EUV exposure device (1) and reusing it in the EUV exposure device (1), and is equipped with a hydrogen treatment module (19) as a backup.

[0089] FIG. 4 is a drawing illustrating an example of the schematic configuration of an exhaust system (10A) according to a second embodiment. Components common to the first embodiment are given the same reference numerals and their descriptions are omitted.

[0090] As shown in FIG. 4, hydrogen gas discharged from the light source side (2) (hydrogen pump module group (11) for the light source) and the exposure side (3) (hydrogen pump module group (16) for the exposure) of the EUV exposure device (1) is first transferred to a hydrogen recovery module (20).

[0091] The hydrogen recovery module (20) has a hydrogen purification device for purifying hydrogen gas, and the hydrogen gas purified by this hydrogen purification device is transferred to an EUV exposure device (1) through a hydrogen transfer pipe and reused.

[0092] In addition, if the hydrogen purification device cannot be operated for any reason, the hydrogen gas is transferred to a hydrogen treatment module (19) and treated by a hydrogen treatment device (hydrogen dilution device or combustion type exhaust gas treatment device). If the hydrogen treatment device also cannot be operated for any reason, it is exhausted out of the factory (into the atmosphere) through a factory exhaust pipe (not shown).

[0093] In this way, the exhaust system of the present embodiment is configured to recover and reuse hydrogen gas emitted from the EUV exposure device (1), so that hydrogen gas can be effectively utilized without being emitted into the atmosphere as exhaust gas.

[0094] <Third Embodiment>

[0095] Next, the exhaust system (10B) according to the third embodiment will be described. In the exhaust system (10) according to the first embodiment, hydrogen gas discharged from the EUV exposure device (1) is treated by the first and second hydrogen treatment modules (18, 19), whereas in the exhaust system (10B) according to the third embodiment, a fuel cell module (21) for generating power using hydrogen gas discharged from the EUV exposure device (1) is provided, and a hydrogen treatment module (19) is provided as a backup.

[0096] FIG. 5 is a drawing illustrating an example of the schematic configuration of an exhaust system (10B) according to a third embodiment. Components common to the first embodiment are given the same reference numerals and their descriptions are omitted.

[0097] As shown in FIG. 5, hydrogen gas discharged from the light source side (2) (hydrogen pump module group (11) for the light source) and the exposure side (3) (hydrogen pump module group (16) for the exposure) of the EUV exposure device (1) is first transferred to a fuel cell module (21).

[0098] The fuel cell module (21) has a fuel cell unit for generating power using hydrogen gas, and hydrogen gas discharged from the light source section (2) side (hydrogen pump module group (11) for the light source section) and the exposure section (3) side (hydrogen pump module group (16) for the exposure section) of the EUV exposure device (1) is supplied to the fuel cell unit. Oxygen from the air is also supplied to the fuel cell unit from an intake port not shown, and power is generated using hydrogen gas and oxygen. The power generated from the fuel cell is supplied to the factory's power equipment (factory power line) through an electric cable.

[0099] In addition, if the fuel cell unit cannot be used for any reason, the hydrogen gas is transferred to a hydrogen treatment module (19) and treated by a hydrogen treatment device (hydrogen dilution device or combustion type exhaust gas treatment device). If the hydrogen treatment device also cannot be operated for any reason, it is exhausted out of the factory (into the atmosphere) through a factory exhaust pipe (not shown).

[0100] In this way, in the exhaust system (10B) of the present embodiment, hydrogen gas discharged from the EUV exposure device (1) is used to generate power by the fuel cell module (21), so the hydrogen gas can be effectively utilized without being discharged into the atmosphere as exhaust gas.

[0101] For the above, the present invention is not limited to the embodiments described above, and may be embodied by modifying the components within the scope of not departing from the gist thereof during the implementation phase. Furthermore, various inventions can be formed by appropriate combinations of the plurality of components disclosed in the embodiments. For example, several components may be deleted from the entire set of components shown in the embodiments. Additionally, components spanning different embodiments may be appropriately combined.

Claims

Claim 1 An exhaust system for exhausting hydrogen discharged from an EUV lithography device, comprising: a hydrogen pump module for a light source unit having a vacuum pump unit for sucking hydrogen discharged from a light source unit of the EUV lithography device; a first oxygen sensor module for measuring the oxygen concentration of a gas discharged from the hydrogen pump module for the light source unit; a hydrogen pump module for an exposure unit having a vacuum pump unit for sucking hydrogen discharged from an exposure unit of the EUV lithography device; a second oxygen sensor module for measuring the oxygen concentration of a gas discharged from the hydrogen pump module for the exposure unit; a hydrogen treatment module for treating hydrogen gas discharged from the first and second oxygen sensor modules; a utility module for supplying cooling water and / or nitrogen gas to each module; and a control module for supplying power to each module and controlling each module. Claim 2 In claim 1, the hydrogen treatment module includes a hydrogen dilution device for diluting the hydrogen gas, and the exhaust system in which air exhausted from the housing from each module is supplied to the hydrogen dilution device as dilution air. Claim 3 In claim 1, the hydrogen treatment module comprises a combustion type exhaust gas treatment device that processes the hydrogen gas by combustion, an exhaust system. Claim 4 An exhaust system according to claim 1, further comprising a hydrogen recovery module for recovering the hydrogen gas and reusing the hydrogen gas in the EUV exposure device, wherein the hydrogen recovery module includes a hydrogen purification device for purifying the recovered hydrogen gas. Claim 5 An exhaust system according to claim 1, further comprising a fuel cell module for generating power using the hydrogen gas. Claim 6 In claim 1, the vacuum pump unit comprises a main pump, a first booster pump, and a second booster pump, and is an exhaust system having casters provided at the bottom. Claim 7 An exhaust system according to claim 1, further comprising a non-hydrogen pump module for exhausting gases other than hydrogen gas discharged from a device other than the EUV exposure device.

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