Substrate transport device and substrate transport method

Abstract

The present invention provides a substrate conveying device and a substrate conveying method capable of improving control stability by detecting the state of a substrate while it is being conveyed in a substrate conveying area set between a substrate extraction position and a substrate insertion position. The substrate conveying device conveys a substrate between a first chamber and a second chamber and comprises a case, a conveying mechanism installed inside the case for conveying the substrate, and a first detection unit installed inside the case for detecting the state of the substrate conveyed by the conveying mechanism. Inside the case, a first conveying area and a second conveying area are formed for conveying the substrate. The first detection unit forms a first detection area extending in a direction intersecting the conveying direction from the first conveying area to the second conveying area. The first conveying area and the second conveying area are positioned facing each other with the first detection area in between. The first detection unit detects the state of the substrate as the substrate being conveyed along the conveying direction from the first conveying area to the second conveying area passes through the first detection area.

Description

Technology Field

[0001] The present invention relates to a substrate transport device and a substrate transport method. Background Technology

[0002] Conventionally, in the manufacturing field of semiconductors and the like, there exists a technology that uses an industrial substrate transport robot installed in a substrate transport device to take a substrate (e.g., wafer, glass substrate, etc.) out of a container that receives the substrate, transport it to various processing devices, and perform processing on the transported substrate. A substrate transport device transports a substrate between a load port where a container that receives the substrate is placed and a processing device or load lock chamber that processes the substrate, by means of a substrate transport robot acting as a transport mechanism. Furthermore, when transporting a substrate into the substrate transport device, the condition of the substrate being transported by the substrate transport device (e.g., height of the substrate, thickness of the substrate, or amount of bending of the substrate) is detected by a detection unit of the substrate transport device, and the transport operation of the substrate transport robot is controlled based on the detected condition of the substrate. Prior art literature

[0003] [Patent Document 1] Japanese Published Patent No. 2020-92130 The problem to be solved

[0004] Recently, in the field of semiconductor devices, while the integration density of devices is increasing, the miniaturization of devices is also progressing. Accordingly, a method called Panel Level Packaging (hereinafter PLP) is becoming widespread as a packaging technology for high-integration devices. PLP is a method for manufacturing multiple semiconductor packages in batches by arranging multiple chips on a rectangular panel, and various industrial robots are used in semiconductor package manufacturing lines utilizing PLP. PLP includes processes such as coating (encapsulating) the upper surface of a panel on which multiple chips are placed with resin, and there is a problem that panels handled in semiconductor package manufacturing lines utilizing PLP are prone to significant warping in the vertical direction (upward warping, downward warping).

[0005] Inside the FOUP (Front Opening Unified Pod), which is a container for receiving substrates, substrate support portions (hereinafter referred to as slots) are formed at equal intervals, and the spacing between each slot is narrowed to improve the efficiency of receiving substrates. When removing substrates from the FOUP using a substrate transport robot, a robot hand is inserted into the FOUP. However, if the pitch between the slots inside the FOUP is narrow and the substrate bends upward or downward, the gap between the slots into which the robot hand is inserted becomes uneven. Consequently, there is a risk that the robot hand may come into contact with the substrate when the robot hand is inserted in areas where the gap is narrow. Additionally, on the lower surface of the substrate used in PLP, an area where the robot hand may come into contact is predetermined. To prevent particles from adhering to the substrate due to contact between the robot hand and the substrate, the robot hand is required to support the substrate within the said area by using a support member, such as a support pin, to minimize the contact area with the substrate. Additionally, the robot hand is required to support the substrate so that the lower surface of the substrate does not come into contact with the hand member of the robot hand described below, regardless of the shape of the substrate. Furthermore, the robot hand is required to have sufficient rigidity because it handles heavy objects such as substrates on which chips are mounted.

[0006] From the above, it is required that the condition of a substrate being transported by a substrate transport device (e.g., height of the substrate, thickness of the substrate, or amount of warping of the substrate) be detected by a detection unit of the substrate transport device and reflected in the control of the transport operation of the substrate transport device. Here, the installation location of the sensor as the detection unit, that is, the location and range of the detection area formed by the detection unit of the substrate transport device, is related to the control precision of the transport operation of the substrate transport device. For example, if the detection area is set near an opening formed to communicate with a load port where a FOUP is placed or a processing device that processes the substrate, the control stability of the transport operation is insufficient because the detection of the condition of the substrate and the correction of the transport operation according to the detected condition of the substrate occur continuously during the transport operation of the substrate being transported through the opening. In addition, depending on the number of load ports, processing devices, or load lock chambers or the arrangement method, there is a possibility that the number of sensors as detection units for forming the detection area may increase.

[0007] Therefore, the present invention provides a substrate conveying device capable of detecting the state of a substrate while it is being conveyed in a substrate conveying area set between a substrate extraction position and a substrate insertion position and improving control stability, and a substrate conveying method for conveying a substrate by said substrate conveying device. means of solving the problem

[0008] According to the present invention, to achieve the above objective, a substrate conveying device for conveying a substrate between a first chamber and a second chamber is provided, comprising: a case; a conveying mechanism installed inside the case for conveying the substrate; and a first detection unit installed inside the case for detecting the state of the substrate conveyed by the conveying mechanism. Inside the case, a first conveying area and a second conveying area are formed for conveying the substrate. The first detection unit forms a first detection area extending in a direction intersecting the conveying direction from the first conveying area to the second conveying area of ​​the substrate. The first conveying area and the second conveying area are positioned facing each other with the first detection area in between. The first detection unit detects the state of the substrate by the substrate being conveyed along the conveying direction from the first conveying area to the second conveying area passing through the first detection area.

[0009] According to the present invention, to achieve the above objective, a substrate conveying method for conveying a substrate between a first chamber and a second chamber by a substrate conveying device comprises: a substrate conveying device comprising a case; a conveying mechanism installed inside the case for conveying the substrate; and a first detection unit installed inside the case for detecting the state of the substrate conveyed by the conveying mechanism; a first conveying area and a second conveying area formed inside the case for conveying the substrate; the first detection unit forms a first detection area extending in a direction intersecting the conveying direction from the first conveying area to the second conveying area of ​​the substrate; and the first conveying area and the second conveying area are positioned facing each other with the first detection area in between. The substrate conveying method comprises: a conveying process for bringing the substrate into the case; a first conveying process for conveying the substrate along the conveying direction from the first conveying area to the second conveying area; a first detection process for detecting the state of the substrate; and from the case A substrate transport method is provided, comprising a transport process for transporting a substrate, wherein in the first transport process, the first detection unit executes the first detection process and detects the state of the substrate by allowing the substrate, which is transported along the transport direction from the first transport area to the second transport area, to pass through the first detection area. Effects of the invention

[0010] According to the present invention, a substrate conveying device capable of detecting the state of a substrate while it is being conveyed and improving control stability in a substrate conveying area set between a substrate extraction position and a substrate insertion position, and a substrate conveying method for conveying a substrate by said substrate conveying device can be provided. Brief explanation of the drawing

[0011] [Fig. 1] This is a perspective view of a substrate transport system to which a substrate transport device according to one embodiment of the present invention is applied. [Fig. 2] This is a perspective view of the substrate transport device shown in Fig. 1 with part of the case removed. [Fig. 3] This is a perspective view of a substrate transport robot used as a transport mechanism in the substrate transport device shown in Fig. 2. [Fig. 4] This is an explanatory diagram of the AA cross-section of the substrate transport robot as a transport mechanism illustrated in Fig. 3. [Fig. 5] This is an explanatory diagram of the bending state of a substrate supported by a substrate transport robot as a transport mechanism as illustrated in Fig. 4. [Fig. 6] This is a schematic top view of a substrate transport system to which the substrate transport device shown in Fig. 1 is applied. [Fig. 7] This is a schematic side view of the substrate transport system illustrated in Fig. 6. [Fig. 8] This is a schematic side view of another comparative example of the substrate transport system illustrated in Fig. 7. [Fig. 9] This is a schematic side view of another comparative example of the substrate transport system illustrated in Fig. 7. [Fig. 10] This is a schematic top view of the first modified form of the substrate transport system shown in Fig. 6. [Fig. 11] This is a schematic top view of the second modified form of the substrate transport system shown in Fig. 6. [Fig. 12] This is a schematic top view of the third modified form of the substrate transport system shown in Fig. 6. [Fig. 13] This is a schematic top view of the fourth change form of the substrate transport system shown in Fig. 6. [Fig. 14] This is a schematic top view of the fifth change form of the substrate transport system shown in Fig. 6. [Fig. 15] This is a schematic top view of the sixth change form of the substrate transport system shown in Fig. 6. [Fig. 16] This is a schematic top view of the substrate transport device shown in Fig. 2. [Fig. 17] This is a flowchart of a substrate transport method to which the substrate transport device shown in Figs. 1 and 6 is applied. Specific details for implementing the invention

[0012] Hereinafter, exemplary embodiments of the present invention are illustrated in the attached drawings with detailed reference to exemplary embodiments of the present invention. Hereinafter, the flow of a substrate transport device (100) of the present embodiment, a substrate transport system (50) to which the substrate transport device (100) is applied, and a substrate transport method for transporting a substrate (W) by the substrate transport device (100) is described by combining FIGS. 1 to 17, and the spatial coordinate system (XYZ) is described as left-right direction (X), front-back direction (Y), and up-down direction (Z), but this is merely an example of the present invention and the present invention is not limited thereto.

