Ultrasonic misting device
The ultrasonic atomizing device addresses inaccuracies and delays in mist supply measurement by using a non-contact mist supply pipe and leak-prevention system, ensuring precise and responsive control of mist generation and supply.
Patent Information
- Authority / Receiving Office
- KR · KR
- Patent Type
- Patents
- Current Assignee / Owner
- 가부시키가이샤 티마이크
- Filing Date
- 2022-12-20
- Publication Date
- 2026-07-15
AI Technical Summary
Conventional ultrasonic atomizing devices face issues with inaccurate and unresponsive measurement of mist supply amount due to weight dispersion effects from mist supply pipes and delayed responsiveness in determining raw material solution consumption, leading to instability in mist generation and supply.
The ultrasonic atomizing device employs a non-contact mist supply pipe and a leak-prevention gas supply pipe, supported from below by a weighing device, which measures the weight of the container and ultrasonic vibrator without direct contact, ensuring accurate and responsive determination of raw material solution consumption and mist generation.
This configuration allows for precise and timely measurement of raw material solution consumption, enabling accurate and responsive control of mist supply, minimizing mist leakage and maintaining consistent mist generation.
Smart Images

Figure 112024074635511-PCT00001_ABST
Abstract
Description
Technology Field
[0001] The present disclosure relates to an ultrasonic atomizing apparatus that uses an ultrasonic vibrator to atomize a raw material solution to obtain a raw material solution mist. Background Technology
[0002] Conventionally, as a film formation apparatus for obtaining a functional thin film by spraying a raw material solution mist obtained by atomizing (mistifying) a raw material solution onto a substrate such as a substrate, an ultrasonic atomizing apparatus is used to generate a raw material solution mist by applying ultrasonic vibration to a raw material solution. In the ultrasonic atomizing apparatus, the raw material solution mist generated in a container for the raw material solution is supplied from the container for the raw material solution to a mist spraying part such as a nozzle by means of a carrier gas, and the raw material solution mist is sprayed from the mist spraying part onto the substrate to form a thin film. As such a conventional ultrasonic atomizing apparatus, there is, for example, the atomizing apparatus disclosed in Patent Document 1.
[0003] In order to form a stable and uniform thin film on a substrate, it is necessary to stabilize the amount of raw material solution mist supplied from the ultrasonic atomization device; therefore, it is necessary to accurately determine the amount of mist supplied per unit time from the ultrasonic atomization device.
[0004] (Measurement of 1st mist supply amount)
[0005] FIG. 8 is an explanatory diagram schematically showing a conventional first configuration ultrasonic atomizing device (300). An XYZ orthogonal coordinate system is shown in FIG. 8. Hereinafter, the configuration of a conventional ultrasonic atomizing device (300) will be explained with reference to FIG. 8.
[0006] In an ultrasonic atomizing device (300), a container for a raw material solution is formed by a misting container (1) and a separator cup (12). The bottom surface of the container for the raw material solution becomes the separator cup (12). In this way, a raw material solution (15) is contained within the container for the raw material solution formed by the misting container (1) and the separator cup (12).
[0007] A pipe section (1A) is provided above the separator cup (12) in communication with the upper part of the atomizing container (1). The pipe outlet (1X) of the pipe section (1A) is connected to a mist spraying part, such as a nozzle not shown, through a mist supply pipe not shown. Accordingly, the raw material solution mist (MT) generated in the raw material solution container of the ultrasonic atomizing device (300) is supplied to the mist spraying part through the pipe section (1A) and the mist supply pipe.
[0008] The ultrasonic misting device (300) further has a tank (10) that contains ultrasonic transmission water (9) which serves as an ultrasonic transmission medium. The tank (10) and the separator cup (12) are configured such that the bottom surface of the separator cup (12) is immersed in the ultrasonic transmission water (9).
[0009] A plurality of ultrasonic transducers (2) are provided on the bottom surface of the tank (10) below the separator cup (12). In FIG. 8, two ultrasonic transducers (2) are shown. Each of the plurality of ultrasonic transducers (2) has an ultrasonic vibrating plate (2T), and each ultrasonic transducer (2) performs an ultrasonic vibration operation that generates an ultrasonic wave W2 from the ultrasonic vibrating plate (2T) of a size that matches the planar shape of the ultrasonic vibrating plate (2T).
[0010] A gas supply pipe (4), which is a supply pipe for transport gas, is provided on the upper side of the atomizing container (1), and transport gas (G4) is supplied from the gas supply pipe (4) to the internal space (1H) inside the atomizing container (1). A gas control device, not shown, is installed in the gas supply pipe (4), and the flow rate of the transport gas (G4) supplied to the atomizing container (1) is controlled by the gas control device.
[0011] A gas supply pipe (3), which is a supply pipe for diluting gas, is provided on the side of the pipe section (1A), and diluting gas (G3) is supplied from the gas supply pipe (3). A gas control device not shown is installed in the gas supply pipe (3), and the flow rate of the diluting gas (G3) supplied into the pipe section (1A) is controlled by the gas control device.
[0012] As described above, the raw material solution (15) is contained within a container for the raw material solution that includes a misting container (1) and a separator cup (12). The bottom surface of the container for the raw material solution becomes the separator cup (12).
[0013] Additionally, a raw material tank (35) is provided independently of the raw material solution container, which includes a misting container (1) and a separator cup (12). The raw material tank (35) contains a raw material solution (15) to be supplied to the raw material solution container. A raw material solution supply pipe (31) is provided between the raw material solution container and the raw material tank (35). The raw material solution (15) can be supplied from the raw material tank (35) to the raw material solution container through the raw material solution supply pipe (31).
[0014] The raw material solution supply pipe (31) is provided with a raw material solution supply mechanism (8) including a suction pump (32) and a flow meter (33).
[0015] In addition, the conventional first configuration ultrasonic atomizing device (300) has a scale (51) that measures weight using a raw material tank (35) and a raw material solution (15) inside the raw material tank (35) as the object to be measured. The scale (51), which is a weight measuring device, can measure the weight of the object to be measured as the measured weight.
[0016] Additionally, the raw material solution supply mechanism (8) and the raw material solution supply pipe (31) are excluded from the objects to be measured by the scale (51). For example, the suction pump (32) and the flow meter (33) are installed on a separate stand so as not to affect the weight measurement of the scale (51). However, regarding the raw material solution supply pipe (31), the portion from the flow meter (33) to the raw material tank (35) (hereinafter abbreviated as "supply pipe measurement target portion") is included in the objects to be measured by the scale (51).
[0017] However, since the weight of the supply pipe measurement target part is a constant value, even if the supply pipe measurement target part is included in the measurement target, the change in weight of the measurement target can be accurately measured. Therefore, since the ultrasonic atomization device (300) can estimate the supply amount of raw material solution (15) to the raw material solution container from the change in weight of the measurement target measured by the scale (51), there is no particular problem.
[0018] The ultrasonic atomizing device (300) can determine the supply amount of raw material solution (15) supplied from the raw material tank (35) to the container for the raw material solution based on the measured weight measured by the scale (51).
[0019] That is, if the measured weight of the object to be measured at time t1 is denoted as the measured weight P1, and the measured weight of the object to be measured at time t2 after time t1 is denoted as the measured weight P2, then the amount of raw material solution (15) supplied from the raw material tank (35) to the container for the raw material solution can be calculated based on the weight reduction amount ΔP12 (=P1-P2).
[0020] The supply amount of the raw material solution (15) is a value that indirectly indicates the mist supply amount of the raw material solution mist (MT). This is because the supply amount of the raw material solution (15) corresponds to the consumption amount of the raw material solution (15) in the misting container (1), so it can be inferred that the raw material solution mist (MT) is generated in an amount equal to the consumption amount of the raw material solution (15).
[0021] Accordingly, the ultrasonic misting device (300) can obtain the amount of mist of the raw material solution (MT) from the amount of raw material solution (15) obtained based on the measured weight of the object to be measured by the scale (51).
[0022] In a conventional ultrasonic atomizing device (300) of such configuration, when an ultrasonic vibration operation is performed in which ultrasonic vibration is applied from a plurality of ultrasonic vibrators (2), each having an ultrasonic vibrating plate (2T), the vibration energy of ultrasonic W2 from the plurality of ultrasonic vibrators (2) is transmitted to the raw material solution (15) in the container for the raw material solution through the ultrasonic transmission water (9) and the separator cup (12).
[0023] Then, as shown in FIG. 8, a liquid column (6) is formed from the liquid surface (15A), and the raw material solution (15) is transferred into liquid particles and mist, so that a raw material solution mist (MT) is obtained within the internal space (1H) of the atomizing container (1). In this way, by performing an ultrasonic vibration operation that applies ultrasonic W2 from the ultrasonic vibrator (2), the raw material solution (15) is atomized to produce a raw material solution mist (MT).
