Substrate processing apparatus

Abstract

The substrate processing device of the present invention comprises: a liquid receiving portion in which a receiving space for storing a liquid is formed; an electromagnet portion which is provided on the outside of the receiving space of the liquid receiving portion and spaced apart from the bottom surface and generates a magnetic force upon power supply; and a levitation portion which is levitized by the magnetic force of the electromagnet portion, wherein the levitation portion may be rotated in a levitized state or repeatedly moved up and down according to the operation of the electromagnet portion to agitate the liquid.

Description

Technology Field

[0001] The present invention relates to a substrate processing device. Background Technology

[0002] Generally, a substrate processing device is used to perform a predetermined processing step, such as treating a chemical solution on a substrate, in order to manufacture semiconductors, displays, etc. The substrate processing device includes an inkjet head that discharges a chemical solution onto a substrate and a supply reservoir that stores the chemical solution supplied to the inkjet head.

[0003] In addition, the substrate processing device can be configured so that the inkjet head moves horizontally to discharge the liquid onto the substrate, and the supply reservoir can be configured to move in the same direction as the inkjet head.

[0004] Furthermore, in the recent manufacturing of display devices, chemical solutions containing nanoparticles are handled. Since the sedimentation of nanoparticles in the supply reservoir can lead to defective products, technological efforts are being made to prevent the sedimentation of chemical solution particles in the supply reservoir. The problem to be solved

[0005] Meanwhile, in the chemical solution supply process of the substrate processing device, in addition to the supply reservoir, a buffer reservoir that supplies the chemical solution to the supply reservoir and a canister that supplies the chemical solution to the buffer reservoir may be further provided, and it is also necessary to prevent sedimentation of the buffer reservoir and the canister.

[0006] The problem that the present invention aims to solve is to provide a substrate processing device capable of preventing the chemical solution discharged onto the substrate from settling in a chemical solution receiving part, such as a supply reservoir, buffer reservoir, or canister.

[0007] The problems of the present invention are not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below. means of solving the problem

[0008] One aspect of the substrate processing device of the present invention for achieving the above objective comprises: a liquid receiving portion in which a receiving space for storing a liquid is formed; an electromagnet portion which is provided spaced apart from the bottom surface on the outside of the receiving space of the liquid receiving portion and generates a magnetic force upon power supply; and a levitation portion which is levitized by the magnetic force of the electromagnet portion, wherein the levitation portion may be rotated in a levitized state or repeatedly moved up and down according to the operation of the electromagnet portion to agitate the liquid.

[0009] The above-mentioned wound may have a predetermined thickness and may form a fluid passage that penetrates in the left-right, up-down, or inclined direction.

[0010] The above liquid receiving section includes a supply line for supplying the liquid to the outside of the liquid receiving section and a recovery line for recovering the liquid, and the liquid receiving section includes a standby state in which the supply line is closed and the supply of the liquid is stopped, and a discharge state in which the supply line is opened and the supply of the liquid is performed, and the levitation section may be rotated in a levitation state or repeatedly levitized in the standby state of the liquid receiving section.

[0011] The above-mentioned floating part may have a speed of 1600 rpm to 12800 rpm when rotating in a floating state from the standby state of the above-mentioned liquid receiving part.

[0012] The above-mentioned buoyancy unit may have a speed of 0 rpm to 4800 rpm when buoyancy is not performed in the discharge state of the above-mentioned liquid receiving unit, or when rotating in a buoyancy state.

[0013] The device further includes an upper cover covering the upper portion of the liquid receiving section, wherein the upper cover may be provided with a liquid supply pipe through which the liquid is supplied from the outside to the liquid receiving section; a pressure control pipe for controlling the pressure of the liquid receiving section; and a sensor for detecting the liquid level of the liquid receiving section.

[0014] The above-mentioned liquid receiving portion further includes a protrusion provided along the periphery of the above-mentioned portion in the receiving space, and the above-mentioned portion may be raised from the inside of the protrusion.

[0015] The receiving space of the above-mentioned liquid receiving portion may be formed as a curve so that the corners on the perimeter surface are omitted.

[0016] The horizontal cross-section of the above-mentioned receiving space may form a circular shape with a curve, and the horizontal cross-section of the above-mentioned floating portion may form a circular shape with a cross-sectional area smaller than that of the above-mentioned receiving space.