[0013] First, with reference to FIGS. 1 and 2, a substrate transport device (100) of the present embodiment and a substrate transport system (50) to which the substrate transport device (100) is applied will be described. In the present embodiment, the substrate transport device (100) is applied to the substrate transport system (50). Specifically, the substrate transport system (50) has a substrate transport device (100), a plurality (e.g., two) of load ports (52) disposed on one side (e.g., the front side) of the substrate transport device (100), and one processing device (54) disposed on the other side (e.g., the rear side) of the substrate transport device (100). Among these, the substrate transport device (100) is, for example, an Equipment Front End Module (EFEM), the load port (52) is a device for holding a container (H) (for example, a FOUP) that accommodates the substrate (W) and for opening and closing the door of the container (H), and the processing device (54) is a device for processing the substrate (W). The type of processing device (54) can be selected according to the content of the process for processing the substrate (W) (for example, processing required for semiconductor manufacturing processes such as ion implantation or etching). In other unillustrated embodiments, a load lock chamber may be further installed between the substrate transport device (100) and the processing device (54). However, the present invention is not limited thereto.

[0014] Hereinafter, the container (H) placed in the load port (52) is referred to as the first chamber (C1), and the processing device (54) that processes the substrate (W) is referred to as the second chamber (C2), and the structure and transport operation of the substrate transport device (100) will be described. In this embodiment, the substrate transport device (100) comprises a case (110), a transport mechanism (120) installed inside the case (110) for transporting the substrate (W), and a first detection unit (130) installed inside the case (110) for detecting the state of the substrate (W) transported by the transport mechanism (120). As an example, the case (110) has a frame portion (112) (shown in FIG. 2) and a wall portion (114) (shown in FIG. 1) for covering the frame portion (112). Among them, one side of the case (110) (e.g., the front side) communicates with the first chamber (C1) through an opening (O1) provided in the wall (114) of the case (110), and the other side of the case (110) (e.g., the rear side) communicates with the second chamber (C2) through an opening (O2) provided in the wall (114) of the case (110). Additionally, a conveying mechanism (120) is installed between the opening (O1) formed to communicate with the first chamber (C1) and the opening (O2) formed to communicate with the second chamber (C2) inside the case (110). Thus, the substrate conveying device (100) can convey the substrate (W) between the first chamber (C1) and the second chamber (C2) when the opening (O1) and the opening (O2) are opened in the substrate conveying system (50).

[0015] Specifically, the substrate (W) is, for example, a glass substrate used in PLP, and is contained in a container (H) for receiving the substrate (W). The container (H) is placed in a load port (52) and has multiple slots (e.g., 12 slots), and can accommodate multiple substrates (W) by supporting the substrate (W) in each of the multiple slots (details are the same as those described below). In addition, the number of substrates (W) stored in the container (H) can be appropriately selected, and the present invention is not limited thereto. Also, by opening the door of the container (H) through the load port (52), the substrate (W) stored in the container (H) comes into contact with the interior of the case (110), and the substrate (W) can be brought from the container (H) into the interior of the case (110) by the transport mechanism (120). Likewise, it becomes possible to transport a substrate (W) from inside the case (110) to the container (H) by means of a transport mechanism (120). Accordingly, the processing device (54) is equipped with at least one support and can support at least one substrate (W) during the processing process of the substrate (W) (details are the same as those described below). In addition, the number of substrates (W) processed by the processing device (54) (i.e., the number of supports) can be appropriately selected, and the present invention is not limited thereto. Furthermore, by opening the door of the processing device (54), the substrate (W) inside the processing device (54) comes into contact with the inside of the case (110), and the substrate (W) can be brought into the inside of the case (110) from inside the processing device (54) by means of a transport mechanism (120). Likewise, it becomes possible to transport a substrate (W) from inside the case (110) to inside the processing device (54) by means of a transport mechanism (120).

[0016] Additionally, the substrate transport device (100) includes a movable body (116) and a guide structure (118) inside the case (110). The movable body (116) is installed to be movable within the case (110) by means of the guide structure (118). For example, the movable body (116) is attached to a guide structure (118) (e.g., a slide rail structure, a conveyor drive device, etc.) to guide movement in the left and right directions (X), and is made movable in the left and right directions (X) within the case (110) by means of the guide structure (118). Accordingly, the transport mechanism (120) moves to the door position of the load port (52) by means of the movable body (116), and the substrate (W) can be transported between the container (H) and the inside of the case (110). Likewise, the conveying mechanism (120) moves to the door position of the processing device (54) by means of the moving body (116), thereby enabling the transfer of the substrate (W) between the processing device (54) and the inside of the case (110). Thus, the substrate conveying device (100) can convey the substrate (W) between the first chamber (C1), which is a container (H) placed at the load port (52) by the conveying mechanism (120) inside the case (110), and the second chamber (C2), which is a processing device (54).

[0017] Also, as illustrated in FIGS. 2 and 3, the conveying mechanism (120) is a substrate conveying robot having a main body (122), an arm (124) attached to the top of the main body (122), a robot hand (126) attached to the tip of the arm (124), and an arm driving part (128) for driving the arm (124). The main body (122) is attached to a movable body (116) installed inside a case (110) and is installed so as to be movable by the movable body (116). For example, the movable body (116) enables the conveying mechanism (120) to move (slide) in the left and right direction (X) by means of a guide structure (118). The arm portion (124) is attached to the top of the main body portion (122) so that it can extend and rotate within a horizontal plane (a virtual horizontal plane formed by the left-right direction (X) and the front-back direction (Y)) relative to the main body portion (122), and also move up and down in the up-down direction (Z). The arm drive portion (128) is, for example, a motor or transmission mechanism built into the main body portion (122) and provides driving force to the arm portion (124). In other unillustrated embodiments, the arm drive portion (128) may be attached to the outside of the main body portion (122). Accordingly, the substrate transport robot as a transport mechanism (120) drives the arm portion (124) by the arm drive portion (128) to move the robot hand (126) freely (moving up and down, rotating, front and back), and transports the substrate (W) by the robot hand (126). Also, as illustrated in FIGS. 3 to 5, the conveying mechanism (120) has a holding support member (129) that holds and supports the substrate (W) being conveyed. The holding support member (129) is installed on the upper surface (126a) of the robot hand (126) and contacts the lower surface of the substrate (W) being conveyed, thereby holding and supporting the substrate (W) and improving stability when the substrate (W) is conveyed. The first detection member (130) detects the state of the substrate (W) held and supported by the holding support member (129) (for example, the height (T1), thickness (T2) of the substrate (W) shown in FIG. 4, or the amount of bending (T3) of the substrate (W) shown in FIG. 5, etc.) (details are the same as those described below).However, the number, location, or presence or absence of the holding support member (129) can be adjusted as needed. The present invention is not limited thereto. In the case where the robot hand (126) does not have a holding support member (129), the robot hand (126) directly holds and supports the substrate (W) by the upper surface (126a) of the robot hand (126). In one embodiment, the robot hand (126) serves as the holding support member (129).

[0018] Here, the height (T1) of the substrate (W) illustrated in FIG. 4 is, for example, the distance from the lower surface (126b) of the robot hand (126) of the conveying mechanism (120) to the upper surface of the substrate (W) placed on the holding support part (129) of the robot hand (126). Also, the thickness (T2) of the substrate (W) is the distance from the lower surface of the substrate (W) to the upper surface of the substrate (W). The correction of the conveying operation of the conveying mechanism (120) after detecting the state of the substrate (W) by the first detection unit (130) may use the value of the height (T1) of the substrate (W) or the value of the thickness (T2) of the substrate (W). For example, if the substrate (W) is not bent, the substrate (W) can be directly held and supported on the upper surface (126a) of the robot hand (126), and the height (T1) of the substrate (W) can be corrected by assuming that it corresponds to the sum of the thickness (T2) of the substrate (W) and the thickness of the robot hand (126). If the substrate (W) is not bent, the substrate (W) can be held and supported on the holding support part (129), and the height (T1) of the substrate (W) can be corrected by assuming that it corresponds to the sum of the thickness (T2) of the substrate (W) and the height from the lower surface (126b) of the hand to the tip of the holding support part (129) (same as shown in FIG. 4). Also, in the case where the substrate (W) is bent (refer to the substrate (W) in FIG. 5), the height (T1) is the distance from the lower hand surface (126b) of the robot hand (126) of the conveying mechanism (120) to the position where the amount of bending of the substrate (W) is greatest (the uppermost surface of the substrate (W)) placed on the holding support part (129) of the robot hand (126). The amount of bending (T3) of the substrate (W) is the distance from the lower hand surface of the substrate (W) to the uppermost surface of the substrate (W) as shown in FIG. 5. The amount of bending (T3) of the substrate (W) may also be expressed as the distance from the upper hand surface (126a) to the upper surface of the substrate (W) placed on the robot hand (126) when the substrate (W) is directly held and supported on the upper hand surface (126a) of the robot hand (126) as shown in FIG. 5.Correction of the conveying operation of the conveying mechanism (120) after detecting the state of the substrate (W) by the first detection unit (130) may be performed using the value of the height (T1) of the substrate (W) or the value of the bending amount (T3) of the substrate (W). In the correction using the value of the bending amount (T3) of the substrate (W), the thickness of the robot hand (126) which is already known or the height from the lower surface of the hand (126b) which is already known to the tip of the holding support unit (129) is determined. For example, if the substrate (W) is bent, and the substrate (W) is directly held and supported on the upper surface (126a) of the robot hand (126), the correction can be performed by assuming that the height (T1) of the substrate (W) corresponds to the sum of the bending amount (T3) of the substrate (W) and the thickness of the robot hand (126) (same as shown in FIG. 5). Additionally, when the substrate (W) is bent, if the substrate (W) is supported by the holding support member (129), the height (T1) of the substrate (W) can be corrected by assuming that, when the lowest surface of the substrate (W) is placed on the holding support member (129), it corresponds to the sum of the bending amount (T3) of the substrate (W) and the height from the lower surface of the hand (126b) to the tip of the holding support member (129). However, the present invention is not limited thereto.

