Method for treating surface of titanium implant with high biocompatibility

Abstract

A surface treatment method for a titanium implant is disclosed. The surface treatment method for a titanium implant may include the steps of: preparing a titanium implant substrate; controlling the surface roughness of the titanium implant substrate; immersing the titanium implant substrate with controlled surface roughness in an electrolyte and forming an oxide film on the surface of the titanium implant substrate through a plasma electrolytic oxidation process; and coating a biomimetic potassium phosphate compound on the surface of the titanium implant substrate on which the oxide film is formed.

Description

Technology Field

[0001] The present invention relates to a surface treatment method for titanium implants, and more specifically, to a surface treatment method for titanium implants in which the surface roughness of the titanium implant substrate is controlled to enhance biocompatibility, and the surface is coated with a biomimetic compound having a structure, size, and chemical composition most similar to bone tissue. Background Technology

[0002] Titanium implants achieve osseointegration through contact with bone, and the contact area between the bone and the implant has been cited as an important factor in this osseointegration. In this regard, various methods such as sandblasting, acid etching, hydroxyapatite coating, anodic oxidation, and laser surface treatment are selectively used to increase the contact area with the bone.

[0003] This method has the advantage of shortening the bone fusion period and stabilizing the implant in a short period by increasing the interfacial contact area between the bone and the implant, thereby increasing the probability that osteocytes can come into contact with the implant surface.

[0004] However, in the case of the above-mentioned sandblasting, acid etching, hydroxyapatite coating, anodic oxidation, and laser surface treatment methods, the surface is unstable at the same time as the surface treatment, so an oxide film is formed when exposed to air, and various contaminants are adsorbed in the oxide film.

[0005] In addition, the oxide film generated by the above surface treatment has very weak interfacial bonding strength with the implant, so when the implant procedure is performed, the oxide film layer peels off from the surface of the implant, causing a change in surface roughness, and if contaminants leak out and enter the human body during the procedure, it can cause an inflammatory reaction or reduce the success rate of the procedure.

[0006] For this reason, cleaning methods using nitric acid and sulfuric acid, alkali mixtures, or plasma cleaning are used after surface treatment; however, the aforementioned cleaning methods using nitric acid and sulfuric acid and alkali mixtures have difficulty removing the oxide film generated by the surface treatment, and the plasma method has limitations in removing oxide films adsorbed with contaminants because it forms an unstable oxide film when exposed to air after the oxide film removal. Prior art literature

[0007] Korean Registered Patent Publication No. 10-1544357 (Published August 13, 2015) The problem to be solved

[0008] The present invention provides a surface treatment method for a titanium implant that can enhance biocompatibility, promote the attachment and growth of bone cells, and increase the corrosion resistance and mechanical properties of the biomaterial. means of solving the problem

[0009] A surface treatment method for a titanium implant according to an embodiment of the present invention may include the steps of: preparing a titanium implant substrate; controlling the surface roughness of the titanium implant substrate; immersing the titanium implant substrate with controlled surface roughness in an electrolyte and forming an oxide film on the surface of the titanium implant substrate through a plasma electrolytic oxidation process; and coating a biomimetic potassium phosphate compound on the surface of the titanium implant substrate on which the oxide film is formed.

[0010] Additionally, the step of controlling the surface roughness may include a blasting step of forming a surface roughness of 1 to 10 μm on the surface of the titanium implant substrate using hydroxyapatite or β-TCP (β-Tricalcium Phosphate) particles; and an electrolytic polishing step of forming a surface roughness of 1 to 100 nm on the surface of the titanium implant substrate by electrolytically polishing the titanium implant substrate after the blasting step.

[0011] In addition, the electrolyte is a solution mixed with calcium acetate monohydrate, calcium glycerophosphate, manganese acetate, sodium metasilicate nonahydrate, and distilled water, wherein the manganese ions relative to calcium ions are 20 mol%, the silicon ions relative to phosphorus ions are 5 mol%, and the calcium acetate is 0.12 mol L -1 , calcium glycerophosphate is 0.02 mol L -1 , manganese acetate 0.03 mol L -1 and sodium metasilicate 0.001 mol L -1 It can be included as.