[0017] The above-mentioned liquid receiving portion may include at least one of a supply reservoir that supplies the liquid to an inkjet head that discharges the liquid, a buffer reservoir that supplies the liquid to the supply reservoir, and a canister that supplies the liquid to the buffer reservoir.

[0018] Specific details of other embodiments are included in the detailed description and drawings. Brief explanation of the drawing

[0019] FIG. 1 is a drawing illustrating a substrate processing apparatus according to a first embodiment of the present invention. FIG. 2 is a drawing showing the interior of a liquid receiving section of a substrate processing device according to a first embodiment of the present invention. FIG. 3 is a drawing showing the upper cover of a substrate processing device according to the first embodiment of the present invention. FIG. 4 is a drawing showing the state in which the buoyancy portion of a substrate processing device according to the first embodiment of the present invention is located on the bottom surface of the liquid receiving portion. FIG. 5 is a drawing illustrating the state in which the levitation part of a substrate processing device according to the first embodiment of the present invention is levited from the bottom surface of the liquid receiving part and rotated. FIG. 6 is a horizontal cross-sectional view of a buoyancy portion of a substrate processing device according to a first embodiment of the present invention. FIG. 7 is a horizontal cross-sectional view of a buoyancy section according to another example of a substrate processing device according to the first embodiment of the present invention. FIG. 8 is a horizontal cross-sectional view of a buoyancy section according to another example of a substrate processing device according to the first embodiment of the present invention. FIG. 9 is a drawing illustrating the state in which the levitation part of a substrate processing device according to the second embodiment of the present invention levits from the bottom surface of the liquid receiving part. FIG. 10 is a drawing illustrating the state in which the levitation part of a substrate processing device according to the second embodiment of the present invention moves from the bottom surface of the liquid receiving part. FIG. 11 is a drawing illustrating a substrate processing apparatus according to a third embodiment of the present invention. Specific details for implementing the invention

[0020] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The advantages and features of the present invention, and the methods for achieving them, will become clear by referring to the embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below but can be implemented in various different forms. These embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and the present invention is defined only by the scope of the claims. Throughout the specification, the same reference numerals refer to the same components.

[0021] When elements or a layer are referred to as being "on" or "on" another element or layer, it includes not only being directly on top of the other element or layer but also cases where another layer or element is interposed in between. On the other hand, when an element is referred to as being "directly on" or "directly on," it indicates that no other element or layer is interposed in between.

[0022] Although terms such as "first," "second," etc. are used to describe various elements, components, and / or sections, it goes without saying that these elements, components, and / or sections are not limited by these terms. These terms are used merely to distinguish one element, component, or section from another. Accordingly, it goes without saying that the first element, first component, or first section mentioned below may be a second element, second component, or second section within the technical scope of the present invention.

[0023] The terms used herein are for describing the embodiments and are not intended to limit the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise in the text. As used herein, "comprises" and / or "comprising" do not exclude the presence or addition of one or more other components, steps, actions, and / or elements to the mentioned components, steps, actions, and / or elements.

[0024] FIG. 1 is a drawing illustrating a substrate processing device according to a first embodiment of the present invention. FIG. 2 is a drawing illustrating the interior of a chemical solution receiving section of a substrate processing device according to a first embodiment of the present invention, and FIG. 3 is a drawing illustrating an upper cover of a substrate processing device according to a first embodiment of the present invention. FIG. 4 is a drawing illustrating a state in which a floating section of a substrate processing device according to a first embodiment of the present invention is positioned on the bottom surface of a chemical solution receiving section, and FIG. 5 is a drawing illustrating a state in which a floating section of a substrate processing device according to a first embodiment of the present invention is floating from the bottom surface of a chemical solution receiving section and rotated. FIG. 6 to 8 are drawings for explaining a floating section of a substrate processing device according to a first embodiment of the present invention.

[0025] Referring to FIGS. 1 to 8, a substrate processing device (100) according to an embodiment of the present invention may include an inkjet head (110), a chemical solution receiving part (130), an electromagnet part (140), and a levitation part (150).

[0026] First, referring to FIG. 1, the inkjet head (110) can receive a chemical solution from the supply reservoir (131) of the chemical solution receiving section (130) and discharge the chemical solution onto the substrate (C). For example, the inkjet head (110) may be equipped with a plurality of nozzles for discharging the chemical solution onto the substrate (C), and various configuration changes are possible.