[0019] In addition, in this embodiment, while the substrate (W) is being transported by the transport mechanism (120) inside the case (110), the state of the substrate (W) is detected by the first detection unit (130) installed inside the case (110). In particular, as shown in Figure 6, a first transport area (TR1) and a second transport area (TR2) are formed inside the case (110) where the substrate (W) is transported. The first detection unit (130) forms a first detection area (DR1) that detects the state of the substrate (W). The first detection area (DR1) extends in a direction (e.g., the forward / backward direction (Y)) that intersects the transport direction (D) from the first transport area (TR1) of the substrate (W) to the second transport area (TR2). The first transport area (TR1) and the second transport area (TR2) are positioned facing each other with the first detection area (DR1) in between. In other words, the first detection area (DR1) is located between the first return area (TR1) and the second return area (TR2). Accordingly, the first detection unit (130) detects the state of the substrate (W) as the substrate (W) being returned along the return direction (D) from the first return area (TR1) to the second return area (TR2) passes through the first detection area (DR1).

[0020] Specifically, the substrate transport device (100) is installed between a plurality (e.g., two) first chambers (C1) and one second chamber (C2). The case (110) of the substrate transport device (100) includes a first wall portion (114a) having a periphery portion (E1) formed to form an opening (O1) communicating with the first chamber (C1), a second wall portion (114b) having a periphery portion (E2) formed to form an opening (O2) communicating with the second chamber (C2) opposite the first wall portion (114a), a third wall portion (114c) and a fourth wall portion (114d) connecting the first wall portion (114a) and the second wall portion (114b), and forms an internal space that is rectangular when viewed from above to below (when viewed from a plane) in the case (110). Among them, the first wall section (114a) is connected to a plurality of first chambers (C1) and also has a peripheral section (E1) for forming a plurality of openings (O1) arranged in a row. The first conveying area (TR1) and the second conveying area (TR2) each face one of the plurality of openings (O1) of the first wall section (114a).

[0021] Additionally, the first detection unit (130) is a line sensor and comprises a first light-emitting unit (132) (first light-emitting unit) that emits detection light forming a first detection area (DR1) and a first light-receiving unit (134) (first light-receiving unit) that receives the detection light. Within the case (110), the first light-receiving unit (134) is positioned opposite the first light-emitting unit (132) at a predetermined distance from the first light-emitting unit (132). At least one of the first light-emitting unit (132) or the first light-receiving unit (134) is fixed to a first wall (114a), which is a wall (114) adjacent to the first chamber (C1) of the case (110). For example, the first light-emitting part (132) is installed on the first wall part (114a) adjacent to the first chamber (C1) of the case (110) and emits detection light toward the opposing second wall part (114b), and the first light-receiving part (134) is installed at a position opposite to the first light-emitting part (132) of the second wall part (114b) and receives the detection light emitted by the first light-emitting part (132). Accordingly, the first light-emitting part (132) and the first light-receiving part (134) as the first detection part (130) form a first detection area (DR1) between the first wall part (114a) and the second wall part (114b).

[0022] Specifically, the first light-emitting unit (132) emits a strip-shaped detection light (L) (shown in FIG. 4 and FIG. 5) having a range of predetermined dimensions in the vertical direction (Z). The strip-shaped detection light (L) is extended from the first light-emitting unit (132) toward the first light-receiving unit (134) to form a first detection area (DR1). The first light-receiving unit (134) receives the light emitted by the first light-emitting unit (132) on the light-receiving surface of an unillustrated line-shaped CCD sensor. Furthermore, it is preferable that the vertical dimension of the strip-shaped detection light (L) is greater than the height (T1), thickness (T2) (shown in FIG. 4), or bending amount (T3) (shown in FIG. 5) of the substrate (W) held and supported by the robot hand (126) of the conveying mechanism (120). The vertical dimension of the strip-type detection light (L) of this embodiment includes the area from the lower surface (126b) of the robot hand (126) to the upper surface of the substrate (W) supported by the robot hand (126). The first detection unit (130) detects the state of the substrate (W) (e.g., the height (T1), thickness (T2) of the substrate (W) shown in FIG. 4, or the amount of bending (T3) of the substrate (W) shown in FIG. 5, etc.) by passing the strip-type detection light (L) directed toward the first light-emitting unit (132) or the first light-receiving unit (134) in the optical path (i.e., the first detection area (DR1)) between the first light-emitting unit (132) and the first light-receiving unit (134) so ​​that the robot hand (126) holding and supporting the substrate (W) blocks it.

[0023] As an example, the first detection area (DR1) formed by the first detection unit (130) is formed to extend from between two adjacent openings (O1) among the plurality of openings (O1) of the first wall unit (114a) as shown in FIG. 6 toward the second wall unit (114b) which is a wall unit facing the first wall unit (114a), and is formed to extend in a horizontal direction (e.g., forward direction (Y)) orthogonal to the return direction (D) from the first return area (TR1) to the second return area (TR2), and is also formed to extend in a horizontal direction as shown in FIG. 7. However, in other unillustrated embodiments, the first light-emitting part (132) of the first detection part (130) may be installed on the second wall part (114b) of the case (110) to emit light for detection toward the opposite first wall part (114a), and the first light-receiving part (134) may be installed on the first wall part (114a) of the case (110) to receive the light emitted by the first light-emitting part (132). The installation position of the first detection part (130) may not interfere with the transport path through the opening (O1) or opening (O2) of the substrate (W) (for example, installed between a plurality of openings (O1) or installed on the lower edge of one opening (O2), and may only form a first detection area (DR1) between the first wall part (114a) and the second wall part (114b). Additionally, the first detection unit (130) may employ a detection means other than a line sensor composed of a first light-emitting unit (132) and a first light-receiving unit (134). In other unillustrated embodiments, the first detection unit (130) may employ a vision sensor such as a reflective optical line sensor, a line sensor camera, or an area sensor camera. For example, if the first detection unit (130) is a vision sensor, the vision sensor may be fixed to only one of the first wall (114a) or the second wall (114b), which are wall parts (114) adjacent to the first chamber (C1) of the case (110), and a first detection area (DR1) may be formed between the first wall (114a) and the second wall (114b).In this case, the state of the substrate (W) can be detected based on the captured image of the vision sensor (e.g., the height (T1), thickness (T2) of the substrate (W) shown in FIG. 4, or the amount of warping (T3) of the substrate (W) shown in FIG. 5, etc.). The present invention is not limited thereto.

[0024] In the substrate transport device (100), the first detection unit (130) forms a first detection area (DR1) inside the case (110), and in the internal space of the case (110), one side of the first detection area (DR1) (e.g., the left side of FIG. 6) is the first transport area (TR1), and the other side of the first detection area (DR1) in the internal space of the case (110) (e.g., the right side of FIG. 6) is the second transport area (TR2). Thus, when the substrate (W) is transported along the transport direction (D) from the first transport area (TR1) to the second transport area (TR2) by the transport mechanism (120), the substrate (W) passes through the first detection area (DR1) located between the first transport area (TR1) and the second transport area (TR2), and the state of the substrate (W) can be detected by the first detection unit (130). As an example, the first detection area (DR1) formed by the first detection unit (130) is formed to extend from between two adjacent openings (O1) among the plurality of openings (O1) of the first wall unit (114a) as shown in FIG. 6 toward the second wall unit (114b) which is a wall unit facing the first wall unit (114a), and is formed to be orthogonal to the return direction (D) from the first return area (TR1) to the second return area (TR2) (e.g., to extend toward the front-back direction (Y)), and also extends in a horizontal direction as shown in FIG. 7. However, the present invention is not limited thereto.

[0025] To explain in detail, the first transport area (TR1) and the second transport area (TR2) formed inside the case (110) in the substrate transport device (100) are two transport areas separated by the first detection area (DR1) formed by the first detection unit (130) inside the case (110). A substrate transport device (100) receives a substrate (W) from a second chamber (C2) along the receiving direction (D1) by, for example, a transport mechanism (120), then transports the substrate (W) along the transport direction (D) from a first transport area (TR1) to a second transport area (TR2), and then transports the substrate (W) to a first chamber (C1) along the export direction (D2) (refer to the dotted line and arrow in FIG. 6). Additionally, during the process of transporting the substrate (W), the substrate (W) passes through a first detection area (DR1), and the state of the substrate (W) is detected by a first detection unit (130). As an example, the transport direction (D) from the first transport area (TR1) to the second transport area (TR2) intersects the receiving direction (D1) and the export direction (D2) of the substrate (W) (for example, orthogonal). In another unillustrated embodiment, the substrate transport device (100) receives the substrate (W) from the first chamber (C1) by means of a transport mechanism (120), transports the substrate (W) along a transport direction (D) from the first transport area (TR1) to the second transport area (TR2), and then transports the substrate (W) to the second chamber (C2). Additionally, during the process of transporting the substrate (W), it is possible to pass the substrate (W) through a first detection area (DR1) and detect the state of the substrate (W) by the first detection unit (130).