[0024] When the ultrasonic vibration operation is executed, the raw material solution mist (MT) generated in the misting container (1) flows through the pipe section (1A) along the mist output direction DM by the transport gas (G4) supplied from the gas supply pipe (4), and then is supplied to the mist supply pipe and mist injection section from the pipe outlet (1X) of the pipe section (1A).
[0025] The gas system connected to the conventional ultrasonic misting device (300) consists of two systems: a transport gas (G4) and a dilution gas (G3). The dilution gas (G3) is a gas for maintaining a constant amount of gas of the raw material solution mist (MT) ejected from a mist spraying part such as a nozzle.
[0026] The raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) by the ultrasonic vibration operation of a plurality of ultrasonic vibrators (2) is supplied to an unillustrated mist supply pipe and mist spraying section from the pipe outlet (1X) of the pipe section (1A) outside the atomizing container (1) by the dilution gas (G3) and the transport gas (G4). When the amount of raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) is maintained at a constant amount, the amount of mist of the raw material solution mist (MT) supplied from the atomizing container (1) to the mist spraying section can be increased or decreased by the transport gas flow rate LC of the transport gas (G4) supplied from the gas supply pipe (4).
[0027] Meanwhile, for the deposition of a thin film using a raw material solution mist (MT), in addition to a stable amount of mist, it is necessary to maintain a constant total gas flow rate LT of the raw material solution mist (MT) output from the mist injection unit. This is because maintaining a constant total gas flow rate LT allows the ejection speed of the raw material solution mist (MT) ejected from the mist injection unit to be kept constant. In addition, the opening of the nozzle, which is the mist injection unit, is provided in a slit shape, for example.
[0028] As described above, the raw material solution mist (MT) is supplied to the outside of the misting container (1) by a transport gas (G4). Along with the transport (return) of the raw material solution mist (MT) to the outside, the raw material solution (15) inside the raw material solution container decreases. In order to stabilize the amount of mist generated, it is necessary to maintain a constant amount of the raw material solution (15) inside the raw material solution container. This is because the amount of raw material solution mist (MT) generated varies according to the height of the liquid level (15A) of the raw material solution (15) from the plurality of ultrasonic vibrators (2).
[0029] For this reason, the height of the liquid level (15A) of the raw material solution (15) in the container for the raw material solution is detected by a liquid level detector (19), and the amount of reduction of the raw material solution (15) is calculated based on the height of the liquid level (15A), and the raw material solution (15) is appropriately supplied from the raw material tank (35) according to the amount of reduction of the raw material solution (15). That is, in order to replenish the amount of reduction of the raw material solution (15) in the container for the raw material solution, the raw material solution (15) is replenished from the raw material tank (35) through the raw material solution supply pipe (31).
[0030] Because the height of the liquid level (15A) of the raw material solution (15) in the container for the raw material solution is maintained constant by replenishing the raw material solution (15) from the raw material tank (35), the amount of raw material solution (15) supplied from the raw material tank (35) is consequently equal to the amount of raw material solution (15) reduced in the container for the raw material solution. Therefore, the ultrasonic atomizing device (300) estimates the amount of mist generated of the raw material solution mist (MT) based on the amount of raw material solution (15) supplied from the raw material tank (35).
[0031] In this way, the conventional first configuration ultrasonic misting device (300) measured the amount of mist generated from the raw material solution mist (MT), that is, the amount of mist supplied to the mist injection unit, based on the amount of raw material solution (15) supplied from the raw material tank (35), thereby ensuring the stability of the raw material solution mist (MT) generation process.
[0032] Meanwhile, when the carrier gas flow rate LC is increased or decreased to control the mist supply amount of the raw material solution mist (MT), the total gas flow rate LT of the raw material solution mist (MT) is also increased or decreased accordingly.
[0033] Therefore, in order to maintain a constant total gas flow rate LT, as shown in FIG. 9, it is necessary to supply a dilution gas (G3) from a separate system from the transport gas (G4) from the gas supply pipe (3) to the pipe section (1A) near the atomizing vessel (1). Here, if the gas flow rate of the dilution gas (G3) is denoted as the dilution gas flow rate LD1, the relationship between the transport gas flow rate LC, the dilution gas flow rate LD1, and the total gas flow rate LT is determined by the following equation (1).
[0034] LT=LC+LD1… (1)
[0035] In addition, the transport gas flow rate LC, the dilution gas flow rate LD1, and the total gas flow rate LT represent the volume per unit time and are expressed in units such as “l (liter) / min”.
[0036] For example, in order to reduce the mist supply amount of the raw material solution mist (MT), if the carrier gas flow rate LC is reduced by ΔLC, the total gas flow rate LT can be maintained constant by increasing the dilution gas flow rate LD1 by ΔLC.
[0037] In this way, the conventional ultrasonic atomizing device (300) can maintain the total gas flow rate LT of the raw material solution mist (MT) constant regardless of changes in the transport gas flow rate LC by adding a dilution gas system for the dilution gas (G3).
[0038] (Measurement of 2nd mist supply amount)
[0039] FIG. 9 is an explanatory diagram schematically showing a conventional second configuration ultrasonic atomizing device (301). An XYZ orthogonal coordinate system is shown in FIG. 9. Hereinafter, with reference to FIG. 9, the configuration of the conventional second configuration ultrasonic atomizing device (301) will be explained. In addition, regarding the configuration of the ultrasonic atomizing device (301), components similar to the ultrasonic atomizing device (300) shown in FIG. 8 are given the same reference numerals and their descriptions are appropriately omitted.
[0040] Although the city is omitted in FIG. 9, in the ultrasonic atomizing device (301), just like in the ultrasonic atomizing device (300), there is a raw material solution supply pipe (31), a raw material solution supply mechanism (8), and a raw material tank (35) that accommodates the raw material solution (15). However, in the ultrasonic atomizing device (301), a scale (51) that measures the raw material tank (35) and the raw material solution (15) is not provided.
[0041] The conventional second configuration ultrasonic atomizing device (301) has a container for a raw material solution (atomizing container (1) + separator cup (12)), a water tank (10), a plurality of ultrasonic vibrators (2), and a scale (52) that measures weight using the raw material solution (15) in the atomizing container (1) and the ultrasonic transmission water (9) in the water tank (10) as the objects to be measured. The scale (52), which is a weight measuring device, measures the weight of the objects to be measured as the measured weight.
[0042] Additionally, the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31) are excluded from the objects to be measured by the scale (52). For example, multiple support points are provided for the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31), and each of the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31) is supported stably by suspending them from the multiple support points. As a result, the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31) can be excluded from the objects to be measured by the scale (52).
[0043] Additionally, the scale (52), which is a weight measuring device, does not come into contact with the plurality of ultrasonic vibrators (2) and supports the tank (10) from the bottom surface of the tank (10) by means of a support member (53), and also measures the weight of a measurement target including a container for raw material solution (foaming container (1) + separator cup (12)), a plurality of ultrasonic vibrators (2), a tank (10), a raw material solution (15), and ultrasonic transmission water (9).
[0044] And, in the ultrasonic atomizing device (301), the amount of raw material solution (15) consumed in the container for the raw material solution can be determined based on the measured weight measured by the scale (52).
[0045] That is, if the measured weight of the object to be measured at time t1 is denoted as the measured weight P1, and the measured weight of the object to be measured at time t2 after time t1 is denoted as the measured weight P2, then the amount of raw material solution (15) consumed in the container for the raw material solution can be calculated from the amount of weight reduction ΔP12 (=P1-P2). At this time, it can be inferred that raw material solution mist (MT) is generated to the extent of the amount of raw material solution (15) consumed.
[0046] Accordingly, the conventional second configuration ultrasonic misting device (301) can determine the amount of mist supplied by the raw material solution mist (MT) from the amount of raw material solution (15) consumed based on the measured weight of the object to be measured by the scale (52). Prior art literature
[0047] International Publication No. 2015 / 019468 The problem to be solved
[0048] The first mist supply amount measurement method using the first conventional ultrasonic misting device (300) shown in FIG. 8 utilizes the raw material solution supply characteristics in which, as a result of the raw material solution mist (MT) generated within the internal space (1H) of the misting container (1) being supplied to the mist spraying part, the raw material solution (15) in the container for the raw material solution decreases, and at the timing when this is detected, the raw material solution (15) is supplied from the raw material tank (35) to the container for the raw material solution.
[0049] Therefore, the supply amount of raw material solution (15) from the raw material tank (35) by the ultrasonic atomizing device (300) is not information that captures the moment when the raw material solution mist (MT) is generated and supplied to the outside, but rather information with a delay. For this reason, the supply amount of raw material solution (15) used by the ultrasonic atomizing device (300) has a first problem in that it has poor responsiveness as information for controlling the mist supply amount at a constant level.