[0027] And the inkjet head (110) can be connected to a head operating unit (not shown) so as to evenly discharge the liquid onto the substrate (C), although this is not shown in the drawing. The head operating unit can briefly move the inkjet head (110) in the X-axis, Y-axis, and Z-axis directions. That is, the head operating unit can move the inkjet head (110) in the horizontal direction as well as adjust its vertical height. This head operating unit may include a configuration such as a gantry and a motor, and the operating mechanism of the head operating unit is omitted in lieu of known technology.

[0028] In addition, the inkjet head (110) can be moved together with the supply reservoir (131) of the liquid receiving section (130), so that the length of the supply line (111) through which the liquid is supplied from the supply reservoir (131) to the inkjet head (110) can be minimized. Therefore, the problem of the supply line (111) becoming completely or partially clogged due to the aggregation or sedimentation of particles in the liquid and the resulting process defects can be minimized, but this is not limited thereto and various variations are possible.

[0029] In addition, the inkjet head (110), the supply reservoir (131), and the buffer reservoir (132) can be arranged sequentially from the bottom to the top. Accordingly, the chemical solution can be supplied from the buffer reservoir (132) to the supply reservoir (131) by gravity. Furthermore, the chemical solution can be supplied from the supply reservoir (131) to the inkjet head (110) by gravity, but various variations are possible depending on changes in the configuration.

[0030] The liquid receiving section (130) may have a receiving space (130A) formed for storing a liquid (which may be ink for a display element) and may include at least one of the previously mentioned supply reservoir (131), buffer reservoir (132), and canister (133). In this embodiment, the liquid receiving section (130) is exemplified as being equipped with the supply reservoir (131), buffer reservoir (132), and canister (133). In other words, in this embodiment, a configuration such as an electromagnet section (140) that can be provided inside the liquid receiving section (130) may be provided individually in each of the supply reservoir (131), buffer reservoir (132), and canister (133), thereby preventing sedimentation of the liquid stored in each of the supply reservoir (131), buffer reservoir (132), and canister (133).

[0031] One or more supply reservoirs (131) may be provided to store a chemical solution to be supplied to the inkjet head (110). And as previously mentioned, the supply reservoir (131) may be provided on the upper part of the inkjet head (110) so that the chemical solution can be supplied to the inkjet head (110) without using a separate device such as a pump.

[0032] However, since the chemical solution is not always supplied from the supply reservoir (131) to the inkjet head (110) depending on the chemical solution discharge operation, it is necessary to block the flow of the chemical solution by gravity. To this end, the supply reservoir (131) may be connected to a pressure regulating unit (125), and the pressure regulating unit (125) can regulate the pressure within the supply reservoir (131).

[0033] Here, the supply of the liquid medicine by the pressure regulating unit (125) can be briefly controlled so that the pressure regulating unit (125) forms a negative pressure inside the supply reservoir (131) to block the supply of the liquid medicine, and forms a positive pressure inside the supply reservoir (131) to enable the supply of the liquid medicine. At this time, the pressure regulating unit (125) can be connected to the pressure control pipe (130T2) (see FIG. 2) described later.

[0034] Since such a supply reservoir (131) supplies the chemical solution directly to the inkjet head (110), it is difficult to refill the chemical solution during the chemical solution application process. This is because, as previously mentioned, negative pressure must be maintained when the chemical solution is supplied from the supply reservoir (131) to the inkjet head (110). Accordingly, if refilling of the chemical solution is required, the supply reservoir (131) may be released from communication with the buffer reservoir (132), but various configuration changes are possible as long as they do not conflict with the present embodiment.

[0035] The buffer reservoir (132) may have a space (which may be a receiving space (130A)) for storing the liquid medicine, and the liquid medicine may be filled independently of the supply reservoir (131) which must maintain a negative pressure state. Additionally, one buffer reservoir (132) may be connected to a plurality of supply reservoirs (131).

[0036] For example, the buffer reservoir (132) can circulate the liquid so that a flow of the liquid is formed regardless of the operation of discharging the liquid to the substrate (C), thereby minimizing or preventing the problem of liquid particles settling.

[0037] Briefly, the buffer reservoir (132) may be provided with a first outlet (not shown) through which the liquid medicine is discharged and a first inlet (not shown) through which the liquid medicine is introduced. In this case, the first outlet and the first inlet form a closed path without passing through the supply reservoir (131), so that the liquid medicine can be circulated regardless of the liquid medicine discharge from the supply reservoir (131).