[0026] In addition, to improve the detection precision of the first detection unit (130), it is desirable that each of the first return area (TR1) and the second return area (TR2) inside the case (110) has a size that includes at least the entire substrate (W). To explain further, the first return area (TR1) is an area having a size such that the return mechanism (120) can hold and support the substrate (W) before it is returned from the first return area (TR1) to the second return area (TR2) without overlapping with at least the first detection area (DR1), or an area having a size that includes at least the entire substrate (W) when the case (110) is viewed in a planar view. Likewise, the second return area (TR2) is an area having a size such that the return mechanism (120) can hold and support the substrate (W) after it has been returned from the first return area (TR1) to the second return area (TR2) without overlapping with at least the first detection area (DR1), or an area having a size such that the entire substrate (W) is included when the case (110) is viewed from a flat plane. For example, when applied to a substrate return system (50) having a plurality of first chambers (C1), the first detection unit (130) of the substrate return device (100) is installed between the opening (O1) communicating with the plurality of first chambers (C1) to form a first return area (TR1) and a second return area (TR2) having a size such that at least two left and right substrates (W) are included inside the case (110). Thus, when transporting the substrate (W) along the transport direction (D) from the first transport area (TR1) to the second transport area (TR2), the first detection area (DR1) can be passed over the entire substrate (W), and since the first detection unit (130) can detect the state of the substrate (W) over the entire front surface of the substrate (W), detection leakage is eliminated and reliability can be increased.

[0027] In other unillustrated embodiments, changes from the substrate transport device (100) with reference to FIG. 6 are listed below. Based on the substrate transport device (100) of FIG. 6, the first detector (130) installed on the first wall (114a) may be formed to extend obliquely toward the second wall (114b) as the opposing wall, and may intersect obliquely with the transport direction (D) from the first transport area (TR1) to the second transport area (TR2). Each of the first transport area (TR1) and the second transport area (TR2) only needs to have a size that includes at least the entire substrate (W). Also, the first detector (130) does not need to be fixed to the first wall (114a) adjacent to the first chamber (C1) of the case (110). For example, it is possible to form the first detection unit (130) by installing it on the upper or lower wall inside the case (110) so that the first detection area (DR1) extends in the vertical direction (Z). Alternatively, it is possible to form the first detection unit (130) by installing it on the third wall (114c) or the fourth wall (114d) inside the case (110) so that the first detection area (DR1) extends in the horizontal direction (X). The first detection unit (130) is capable of detecting the state of the substrate (W) as the substrate (W) being transported along the transport direction (D) from the first transport area (TR1) to the second transport area (TR2) passes through the first detection area (DR1).

[0028] Also, as illustrated in FIG. 7, the opening (O1) formed in the first wall portion (114a) and the opening (O2) formed in the second wall portion (114b) of the substrate transport device (100) have different height positions in the vertical direction (Z) of the case (110). The first detection area (DR1) formed by the first detection portion (130) extends from the first wall portion (114a) toward the second wall portion (114b) and is also formed to be located between the opening (O1) formed in the first wall portion (114a) and the opening (O2) formed in the second wall portion (114b). For example, if the height position of the opening (O1) formed in the first wall portion (114a) is lower than the height position of the opening (O2) formed in the second wall portion (114b), the first detection unit (130) is installed at a height position corresponding to the central portion between the upper and lower portions of the opening (O1) at a location between a plurality of openings (O1) arranged in the left-right direction (X) from the first wall portion (114a) and provided at the same height position, and forms a first detection area (DR1) toward a height position corresponding to the lower portion of the opening (O2) formed in the second wall portion (114b), and forms the first detection area (DR1) between the opening (O1) and the opening (O2).

[0029] To explain in detail, as illustrated in FIG. 7, the second chamber (C2) as a processing device (54) in the substrate transport device (100) has a support (P). The support (P) can support at least one substrate (W) during the processing process of the substrate (W). An opening (O2) for communicating with the second chamber (C2) of the case (110) is installed to correspond to the position of the support (P) (for example, the support (P) is installed near the upper edge of the opening (O2). Also, the first chamber (C1) as a container (H) has a plurality of slots (S). The slots (S) can support the substrate (W) stored in the container (H). An opening (O1) for communicating with the first chamber (C1) of the case (110) is installed to correspond to the positions of a plurality of slots (S) (for example, a plurality of slots (S) are installed to be arranged along the vertical direction (Z) from the upper edge to the lower edge of the opening (O1). A conveying mechanism (120) conveys the substrate (W) extracted from the opening (O1) to the height where the first detection unit (130) is located, in order to pass the substrate (W) into the first detection area (DR1) formed by the first detection unit (130). Specifically, the conveying mechanism (120) moves the substrate (W) along the vertical direction (Z) from the height position of the substrate (W) intake / output position of the opening (O1) to the height position of the first detection unit (130). Likewise, the conveying mechanism (120) conveys the substrate (W) extracted from the opening (O2) to the height where the first detection unit (130) is located, so that the substrate (W) passes into the first detection area (DR1) formed by the first detection unit (130). Specifically, the conveying mechanism (120) moves the substrate (W) along the vertical direction (Z) from the height position of the substrate (W) intake / output position of the opening (O2) to the height position of the first detection unit (130).

[0030] Therefore, if the distance between the height of the input / output position of the substrate (W) of the opening (O1) and the height of the first detection unit (130) is long, the distance of the arm unit (124) moving up and down in the vertical direction (Z) becomes long, and thus the cycle time becomes long, and the throughput performance is impaired. Similarly, if the distance between the height of the input / output position of the substrate (W) of the opening (O2) and the height of the first detection unit (130) is long, the distance of the arm unit (124) moving up and down in the vertical direction (Z) becomes long, and thus the cycle time becomes long, and thus the throughput performance is impaired. Accordingly, in the embodiment of FIG. 7, by installing the first detection area (DR1) between the opening (O1) and the opening (O2), the lifting distance is shortened compared to the case where the first detection area (DR1) is not between the opening (O1) and the opening (O2) (e.g., the position shown in FIG. 9), even when the substrate (W) is removed from one of the openings and transported to the position of the first detection unit (130). Therefore, the cycle time in the substrate transport operation is shortened, and throughput performance can be improved.

[0031] Specifically, the first detection unit (130) is preferably installed to form a first detection area (DR1) between a base (P) installed near the upper edge of the opening (O2) and the lower edge of the opening (O1) (for example, in the installation range (SR1) shown in FIG. 7). As an example, as shown in FIG. 7, the first detection area (DR1) is provided between a height position corresponding to the approximate center of the opening (O1) and a height position corresponding to the approximate lower edge of the opening (O2). Accordingly, when a substrate (W) brought in from a base (P) through an opening (O2) is transferred to a predetermined slot (S) through an opening (O1), the transfer mechanism (120) performs a downward movement from the height position of the base (P) to the height position of the first detection unit (130), and a rising / falling movement from the height position of the first detection unit (130) to several height positions of the plurality of slots (S) (refer to the dotted line and arrow in FIG. 7). Likewise, when a substrate (W) brought in from any one of the plurality of slots (S) through an opening (O1) is transferred to a base (P) through an opening (O2), the transfer mechanism (120) performs a rising / falling movement from the height position of any one of the plurality of slots (S) to the height position of the first detection unit (130), and a rising movement from the height position of the first detection unit (130) to the height position of the base (P). Since the first detection area (DR1) is formed between the opening (O1) and the opening (O2), even when the substrate (W) is extracted from one of the openings and transported to the height position of the first detection unit (130), the substrate (W) does not move to a height position lower than the opening (O1) located below or higher than the opening (O2) located above, so the lifting distance is shortened. Therefore, the cycle time in the substrate transport operation is shortened, and throughput performance can be improved.

[0032] Referring to an embodiment as another comparative example, a first detection area (DR1) may be set between a support (P) installed near the upper edge of the opening (O2) with respect to the height position of the first detection unit (130) and the upper part of the opening (O1) (e.g., the top slot (S)) (e.g., in the installation range (SR2) shown in FIG. 8). As an example, as shown in FIG. 8, the first detection area (DR1) is provided between a height position above the upper edge of the opening (O1) and a height position corresponding to approximately the upper edge of the opening (O2). Accordingly, when a substrate (W) brought in from a base (P) through an opening (O2) is transferred to a predetermined slot (S) through an opening (O1), the transfer mechanism (120) moves from the height position of the base (P) to the height position of the first detection unit (130) (almost the same height) and performs a lifting operation to descend from the height position of the first detection unit (130) to the height position of one of the plurality of slots (S) (refer to the dotted line and arrow in FIG. 8). Likewise, when a substrate (W) brought in from one of the multiple slots (S) through the opening (O1) is transferred to a base (P) through the opening (O2), the transfer mechanism (120) performs a lifting operation of rising from a height position of one of the multiple slots (S) to a height position of the first detection unit (130), and moving from a height position of the first detection unit (130) to a height position of the base (P) (almost the same height). Since the first detection area (DR1) is formed between the opening (O1) and the opening (O2), even when the substrate (W) is taken out from one of the openings and transferred to a height position of the first detection unit (130), the substrate (W) does not move to a height position lower than the opening (O1) located below or higher than the opening (O2) located above, so the lifting distance is shortened. Therefore, the cycle time in the substrate transport operation is shortened, making it possible to improve throughput performance.

