Pellicle for EUV photomask using reinforeced graphene membrane
The reinforced graphene membrane pellicle for EUV photomasks addresses issues of transmittance, mechanical stability, and thermal deformation by using a reinforced edge structure, enhancing defect reduction and process efficiency.
KR102991414B1Active Publication Date: 2026-07-15CHARM GRAPHENE CO LTD
Patent Information
- Authority / Receiving Office
- KR · KR
- Patent Type
- Patents
- Current Assignee / Owner
- CHARM GRAPHENE CO LTD
- Filing Date
- 2023-08-25
- Publication Date
- 2026-07-15
AI Technical Summary
Technical Problem
Conventional pellicles used in EUV lithography equipment suffer from low transmittance, mechanical instability, and thermal deformation due to the absorption of extreme ultraviolet light, leading to defects in photomask patterns.
Method used
A pellicle for EUV photomasks utilizing a reinforced graphene membrane with a reinforcing pad formed on its edge, attached to a pellicle frame, to enhance mechanical stability and minimize damage during the manufacturing process.
Benefits of technology
The reinforced graphene membrane pellicle reduces defect rates by minimizing damage during attachment and allows for cost-effective, simplified manufacturing processes with improved mechanical stability and control over thickness.
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Smart Images
Figure 112023093964628-PAT00001_ABST
Abstract
The present invention relates to a pellicle for an EUV photomask using a reinforced graphene membrane, and more specifically, to a pellicle for an EUV photomask using a reinforced graphene membrane in which a graphene membrane having a reinforced pad formed with a reinforced edge is attached to a pellicle frame. The present invention provides a pellicle for an EUV photomask using a reinforced graphene membrane, characterized by comprising: a pellicle frame; a graphene membrane attached to the front or back surface of the pellicle frame; and a reinforcing pad formed on the edge of the graphene membrane.
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