[0038] In addition, the buffer reservoir (132) may include a second outlet (which may be provided with a supply line (130L1) described later) capable of supplying the liquid medicine to the supply reservoir (131) and a second inlet (which may be provided with a liquid medicine supply pipe (130T1) described later) capable of receiving the liquid medicine from the canister (133). Furthermore, the second outlet and the second inlet may be opened and closed by means of a valve, and various variations are possible depending on changes in configuration.

[0039] In addition, the buffer reservoir (132) and the supply reservoir (131) can maintain a constant flow rate so that process defects caused by differences in the flow rate of the chemical solution do not occur. In this case, the buffer reservoir (132) can supply the chemical solution from the canister (133) while controlling the flow rate of the chemical solution to prevent rapid filling of the chemical solution. However, this is not a fixed charge, and as mentioned above, various configurations are possible, such as by providing a buoyancy section (150) to prevent sedimentation of the chemical solution.

[0040] A canister (133) can be provided upstream of a buffer reservoir (132) and a supply reservoir (131) so that a predetermined amount of liquid, such as 10L or more, can be filled at once within a few seconds to prevent work delays caused by filling and to ensure work convenience.

[0041] The canister (133) may have a space (which may be a receiving space (130A)) formed so that a liquid medicine, which is an ink containing multiple particles, can be stored. After the liquid medicine is supplied into the canister (133) all at once, the liquid medicine may have a structure in which it is supplied to the supply reservoir (131) via the buffer reservoir (132). For example, a connection line (133A), as well as a valve (not shown) and a flow meter (not shown), may be installed. Furthermore, the supply of the liquid medicine and flow control are omitted in the form of a known mechanism.

[0042] The liquid in these canisters (133) does not require flow rate and precise level control, but particles in the liquid may settle as time passes during the process of storing the liquid supplied to the supply reservoir (131) and buffer reservoir (132).

[0043] However, in order to maintain the quality of the substrate (C), it is necessary for the particles of the liquid medicine supplied from the canister (133) to be evenly dispersed. To this end, the present embodiment may allow the liquid medicine inside the canister (133) to flow so that the particles inside the canister (133) are evenly dispersed. To this end, an electromagnet part (140) and a levitation part (150) may be provided on the inside and outside of the canister (133).

[0044] However, in this embodiment, the levitation part (150) can be controlled so that the influence of the meniscus is minimized, so the levitation part (150) and the electromagnet part (140) are not limited to being provided in the canister (133). As another example, the levitation part (150) and the electromagnet part (140) may also be provided in the supply reservoir (131) and the buffer reservoir (132), and in this case, the rotational speed of the levitation part (150) may be controlled, and this will be described later.

[0045] For example, the order of supplying the medicine is as follows.

[0046] The initial liquid medicine can be supplied to the canister (133). To do this, the liquid medicine can be injected by applying pressure to the provided canister (133) with the pressure control tube (130T2) (see FIG. 2) open, or by opening the upper cover (130T) (see FIG. 2) and injecting it directly. At this time, the power to the electrical box (EB) (see FIG. 2) is turned off so that the magnetic force of the electromagnet part (140) is not generated, and the power to the electrical box (EB) can be turned on after the injection of the liquid medicine is completed.

[0047] Next, the liquid medicine can be supplied to the buffer reservoir (132). The liquid medicine is injected by applying pressure to the buffer reservoir (132) with the pressure control tube (130T2) of the buffer reservoir (132) open. At this time, the power of the electrical box (EB) is turned off so that the magnetic force of the electromagnet part (140) is not generated, and the power of the electrical box (EB) can be turned on after the injection of the liquid medicine is completed.

[0048] Next, the chemical solution can be supplied to the supply reservoir (131), and, for example, supply can be made by natural gravity. This is a supply method in which the buffer reservoir (132) is located above the supply reservoir (131), and the pressure control pipe (130T2) between the buffer reservoir (132) and the supply reservoir (131) is opened in a negative pressure control environment of the supply supply device to inject ink by natural gravity, at which time the power of the electrical box (EB) is turned off, and the power of the electrical box (EB) can be turned on after the injection of the chemical solution is completed. Meanwhile, it is not limited to this, and supply by a pump is possible, and this will be described later with reference to FIG. 11.

[0049] Below, with reference to the drawings, the structure and configuration in which fluid flow is generated so that the liquid does not settle within the liquid receiving section (130) will be explained in detail.