[0012] Additionally, the step of coating the biomimetic potassium phosphate compound may include a deposition step of depositing the biomimetic potassium phosphate compound onto the oxide film using a plasma spray coating method; and, after the deposition step, a coating step of coating the surface of the titanium implant substrate with a calcium phosphate compound colloidal solution mixed with the biomimetic potassium phosphate compound.

[0013] In addition, the above calcium phosphate compound colloidal solution may contain TGF-β, BMPs, PDGF, and IGF. Effects of the invention

[0014] According to the present invention, since the oxide film formed on the surface of a titanium implant substrate contains various ions such as calcium ions, manganese ions, silicon ions, phosphorus ions, magnesium ions, and fluoride ions, the biocompatibility of the titanium implant substrate is enhanced, the attachment and growth of bone cells are promoted, and the corrosion resistance and mechanical properties of the biomaterial can be increased. Brief explanation of the drawing

[0015] FIG. 1 is a flowchart illustrating a surface treatment method for an implant according to an embodiment of the present invention. FIG. 2 is a flowchart showing the steps for controlling the surface roughness of a titanium implant substrate according to an embodiment of the present invention. FIG. 3 is a drawing showing an electrolytic polishing device according to an embodiment of the present invention. FIG. 4 is a flowchart showing the step of forming an oxide film on the surface of a titanium implant substrate according to an embodiment of the present invention. FIG. 5 is a flowchart showing the step of coating a biomimetic potassium phosphate compound according to an embodiment of the present invention. FIG. 6 is a flowchart showing the step of forming an oxide film on the surface of a titanium implant substrate according to another embodiment of the present invention. Specific details for implementing the invention

[0016] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings. However, the technical concept of the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided to ensure that the disclosed content is thorough and complete and to sufficiently convey the concept of the present invention to those skilled in the art.

[0017] In this specification, when a component is described as being on another component, it means that it may be formed directly on the other component or that a third component may be interposed between them. Additionally, in the drawings, the thicknesses of the films and regions are exaggerated for the effective description of the technical content.

[0018] Additionally, although terms such as first, second, third, etc., have been used to describe various components in the various embodiments of this specification, these components should not be limited by such terms. These terms are used merely to distinguish one component from another. Accordingly, what is referred to as the first component in one embodiment may be referred to as the second component in another embodiment. Each embodiment described and illustrated herein also includes its complementary embodiment. Furthermore, in this specification, "and / or" is used to mean including at least one of the components listed before and after it.

[0019] In the specification, singular expressions include plural expressions unless the context clearly indicates otherwise. Furthermore, terms such as "include" or "have" are intended to specify the existence of the features, numbers, steps, components, or combinations thereof described in the specification, and should not be understood as excluding the existence or addition of one or more other features, numbers, steps, components, or combinations thereof. Additionally, in this specification, "connection" is used to include both indirectly connecting multiple components and directly connecting them.

[0020] In addition, in describing the present invention below, if it is determined that a detailed description of related known functions or configurations could unnecessarily obscure the essence of the invention, such detailed description will be omitted.

[0022] FIG. 1 is a flowchart illustrating a surface treatment method for an implant according to an embodiment of the present invention.

[0023] Referring to Fig. 1, the surface treatment method of the implant involves adjusting the surface roughness of the titanium implant substrate to increase biocompatibility and coating the surface with a biomimetic calcium phosphate compound having a structure, size, and chemical composition most similar to bone tissue.

[0024] A surface treatment method for an implant includes the steps of preparing a titanium implant substrate (S10), controlling the surface roughness of the titanium implant substrate (S20), forming an oxide film on the surface of the titanium implant substrate (S30), and coating the surface of the titanium implant substrate with a biomimetic potassium phosphate compound (S40).

