Substrate processing apparatus and substrate processing method

Abstract

[Project] Reduce the particle level of the substrate after supercritical drying. [Solution] The substrate processing apparatus of the present disclosure is a substrate processing apparatus that performs supercritical drying treatment using a processing fluid in a supercritical state on a substrate having a liquid attached to its surface, and comprises a processing vessel having an internal space in which supercritical drying treatment is performed on the substrate, a processing area in which the processing vessel is arranged, a housing having an incoming / outgoing area for receiving and receiving substrates set therein, a transfer unit installed in the incoming / outgoing area and transferring substrates between a substrate transfer arm that enters the incoming / outgoing area from the outside of the housing, a substrate transfer mechanism that transfers substrates between the transfer unit and the processing vessel, and a gas supply unit installed to supply dry gas to the incoming / outgoing area.

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