[0050] Referring to FIGS. 2 to 8, the above-described liquid receiving portion (130) may have a plurality of groove structures (130B, 130C) formed so as to provide not only a receiving space (130A) for receiving the liquid, but also an electromagnet portion (140) and a levitation portion (150). In addition, the liquid receiving portion (130) may include a supply line (130L1), a recovery line (130L2), and a protrusion (130P), and an upper cover (130T) covering the receiving space (130A) may be provided.

[0051] First, the plurality of groove structures (130B, 130C) may include a first groove (130B) and a second groove (130C).

[0052] The first groove (130B) is a space where the electromagnet part (140) is installed and may be located on the outer perimeter of the receiving space (130A). The first groove (130B) allows the magnetic force of the electromagnet part (140) to extend into the interior of the receiving space (130A), but may be formed as a separate space that is not connected to the receiving space (130A). For example, the first groove (130B) may be partitioned by a partition structure on the perimeter surface of the receiving space (130A). The first groove (130B) may have a structure in which a hollow is formed from the top to the bottom, identical or similar to the receiving space (130A), so that the top is open. The opened first groove (130B) and the receiving space (130A) may be opened and closed by an upper cover (130T).

[0053] The second groove (130C) is a space that accommodates an electrical box (EB) that supplies power to the electromagnet part (140), and may be located at the bottom of the accommodation space (130A). Similar to the first groove (130B), the second groove (130C) may be formed as a separate space without communicating with the accommodation space (130A), and may have a structure in which a hollow is formed from the bottom to the top so that the bottom is open.

[0054] The supply line (130L1) can supply the liquid to the outside of the liquid receiving section (130), and the recovery line (130L2) can recover the liquid. For example, the supply line (130L1) may be the supply line (111) connecting the previously mentioned supply reservoir (131) and the inkjet head (110), but is not limited thereto, and may be a line communicating with the receiving space (130A) of the buffer reservoir (132) and canister (133). In addition, various configurations are possible, such as the recovery line (130L2) may be omitted depending on the modification of the embodiment.

[0055] The protrusion (130P) is configured to prevent the wound portion (150) from being stored or the wound portion (150) from being displaced from the center. The protrusion (130P) may be provided along the circumference of the wound portion (150) in the receiving space of the liquid receiving portion (130).

[0056] The upper cover (130T) can cover the open upper portion of the liquid receiving section (130). The upper cover (130T) may be provided with a liquid supply pipe (130T1), a pressure control pipe (130T2), and a sensor (130T3). The liquid supply pipe (130T1) can supply liquid to the liquid receiving section (130) from the outside. The pressure control pipe (130T2) can control the pressure of the liquid receiving section (130). The pressure control pipe (130T2) may be connected to a pressure regulating section (125), which is described above, to provide negative pressure to the liquid receiving section (130). The sensor (130T3) can detect the liquid level of the liquid receiving section (130).

[0057] The liquid receiving section (130) may include a standby state in which the supply line (130L1) is closed and the supply of liquid is stopped, and a discharge state in which the supply line (130L1) is opened and the supply of liquid is performed. This distinction is intended to ensure that, depending on the variation of the embodiment, the stirring operation occurring inside the liquid receiving section (130) is not performed in the liquid discharge state, or that the operating speed (e.g., rotational speed) of the buoyancy section (150) is kept low.

[0058] In addition, the liquid receiving section (130) may be formed with a curve such that the receiving space (130A) of the liquid receiving section (130) has no corners on its perimeter surface, so that the dead zone where the liquid accumulates is minimized or does not occur. For example, the horizontal cross-section of the receiving space (130A) may form a circular shape with a curve.

[0059] The electromagnet part (140) may be provided spaced apart from the bottom surface on the outside of the receiving space (130A) of the liquid receiving part (130), and may generate magnetic force upon power supply. Here, the power supply may be provided, for example, from an electrical box (EB) provided at the bottom of the liquid receiving part (130).

[0060] When the electromagnet part (140) receives power from the electric box (EB), a magnetic force can be generated, and the levitation part (150) can be rotated while in a levitation state. However, it is not limited to this, and the electromagnet part (140) can cause the levitation part (150) to repeatedly move up and down. This will be described later with reference to FIGS. 9 and FIGS. 10.

[0061] The operation of the electromagnet unit (140) levitating and then rotating the levitation unit (150) can be achieved by supplying power to the electromagnet unit (140) to generate magnetic force, and by repeating the process in which the magnetic force of the electromagnet unit (140) is sequentially generated and decreased along the circumference. For example, the magnetic force generated in the circumference direction of the electromagnet unit (140) is not maintained at a constant magnitude, but has a structure in which the magnitude of the magnetic force changes and the magnetic force of the greatest strength moves in the circumference direction, thereby allowing the levitation unit (150) to rotate along the direction in which the magnetic force of the greatest strength moves. In addition, the rotation speed of the levitation unit (150) can be controlled by the change in the speed of movement of the magnetic force of the greatest strength.