[0025] The step of preparing a titanium implant substrate (S10) involves preparing a titanium implant substrate manufactured in a pre-designed shape. The titanium implant substrate is manufactured from a titanium-based alloy. According to an embodiment, the titanium-based alloy may be selected from Ti-6Al-4V, Ti-6Al-7Nb, Ti-13Nb-13Zr, Ti-15Mo, Ti-35.3Nb-5.1Ta-7.1Zr, Ti-30Nb, Ti-29Nb-13Ta-2Sn, Ti-29Nb-13Ta-4.6Sn, Ti-29Nb-13Ta-6Sn, Ti-16Nb-13Ta-4Mo, and Ti-29Nb-13Ta-4.6Zr.

[0026] The step (S20) of controlling the surface roughness of the titanium implant substrate controls the surface roughness of the titanium implant substrate to promote the attachment and growth of bone cells.

[0028] FIG. 2 is a diagram showing the step of controlling the surface roughness of a titanium implant substrate according to an embodiment of the present invention.

[0029] Referring to FIG. 2, the step (S20) of controlling the surface roughness of a titanium implant substrate includes a blasting step (S21) of controlling the surface roughness of the titanium implant substrate to a micro size using a blasting method, and an electrolytic polishing step (S22) of controlling the surface roughness of the titanium implant substrate to a nano size by electrolytic polishing the titanium implant substrate.

[0030] The blasting step (S21) controls the surface roughness by spraying bioabsorbable material particles, such as HA (Hydroxyapatite) or β-TCP (β-Tricalcium Phosphate), onto the surface of the titanium implant substrate. According to the embodiment, the surface of the titanium implant substrate has a surface roughness of 1 to 10 μm through the blasting step.

[0031] HA (Hydroxyapatite) is one of the components of teeth and bones and promotes bone ingrowth.

[0032] β-TCP (β-Tricalcium Phosphate) particles are biodegradable absorbable materials with excellent bone-forming ability. β-TCP has relatively weaker mechanical strength than HA.

[0033] According to an embodiment, the blasting step (S21) can form a porous structure on the surface of a titanium implant substrate by spraying a powder mixed with HA particles and β-TCP particles onto the surface of the titanium implant substrate. During the process of the HA particles and β-TCP particles colliding with the surface of the titanium implant substrate, the particles can penetrate into the porous structure.

[0034] The electrolytic polishing step (S22) involves immersing the titanium implant substrate, which has completed the blasting step (S21), in an electrolytic polishing solution and applying an electric current to electrolytically polish the surface of the titanium implant substrate.

[0035] FIG. 3 is a drawing showing an electrolytic polishing device according to an embodiment of the present invention.

[0036] Referring to FIG. 3, an electrolytic polishing liquid is filled into the chamber (110) of an electrolytic polishing device (100), and a temperature control device (120) and a stirrer (130) are provided. The electrolytic polishing liquid is heated or cooled by the temperature control device (120) to control its temperature. The stirrer (130) stirs the electrolytic polishing liquid while the electrolytic polishing process is in progress.

[0037] A voltage of 0 to 35V is applied through a rectifier (140), and electrolytic polishing occurs on the surface of the titanium implant substrate (WP) due to the voltage difference between the cathode electrode (150) and the anode electrode (160).

[0038] According to an embodiment, the electrolytic polishing process can be carried out for 30 to 600 seconds under conditions of a voltage of 25 to 30 V and a temperature of 20 to 40°C. During the electrolytic polishing process, the anode electrode (160) can move in the up, down, left, and right directions to adjust the distance between it and the cathode electrode (150).

[0039] Through an electrolytic polishing process, pores with a size of 1 to 100 nm are formed on the surface of the titanium implant substrate.

[0040] As described above, in the step (S20) of controlling the surface roughness of the titanium implant substrate, pores of size 1 to 10 μm are formed on the surface of the titanium implant substrate in the blasting step (S21), and subsequently, pores of size 1 to 100 nm are formed in the electrolytic polishing step, so pores of size 1 to 10 μm and pores of size 1 to 100 nm are formed together on the surface of the titanium implant substrate. As a result, the surface area of ​​the titanium implant substrate can be increased.