[0033] Additionally, in the vertical direction (Z), the first detection unit (130) may be installed to form a first detection area (DR1) between the base (P) installed near the upper edge of the opening (O2) and the lower edge of the opening (O1) (in the installation range (SR1)) as shown in FIG. 7, or may be installed to form a first detection area (DR1) between the base (P) installed near the upper edge of the opening (O2) and the upper part of the opening (O1) (for example, the top slot (S)) (in the installation range (SR2)) as shown in FIG. 8. Among these, it is preferable that the first detection unit (130) be installed to form a first detection area (DR1) at the same height as the base (P). For example, when the base (P) is installed near the upper edge of the opening (O2), a first detection area (DR1) is formed above the opening (O1) and near the upper edge of the opening (O2), as shown in FIG. 8. In this case, the first detection area (DR1) may be formed in an installation range (SR2) located between the base (P) and the upper part of the opening (O1) (e.g., the top slot (S)), or in an installation range (SR1) located between the base (P) and the lower edge of the opening (O1). When the first detection area (DR1) is formed at the same height as the base (P), no elevation occurs in the movement between the height position of the base (P) and the height position of the first detection unit (130), regardless of the distance from the height position of the first detection unit (130) to the height position of the opening (O1). Accordingly, when the return mechanism (120) returns a substrate (W) brought in from a base (P) or a predetermined slot (S) to the predetermined slot (S) or base (P), the lifting and lowering motion that reciprocates in the vertical direction (Z) can be avoided, and the lifting distance is shortened. Accordingly, the cycle time in the substrate return operation is shortened, and throughput performance can be improved. Likewise, if the base (P) is installed near the lower edge of the opening (O2), a first detection area (DR1) may be formed at the same height as the base (P). The present invention is not limited thereto.

[0034] In this regard, referring to an embodiment as a comparative example opposite to FIG. 7 and 8, as shown in FIG. 9, the first detection unit (130) is installed to form a first detection area (DR1) below the opening (O1), rather than between the opening (O1) and the opening (O2). In this case, even if the substrate (W) is brought in from one of the openings, the conveying mechanism (120) needs to move the substrate (W) to the height position of the first detection unit (130) installed below the openings (O1) and the opening (O2). That is, the lifting distance of the conveying mechanism (120) in the substrate conveying operation becomes longer (refer to the dotted line and arrow in FIG. 9). Therefore, it is preferable to avoid forming the first detection area (DR1) at a height position below the opening (O1) or above the opening (O2). The present invention is not limited thereto.

[0035] In other unillustrated embodiments, changes from the substrate transport device (100) with reference to FIG. 7 are listed below. Regarding the arrangement of the first detection unit (130), the first detection area (DR1) does not have to be formed to extend in a horizontal direction. For example, based on the substrate transport device (100) of FIG. 7, the first detection area (DR1) may be formed to extend obliquely toward the second wall (114b). For example, the first detection area (DR1) is formed to extend upward from a height position corresponding to the lower edge of the opening (O1) located further down toward a height position corresponding to the lower edge of the opening (O2) located further up. Thus, when transporting the substrate (W), the first detection area (DR1) can be passed through the substrate (W) to detect the state of the substrate (W) by the first detection unit (130). Additionally, although an embodiment has been described in which the first detection area (DR1) is formed to be located between openings (O1) and (O2) at different heights, in other unillustrated embodiments, the heights of the openings (O1) and (O2) may be the same, and the first detection area (DR1) may be formed at a location separated from the openings (O1) and (O2) in the vertical direction (Z) (for example, the first detection area (DR1) is formed at a location lower than the lower edge of the openings (O1) and (O2). When transporting the substrate (W), the first detection area (DR1) is passed through the substrate (W), and the state of the substrate (W) can be detected by the first detection unit (130).

[0036] To explain further, the first detection unit (130) detects the state of the substrate (W) being returned. As an example, the first detection unit (130) detects the distance from the return mechanism (120) to the upper surface of the substrate (W) as the height (T1) of the substrate (W) being returned. For example, as shown in FIGS. 4, 6, and 7, when the substrate (W) being returned by the return mechanism (120) is returned along the return direction (D) from the first return area (TR1) to the second return area (TR2), the height (T1) of the substrate (W) being returned is detected by the detection light emitted by the first detection unit (130) as it passes through the first detection area (DR1) formed by the first detection unit (130). The height (T1) of the substrate (W) is, for example, the distance from the lower hand surface (126b) of the robot hand (126) of the conveying mechanism (120) to the upper surface of the substrate (W), as shown in FIG. 4. Preferably, the substrate (W) is held and supported by a plurality of holding support members (129) (shown in FIG. 3 and FIG. 4) disposed on the upper surface of the robot hand (126) of the conveying mechanism (120), and is detected by the first detection unit (130) during the conveying process. Specifically, the first detection unit (130) detects the position of the shadow created by the robot hand (126) holding and supporting the substrate (W) blocking the range of the detection light emitted from the first light-emitting unit (132) as the light reception result of the first light-receiving unit (134), thereby detecting the distance between the upper surface of the substrate (W) and the lower hand surface (126b) of the robot hand (126) holding and supporting the substrate (W) as the height. That is, the first detection unit (130) is a sensor for detecting the state (e.g., height (T1)) of the substrate (W) being returned. Then, the return mechanism (120) raises and lowers, for example, the arm unit (124) in the vertical direction (Z) based on the detection result (e.g., height (T1) of the substrate (W)) to adjust the height of the robot hand (126) that holds and supports the substrate (W).

[0037] Specifically, when the conveying mechanism (120) takes the substrate (W) out of the container (H), it inserts the robot hand (126) into the gap between the slots (S) of the container (H). However, as previously mentioned, in addition to the spacing of each slot (S) becoming narrower than before due to the narrow pitch, if there is a large bend in the substrate (W), there is a risk of interference between the substrate (W) or the robot hand (126) and the slot (S) or another substrate (W) placed in the corresponding slot (S). To prevent this interference, as shown in FIG. 2, the substrate transport device (100) is equipped with a control unit (C) (shown in FIG. 2) that controls the transport mechanism (120). The control unit (C) drives the arm (124) according to the height (T1) of the substrate (W) detected by the first detection unit (130) to raise and lower the robot hand (126) that holds and supports the substrate (W) in the vertical direction (Z) to a height position where no interference occurs, thereby adjusting the height position of the robot hand (126). More specifically, the control unit (C) has information such as the height or gap of each slot (S) of the container (H) that has been measured in advance by other sensors not shown, and combines that information with the height (T1) of the substrate (W) to adjust the height position of the robot hand (126) so that no interference occurs. If the control unit (C) determines that interference cannot be avoided even if the height position of the robot hand (126) is adjusted due to the large bending of the substrate (W), it outputs a signal to the return mechanism (120) to stop the introduction of the substrate (W) into the container (H) as an error. The substrate (W) whose introduction into the container (H) has been stopped is removed from the substrate return device (100) by an operator or returned to an unillustrated recovery unit within the case (110) by the return mechanism (120). The operation of the control unit (C) is as described below. Furthermore, detecting the state of the substrate (W) may involve detecting not only the height (T1) of the substrate (W) but also the thickness (T2) of the substrate (W) or the amount of bending of the substrate (W) relative to the robot hand (126) (for example, the amount of bending of the substrate (W) shown in FIG. 5, T3). The present invention is not limited thereto.

[0038] Also, with reference to FIGS. 10 to 15, a different modified form of the substrate transport device (100) applied to the substrate transport system (50) will be described. Specifically, the substrate transport device (100) shown in FIG. 6 is installed between a plurality of first chambers (C1) and one second chamber (C2), but the substrate transport device (100A) shown in FIG. 10 is installed between a plurality (e.g., two) of first chambers (C1) and a plurality (e.g., two) of second chambers (C2). Accordingly, the substrate transport device (100A) communicates with the first chamber (C1) through a plurality of openings (O1) provided in the first wall portion (114a) and communicates with the second chamber (C2) through a plurality of openings (O2) provided in the second wall portion (114b). As an example, the first detection area (DR1) formed by the first detection unit (130) of the substrate transport device (100A) is provided between a plurality of openings (O1) of the first wall portion (114a) as shown in FIG. 10 (for example, at a location at a height corresponding to the upper or lower edge of the opening (O1)), and is formed to extend toward the space between a plurality of openings (O2) provided in the second wall portion (114b) as a wall portion facing the first wall portion (114a), and is also extended in a horizontal direction (it may be extended at an angle in the vertical direction (Z) rather than the horizontal direction).

[0039] Likewise, the substrate transport device (100) illustrated in FIG. 11 is installed between one first chamber (C1) and one second chamber (C2). Accordingly, the substrate transport device (100B) communicates with the first chamber (C1) through one opening (O1) installed in the first wall portion (114a) and communicates with the second chamber (C2) through one opening (O2) installed in the second wall portion (114b). As an example, the first detection area (DR1) formed by the first detection unit (130) of the substrate transport device (100B) is formed to extend toward the vicinity of the opening (O2) provided in the second wall unit (114b) as a wall unit facing the first wall unit (114a), as shown in FIG. 11 (e.g., a location at a height corresponding to the upper or lower edge), and also extends in a horizontal direction (it may be extended at an angle in the vertical direction (Z) rather than the horizontal direction).

[0040] As can be seen from this, the number of first chambers (C1) and second chambers (C2) applied to the substrate transport system (50) may be adjusted as needed (it is also possible to have multiple of both). In addition, the number or location of the openings (O1) and openings (O2) of the substrate transport devices (100) to (100B) applied to the substrate transport system (50) may be adjusted according to the number of first chambers (C1) and second chambers (C2). Furthermore, the first detection unit (130) installed in the substrate transport devices (100) to (100B) may adjust the formation location or range of the first detection area (DR1) according to the number or location of the openings (O1) and openings (O2). The present invention does not limit the number of first chambers (C1) and second chambers (C2) applied to the substrate transport system (50), the number or location of openings (O1) and openings (O2) provided in the substrate transport devices (100) to (100B) applied to the substrate transport system (50), the location of the first detection unit (130) installed in the substrate transport devices (100) to (100B), or the formation location or range of the first detection area (DR1).