[0062] For example, the electromagnet section (140) may include multiple coils spaced apart from each other along the circumference of the levitation section (150). The multiple coils may not receive power supply simultaneously, nor may the greatest power intensity occur at the same point in time. In other words, the point in time when the magnetic force is greatest in each of the multiple coils may differ from one another. In this way, the process of sequentially generating and blocking magnetic force in the multiple coils is repeated, that is, the position of the magnetic force of the greatest intensity changes in one direction, so that the levitation section (150) may rotate by being pushed by an attractive force or pulled by a repulsive force in the direction of the magnetic force of the greatest intensity; however, this is merely an example, and various variations are possible.

[0063] This floating section (150) can be rotated in a floating state from the standby state of the liquid receiving section (130). When the floating section (150) is rotated in a floating state from the standby state of the liquid receiving section (130), it can have a speed of 1600 rpm to 12800 rpm.

[0064] On the other hand, the buoyancy section (150) may have a speed of 0 rpm to 4800 rpm when buoyancy is not performed in the discharge state of the liquid receiving section (130) or when rotating in the buoyancy state. For example, when the liquid receiving section (130) needs to have a small meniscus effect, that is, when the liquid receiving section (130) is made of a supply reservoir (131) and vibration needs to occur within a range where the negative pressure is not broken, the rotational speed of the buoyancy section (150) may be 0 rpm to 4800 rpm.

[0065] The floating portion (150) can be formed such that, if the liquid receiving portion (130) is circular, the horizontal cross-section is smaller in cross-sectional area than the receiving space (130A) of the liquid receiving portion (130). The floating portion (150) can be floated from the inside of the protrusion (130P).

[0066] The levitation section (150) is configured to stir the liquid medicine and can be levitized by the magnetic force of the electromagnet section (140) to allow the liquid medicine to flow. The levitation section (150) may be made of metal or may be made of a magnet that has a magnetic force opposite to that of the electromagnet section (140). That is, the levitation section (150) may be made of various materials that allow levitation by the magnetic force of the electromagnet section (140). Additionally, the levitation section (150) may have a hollow structure to facilitate levitation by magnetic force.

[0067] However, the floating portion (150) may have a predetermined thickness (it may have a height of less than half of the receiving space (130A), and for example, a height of 1 / 3), and a fluid passage (150H) that penetrates in the left-right, up-down, or inclined direction may be formed. In other words, the floating portion (150) may be formed with various structures that are lightweight while forming a fluid passage (150H).

[0068] When the floating section (150) is rotated, the process of the liquid flowing in and out through the fluid passage (150H) can be repeated, thereby facilitating the stirring action of the liquid. For example, the fluid passage (150H) may form a single horizontal passage crossing the floating section (150) (see FIG. 6). However, it is not limited to this and various variations are possible. As another example, the fluid passage (150H) may have a cross-shaped horizontal cross-section (see FIG. 7) or be radial (see FIG. 8). In addition, the fluid passage (150H) may have a structure that penetrates in the vertical direction, which will be explained with reference to FIG. 9 and FIG. 10.

[0069] Below, variations of the present embodiment will be described with reference to FIGS. 9 and FIGS. 10, and redundant descriptions of identical components having the same function will be omitted.

[0070] FIG. 9 is a drawing illustrating a state in which a floating portion of a substrate processing device according to a second embodiment of the present invention floats from the bottom surface of a chemical liquid receiving portion, and FIG. 10 is a drawing illustrating a state in which a floating portion of a substrate processing device according to a second embodiment of the present invention moves from the bottom surface of a chemical liquid receiving portion. With reference to FIG. 9 and FIG. 10, the differences from those described using FIG. 2 to FIG. 8 will be explained in detail.

[0071] Referring to FIGS. 9 and 10, the liquid receiving portion (130) may be provided with a receiving space (130A) in which the liquid is received, identical or similar to the first embodiment, as well as a plurality of groove structures (130B, 130C), a supply line (130L1), a recovery line (130L2), a protrusion (130P), an upper cover (130T), an electromagnet portion (140), and a levitation portion (150).