[0041] When the electrolytic polishing step (S22) is completed, a washing and drying process of the titanium implant substrate is performed. In the washing process, the titanium implant substrate is washed with a washing solution mixed with ethanol and distilled water. In the drying process, the washed titanium implant substrate is dried with an air gun.

[0042] Referring again to FIG. 1, the step (S30) of forming an oxide film on the surface of a titanium implant substrate involves immersing a titanium implant substrate with controlled surface roughness in an electrolyte and forming an oxide film on the surface of the titanium implant substrate through a plasma electrolytic oxidation process.

[0043] The electrolyte is a solution mixed with calcium acetate monohydrate, calcium glycerophosphate, manganese acetate, sodium metasilicate nonahydrate, and distilled water, and may contain 20 mol% of manganese ions relative to calcium ions, 5 mol% of silicon ions relative to phosphorus ions, 0.12 mol L-1 of calcium acetate, 0.02 mol L-1 of calcium glycerophosphate, 0.03 mol L-1 of manganese acetate, and 0.001 mol L-1 of sodium metasilicate.

[0044] FIG. 4 is a diagram showing the step of forming an oxide film on the surface of a titanium implant substrate according to an embodiment of the present invention.

[0045] Referring to FIG. 4, the step (S30) of forming an oxide film on the surface of a titanium implant substrate involves immersing the titanium implant substrate in an electrolyte and applying voltage to a plasma electrolytic oxidation device to form a porous oxide film on the surface of the titanium implant substrate (S31).

[0046] When voltage is applied, oxygen ions are generated on the surface of the titanium implant substrate, and these ions react with titanium to form an oxide film. The thickness, composition, and pore size of the oxide film can be controlled by adjusting the voltage, current density, and electrolyte temperature.

[0047] According to an embodiment, in the step (S30) of forming an oxide film on the surface of a titanium implant substrate, a voltage of 60 to 150 V and 0.1 to 0.5 A / m 2 The current is applied for 60 to 120 seconds, and the temperature of the electrolyte is controlled to 23 to 25°C.

[0048] During the process of oxide film formation, various ions contained in the electrolyte, such as calcium ions, manganese ions, silicon ions, phosphorus ions, magnesium ions, and fluoride ions, are incorporated into the oxide film. The ions contained in the oxide film enhance bioactivity. Calcium ions promote the attachment and growth of osteocytes, while manganese ions increase the corrosion resistance and mechanical properties of biomaterials. Phosphorus ions promote the mineralization of osteocytes, and magnesium ions promote the growth and differentiation of osteocytes and increase bone strength. Additionally, fluoride ions promote bone mineralization and strengthen tooth enamel.

[0049] Once the oxide film formation is complete, the titanium implant substrate is washed (S32). For the washing process, the titanium implant substrate is washed with a washing solution mixed with ethanol and distilled water.

[0050] The titanium implant substrate, after being washed, is provided to a hot water process (S33). The hot water process involves immersing the titanium implant substrate in water heated to 80 to 90°C. The immersion of the titanium implant substrate may be carried out for 5 to 10 minutes.

[0051] When the hot water process (S33) is completed, a deionized water washing process is performed. The deionized water washing process washes the titanium implant substrate, which has completed the hot water process, with ultrapure water.

[0052] Once cleaning is complete, the titanium implant substrate is dried with an air gun (S34).

[0054] The step of coating a biomimetic potassium phosphate compound (S40) involves coating a biomimetic potassium phosphate compound onto the surface of a titanium implant substrate on which an oxide film has been formed.

[0055] Biomimetic potassium phosphate compounds are compounds having a structure, size, and chemical composition similar to bone tissue, selected from hydroxyapatite (HA), biphasic calcium phosphate (BCP), α-tricalcium phosphate (α-TCP), β-tricalcium phosphate (β-TCP), amorphous calcium phosphate (ACP), octacalcium phosphate (OCP), tetracalcium phosphate (TTCP), magnesium-substituted calcium phosphates, and calcium-deficient hydroxyapatite (CDHA), or mixtures thereof. It can be provided.

[0056] Hydroxyapatite (HA) is a major component of human bones and teeth and has high biocompatibility.