[0050] Meanwhile, the second mist supply amount measurement method using the ultrasonic misting device (301), which is the second conventional configuration shown in FIG. 9, is a method of measuring the weight of a measurement target containing a raw material solution (15) in a container for a raw material solution and estimating the mist supply amount from the change in weight. Accordingly, the second mist supply amount measurement method aims to resolve the first problem described above.
[0051] However, a mist supply pipe for supplying mist to a mist spraying part, such as a nozzle, is connected to the pipe outlet (1X) of the pipe section (1A). Since chemical resistance and mechanical strength are required for this mist supply pipe, a pipe made of metal with high rigidity or a pipe made of fluoropolymer is often used. Also, at least a portion of the mist supply pipe is included in the object to be measured by the scale (52).
[0052] Because of this, the mist supply pipe produces a weight dispersion effect in the measured weight of the scale (52), so the conventional ultrasonic misting device (301) has a second problem in that it cannot accurately measure the weight of the object to be measured.
[0053] In addition, the weight dispersion effect means that when the mist supply pipe is installed in the pipe section (1A), the force directed upward in Fig. 9 is applied as a force pulling the mist container (1), so the weight of the object to be measured cannot be accurately measured.
[0054] As such, the conventional ultrasonic atomizing device including the ultrasonic atomizing device (300) and the ultrasonic atomizing device (301) had a problem in that the amount of mist supplied by the raw material solution mist (MT) could not be obtained with good responsiveness and accurately.
[0055] The present disclosure aims to provide an ultrasonic atomizing device that solves the above-mentioned problems and can accurately determine the mist supply amount of a raw material solution mist with good responsiveness. means of solving the problem
[0056] The ultrasonic misting device of the present disclosure comprises: a container for a raw material solution having an internal space for receiving a raw material solution and having a pipe for mist output provided on its upper surface; an ultrasonic vibrator provided below the container for the raw material solution; a non-contact mist supply pipe disposed above the container for the raw material solution without contacting the container for the raw material solution including the pipe for mist output; and a weighing device that supports the container for the raw material solution from below and measures the weight of a measurement target including the container for the raw material solution, the ultrasonic vibrator, and the raw material solution; wherein the raw material solution is misted by an ultrasonic vibration operation by the ultrasonic vibrator to generate a raw material solution mist within the internal space; wherein the non-contact mist supply pipe has a duplicate pipe section and a non-duplicate pipe section other than the duplicate pipe section; wherein the duplicate pipe section has a pipe duplicate area along the mist output direction between the duplicate pipe section and the upper region of the mist output pipe, and a pipe duplicate space is provided between the duplicate pipe section and the upper region; and wherein the raw material solution mist is formed by the mist output pipe and the non-contact mist supply pipe It flows through the interior of the pipe along the mist output direction and is output from the non-contact mist supply pipe. Effects of the invention
[0057] In the ultrasonic atomization device of the present disclosure, since the non-contact mist supply pipe does not have a contact relationship with a container for a raw material solution including a mist output pipe, the non-contact mist supply pipe can be relatively easily excluded from the object to be measured by the weighing device.
[0058] Meanwhile, the object being measured by the weighing instrument contains the raw material solution within the container for the raw material solution, and the weight of the object excluding the raw material solution is a constant value. Therefore, the amount of raw material solution consumed can be determined with high precision from the change in the weight of the object being measured. Furthermore, there is no delay between the amount of raw material solution consumed and the amount of raw material solution mist generated.
[0059] As a result, the ultrasonic misting device of the present disclosure can determine the amount of raw material solution consumed from the change in weight of the object to be measured during the execution period of the ultrasonic vibration operation, and can determine the amount of raw material solution mist supplied with good responsiveness and accuracy based on the amount of raw material solution consumed.
[0060] In addition, a pipe overlap space is provided between the overlap section of the non-contact mist supply pipe and the upper region of the mist output pipe. Because of this, the ultrasonic atomizing device of the present disclosure can suppress the phenomenon of mist leakage in which the raw material solution mist leaks out of the non-contact mist supply pipe through the pipe overlap space.
[0061] The purpose, features, aspects, and advantages of the present disclosure will become more apparent from the following detailed description and the accompanying drawings. Brief explanation of the drawing
[0062] FIG. 1 is an explanatory diagram schematically showing the configuration of an ultrasonic atomizing device, which is Embodiment 1 of the present disclosure. Figure 2 is an explanatory diagram schematically showing the cross-sectional structure of the leak-prevention gas supply pipe shown in Figure 1. FIG. 3 is an explanatory diagram schematically showing the upper surface structure of the first configuration example of the leak-prevention gas supply pipe shown in FIG. 1. FIG. 4 is an explanatory diagram schematically showing the upper surface structure of the second configuration example of the leak-prevention gas supply pipe shown in FIG. 1. Figure 5 is an explanatory diagram schematically showing a mist supply system including the non-contact mist supply piping shown in Figure 1. FIG. 6 is an explanatory diagram schematically showing the configuration of the flow rate control system of the raw material solution in the ultrasonic atomizing device of Embodiment 1. FIG. 7 is an explanatory diagram schematically showing the configuration of an ultrasonic atomizing device, which is Embodiment 2 of the present disclosure. FIG. 8 is an explanatory diagram schematically showing an ultrasonic atomizing device, which is a first configuration example of a conventional device. FIG. 9 is an explanatory diagram schematically showing an ultrasonic atomizing device, which is a second configuration example of a conventional device. Specific details for implementing the invention
[0063] <Embodiment 1>
[0064] FIG. 1 is an explanatory diagram schematically showing the configuration of an ultrasonic atomizing device (101) of Embodiment 1 of the present disclosure. An XYZ orthogonal coordinate system is shown in FIG. 1. Hereinafter, with reference to FIG. 1, the configuration of the ultrasonic atomizing device (101) of Embodiment 1 will be explained.
[0065] In an ultrasonic atomizing device (101), a container for a raw material solution is formed by a misting container (1) and a separator cup (12). The bottom surface of the container for the raw material solution becomes the separator cup (12). In this way, a raw material solution (15) is contained within the internal space (1H) of the container for the raw material solution, which is composed of the misting container (1) and the separator cup (12).
[0066] A pipe (1t) for mist output is provided above the separator cup (12) in communication with the upper surface of the misting container (1). That is, the misting container (1) has a pipe (1t) for mist output on its upper surface.
[0067] The ultrasonic atomizing device (101) further has a tank (10) that contains ultrasonic transmission water (9) which serves as an ultrasonic transmission medium. The tank (10) and the separator cup (12) are positioned so that the bottom surface of the separator cup (12) is immersed in the ultrasonic transmission water (9). By inserting the end of the separator cup (12) between the atomizing container (1) and the tank (10), the atomizing container (1), the tank (10), and the separator cup (12) are integrally formed.
[0068] A plurality of ultrasonic transducers (2) are provided on the bottom surface of the water tank (10) below the separator cup (12). In FIG. 1, two ultrasonic transducers (2) are shown. Each of the plurality of ultrasonic transducers (2) has an ultrasonic vibrating plate (2T), and each ultrasonic transducer (2) performs an ultrasonic vibration operation that generates ultrasonic waves of a size that matches the planar shape of the ultrasonic vibrating plate (2T) from the ultrasonic vibrating plate (2T).
[0069] A gas supply pipe (4) is provided on the upper side of the atomizing container (1), and a transport gas (G4) is supplied from the gas supply pipe (4), which is a supply pipe for transport gas, to the internal space (1H) inside the atomizing container (1). A gas control device not shown is installed in the gas supply pipe (4), and the transport gas flow rate LC, which is the flow rate of the transport gas (G4) supplied to the atomizing container (1), is controlled by the gas control device.
[0070] A gas supply pipe (3) is provided on the side of a pipe (1t) for mist output, and a dilution gas (G3) is supplied from the gas supply pipe (3), which is a supply pipe for dilution gas. A gas control device not shown is installed in the gas supply pipe (3), and the dilution gas flow rate LD1, which is the flow rate of the dilution gas (G3) supplied into the pipe (1t) for mist output, is controlled by the gas control device.
[0071] A non-contact mist supply pipe (20) is disposed above the misting container (1) without contacting the misting container (1) which includes a mist output pipe (1t). The non-contact mist supply pipe (20) has a downstream pipe section (21), a tapered pipe section (22), and a connecting pipe section (23).
[0072] The connecting pipe section (23) is arranged to surround the upper region A1t of the mist output pipe (1t). Accordingly, there is a pipe overlap area R12 along the mist output direction DM between the connecting pipe section (23) and the upper region A1t of the mist output pipe (1t), and a pipe overlap space (SP12) is provided between the connecting pipe section (23) and the upper region A1t. In this way, the connecting pipe section (23) becomes a pipe overlap section with the upper region A1t.
[0073] Meanwhile, the tapered piping section (22) and the downstream piping section (21) do not have a pipe overlapping area R12 along the mist output direction DM between them and the upper area A1t. That is, the tapered piping section (22) and the downstream piping section (21) become non-overlapping piping sections other than the overlapping piping sections.
