Gas diffusing member, and substrate processing equipment having the same

KR103003504B1Active Publication Date: 2026-08-11WONIK IPS CO LTD
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Patent Information

Application Number
KR1020220149704
Authority / Receiving Office
KR · KR
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-11-10
Publication Date
2026-08-11
Estimated Expiration
2042-11-10

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Abstract

The present invention relates to a substrate processing apparatus, and more specifically, to a gas diffusion member of a substrate processing apparatus that performs substrate processing using plasma, and a substrate processing apparatus including the same. The present invention discloses a gas diffusion member installed downstream of a gas introduction channel (171) to diffuse process gas introduced through the gas introduction section, comprising: a main body section (231); a connecting section (232) that surrounds the main body section (231) and is spaced apart from the edge of the main body section (231); and one or more spokes (236) connecting the main body section (231) and the connecting section (232) so as to diffuse process gas through a spaced-apart space (239) between the main body section (231) and the connecting section (232), wherein one or more openings (233) are formed in the main body section (231) so as to be aligned with a virtual line connecting the spokes (236) from the center of the main body section (231).
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Citation Information

Patent Citations

  • Showerhead and apparatus for manufacturing semiconductor having the showerhead

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  • A substrate processing apparatus

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  • Gas diffuser mounting plate for reduced particle generation

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