[0057] β-tricalcium phosphate (β-TCP) is a biodegradable substance with a speed-controlled degradation that gradually degrades in the body and is replaced by new bone tissue.

[0058] α-tricalcium phosphate (α-Tricalcium Phosphate, α-TCP) has characteristics similar to α-TCP but has a different crystal structure and is highly biodegradable.

[0059] Biphasic calcium phosphate (BCP) is a mixture of hydroxyapatite and β-calcium phosphate, which can control high biocompatibility and biodegradability.

[0060] Amorphous Calcium Phosphate (ACP) is an amorphous form of calcium phosphate that is relatively quickly reabsorbed and can participate in the remineralization process, making it suitable for dental implants.

[0061] Octacalcium phosphate (OCP) is considered a precursor of hydroxyapatite and induces and supports bone or tooth tissue.

[0062] Tetracalcium phosphate (TTCP) provides or enhances antibacterial properties by doping with ions such as fluorine.

[0063] Magnesium-substituted calcium phosphate has improved physical properties and high bioactivity compared to ordinary calcium phosphate due to the addition of magnesium.

[0064] Calcium-deficient hydroxyapatite (CDHA) is a form of hydroxyapatite with an adjusted calcium / phosphorus ratio, and has excellent biocompatibility and biodegradability.

[0065] FIG. 5 is a flowchart showing the step of coating a biomimetic potassium phosphate compound according to an embodiment of the present invention.

[0066] Referring to FIG. 5, the step (S40) of coating a biomimetic potassium phosphate compound includes a deposition step (S41) of depositing the biomimetic potassium phosphate compound onto the oxide film using a plasma spray coating method, and a coating step (S42) of coating the surface of the titanium implant substrate with a calcium phosphate compound colloidal solution in which the biomimetic potassium phosphate compound is dissolved after the deposition step.

[0067] The above deposition step (S41) is a plasma spray coating method, in which a potassium phosphate compound in powder form is sprayed onto the titanium surface using high-temperature plasma to deposit the biomimetic potassium phosphate compound onto the oxide film.

[0068] While plasma spraying coating methods enable high coating speeds and the formation of thick coating films, the adhesion between the oxide film and the biomimetic potassium phosphate compound may be low. To address this issue, an additional coating step is performed.

[0069] The above coating step (S42) uses a sol-kel coating method. In the coating step (S42), a colloidal solution of a calcium phosphate compound mixed with a biomimetic potassium phosphate compound is prepared, and the colloidal solution is coated onto the surface of a titanium implant substrate.

[0070] Biomimetic potassium phosphate compound, alcohol solvent, catalyst, dispersant, and water are used in the preparation of a colloidal solution of calcium phosphate compounds.

[0071] The alcohol solvent dissolves the biomimetic potassium phosphate compound. Ethanol or methanol may be used as the alcohol solvent.

[0072] Acid or base catalysts may be used to control the sol-gel conversion rate and to promote the gelation process.

[0073] Dispersants are included to improve the stability and particle dispersion of the colloidal solution.

[0074] According to an example, the solvent is contained in a volume ratio of 50% relative to the total volume of the calcium phosphate compound colloidal solution, the biomimetic potassium phosphate compound may be contained in a volume ratio of 30 to 50% relative to the solvent volume, and the catalyst may be contained in a volume ratio of 1 to 10% relative to the solvent volume. The dispersant may be contained in a volume ratio of 0.5 to 2% relative to the solvent volume. The remainder of the calcium phosphate compound colloidal solution is water.

[0075] According to another embodiment, the calcium phosphate compound colloidal solution may further include an adjuvant. The adjuvant may be selected from transforming growth factor-beta (TGF-β), bone morphogenetic proteins (BMPs), platelet-derived growth factor (PDGF), and insulin-like growth factors (IGFa), or provided as a mixture thereof.