[0074] The connecting pipe section (23) is a pipe section formed by extending in the Z direction in a drawing with a constant inner diameter, the tapered pipe section (22) is a pipe section where the inner diameter narrows along the +Z direction in a drawing, and the downstream pipe section (21) is a pipe section formed by extending in the Z direction in a drawing with a constant inner diameter. The inner diameter of the upper end of the tapered pipe section (22) matches the inner diameter of the downstream pipe section (21), and the inner diameter of the lower end of the tapered pipe section (22) matches the inner diameter of the connecting pipe section (23).
[0075] In this way, the non-contact mist supply pipe (20) has a connecting pipe section (23), a tapered pipe section (22), and a downstream pipe section (21) that are continuously provided along the +Z direction. Additionally, the downstream pipe section (21) is located above the mist output pipe (1t) and is provided on an extension line in the +Z direction relative to the mist output pipe (1t).
[0076] Since the inner diameter of the connecting pipe section (23) is sufficiently longer than the inner diameter of the mist output pipe (1t), the connecting pipe section (23) does not come into contact with the upper region A1t of the mist output pipe (1t), and a pipe overlap space (SP12) is provided between the connecting pipe section (23) and the upper region A1t. Meanwhile, a pipe overlap space (SP12) is not provided between the non-overlapping pipe section, the tapered pipe section (22) and the downstream pipe section (21), and the mist output pipe (1t).
[0077] A leak-prevention gas supply pipe (25) is provided within the pipe overlapping space (SP12) without contacting the mist output pipe (1t) and the non-contact mist supply pipe (20), respectively.
[0078] FIG. 2 is an explanatory diagram schematically showing the cross-sectional structure of a leak-prevention gas supply pipe (25) and its surroundings. FIG. 2 shows an XYZ orthogonal coordinate system. The leak-prevention gas supply pipe (25) has a toroidal structure having a leak-prevention gas flow path inside, and has a circular flow path cross-sectional area (25d) in the XZ cross-section of the leak-prevention gas flow path.
[0079] As shown in FIG. 2, the leak-proof gas supply pipe (25) includes a supply pipe main body (25m) and a gas outlet (28) as main components, and the gas outlet (28) is provided on the upper part of the supply pipe main body (25m).
[0080] As shown in FIG. 2, a gas (G2) for preventing mist leakage is supplied from a leak-prevention gas control device (55) through an external pipe (56) to the leak-prevention gas flow path of a leak-prevention gas supply pipe (25). The external pipe (56) is connected to the lower part of the leak-prevention gas supply pipe (25) without contacting, for example, the mist output pipe (1t) and the non-contact mist supply pipe (20). Additionally, an opening is provided at the lower part of the leak-prevention gas supply pipe (25) connected to the external pipe (56) through which the gas (G2) for preventing mist leakage can flow.
[0081] In the leak-prevention gas supply pipe (25) of this structure, the mist leak-prevention gas (G2) flowing through the leak-prevention gas distribution path is discharged from the gas output port (28) in the +Z direction.
[0082] Additionally, the leak-prevention gas supply pipe (25) can be stably supported from below by a support member not shown, etc., without contacting the mist output pipe (1t), the non-contact mist supply pipe (20), and the external pipe (56), respectively.
[0083] FIG. 3 is an explanatory diagram schematically showing the upper surface structure of a leak-prevention gas supply pipe (25A), which is a first configuration example of a leak-prevention gas supply pipe (25). An XYZ orthogonal coordinate system is shown in FIG. 3.
[0084] As shown in the drawing, a leak-proof gas supply pipe (25A) is arranged within a pipe overlapping space (SP12), and the leak-proof gas supply pipe (25A) has a supply pipe main body (25m) and a plurality of partial gas outlets (28A) as main components.
[0085] Multiple partial gas outlets (28A) are arranged at equal intervals on the upper part of the supply pipe body (25m). That is, the leak-prevention gas supply pipe (25A) has multiple partial gas outlets (28A) as gas outlets (28).
[0086] The leak-prevention gas supply pipe (25A) introduces a mist leak prevention gas (G2) into the leak-prevention gas distribution path through an external pipe (56) from a leak-prevention gas control device (55), and while circulating it within the leak-prevention gas distribution path, it outputs the mist leak prevention gas (G2) in the +Z direction from a plurality of partial gas output ports (28A) provided at the top of the supply pipe main body (25m). That is, the plurality of partial gas output ports (28A) are connected to the leak-prevention gas distribution path.
[0087] FIG. 4 is an explanatory diagram schematically showing the upper surface structure of a leak-prevention gas supply pipe (25B), which is a second configuration example of a leak-prevention gas supply pipe (25). An XYZ orthogonal coordinate system is indicated in FIG. 4.
[0088] As shown in the drawing, a leak-proof gas supply pipe (25B) is arranged within a pipe overlapping space (SP12), and the leak-proof gas supply pipe (25B) has a supply pipe body (25m) and a single gas outlet (28B) as its main components. The slit-shaped single gas outlet (28B) has a circular structure. That is, the leak-proof gas supply pipe (25B) has a single gas outlet (28B) as a gas outlet (28).
[0089] The leak-prevention gas supply pipe (25B), like the leak-prevention gas supply pipe (25A), introduces a mist leak-prevention gas (G2) into the leak-prevention gas distribution path through an external pipe (56) from a leak-prevention gas control device (55), and while circulating it within the leak-prevention gas distribution path, outputs the mist leak-prevention gas (G2) in the +Z direction from a single gas output port (28B) provided at the top of the supply pipe main body (25m). That is, the single gas output port (28B) is connected to the leak-prevention gas distribution path.
[0090] FIG. 5 is an explanatory diagram schematically illustrating a mist supply system including a non-contact mist supply pipe (20). As shown in FIG., the pipe outlet (20X) of the non-contact mist supply pipe (20) is connected to one end of the mist supply pipe (5). A nozzle (17), which is a mist spraying part, is connected to the other end of the mist supply pipe (5).
[0091] A substrate (18) to be used as a substrate is placed below the nozzle (17). The substrate (18) is loaded, for example, onto a loading platform not shown. The raw material solution mist (MT) supplied to the nozzle (17), which is a mist injection unit, is ejected onto the surface of the substrate (18) through an opening not shown provided on the bottom surface of the nozzle (17), thereby forming a thin film on the surface of the heated substrate (18). The opening of the nozzle (17) is provided, for example, in the shape of a slit.
[0092] Although the illustration is omitted in FIG. 1, the ultrasonic atomizing device (101) of Embodiment 1 has a raw material tank (35) provided independently of a container for a raw material solution, which includes a misting container (1) and a separator cup (12), just like the ultrasonic atomizing device (300) shown in FIG. 8. As shown in FIG. 8, the raw material tank (35) contains a raw material solution (15) to be supplied to the container for the raw material solution. In addition, the ultrasonic atomizing device (101) has a raw material solution supply pipe (31) and a raw material solution supply mechanism (8), just like the ultrasonic atomizing device (300) shown in FIG. 8. However, a scale (51) for measuring the weight of the object to be measured, including the raw material tank (35), is not provided.
[0093] The ultrasonic atomizing device (101) of Embodiment 1 has a container for raw material solution (atomizing container (1) + separator cup (12)), a water tank (10), a plurality of ultrasonic vibrators (2), a raw material solution (15) in the container for raw material solution, and an ultrasonic transmission water (9) in the water tank (10) as objects to be measured, and a scale (50) to measure weight. The scale (50), which is a weight measuring device, measures the weight of the object to be measured as the measured weight.
[0094] In the ultrasonic atomizing device (101) of Embodiment 1, for example, a plurality of support points are provided for the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31), and the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31) are each supported stably by the plurality of support points. As a result, the gas supply pipe (3), the gas supply pipe (4), and the raw material solution supply pipe (31) can be excluded from the measurement targets of the scale (50).
[0095] In addition, the scale (50), which is a weight measuring device, supports the tank (10) from the bottom surface of the tank (10) by means of a support member (53) without contacting the plurality of ultrasonic vibrators (2), and measures the weight of the object to be measured, which includes a container for raw material solution (foaming container (1) + separator cup (12)), a plurality of ultrasonic vibrators (2), the tank (10), the raw material solution (15), and the ultrasonic transmission water (9). In this way, the scale (50) supports the container for raw material solution from below and measures the weight of the object to be measured.
[0096] In the ultrasonic atomizing device (101), the non-contact mist supply pipe (20) and the mist supply system shown in FIG. 5 do not have a contact relationship with the atomizing container (1) including the mist output pipe (1t), so they can be reliably excluded from the measurement target of the scale (50). In addition, the leak-prevention gas supply pipe (25) also does not have a contact relationship with the atomizing container (1), so it can be reliably excluded from the measurement target of the scale (50).