[0041] Also, the substrate transport device (100) to (100B) illustrated in FIGS. 6, 10 and 11 is installed between the first chamber (C1) and the second chamber (C2) facing each other, and the first detection area (DR1) formed by the first detection unit (130) installed on the first wall (114a) is formed to extend from the first wall (114a) toward the second wall (114b) facing the first wall (114a), but the substrate transport device (100C) illustrated in FIG. 12 is installed between the first chamber (C1) and the second chamber (C2) which are installed orthogonally. In this case, since the first wall portion (114a), which is provided with an opening (O1) communicating with the first chamber (C1) in the substrate transport device (100C), and the second wall portion (114b), which is provided with an opening (O2) communicating with the second chamber (C2), are installed orthogonally, the first detection area (DR1) formed by the first detection unit (130) installed in the first wall portion (114a) is formed to extend from the first wall portion (114a) toward another wall portion (114) facing the first wall portion (114a). For example, the first light-emitting unit (132) is installed near the opening (O1) of the first wall portion (114a) (at a location such as the lower edge), and the first light-receiving unit (134) is installed on another wall portion (114) facing the first wall portion (114a). Among these, the first detection area (DR1) may be formed to extend along the front-rear direction (Y) (orthogonal to the return direction (D)) or to extend obliquely along the front-rear direction (Y) (intersecting the return direction (D)). Similarly, the first detection area (DR1) may be formed to extend in the horizontal direction or to extend obliquely with respect to the up-down direction (Z).

[0042] Likewise, the substrate transport device (100D) illustrated in FIG. 13 is installed on the same side of the first chamber (C1) and the second chamber (C2), which are installed in a left-right direction. In this case, since the first wall portion (114a) in which an opening (O1) communicating with the first chamber (C1) is installed and the second wall portion (114b) in which an opening (O2) communicating with the second chamber (C2) is installed are installed in a left-right direction, the first detection area (DR1) formed by the first detection portion (130) installed in the first wall portion (114a) is formed to extend from the first wall portion (114a) toward another wall portion (114) facing the first wall portion (114a). For example, the first light-emitting part (132) is installed at a location (such as a lower edge) close to the second wall part (114b) of the first wall part (114a), and the first light-receiving part (134) is installed on another wall part (114) facing the first wall part (114a). Among these, the first detection area (DR1) may be formed to extend along the front-rear direction (Y) (to be orthogonal to the conveying direction (D)) or may be formed to extend at an angle with respect to the front-rear direction (Y) (to intersect with the conveying direction (D). Likewise, the first detection area (DR1) may be formed to extend in the horizontal direction or may be formed to extend at an angle with respect to the up-down direction (Z).

[0043] As can be seen from this, the first chamber (C1) and the second chamber (C2) applied to the substrate transport system (50) do not need to be installed facing each other. The positions of the first chamber (C1) and the second chamber (C2) may be adjusted as needed (it is also possible to have multiple of both). In addition, the positions of the first wall (114a) and the second wall (114b) of the substrate transport device (100) to (100D) applied to the substrate transport system (50) may be adjusted according to the positions of the first chamber (C1) and the second chamber (C2). Furthermore, the first detection unit (130) installed on the first wall (114a) of the substrate transport device (100) to (100D) preferably forms a first detection area (DR1) extending from the first wall (114a) toward another wall (114) facing the first wall (114a). It is not necessary to form a first detection area (DR1) from the first wall (114a) toward the second wall (114b). However, the first detection area (DR1) may be formed at an angle from the first wall (114a) toward the second wall (114b) that is not opposite to the first wall (114a). The present invention does not limit the location of the first chamber (C1) and the second chamber (C2) applied to the substrate transport system (50), the location of the first wall (114a) and the second wall (114b) installed in the substrate transport device (100) to (100D) applied to the substrate transport system (50), the location of the first detection unit (130) installed in the substrate transport device (100) to (100D), or the location or range of the formation of the first detection area (DR1).

[0044] Also, the substrate transport device (100) to (100D) illustrated in FIG. 6, FIG. 10 to FIG. 13 has four wall sections (114), including a first wall section (114a) and a second wall section (114b), and forms an internal space that is rectangular when viewed from above to below in the case (110). However, the substrate transport device (100E) illustrated in FIG. 14 has six wall sections (114), including one first wall section (114a) that has an opening (O1) communicating with one first chamber (C1) and a plurality of (e.g., two) second wall sections (114b) that have an opening (O2) communicating with a plurality of second chambers (C2), and forms an internal space that is hexagonal when viewed from above to below in the case (110). In this case, in the substrate transport device (100E), the first detection area (DR1) formed by the first detection unit (130) installed on the first wall (114a) is formed to extend from the first wall (114a) toward the center of the case (110). For example, the first light-emitting unit (132) is installed at a corner (such as a lower edge) of the first wall (114a), and the first light-receiving unit (134) is installed in the center facing the first wall (114a) of the case (110). In other unillustrated embodiments, the first detection area (DR1) formed by the first detection unit (130) installed on the first wall (114a) may be formed to extend from the first wall (114a) toward the second wall (114b) opposite the first wall (114a), or may be formed to extend from the first wall (114a) toward the two second walls (114b), or may be formed to extend from a wall (114) other than the first wall (114a) toward the center of the case (110) or another wall (114).

[0045] As can be seen here, the case (110) installed in the substrate transport device (100) to (100E) does not need to form an internal space that is rectangular when viewed from above to below. The case (110) may form an internal space that is different in shape depending on the number or arrangement method of the wall portions (114). In other unillustrated embodiments, the case (110) may form an internal space that is triangular when viewed from above to below by three wall portions (114), or may form an internal space that is circular when viewed from above to below by one wall portion (114) that is continuously formed as a curved surface. Also, the first detection area (DR1) formed by the first detection unit (130) does not need to be completely divided into a first transport area (TR1) and a second transport area (TR2) inside the case (110). The spaces on both sides facing each other of the first detection area (DR1) are defined as the first return area (TR1) and the second return area (TR2), and the first return area (TR1) and the second return area (TR2) are formed with the first detection area (DR1) in between. When returning a substrate (W) along the return direction (D) from the first return area (TR1) to the second return area (TR2), it is sufficient to simply pass the first detection area (DR1) through the substrate (W) and detect the state of the substrate (W) by the first detection unit (130). The present invention does not limit the configuration of the case (110) (such as the number or position of the wall portion (114)) or the position or range of the first detection area (DR1).

[0046] In addition, in the substrate transport device (100) illustrated in FIG. 6, the transport mechanism (120) itself is installed to be movable between the first chamber (C1) and the second chamber (C2) by means of a movable body (116) and a guide structure (118) (identical to those illustrated in FIG. 2 and FIG. 3) (i.e., self-moving type). In other unillustrated embodiments, the transport mechanism (120) itself in the substrate transport device (100) is installed to be immovable between the first chamber (C1) and the second chamber (C2) (i.e., fixed type). That is, when a self-moving type transport mechanism (120) is adopted, the substrate transport device (100) has a movable body (116) and a guide structure (118) installed inside the case (110) as illustrated in FIG. 6. In this case, the conveying mechanism (120) itself can move in the left and right directions (X) by means of the movable body (116) and the guide structure (118) along with the extension, lifting, and turning of the arm part (124) and the main body part (122), thereby conveying the substrate (W) between the first chamber (C1) and the second chamber (C2). Thus, the structural complexity of the arm part (124) can be avoided. On the other hand, when a fixed type conveying mechanism (120) is adopted, the substrate conveying device (100) omits structures such as the movable body (116) and the guide structure (118) inside the case (110) and directly fixes the conveying mechanism (120) to the case (110) (for example, the main body part (122) of the conveying mechanism (120) is fixed to the bottom of the case (110). In this case, the conveying mechanism (120) has the extension, lifting, and rotation of the arm portion (124) having multiple joints and the main body portion (122), and conveys the substrate between the first chamber (C1) and the second chamber (C2). Thus, structural complexity of the case (110) can be avoided. The substrate conveying devices (100A) to (100E) shown in FIGS. 10 to 14 can also be adjusted to either a self-contained type or a fixed type conveying mechanism (120). However, the present invention is not limited thereto.

[0047] In addition, in the substrate transport device (100) illustrated in FIG. 6, the first detector (130) is installed between two adjacent openings (O1) among a plurality of openings (O1) of the first wall portion (114a), and the first detection area (DR1) formed by the first detector (130) forms a first transport area (TR1) and a second transport area (TR2) having almost the same size. In other embodiments, the position of the first detector (130) and the sizes of the first transport area (TR1) and the second transport area (TR2) are not limited thereto. As an example, as illustrated in FIG. 15, the first wall portion (114a) of the case (110) in the substrate transport device (100F) is installed to be extended toward one side (e.g., the right side), and the first detection portion (130) is installed at a position (e.g., the right end) that is one side of the plurality of openings (O1) of the first wall portion (114a) to form a first detection area (DR1) at a position one side of the plurality of openings (O1). The size of the first transport area (TR1) is larger than the size of the second transport area (TR2). In this case, the substrate (W) is conveyed by the conveying mechanism (120) along the conveying direction (D) from the first conveying area (TR1) to the second conveying area (TR2), and the first detection unit (130) can detect the state of the substrate (W) as the substrate (W) conveyed along the conveying direction (D) from the first conveying area (TR1) to the second conveying area (TR2) passes through the first detection area (DR1). As can be seen from this, the installation location of the first detection unit (130) and the first detection area (DR1), and the size of the first conveying area (TR1) and the second conveying area (TR2) separated by the first detection area (DR1), etc., can be adjusted as needed. The present invention is not limited thereto.