[0076] TGF-β is an important growth factor involved in various physiological processes such as cell growth, differentiation, angiogenesis, and immune regulation. In bone formation, TGF-β contributes to differentiating bone marrow mesenchymal stem cells into osteoblasts and promoting matrix production. TGF- It is primarily active during the early stages of bone matrix formation, stimulating the synthesis of collagen and other matrix proteins, and reducing bone resorption by inhibiting the formation and function of osteoclasts.

[0077] BMPs are potent stimulants that induce bone formation and healing; various types exist, among which BMP-2, BMP-4, and BMP-7 play particularly important roles in human bone regeneration. BMPs induce osteoprogenitor cells and mesenchymal stem cells to differentiate into osteoblasts, which consequently promotes the formation of new bone tissue. BMP signaling primarily acts through the Smad pathway and increases calcium deposition in the bone matrix.

[0078] PDGF is primarily released from platelets and plays an important role in promoting cell proliferation and wound healing, as well as promoting the repair and growth of connective and vascular tissues. PDGF contributes to bone formation by stimulating the proliferation of mesenchymal and osteoblast cells, and also promotes angiogenesis to increase the blood supply necessary for the bone regeneration process.

[0079] IGFs primarily consist of IGF-1 and IGF-2, which are crucial for promoting cell growth and differentiation. In particular, IGF-1 contributes to increased bone density and joint health. IGFs promote the proliferation and differentiation of osteoblasts, increase the synthesis of bone matrix proteins, and support both the strengthening of existing bone and the formation of new bone. IGF signaling acts primarily by activating the PI3K / Akt pathway.

[0080] The above-mentioned adjuvant is mixed in an alcohol solvent together with a biomimetic potassium phosphate compound. As the adjuvant is incorporated into the coating layer, the bone regeneration and repair processes can be optimized. In particular, it may be useful for fracture healing, artificial bone grafting, and the treatment of various bone diseases.

[0081] When the coating step (S42) is completed, a heat treatment step (S43) is performed. The heat treatment step (S43) improves the bonding strength between the titanium implant substrate and the biomimetic potassium phosphate compound, and the bonding strength between the titanium implant substrate and the auxiliary agent. The heat treatment step (S43) heats the titanium implant substrate with the formed coating layer to a high temperature. According to an example, the titanium implant substrate can be heated to 80 to 90°C for 5 to 10 minutes.

[0082] When the heat treatment step (S43) is completed, the titanium implant substrate is washed with deionized water and then dried with an air gun.

[0084] FIG. 6 is a flowchart showing the step of forming an oxide film on the surface of a titanium implant substrate according to another embodiment of the present invention.

[0085] Referring to FIG. 6, the step (S30) of forming an oxide film on the surface of a titanium implant substrate includes a first plasma electrolytic oxidation process (S310), a plasma surface treatment step (S320), a second plasma electrolytic oxidation process (S330), a washing process (S340), a hot water process (S350), and a washing and drying process (S360).

[0086] The first plasma electrolytic oxidation process (S310) involves immersing a titanium implant substrate in the aforementioned electrolyte and applying voltage to a plasma electrolytic oxidation device to form a porous first oxide film on the surface of the titanium implant substrate. Once the first oxide film is formed, the titanium implant substrate is washed and dried. According to the embodiment, the first plasma electrolytic oxidation process applies a voltage of 60 to 90 V and a current of 0.1 A / m2 for 60 to 90 seconds, and the temperature of the electrolyte is controlled to 23°C.

[0087] The plasma surface treatment step (S320) exposes the titanium implant substrate having the first oxide film formed thereon to a dry plasma process. Through exposure to dry plasma, the bonding strength between various ions contained in the first oxide film, such as calcium ions, manganese ions, silicon ions, phosphorus ions, magnesium ions, and fluoride ions, is improved, and the bonding strength between the first oxide film and the titanium implant substrate can be improved.

[0088] The second plasma electrolytic oxidation process (S330) involves immersing the titanium implant substrate, upon which the plasma surface treatment step has been completed, back into the electrolyte and applying a voltage to the plasma electrolytic oxidation device to form a porous second oxide film on the surface of the titanium implant substrate. At this time, a voltage greater than that applied in the first plasma electrolytic oxidation process is applied. According to an embodiment, the first plasma electrolytic oxidation process is performed using a voltage of 100 to 150 V and 0.2 A / m² 2 A current is applied for 60 to 90 seconds, and the temperature of the electrolyte is controlled to 25℃. The micropores of the second oxide film have a smaller size than the micropores of the first oxide film.