[0097] The ultrasonic atomizing device (101) of embodiment 1 can determine the amount of raw material solution (15) consumed in a container for raw material solution based on the measured weight measured by the scale (50).
[0098] That is, if the measured weight of the object to be measured at time t1 is denoted as the measured weight P1, and the measured weight of the object to be measured at time t2 after time t1 is denoted as the measured weight P2, then the ultrasonic atomizing device (101) of Embodiment 1 can calculate the consumption amount of the raw material solution (15) in the container for the raw material solution from the weight reduction amount ΔP12 (=P1-P2).
[0099] Accordingly, the ultrasonic atomizing device (101) of embodiment 1, like the ultrasonic atomizing device (301) shown in FIG. 9, can obtain the amount of mist supplied by the raw material solution mist (MT) from the amount of raw material solution (15) consumed based on the change in weight of the measured weight of the object to be measured by the scale (50).
[0100] FIG. 6 is an explanatory diagram schematically showing the configuration of a flow rate control system for a raw material solution (15) in an ultrasonic atomizing device (101) of Embodiment 1. As shown in FIG. 6, the flow rate control system has a scale (50), a raw material solution supply mechanism (8), and a flow rate control unit (60) as its main components. The raw material solution supply mechanism (8) includes a suction pump (32) and a flow meter (33).
[0101] The flow meter (33) measures the flow rate flowing through the raw material solution supply pipe (31) and obtains flow rate information S33 indicating the measured flow rate. The scale (50) measures the weight of the object to be measured and outputs measured weight information S50 indicating the weight.
[0102] The flow rate control unit (60) receives flow rate information S33 from the flow meter (33) and measured weight information S50 from the scale (50). Accordingly, the flow rate control unit (60) always recognizes the flow rate flowing through the raw material solution supply pipe (31) based on the measured flow rate indicated by the flow rate information S33.
[0103] The flow rate control unit (60) can always determine the consumption amount of the raw material solution (15) in the container for the raw material solution from the weight change of the measured weight indicated by the measured weight information S50. In addition, when the raw material solution (15) is supplied from the raw material tank (35) to the internal space (1H) of the container for the raw material solution, the flow rate control unit (60) can determine the supply amount of the raw material solution (15) from the measured flow rate indicated by the flow rate information S33, and accurately determine the consumption amount of the raw material solution (15) by adding the supply amount of the raw material solution (15).
[0104] Accordingly, the flow rate control unit (60) can execute a raw material supply control process that outputs a control signal SC32 indicating the driving amount of the suction pump (32) to replenish the consumption amount of the raw material solution (15) in the internal space (1H) based on the flow rate information S33 and the measured weight information S50.
[0105] In this way, the flow rate control unit (60) performs a raw material supply control process for controlling the raw material solution supply operation of supplying the raw material solution (15) to a container for the raw material solution, with respect to the raw material solution supply mechanism (8) including the suction pump (32) and the flow meter (33).
[0106] When the raw material solution supply operation by the raw material solution supply mechanism (8) is executed, the raw material solution (15) is supplied into the internal space (1H).
[0107] In the ultrasonic atomizing device (101) of the embodiment 1 of such configuration, when an ultrasonic vibration operation is executed in which ultrasonic vibration is applied from a plurality of ultrasonic vibrators (2), each having an ultrasonic vibrating plate (2T), the vibration energy of the ultrasonic waves from the plurality of ultrasonic vibrators (2) is transmitted to the raw material solution (15) in the container for the raw material solution through the ultrasonic transmission water (9) and the separator cup (12).
[0108] Then, as shown in FIG. 1, a liquid column (6) is formed from the liquid surface (15A), and the raw material solution (15) is transferred into liquid particles and mist, and a raw material solution mist (MT) is obtained within the internal space (1H) of the atomizing container (1). In this way, by performing an ultrasonic vibration operation that applies ultrasound from the ultrasonic vibrator (2), the raw material solution (15) can be atomized to produce a raw material solution mist (MT).
[0109] When the ultrasonic vibration operation is executed, the raw material solution mist (MT) generated within the internal space (1H) of the misting container (1) flows along the mist output direction DM inside the mist output pipe (1t) by means of a transport gas (G4) and a dilution gas (G3). Even after being discharged from the pipe outlet (1X) of the mist output pipe (1t), the raw material solution mist (MT) flows along the mist output direction DM inside the non-contact mist supply pipe (20) by means of a transport gas (G4), a dilution gas (G3), and a mist leakage prevention gas (G2). Afterward, the raw material solution mist (MT) is supplied from the non-contact mist supply pipe (20) to a mist supply system including a mist supply pipe (5) and a nozzle (17).
[0110] The gas system connected to the ultrasonic misting device (101) of Embodiment 1 consists of three systems: a transport gas (G4), a dilution gas (G3), and a mist leakage prevention gas (G2). The dilution gas (G3) is a gas for maintaining a constant amount of gas in the raw material solution mist (MT) ejected from a mist injection part such as a nozzle. The mist leakage prevention gas (G2) is a gas for avoiding the phenomenon of mist leakage in which the raw material solution mist (MT) leaks to the outside through the pipe overlapping space (SP12). In addition, the mist leakage prevention gas (G2) also has an auxiliary function of maintaining a constant amount of gas in the raw material solution mist (MT), similar to the dilution gas (G3).
[0111] The raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) by ultrasonic vibration operation flows through the mist output pipe (1t), non-contact mist supply pipe (20), and mist supply pipe (5) outside the atomizing container (1) by means of a dilution gas (G3), a transport gas (G4), and a mist leakage prevention gas (G2), and is supplied to the nozzle (17) (mist injection part). At this time, the raw material solution mist (MT) flows through the interior of the mist output pipe (1t) and the non-contact mist supply pipe (20) along the mist output direction DM (+Z direction).
[0112] When the amount of raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) is maintained at a constant amount, the amount of mist of the raw material solution mist (MT) supplied from the atomizing container (1) to the mist spraying unit can be increased or decreased by the transport gas flow rate LC of the transport gas (G4).
[0113] Meanwhile, as described above, for the deposition of a thin film using a raw material solution mist (MT), in addition to a stable amount of mist, it is necessary to maintain a constant total gas flow rate LT of the raw material solution mist (MT) supplied to the mist injection unit. By keeping the total gas flow rate LT constant, the ejection speed of the raw material solution mist (MT) ejected from the mist injection unit can be kept constant.
[0114] The raw material solution mist (MT) generated within the internal space (1H) by the ultrasonic vibration operation of a plurality of ultrasonic vibrators (2) is supplied to the outside of the misting container (1) by a transport gas (G4), a dilution gas (G3), and a gas (G2) for preventing mist leakage. As the raw material solution mist (MT) is transported to the outside, the amount of raw material solution (15) inside the raw material solution container decreases. As described above, in order to stabilize the amount of mist generated by the raw material solution mist (MT), it is necessary to maintain the amount of raw material solution (15) inside the raw material solution container at a constant level.
[0115] In order to control the mist supply amount of the raw material solution mist (MT), when the carrier gas flow rate LC of the carrier gas (G4) is increased or decreased, the total gas flow rate LT of the raw material solution mist (MT) is also increased or decreased accordingly.
[0116] Accordingly, in order to maintain a constant total gas flow rate LT, as shown in FIG. 1, a gas supply pipe (3) is provided in a mist output pipe (1t) near a misting container (1), and a dilution gas (G3) in a separate system from the transport gas (G4) is supplied from the gas supply pipe (3), which is a dilution gas supply pipe. Here, the gas flow rate of the dilution gas (G3) is called the dilution gas flow rate LD1, the gas flow rate of the mist leakage prevention gas (G2) is called the leakage prevention gas flow rate LD2, and the gas flow rate of the transport gas (G4) is called the transport gas flow rate LC. In this case, the relationship between the transport gas flow rate LC, the dilution gas flow rate LD1, the leakage prevention gas flow rate LD2, and the total gas flow rate LT is determined by the following equation (2).
[0117] LT=LC+LD1+LD2… (2)
[0118] In addition, the transport gas flow rate LC, dilution gas flow rate LD1, leak prevention gas flow rate LD2, and total gas flow rate LT represent the volume per unit time and are expressed in units such as “l (liter) / min”.
[0119] The total dilution gas flow rate LD is the sum of the dilution gas flow rate LD1 and the leak prevention gas flow rate LD2. For example, if the carrier gas flow rate LC is reduced by ΔLC to reduce the mist supply amount of the raw material solution mist (MT), the total gas flow rate LT can be maintained constant by increasing the dilution gas flow rate LD1 by ΔLC. At this time, the leak prevention gas flow rate LD2 is fixed at a constant value. Therefore, control of increasing or decreasing the leak prevention gas flow rate LD2 is not particularly necessary.