[0048] Also, referring to FIG. 2 and FIG. 16, in this embodiment, a first detection unit (130) is installed in the substrate transport device (100) to detect the state of the substrate (W) (height (T1), thickness (T2), bending amount (T3), etc. of the substrate (W)). The substrate transport device (100) may further be provided with a second detection unit (140) installed inside the case (110) to detect the position of the substrate (W) being transported by the transport mechanism (120). As an example, the second detection unit (140) may use a line sensor in the same way as the first detection unit (130). The second detection unit (140) is installed on the second wall (114b), which is the wall (114) adjacent to the second chamber (C2) of the case (110), and is installed in the case (110) corresponding to the opening (O2) of the processing device (54) (second chamber (C2)) to form a second detection area (DR2) that extends in the vertical direction (Z) of the case (110) and detects the position of the substrate (W) in the horizontal direction that intersects the vertical direction (Z). Accordingly, the first detection area (DR1) formed by the first detection unit (130) and the second detection area (DR2) formed by the second detection unit (140) are formed to intersect (for example, orthogonally) when viewed from the side of the case (110). Thus, unlike the role of the first detection area (DR1), the second detection area (DR2) is used to detect the left-right direction (X) position of the substrate (W) when the substrate (W) is returned to the substrate placement position (support (P) shown in FIG. 7) of the processing device (54) (second chamber (C2)) (e.g., when the substrate (W) is removed from the inside of the case (110) through the opening (O2) to the substrate placement position (support (P)) of the second chamber (C2)). Specifically, the second detection area (DR2) detects the position of the edge of the substrate (W) relative to the substrate placement position (support (P)). The substrate placement position (support (P), slot (S)) is the position where the substrate (W) is placed inside the first chamber (C1) or the second chamber (C2).For example, the substrate placement position (slot (S)) in the first chamber (C1) is the inner position of the FOUP side wall where the slot (S) forming the same horizontal plane among the plurality of slots formed in the FOUP supports the substrate (W), and the substrate placement position (support (P)) in the second chamber (C2) is the position where a support is installed to temporarily place the substrate (W) when transporting the substrate (W) between the case (110) and the processing device (54) (second chamber (C2)), but the present invention is not limited thereto.

[0049] For example, the second detection unit (140) comprises a second light-emitting unit (142) (second light-emitting unit) that emits detection light to form a second detection area (DR2), and a second light-receiving unit (144) (second light-receiving unit) that receives the detection light. At least one of the second light-emitting unit (142) or the second light-receiving unit (144) is installed on the second wall (114b) adjacent to the second chamber (C2) of the case (110). For example, the second light-emitting unit (142) is installed on the upper edge and side corners of the opening (O2) provided in the second wall (114b), and the second light-receiving unit (144) is installed on the lower edge and side corners of the opening (O2) provided in the second wall (114b). A second light-emitting unit (142) emits detection light from above toward below along the side of the opening (O2), and a second light-receiving unit (144) receives the detection light, thereby forming a second detection area (DR2) that extends in the vertical direction (Z) along the side of the opening (O2). In this case, the second detection area (DR2) is formed at a position that does not overlap with the transport path of the substrate (W) that is transported from inside the case (110) through the opening (O2) to the substrate placement position (support (P)) of the second chamber (C2) by the transport mechanism (120). Therefore, the second detection area (DR2) and the substrate (W) transported to the substrate placement position (support (P)) of the second chamber (C2) do not interfere with each other. However, the present invention is not limited thereto. The second detection area (DR2) may be formed at a position overlapping with the transport path of the substrate (W) that is transported from inside the case (110) through the opening (O2) to the substrate placement position (support (P)) of the second chamber (C2) by the transport mechanism (120).

[0050] Additionally, the second detection area (DR2) is preferably used to detect the position of the edge of the substrate (W) on one side of the left-right direction (X) of the substrate (W) when the substrate (W) is being transported to the substrate placement position (support (P)) of the processing device (54) (second room (C2)). In other words, the second detection unit (140) detects the position of the shadow or change in light intensity that occurs when the substrate (W) being transported by the transport mechanism (120) is located in the second detection area (DR2), thereby blocking a portion of the detection light emitted from the second light-emitting unit (142). This detects the relative position of the substrate (W) in the left-right direction (X) with respect to the transport mechanism (120) (specifically, the robot hand (126)). Specifically, the second detection unit (140) detects a substrate misalignment in the left-right direction (X) that cannot be detected in the first detection area (DR1) (equivalent to a misalignment between the centerline (L1) of the robot hand (126) and the centerline (L2) of the substrate (W). As an example, the operation of bringing the substrate (W) to the second detection area (DR2) may be an orthogonal operation in which the robot hand (126) is brought to a predetermined position in the front-back direction (Y) relative to the opening (O2) (moved in the front-back direction (Y)) and then moved to the second detection area (DR2) in the left-right direction (X), or it may be an operation in which the substrate is moved from a predetermined position separated from the opening (O2) to a coordinate position in the second detection area (DR2) (including inclined movement). Additionally, for the detection of the substrate (W) by the second detection area (DR2), the second detection unit (140) may calculate the center position of the substrate (W) from the amount of detection light shielded by the substrate (W) in the second detection area (DR2), or the second detection unit (140) may calculate the center position of the substrate (W) from the position by specifying the on / off switching position of the detection light as the edge position of the substrate (W).Based on the detection result, the substrate (W) is inserted at a position where the centerline (L3) of the opening (O2) and the centerline (L2) of the substrate (W) held and supported by the robot hand (126) are aligned (for example, the operation of the conveying mechanism (120) is controlled by the control unit (C) described later).

[0051] To explain further, as an example of correction by the second detection unit (140), the position of the robot hand (126) in the left and right directions (X) is corrected by the sum of a predetermined value (a) and a shielding amount (b), thereby allowing the substrate (W) held and supported by the robot hand (126) to be transferred to the second chamber (C2) without collision. The predetermined value (a) is the distance between the end of the second detection area (DR2) (here, the left end) and the end of the support (P) (here, the right end), and is a value uniquely determined from the layout of the substrate transfer device (100). Therefore, as the second chamber (C2) is arranged for the second detection area (DR2), the predetermined value (a) may become 0. Additionally, the shielding amount (b) is the distance between the edge of the substrate (W) (here, the right edge) and the end of the second detection area (DR2) (here, the left edge), and is a value that can be determined by the range of detection light forming the second detection area (DR2) that is blocked by the substrate (W). As an example of correction by the second detection unit (140), the position of the robot hand (126) in the left / right direction (X) is corrected by the sum of the shielding amount (b) and a predetermined value (a), thereby allowing the substrate (W) held and supported by the robot hand (126) to be transferred to the second chamber (C2) without collision. However, in the case of the above correction, the actual center position (center line (L2)) of the substrate (W) and the center position (center line (L3)) of the base (P) (second chamber (C2)) are not necessarily limited to coincide as the size of the substrate (W) and the size of the base (P) are balanced. Additionally, although the second detector (140) is applied to the second chamber (C2), in other unillustrated embodiments, the second detector (140) may be installed on the first chamber (C1) side to perform approximately the same operation.In this case, it is preferable that the second detection area (DR2) be formed at a location that does not overlap with the transport path of the substrate (W) being transported from inside the case (110) through the opening (O1) to the substrate placement position (slot (S)) of the first chamber (C1) by the transport mechanism (120) (i.e., the second detection area (DR2) and the substrate (W) being transported to the substrate placement position (slot (S)) of the first chamber (C1) do not interfere with each other), but the present invention is not limited thereto. Additionally, the second detection unit (140) may employ a vision sensor such as a reflective optical line sensor, a line sensor camera, or an area sensor camera, and the structure and location of the second detection unit (140), the location or range of the second detection area (DR2) formed by the second detection unit (140), or whether or not the second detection unit (140) is installed may be adjusted as needed. The present invention is not limited thereto.

[0052] With continued reference to FIGS. 6 and FIG. 17, a substrate transport method for transporting a substrate (W) between a first chamber (C1) and a second chamber (C2) by a substrate transport device (100) in the present embodiment will be described. As an example, the substrate transport method is suitable for transporting a substrate (W) between a first chamber (C1) and a second chamber (C2) by a substrate transport device (100). The substrate transport method may also transport a plurality of substrates (W) by repeating the transport from the first chamber (C1) to the second chamber (C2) and the transport from the second chamber (C2) to the first chamber (C1). The substrate transport method includes the following processes. Incoming process S01: Incoming a substrate (W) into a case (110). Transport process S02: Transporting a substrate (W) to a case (110). First detection process S03: Detecting the state of the substrate (W). Second detection process S04: Detects the position of the substrate (W) in the horizontal direction intersecting the vertical direction (Z). Dispatch process S05: Dispatches the substrate (W) from the case (110). Among these, the return process S02 includes the following process. First return process S021: Returns the substrate (W) along the return direction (D) from the first return area (TR1) to the second return area (TR2). Second return process S022: Returns the substrate (W) so that the substrate (W) faces the second detection area (DR2). Accordingly, the first detection process S03 is executed in the first return process S021 to detect the state of the substrate (W), and the second detection process S04 is executed in the second return process S022 to detect the position of the substrate (W) in the horizontal direction.