[0072] However, this embodiment differs in that the buoyancy part (150) moves repeatedly in the up and down direction, and the direction in which the fluid path (150H) is formed differs.

[0073] The electromagnet part (140) of the present embodiment may not cause the levitation part (150) to rotate while in a levitation state, but may instead allow for repeated up-and-down movement. However, it is of course possible to combine the present embodiment and the first embodiment so that the electromagnet part (140) allows for repeated up-and-down movement while causing the levitation part (150) to rotate while in a levitation state. In other words, various variations in which stirring action is performed are possible.

[0074] The vertical movement of the levitation unit (150) by the electromagnet unit (140) may, for example, be achieved by a change in the magnitude of the magnetic force of the electromagnet unit (140) (which may be the on / off switch of the electric field box (EB)). The operation may be performed by repeatedly forming the magnitude of the magnetic force of the electromagnet unit (140) to a size capable of levitating the levitation unit (150), and then reducing it to a size that cannot levitize the levitation unit (150) (or a size of magnetic force that causes the levitation unit (150) to partially descend).

[0075] In other words, the electromagnet part (140) can repeat the action of lifting and lowering the levitation part (150), and the levitation part (150) can be made to move up and down while remaining continuously lifted without being completely lowered to the floor surface.

[0076] When the floating part (150) moves up and down, the fluid passage (150H) may have a structure that penetrates in the vertical direction so that fluid can move through the interior of the floating part (150). In addition, the fluid passage (150H) may have a structure that penetrates perpendicular to the bottom surface, but various variations are possible, such as having an inclined angle to make fluid movement easier, as shown in FIGS. 9 and 10.

[0077] In particular, since the production yield can vary significantly even with micro-sized particles when producing semiconductors, it is necessary to reduce the generation of particles caused by friction. To this end, the present embodiment omits the stirring blade connected to the shaft and causes the floating part (150), which does not generate friction with the wall surface of the receiving space (130A), to float, thereby increasing the production yield.

[0078] Below, with reference to the drawings, we will describe an example in which the arrangement of the supply reservoir (131), buffer reservoir (132), and canister (133) of the liquid receiving section (130) is different.

[0079] FIG. 11 is a drawing illustrating a substrate processing apparatus according to a third embodiment of the present invention. With reference to FIG. 11, the differences from the description using FIG. 1 will be explained in detail.

[0080] Referring to FIG. 11, a substrate processing device (100) according to an embodiment of the present invention may include an inkjet head (110) and a chemical solution receiving part (130), and may include an electromagnet part (140) and a levitation part (150) in the same or similar manner as in the first embodiment.

[0081] However, in this embodiment, the supply reservoir (131), buffer reservoir (132), and canister (133) of the liquid receiving section (130) may not be arranged in an upper and lower configuration. That is, the movement of the liquid between the supply reservoir (131) and the buffer reservoir (132) may not be moved by gravity, but may be achieved by the pumping operation of the pump (P).

[0082] The order of supplying the liquid medicine in this embodiment is as follows. However, the supply of the liquid medicine to the canister (133) and the buffer reservoir (132) may be the same or similar as in the first embodiment, and there is a difference in that it is supplied from the buffer reservoir (132) to the supply reservoir (131).

[0083] The initial liquid medicine can be supplied to the canister (133). To do this, the liquid medicine can be injected by applying pressure to the provided canister (133) with the pressure control tube (130T2) open, or by opening the upper cover (130T) and injecting it directly. At this time, the power of the electrical box (EB) is turned off so that the magnetic force of the electromagnet part (140) is not generated, and the power of the electrical box (EB) can be turned on after the injection of the liquid medicine is completed.

[0084] Next, the liquid medicine can be supplied to the buffer reservoir (132). The liquid medicine is injected by applying pressure to the buffer reservoir (132) with the pressure control tube (130T2) of the buffer reservoir (132) open. At this time, the power of the electrical box (EB) is turned off so that the magnetic force of the electromagnet part (140) is not generated, and the power of the electrical box (EB) can be turned on after the injection of the liquid medicine is completed.

[0085] Next, the liquid medicine can be supplied to the supply reservoir (131), and this can be done, for example, by a pump. This is a supply method when the buffer reservoir (132) is not located above the supply reservoir (131), and in a negative pressure control environment of the supply reservoir (131), the pressure control pipe (130T2) between the buffer reservoir (132) and the supply reservoir (131) is opened and the liquid medicine is injected by pressurizing the buffer reservoir (132) or by operating the pump located between them. At this time, the power of the electrical box (EB) is turned off, and the power of the electrical box (EB) can be turned on after the injection of the liquid medicine is completed.