[0120] In this way, the ultrasonic atomizing device (101) of embodiment 1 can use a dilution gas (G3) to maintain the total gas flow rate LT constant regardless of changes in the transport gas flow rate LC.
[0121] In the ultrasonic misting device (101) of Embodiment 1, the non-contact mist supply pipe (20) does not have a contact relationship with the misting container (1) including the mist output pipe (1t), so the non-contact mist supply pipe (20) can be relatively easily excluded from the measurement target of the scale (50), which is a weight measuring device.
[0122] Meanwhile, the object to be measured by the scale (50), which is a weight measuring device, contains the raw material solution (15) in the container for the raw material solution, and the weight of the object to be measured excluding the raw material solution (15) is a constant value.
[0123] Specifically, the total weight of the misting container (1), separator cup (12), water tank (10), multiple ultrasonic transducers (2), and ultrasonic transmission water (9) is a constant value. Additionally, the weight of the ultrasonic transmission water (9) is not increased or decreased by the ultrasonic vibration operation.
[0124] For this reason, the ultrasonic misting device (101) of Embodiment 1 can determine the amount of raw material solution (15) consumed in the container for the raw material solution with high precision from the change in weight of the object to be measured. At this time, there is no delay between the amount of raw material solution (15) consumed and the amount of raw material solution mist (MT) generated.
[0125] As a result, the ultrasonic misting device (101) of embodiment 1 can determine the amount of raw material solution (15) consumed from the change in weight of the object to be measured during the execution period of the ultrasonic vibration operation by a plurality of ultrasonic vibrators (2), and can determine the amount of raw material solution mist (MT) supplied with good responsiveness and accuracy based on the amount of raw material solution (15) consumed.
[0126] Here, it is assumed that the raw material solution (15) is supplied from the raw material tank (35) into the internal space (1H) of the container for the raw material solution by the raw material solution supply operation of the raw material solution supply mechanism (8).
[0127] In this case, the flow control unit (60) can determine the supply amount of raw material solution (15) supplied from the raw material tank (35) to the internal space (1H) based on the flow information S33 received from the flow meter (33) of the raw material solution supply mechanism (8), and appropriately subtract the supply amount of raw material solution (15) from the weight change of the object to be measured.
[0128] Additionally, a pipe overlap space (SP12) is provided between the connecting pipe section (23), which is an overlap pipe section, and the upper region A1t of the mist output pipe (1t). Because of this, the ultrasonic misting device (101) of Embodiment 1 can suppress the phenomenon of mist leakage where the raw material solution mist (MT) flows through the pipe overlap space (SP12) in the -Z direction (opposite direction to the mist output direction DM) and leaks out of the non-contact mist supply pipe (20) through the pipe overlap space (SP12).
[0129] In addition, the ultrasonic misting device (101) of embodiment 1 can reliably avoid the mist leakage phenomenon by discharging a mist leakage prevention gas (G2) from the gas output port (28) of the leakage prevention gas supply pipe (25) along the mist output direction DM.
[0130] In addition, in the ultrasonic misting device (101) of Embodiment 1, even if a configuration is adopted in which a leak-prevention gas supply pipe (25) is not provided within the pipe overlapping space (SP12), the presence of the pipe overlapping space (SP12) can produce a suppression effect against mist leakage.
[0131] The ultrasonic atomizing device (101) of Embodiment 1 is equipped with a gas supply pipe (4) which is a supply pipe for transport gas and a gas supply pipe (3) which is a supply pipe for dilution gas. Accordingly, when the transport gas flow rate LC of the transport gas (G4) increases or decreases, the total dilution gas flow rate LD is increased or decreased to compensate for the increase or decrease in the transport gas flow rate LC, thereby allowing the total gas flow rate LT of the raw material solution mist (MT) to always be maintained constant. In Embodiment 1, the total flow rate (LD1+LD2) of the dilution gas flow rate LD1 and the leak prevention gas flow rate LD2 becomes the total dilution gas flow rate LD.
[0132] In addition, the ultrasonic misting device (101) of embodiment 1 exhibits the following effects when a leak-prevention gas supply pipe (25A) is adopted as a leak-prevention gas supply pipe (25).
[0133] The ultrasonic atomizing device (101) of Embodiment 1 outputs a plurality of partial leak-prevention gases distributed from a plurality of partial gas output ports (28A) provided at the top of a leak-prevention gas supply pipe (25A) of a toroidal structure. At this time, the aggregate of the plurality of partial leak-prevention gases becomes a mist leak-prevention gas (G2). Accordingly, the ultrasonic atomizing device (101) of Embodiment 1 can output the mist leak-prevention gas (G2) without bias along the mist output direction DM from the leak-prevention gas supply pipe (25A) of a toroidal structure.
[0134] In addition, the ultrasonic misting device (101) of embodiment 1 exhibits the following effects when a leak-prevention gas supply pipe (25B) is adopted as a leak-prevention gas supply pipe (25).
[0135] By outputting a gas (G2) for preventing mist leakage from a single gas outlet (28B) of a circular shape, the ultrasonic atomizing device (101) of embodiment 1 can output the gas (G2) for preventing mist leakage along the mist output direction DM without causing deviation within the single gas outlet (28B).
[0136] In addition, the ultrasonic atomizing device (101) of Embodiment 1 adopts a double chamber method including a water tank (10) and a container for a raw material solution (atomizing container (1) + separator cup (12)), and the object to be measured by the scale (50) further includes a separator cup (12), a water tank (10), and an ultrasonic transmission water (9) (ultrasonic transmission medium). Accordingly, in the ultrasonic atomizing device (101) adopting a double chamber method, the amount of mist supplied by the raw material solution mist (MT) can be determined more accurately and with better responsiveness.
[0137] <Embodiment 2>
[0138] FIG. 7 is an explanatory diagram schematically showing the configuration of an ultrasonic atomizing device (102) of Embodiment 2 of the present disclosure. An XYZ orthogonal coordinate system is shown in FIG. 7. Hereinafter, the configuration of the ultrasonic atomizing device (102) of Embodiment 2 will be explained with reference to FIG. 7. In addition, parts identical to the ultrasonic atomizing device (101) of Embodiment 1 shown in FIG. 1 are given the same reference numerals and descriptions are appropriately omitted.
[0139] A supply pipe for diluting gas is not provided on the side of the mist output pipe (1t) provided on the upper surface of the misting container (1) of the ultrasonic misting device (102) of embodiment 2.
[0140] Meanwhile, in the ultrasonic atomizing device (102) of embodiment 2, just like the ultrasonic atomizing device (101) of embodiment 1, a leak-preventing gas supply pipe (25) is provided in the pipe overlapping space (SP12).
[0141] In addition, in embodiment 2 as in embodiment 1, a mist leak prevention gas (G2) is supplied from a leak prevention gas control device (55) through an external pipe (56) to the leak prevention gas distribution path of the leak prevention gas supply pipe (25).
[0142] In addition, the ultrasonic misting device (102) of embodiment 2 also has a mist supply system as shown in FIG. 5, just like embodiment 1.
[0143] Although the illustration is omitted in FIG. 7, the ultrasonic atomizing device (102) of Embodiment 2, like the ultrasonic atomizing device (300) shown in FIG. 8, has a raw material tank (35) provided independently of the container for the raw material solution, which includes a atomizing container (1) and a separator cup (12). Additionally, the ultrasonic atomizing device (102) of Embodiment 2, like Embodiment 1, has a raw material solution supply pipe (31) and a raw material solution supply mechanism (8), but a scale (51) for measuring the weight of the object to be measured, including the raw material tank (35), is not provided.
[0144] The ultrasonic atomizing device (102) of Embodiment 2, like Embodiment 1, has a container for raw material solution (atomizing container (1) + separator cup (12)), a water tank (10), a plurality of ultrasonic vibrators (2), a raw material solution (15) in the container for raw material solution, and an ultrasonic transmission water (9) in the water tank (10) as objects to be measured, and a scale (50) to measure weight. The scale (50), which is a weight measuring device, measures the weight of the object to be measured as the measured weight.
[0145] In addition, the ultrasonic atomizing device (102) of embodiment 2, like embodiment 1, has the gas supply pipe (4) and the raw material solution supply pipe (31) excluded from the measurement target of the scale (50).
[0146] Additionally, the scale (50), which is a weight measuring device, does not come into contact with the plurality of ultrasonic vibrators (2) and supports the tank (10) from the bottom surface of the tank (10) by means of a support member (53), and also measures the weight of a measurement target including a container for raw material solution (foaming container (1) + separator cup (12)), a plurality of ultrasonic vibrators (2), a tank (10), a raw material solution (15), and ultrasonic transmission water (9).
[0147] Meanwhile, the non-contact mist supply pipe (20) and the mist supply system shown in FIG. 5 do not have a contact relationship with the misting container (1) having a mist output pipe (1t) on its upper surface, so they can be reliably excluded from the measurement target of the scale (50). In addition, the leak-prevention gas supply pipe (25) also does not have a contact relationship with the misting container (1), so it can be reliably excluded from the measurement target of the scale (50).