[0089] Subsequently, the washing process (S340), the hot water process (S350), and the washing and drying process (S360) proceed sequentially. Since the washing process (S340), the hot water process (S350), and the washing and drying process (S360) proceed as described above, a detailed explanation is omitted.

[0090] By the step of forming an oxide film on the surface of the titanium implant substrate described above, various ions such as calcium ions, manganese ions, silicon ions, phosphorus ions, magnesium ions, and fluoride ions can be stably contained in the oxide film.

[0092] Although the present invention has been described in detail using preferred embodiments, the scope of the invention is not limited to specific embodiments and should be interpreted by the appended claims. Furthermore, those skilled in the art will understand that many modifications and variations are possible without departing from the scope of the invention. Explanation of the symbols

[0093] S10: Step of preparing the titanium implant substrate S20: Step for controlling the surface roughness of a titanium implant substrate S30: A step of forming an oxide film on the surface of a titanium implant substrate S40: A step of coating a biomimetic potassium phosphate compound on the surface of a titanium implant substrate

Claims

Claim 1 The method comprises the steps of: preparing a titanium implant substrate; controlling the surface roughness of the titanium implant substrate; immersing the titanium implant substrate with controlled surface roughness in an electrolyte and forming an oxide film on the surface of the titanium implant substrate through a plasma electrolytic oxidation process; and coating a biomimetic potassium phosphate compound on the surface of the titanium implant substrate having the oxide film formed thereon, wherein the step of controlling the surface roughness comprises a blasting step of forming a surface roughness of 1 to 10 μm on the surface of the titanium implant substrate using hydroxyapatite or β-TCP (β-Tricalcium Phosphate) particles. The method comprises an electrolytic polishing step in which, after the blasting step, the titanium implant substrate is electrolytically polished for 30 to 600 seconds under electrolytic polishing process conditions of a voltage of 25 to 30 V and a temperature of 20 to 40°C to form a surface roughness of 1 to 100 nm on the surface of the titanium implant substrate, and the step of coating the potassium phosphate compound comprises: a deposition step in which the biomimetic potassium phosphate compound is deposited on the oxide film using a plasma spray coating method; and, after the deposition step, a coating step in which a calcium phosphate compound colloidal solution in which the biomimetic potassium phosphate compound is dissolved is coated on the surface of the titanium implant substrate using a sol-gel coating method. A method for surface treatment of a titanium implant, comprising the step of heat-treating a titanium implant substrate having a coating layer formed thereon at a temperature of 80 to 90°C, wherein the calcium phosphate compound colloidal solution comprises the biomimetic potassium phosphate compound, an alcohol solvent, a catalyst, a dispersant, an auxiliary agent, and water, wherein the biomimetic potassium phosphate compound is present in a volume ratio of 30 to 50% of the volume of the alcohol solvent, the catalyst is present in a volume ratio of 1 to 10% of the volume of the alcohol solvent, the dispersant is present in a volume ratio of 0.5 to 2% of the volume of the alcohol solvent, and the auxiliary agent is one selected from TGF-β, BMPs, PDGF, and IGFa, or a mixture thereof. Claim 2 delete Claim 3 In claim 1, the electrolyte is a solution mixed with calcium acetate monohydrate, calcium glycerophosphate, manganese acetate, sodium metasilicate nonahydrate, and distilled water, wherein the manganese ions relative to calcium ions are 20 mol%, the silicon ions relative to phosphorus ions are 5 mol%, and the calcium acetate is 0.12 mol L -1 , calcium glycerophosphate is 0.02 mol L -1 , manganese acetate 0.03 mol L -1 and sodium metasilicate 0.001 mol L -1 Surface treatment method for titanium implants included in. Claim 4 delete Claim 5 delete

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