Pellicle for EUV photomask using reinforeced graphene membrane

The reinforced graphene membrane pellicle for EUV photomasks addresses issues of transmittance, mechanical stability, and thermal deformation by using a reinforced edge structure, enhancing defect reduction and process efficiency.

KR102991414B1Active Publication Date: 2026-07-15CHARM GRAPHENE CO LTD
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Patent Information

Application Number
KR1020230111941
Authority / Receiving Office
KR · KR
Patent Type
Patents
Current Assignee / Owner
Filing Date
2023-08-25
Publication Date
2026-07-15
Estimated Expiration
2043-08-25

AI Technical Summary

Technical Problem

Conventional pellicles used in EUV lithography equipment suffer from low transmittance, mechanical instability, and thermal deformation due to the absorption of extreme ultraviolet light, leading to defects in photomask patterns.

Method used

A pellicle for EUV photomasks utilizing a reinforced graphene membrane with a reinforcing pad formed on its edge, attached to a pellicle frame, to enhance mechanical stability and minimize damage during the manufacturing process.

Benefits of technology

The reinforced graphene membrane pellicle reduces defect rates by minimizing damage during attachment and allows for cost-effective, simplified manufacturing processes with improved mechanical stability and control over thickness.

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Abstract

The present invention relates to a pellicle for an EUV photomask using a reinforced graphene membrane, and more specifically, to a pellicle for an EUV photomask using a reinforced graphene membrane in which a graphene membrane having a reinforced pad formed with a reinforced edge is attached to a pellicle frame. The present invention provides a pellicle for an EUV photomask using a reinforced graphene membrane, characterized by comprising: a pellicle frame; a graphene membrane attached to the front or back surface of the pellicle frame; and a reinforcing pad formed on the edge of the graphene membrane.
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Citation Information

Patent Citations

  • Pellicle and reticle

    JP3529062B2

  • Pellicle for an Extreme Ultraviolet(EUV) Lithography and method for fabricating the same

    KR1020170126265A

  • Pellicle with a Pattern to reduce external stimulus, and Method for manufacturing the same

    KR1020210054385A

  • Pellicle Frame for EUV(extreme ultraviolet) Lithography

    KR1020220112519A

  • Pellicle for EUV lithography and fabrication method thereof

    KR1020230082570A