[0148] In the ultrasonic atomizing device (102) of embodiment 2, just like in embodiment 1, the amount of raw material solution (15) consumed in the container for the raw material solution can be determined from the change in weight of the measured weight of the object to be measured by the scale (50).
[0149] In addition, in the ultrasonic atomizing device (102) of embodiment 2, just like in embodiment 1, a raw material supply control process is performed to control the raw material solution supply operation of supplying the raw material solution (15) to the raw material solution container under the control of the flow rate control unit (60) for the raw material solution supply mechanism (8).
[0150] In the ultrasonic atomizing device (102) of embodiment 2 of such configuration, when an ultrasonic vibration operation is executed in which ultrasonic vibrations are applied from a plurality of ultrasonic vibrators (2), the vibration energy of the ultrasonic waves from the plurality of ultrasonic vibrators (2) is transmitted to the raw material solution (15) in the container for the raw material solution through the ultrasonic transmission water (9) and the separator cup (12).
[0151] Then, as shown in FIG. 7, a liquid column (6) is formed from the liquid surface (15A), and the raw material solution (15) is transferred into liquid particles and mist, and a raw material solution mist (MT) is obtained within the internal space (1H) of the atomizing container (1). In this way, by performing an ultrasonic vibration operation that applies ultrasound from the ultrasonic vibrator (2), the raw material solution (15) is atomized to produce a raw material solution mist (MT).
[0152] When the ultrasonic vibration operation is executed, the raw material solution mist (MT) generated within the internal space (1H) of the misting container (1) flows through the interior of the mist output pipe (1t) along the mist output direction DM by the transport gas (G4). Even after being discharged from the pipe outlet (1X) of the mist output pipe (1t), the raw material solution mist (MT) flows through the interior of the non-contact mist supply pipe (20) along the mist output direction DM by the transport gas (G4) and the mist leakage prevention gas (G2). Afterward, the raw material solution mist (MT) is supplied from the pipe outlet (20X) of the non-contact mist supply pipe (20) to a mist supply system including the mist supply pipe (5) and the nozzle (17).
[0153] The gas system connected to the ultrasonic atomizing device (102) of Embodiment 2 consists of two systems: a transport gas (G4) and a mist leakage prevention gas (G2). The mist leakage prevention gas (G2) is a gas intended to prevent mist leakage, in which the raw material solution mist (MT) leaks to the outside through the pipe overlapping space (SP12). Additionally, in the ultrasonic atomizing device (102) of Embodiment 2, the mist leakage prevention gas (G2) also functions as the sole diluting gas that keeps the total amount of raw material solution mist (MT) constant.
[0154] Accordingly, in the ultrasonic atomizing device (102) of embodiment 2, the leak-prevention gas control device (55) needs to have a function to increase or decrease the leak-prevention gas flow rate LD2.
[0155] The raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) by ultrasonic vibration operation flows through the mist output pipe (1t), non-contact mist supply pipe (20), and mist supply pipe (5) outside the atomizing container (1) by means of a transport gas (G4) and a mist leakage prevention gas (G2), and is supplied to the nozzle (17) (mist injection part). At this time, the raw material solution mist (MT) flows through the interior of the mist output pipe (1t) and the non-contact mist supply pipe (20) along the mist output direction DM (+Z direction).
[0156] When the amount of raw material solution mist (MT) generated within the internal space (1H) of the atomizing container (1) is maintained at a constant amount, the amount of mist of the raw material solution mist (MT) supplied from the atomizing container (1) can be increased or decreased by the transport gas flow rate LC of the transport gas (G4).
[0157] As mentioned above, for the deposition of a thin film using a raw material solution mist (MT), in addition to a stable amount of mist, it is necessary to maintain a constant total gas flow rate LT of the raw material solution mist (MT).
[0158] The raw material solution mist (MT) generated within the internal space (1H) by the ultrasonic vibration operation of multiple ultrasonic vibrators (2) is supplied to the outside of the misting container (1) by a transport gas (G4). As the raw material solution mist (MT) is transported to the outside, the amount of raw material solution (15) in the container for raw material solution decreases. As described above, in order to stabilize the amount of mist generated, it is necessary to maintain the amount of raw material solution (15) in the container for raw material solution at a constant level.
[0159] In order to control the mist supply amount of the raw material solution mist (MT), if the carrier gas flow rate LC of the carrier gas (G4) is increased or decreased, the total gas flow rate LT increases or decreases accordingly.
[0160] Accordingly, in order to maintain the total gas flow rate LT constant, in Embodiment 2, the mist leakage prevention gas (G2) output from the leakage prevention gas supply pipe (25) is used as the sole diluent gas. Here, the gas flow rate of the mist leakage prevention gas (G2) is denoted as the leakage prevention gas flow rate LD2, and the gas flow rate of the transport gas (G4) is denoted as the transport gas flow rate LC. In this case, the relationship between the transport gas flow rate LC, the leakage prevention gas flow rate LD2, and the total gas flow rate LT is determined by the following equation (3).
[0161] LT=LC+LD2… (3)
[0162] In addition, the transport gas flow rate LC, the leak prevention gas flow rate LD2, and the total gas flow rate LT represent the volume per unit time and are expressed in units such as “l (liter) / min”, and in Equation (3), the leak prevention gas flow rate LD2 becomes the total dilution gas flow rate LD.
[0163] For example, in order to reduce the mist supply amount of the raw material solution mist (MT), if the transport gas flow rate LC is reduced by ΔLC, the total gas flow rate LT can be maintained constant by increasing the leak prevention gas flow rate LD2 by ΔLC.
[0164] In this way, the ultrasonic atomizing device (102) of embodiment 2 can maintain the total gas flow rate LT constant regardless of changes in the transport gas flow rate LC by using a mist leakage prevention gas (G2) as the only diluting gas.
[0165] In the ultrasonic misting device (102) of embodiment 2, the non-contact mist supply pipe (20) does not have a contact relationship with the misting container (1) having the mist output pipe (1t), so the non-contact mist supply pipe (20) can be removed relatively easily from the object being measured by the scale (50), which is a weight measuring device.
[0166] Meanwhile, the object to be measured by the scale (50), which is a weight measuring device, contains the raw material solution (15) in the container for the raw material solution, and the weight of the object to be measured excluding the raw material solution (15) is a constant value.
[0167] As a result, the ultrasonic misting device (102) of embodiment 2, like embodiment 1, can determine the amount of raw material solution (15) consumed from the weight change of the object to be measured during the execution period of the ultrasonic vibration operation, and can determine the amount of raw material solution mist (MT) supplied responsively and accurately based on the amount of raw material solution (15) consumed.
[0168] In addition, the ultrasonic misting device (102) of embodiment 2 is provided with a pipe overlapping space (SP12), and by also discharging a gas (G2) for preventing mist leakage from the gas outlet (28) of the leak-prevention gas supply pipe (25) along the mist output direction DM, the mist leakage phenomenon can be reliably avoided.
[0169] The ultrasonic atomizing device (102) of Embodiment 2 is equipped with a gas supply pipe (4) which is a supply pipe for transport gas and a non-contact mist supply pipe (20). Accordingly, when the transport gas flow rate LC increases or decreases, the total dilution gas flow rate LD is increased or decreased to compensate for the increase or decrease in the transport gas flow rate LC, thereby allowing the total gas flow rate LT of the raw material solution mist (MT) to always be maintained at a constant level. In Embodiment 2, the total dilution gas flow rate LD becomes the leak-prevention gas flow rate LD2.
[0170] In addition, since the ultrasonic atomizing device (102) of embodiment 2 does not require a dedicated supply pipe for diluted gas equivalent to the gas supply pipe (3) of embodiment 1, the device configuration of the ultrasonic atomizing device (102) can be simplified compared to the ultrasonic atomizing device (101) of embodiment 1.
[0171] In addition, the ultrasonic misting device (102) of embodiment 2, like embodiment 1, has a device structure that employs a double chamber method, so that the amount of mist supplied by the raw material solution mist (MT) can be determined with high precision.
[0172] The ultrasonic misting device (102) of Embodiment 2 can employ the leak-prevention gas supply pipe (25A) shown in FIG. 3 as the leak-prevention gas supply pipe (25), just like Embodiment 1, and exhibits the same effect as Embodiment 1.
[0173] However, in the ultrasonic misting device (102) of Embodiment 2, since the mist leakage prevention gas (G2) is used as the only diluting gas, it is necessary to control the leakage prevention gas flow rate LD2 of the mist leakage prevention gas (G2) with high precision. Accordingly, the following dimension settings are made for the leakage prevention gas supply pipe (25A).