[0086] Although embodiments of the present invention have been described above with reference to the attached drawings, those skilled in the art will understand that the present invention may be implemented in other specific forms without changing its technical concept or essential features. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive. Explanation of the symbols

[0087] 100: Substrate processing unit 110: Inkjet head 130: Liquid receiving section 140: Electromagnet section 150: Injury

Claims

Claim 1 A substrate processing device comprising: a liquid receiving section in which a receiving space for storing a liquid is formed; an electromagnet section provided on the outer side of the receiving space of the liquid receiving section and spaced apart from the bottom surface, and generating a magnetic force upon power supply; and a levitation section that is levitized by the magnetic force of the electromagnet section, wherein the levitation section rotates in a levitated state or repeatedly moves up and down according to the operation of the electromagnet section to agitate the liquid, and the levitation section has a predetermined thickness and a fluid passage formed that penetrates in a left-right, up-down, or inclined direction. Claim 2 delete Claim 3 A substrate processing device comprising: a liquid receiving section in which a receiving space for storing a liquid is formed; an electromagnet section provided on the outer side of the receiving space of the liquid receiving section and spaced apart from the bottom surface, and generating a magnetic force upon power supply; and a levitation section that is levitized by the magnetic force of the electromagnet section, wherein the levitation section is rotated in a levitated state or repeatedly moves up and down according to the operation of the electromagnet section to agitate the liquid, and the liquid receiving section includes a supply line for supplying the liquid to the outside of the liquid receiving section and a recovery line for recovering the liquid, and the liquid receiving section includes a standby state in which the supply line is closed and the supply of the liquid is stopped, and a discharge state in which the supply line is opened and the supply of the liquid is performed, and wherein the levitation section is repeatedly levitized or rotated in a levitated state in the standby state of the liquid receiving section. Claim 4 A substrate processing device according to paragraph 3, wherein the floating portion has a speed of 1600 rpm to 12800 rpm when rotating in a floating state from the standby state of the liquid receiving portion. Claim 5 A substrate processing device according to paragraph 3, wherein the buoyancy portion is not buoyant in the discharge state of the liquid receiving portion, or has a speed of 0 rpm to 4800 rpm when rotating in a buoyant state. Claim 6 A substrate processing device comprising: a liquid receiving section in which a receiving space for storing a liquid is formed; an electromagnet section provided on the outer side of the receiving space of the liquid receiving section and spaced apart from the bottom surface, and generating a magnetic force upon power supply; and a levitation section that is levitized by the magnetic force of the electromagnet section, wherein the levitation section rotates in a levitated state or repeatedly moves up and down according to the operation of the electromagnet section to agitate the liquid, and further comprises an upper cover covering the upper part of the liquid receiving section, wherein the upper cover is provided with a liquid supply pipe through which the liquid is supplied from the outside to the liquid receiving section; a pressure control pipe for controlling the pressure of the liquid receiving section; and a sensor for detecting the liquid level of the liquid receiving section. Claim 7 A substrate processing device comprising: a liquid receiving portion having a receiving space for storing a liquid; an electromagnet portion arranged spaced apart from the bottom surface on the outer side of the receiving space of the liquid receiving portion and generating a magnetic force upon power supply; and a levitation portion that is levitized by the magnetic force of the electromagnet portion, wherein the levitation portion is rotated in a levitated state or repeatedly moves up and down according to the operation of the electromagnet portion to agitate the liquid, and further comprises a protrusion arranged along the periphery of the levitation portion in the receiving space of the liquid receiving portion, wherein the levitation portion is levitized from the inner side of the protrusion. Claim 8 A substrate processing device according to claim 1, wherein the receiving space of the above-mentioned liquid receiving portion is formed as a curve such that the corners on the periphery surface are omitted. Claim 9 A substrate processing device according to claim 1, wherein the horizontal cross-section of the receiving space forms a circular shape formed by a curve, and the horizontal cross-section of the buoyancy portion forms a circular shape with a cross-sectional area smaller than that of the receiving space. Claim 10 A substrate processing apparatus according to claim 1, wherein the above-mentioned liquid receiving portion comprises at least one of a supply reservoir that supplies the liquid to an inkjet head that discharges the liquid, a buffer reservoir that supplies the liquid to the supply reservoir, and a canister that supplies the liquid to the buffer reservoir.

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