[0174] In the leak-prevention gas supply pipe (25A), the cross-sectional area (25d) of the flow path in the leak-prevention gas flow path has a circular shape and has a flow path cross-sectional area S25 of a constant value. In addition, a plurality of partial gas outlets (28A) are each provided in a circular shape and have the same diameter. That is, the area S28A of each of the plurality of partial gas outlets (28A) is set to be the same. Here, if the number of the plurality of partial gas outlets (28A) is N, the cross-sectional area S25 and the area S28A satisfy the following equation (4).
[0175] S25>N×S28A… (4)
[0176] As shown in Equation (4), the total area of the multiple partial gas outlets (28A) is narrower than the cross-sectional area of the flow path S25.
[0177] In order to satisfy Equation (4), the leak-prevention gas supply pipe (25A) is subjected to pressure across the entire plurality of partial gas outlets (28A), so the leak-prevention gas flow rate LD2 can be controlled with high precision by the leak-prevention gas control device (55) (see FIG. 2).
[0178] In this way, in the ultrasonic misting device (102) of embodiment 2, when a leak-prevention gas supply pipe (25A) is adopted, the total area of the plurality of partial gas output ports (28A) is narrower than the cross-sectional area of the flow path S25, thereby allowing the mist leak-prevention gas (G2) to be uniformly output from each of the plurality of partial gas output ports (28A).
[0179] Accordingly, when the ultrasonic atomizing device (102) of embodiment 2 employs a leak-prevention gas supply pipe (25A) as a leak-prevention gas supply pipe (25), the leak-prevention gas flow rate LD2 is controlled stably, thereby maintaining the total gas flow rate LT of the raw material solution mist (MT) at a constant level with high precision.
[0180] As a result, the ultrasonic misting device (102) of embodiment 2, which employs a leak-prevention gas supply pipe (25A), can maintain the total gas flow rate LT of the raw material solution mist (MT) at a constant level with high precision even when using the mist leak-prevention gas (G2) as the only diluting gas.
[0181] The ultrasonic misting device (102) of Embodiment 2 can employ the leak-prevention gas supply pipe (25B) shown in FIG. 4 as the leak-prevention gas supply pipe (25), just like Embodiment 1, and exhibits the same effect as Embodiment 1.
[0182] However, in the ultrasonic misting device (102) of Embodiment 2, since the mist leakage prevention gas (G2) is used as the only diluting gas, it is necessary to control the leakage prevention gas flow rate LD2 of the mist leakage prevention gas (G2) with high precision. Accordingly, the following dimension settings are made for the leakage prevention gas supply pipe (25B).
[0183] In the leak-prevention gas supply pipe (25B), the cross-sectional area (25d) of the flow path in the leak-prevention gas flow path has a flow path cross-sectional area S25 of a constant value. In addition, the single gas outlet (28B) is provided in a circular shape, and the single gas outlet (28B) has a formation area S28B. The flow path cross-sectional area S25 and the formation area S28B satisfy the following equation (5).
[0184] S25>S28B… (5)
[0185] As shown in Equation (5), the formation area S28B of a single gas outlet (28B) is narrower than the distribution path cross-sectional area S25.
[0186] In order to satisfy Equation (5), the leak-proof gas supply pipe (25B) is subjected to pressure throughout the entire single gas outlet (28B), so the leak-proof gas flow rate LD2 can be controlled with high precision by the leak-proof gas control device (55) (see FIG. 2).
[0187] In this way, in the ultrasonic misting device (102) of embodiment 2, when a leak-prevention gas supply pipe (25B) is adopted, the formation area S28B of the single gas output port (28B) is made narrower than the flow path cross-sectional area S25, thereby allowing the mist leak-prevention gas (G2) to be uniformly output from the entire single gas output port (28B).
[0188] Accordingly, when the ultrasonic atomizing device (102) of embodiment 2 employs a leak-prevention gas supply pipe (25B) as a leak-prevention gas supply pipe (25), the leak-prevention gas flow rate LD2 is controlled stably, thereby maintaining the total gas flow rate LT of the raw material solution mist (MT) at a constant level with high precision.
[0189] As a result, the ultrasonic misting device (102) of embodiment 2, which employs a leak-prevention gas supply pipe (25B), can maintain the total gas flow rate LT of the raw material solution mist (MT) at a constant level with high precision even when using the mist leak-prevention gas (G2) as the only diluting gas.
[0190] Although the present disclosure has been described in detail, the foregoing description is illustrative in all respects and is not limited thereto. It is understood that countless variations not exemplified may be conceived without departing from the scope of the present disclosure. Explanation of the symbols
[0191] 1: Fog container 1t: Piping for mist output 2: Ultrasonic transducer 3, 4: Gas supply pipes 5: Mist supply piping 10: Aquarium 12: Separator cup 15: Raw material solution 17: Nozzle 20: Non-contact mist supply piping 21: Downstream piping section 22: Tapered piping section 23: Connecting piping section 25, 25A, 25B: Leak-proof gas supply pipes 28: Gas outlet 28A: Partial gas outlet 28B: Single gas outlet 35: Raw material tank 50: Scales G2: Gas for preventing mist leakage G3: Dilution gas G4: Transport Gas MT: Raw material solution mist SP12: Piping Overlap Space
Claims
Claim 1 a raw material solution container having an internal space for accommodating a raw material solution, and having a mist output pipe provided on an upper surface thereof; an ultrasonic vibrator provided below the raw material solution container; a non-contact type mist supply pipe disposed above the raw material solution container without contacting the raw material solution container including the mist output pipe; a weight measuring device that supports the raw material solution container from below and measures the weight of a measurement object including the raw material solution container, the ultrasonic vibrator, and the raw material solution; by an ultrasonic vibration operation by the ultrasonic vibrator, the raw material solution is atomized to generate a raw material solution mist in the internal space; the non-contact type mist supply pipe has a duplicate pipe portion and a non-duplicate pipe portion other than the duplicate pipe portion, the duplicate pipe portion has a pipe duplication region along the mist output direction between the upper region of the mist output pipe, and a pipe duplication space is provided between the duplicate pipe portion and the upper region; the raw material solution mist flows through the inside of the mist output pipe and the non-contact type mist supply pipe along the mist output direction, and is output from the non-contact type mist supply pipe, an ultrasonic atomization device. Claim 2 The ultrasonic atomization device according to claim 1, further comprising a leak prevention gas supply pipe provided in the pipe duplication space without contacting the mist output pipe and the non-contact type mist supply pipe, and having a gas outlet for outputting a leak prevention gas along the mist output direction. Claim 3 According to claim 2, provided in the container for the raw material solution, a supply pipe for a transport gas for supplying the transport gas to the internal space, provided in the mist output pipe, further comprising a supply pipe for a dilution gas for supplying the dilution gas into the mist output pipe, by the transport gas and the dilution gas, the raw material solution mist flows through the inside of the mist output pipe and the non-contact type mist supply pipe along the mist output direction, an ultrasonic atomization device. Claim 4 According to claim 2, provided in the container for the raw material solution, further comprising a supply pipe for a transport gas for supplying the transport gas to the internal space, the sum of the transport gas flow rate of the transport gas and the leakage prevention gas flow rate of the leakage prevention gas is defined as the total gas flow rate of the raw material solution mist, an ultrasonic atomization device. Claim 5 According to any one of claims 2 to 4, the leakage prevention gas supply pipe has an annular structure having a leakage prevention gas flow path inside, the gas outlet includes a plurality of partial gas outlets provided separately above the leakage prevention gas supply pipe, an ultrasonic atomization device. Claim 6 According to claim 5, the leakage prevention gas flow path has a flow path cross-sectional area that becomes a constant value, the area of each of the plurality of partial gas outlets is set to be the same, the total area of the plurality of partial gas outlets is narrower than the flow path cross-sectional area, an ultrasonic atomization device. Claim 7 According to any one of claims 2 to 4, the leakage prevention gas supply pipe has an annular structure having a leakage prevention gas flow path inside, the gas outlet includes a single gas outlet provided in an annular shape above the leakage prevention gas supply pipe, an ultrasonic atomization device. Claim 8 According to claim 7, the leakage prevention gas flow path has a flow path cross-sectional area that becomes a constant value, the area of the single gas outlet is narrower than the flow path cross-sectional area, an ultrasonic atomization device. Claim 9 In any one of Claims 1 to 4, the container for the raw material solution has a separator cup on the bottom surface, The ultrasonic atomization device further includes a water tank for accommodating an ultrasonic transmission medium therein, and the water tank and the separator cup are positioned such that the bottom surface of the separator cup is immersed in the ultrasonic transmission medium, The ultrasonic vibrator is provided on the bottom surface of the water tank located below the separator cup, The weight measuring device supports the water tank from the bottom surface of the water tank without contacting the ultrasonic vibrator, The object to be measured further includes the separator cup, the water tank, and the ultrasonic transmission medium, An ultrasonic atomization device.