[0053] To explain in detail, the receiving process S01 brings a substrate (W) into the case (110). For example, as shown in FIG. 6, a conveying mechanism (120) installed inside the case (110) inserts a robot hand (126) into a processing device (54) as a second chamber (C2) through an opening (O2) by moving an arm part (124) (shown in FIG. 3), holds and supports the substrate (W) by a holding support part (129), and also returns the robot hand (126) to the case (110) through the opening (O2) by moving the arm part (124) (for example, moves to the case (110) along the receiving direction (D1), and brings the substrate (W) held and supported on the upper surface of the robot hand (126) by the holding support part (129) into the case (110). As a result, the return mechanism (120) can bring a substrate (W) into the interior of the case (110) from the processing device (54) as the second chamber (C2). However, it is also possible to bring the substrate (W) into the case (110) from the first chamber (C1) in the bringing process S01. The present invention is not limited to these.

[0054] Next, the return process S02 includes all operations of returning a substrate (W) inside the case (110) between the first chamber (C1) and the second chamber (C2). The return process S02 includes a first return process S021 and a second return process S022. The first return process S021 returns the substrate (W) along the return direction (D) from the first return area (TR1) to the second return area (TR2). The second return process S022 returns the substrate (W) so that the substrate (W) faces the second detection area (DR2). Specifically, in the return process S02 (including the first return process S021 and the second return process S022), the substrate (W) held and supported by the robot hand (126) inside the case (110) is returned by the movement of the main body part (122) (shown in FIG. 3) of the return mechanism (120). Among these, the first return area (TR1) is an area located at the end of the path for bringing the substrate (W) into the case (110) from the second chamber (C2) or the first chamber (C1), and the second return area (TR2) is an area located at the starting point of the path for subsequently returning the substrate (W) from the inside of the case (110) to the first chamber (C1) or the second chamber (C2). Accordingly, in the first return process S021, the substrate (W) is returned from the first return area (TR1) facing the opening (O2) or opening (O1) that must pass through in the receiving process S01 to the second return area (TR2) facing the opening (O1) or opening (O2) that must pass through in the outgoing process S05.

[0055] And the first detection process S03 detects the state of the substrate (W) during the process in which the first return process S021 is executed. The first detection unit (130) executes the first detection process S03 and detects the state of the substrate (W) by having the substrate (W), which is returned along the return direction (D) from the first return area (TR1) to the second return area (TR2), pass through the first detection area (DR1) located between the first return area (TR1) and the second return area (TR2). That is, the first detection process S03 is executed during the process in which the first return process S021 is executed and detects the state of the returned substrate (W) by the first detection unit (130). For example, in the first conveying process S021, at the point when the substrate (W) being conveyed by the conveying mechanism (120) passes through the first detection area (DR1) along the conveying direction (D), the first detection process S03 is executed to detect the state of the substrate (W) by the first detection unit (130). As an example, in the first conveying process S021, the conveying direction (D) from the first conveying area (TR1) to the second conveying area (TR2) is preferably intersected (e.g., orthogonal) with the receiving direction (D1) and the receiving direction (D2) of the substrate (W), but the present invention is not limited thereto.

[0056] In addition, based on the structure of the substrate transport device (100) of FIGS. 6 and 7, in this embodiment, in order to execute the first detection process S03 during the process of executing the first transport process S021, the first detection process S03 detects the state of the substrate (W) (height (T1), thickness (T2), amount of warping (T3), etc.) of the substrate (W) from one edge of the substrate (W) to the other edge of the substrate (W). Specifically, as shown in FIGS. 4 and 5, the first detection process S03 can detect the state of the substrate (W) (height (T1), thickness (T2), amount of warping (T3), etc.) of the substrate (W) based on the amount of detection of the strip-shaped detection light (L). For example, the distance from the conveying mechanism (120) to the upper surface of the substrate (W) (for example, from the lower surface of the robot hand (126) to the upper surface of the substrate (W)) is detected as the height (T1) of the substrate (W) being conveyed in the first detection process S03.

[0057] Likewise, in the second return process S022, the substrate (W) is returned so that it faces the second detection area (DR2). As an example, in the second return process S022, the substrate (W) is returned along the left-right direction (X) so that it passes through the second detection area (DR2). In that case, the second return process S022 may return the substrate (W) along the return direction (D), as in the first return process S021. However, in the operation of facing the second detection area (DR2) in the second return process S022, the specific direction of operation is not specified and can be adjusted as needed. Also, in the second return process S022, when returning the substrate (W) to the substrate placement position (support (P)) of the processing device (54) (second chamber (C2)), the second detection process S04 is executed by passing the substrate (W) through the second detection area (DR2). That is, the second detection process S04 is executed during the execution of the second return process S022, and the position of the returned substrate (W) is detected by the second detection unit (140). For example, in the second return process S022, the second detection process S04 is executed at the point when the substrate (W) returned by the return mechanism (120) passes through the second detection area (DR2) toward the substrate placement position (support (P)) of the processing device (54) (second room (C2)), and the position of the substrate (W) is detected by the second detection unit (140). In other words, the second detection process S04 detects the relative position of the substrate (W) in the left-right direction (X) with respect to the return mechanism (120) (robot hand (126)) by the second detection unit (140). That is, a second conveying process S022 and a second detection process S04 are executed to correct the position of the substrate (W) toward the outgoing process S05 (for example, to convey the substrate (W) so as to align the aforementioned centerline (L2) and centerline (L3). In this case, it is preferable to use the second chamber (C2) as the outgoing destination for the outgoing process S05.In another unillustrated embodiment, it is also possible to install a second detection unit (140) in the first chamber (C1), use the first chamber (C1) as the destination in the outgoing process S05, and in the second return process S022, have the substrate (W) being returned by the return mechanism (120) pass through the second detection area (DR2) toward the substrate placement position (slot (S)) of the first chamber (C1) to execute the second detection process S04 and detect the position of the substrate (W) by the second detection unit (140). Accordingly, the second return process S022 and the second detection process S04 are not limited to processes executed to correct the position of the substrate (W) toward the outgoing process S05. Additionally, the order of the first detection process S03 and the second detection process S04 can be adjusted according to conditions such as the order in which the substrate (W) passes through the first detection area (DR1) and the second detection area (DR2) when it is transported, that is, the position of the first detection area (DR1) and the second detection area (DR2). However, the present invention does not limit the installation of the second detection unit (140), that is, the presence or absence of the second detection process S04.

[0058] In addition, in this embodiment, as shown in FIG. 2, the substrate transport device (100) is equipped with a control unit (C) (shown in FIG. 2) that controls the transport mechanism (120) and controls the operation of the transport mechanism (120). The control unit (C) may, for example, be installed in the case (110) of the substrate transport device (100), may be installed in the transport mechanism (120) of the substrate transport device (100), or may be installed outside the substrate transport device (100) separately from the substrate transport device (100). The control unit (C) only needs to be electrically connected to the transport mechanism (120) to control the transport mechanism (120). In addition, the control unit (C) may calculate the state (height, etc.) of the substrate (W) or the position of the substrate (W) based on information from the first detection unit (130) or the second detection unit (140). Accordingly, in order to execute the first detection process S03 during the execution of the first return process S021, the control unit (C) controls the operation of the return mechanism (120) according to the state of the substrate (W) detected in the first detection process S03 in the first return process S021 (height (T1), thickness (T2), bending amount (T3), etc. of the substrate (W)). For example, in the first return process S021, when the substrate (W) being returned by the return mechanism (120) passes through the first detection area (DR1), information regarding the state of the substrate (W) detected in the first detection process S03 (height (T1), thickness (T2), amount of bending (T3), etc.) is obtained, and then the control unit (C) controls the operation of the return mechanism (120) moving through the first detection area (DR1) to the second return area (TR2) according to the information detected in the first detection process S03, so that the state of the returned substrate (W) can be adjusted to a preset condition.Likewise, in order to execute the second detection process S04 while the second return process S022 is being executed, the operation of the return mechanism (120) is controlled according to the relative position in the left and right direction (X) of the return mechanism (120) (robot hand (126)) with respect to the substrate (W) detected in the second detection process S04 in the second return process S022. For example, in the second return process S022, when the substrate (W) being returned by the return mechanism (120) passes through the second detection area (DR2), information regarding the relative position of the substrate (W) detected in the second detection process S04 in the left and right direction (X) with respect to the return mechanism (120) (robot hand (126)) is obtained, and thereafter, the control unit (C) controls the operation of the return mechanism (120) moving through the second detection area (DR2) to the second return area (TR2) according to the information detected in the second detection process S04, and can make the state of the returned substrate (W) match the preset conditions.

[0059] Finally, the discharge process S05 discharges the substrate (W) from the case (110). For example, as shown in FIG. 6, the discharge mechanism (120) installed inside the case (110) inserts the robot hand (126) into the container (H) as the first chamber (C1) through the opening (O1) by moving the arm part (124) (shown in FIG. 3) (for example, moving into the first chamber (C1) along the discharge direction (D2), discharges the substrate (W) held and supported on the upper surface of the robot hand (126) by the holding support part (129) from the case (110) to store the substrate (W) in the slot (S) of the container (H), and also returns the robot hand (126) to the case (110) through the opening (O1) by moving the arm part (124). As a result, the return mechanism (120) can transfer a substrate (W) from inside the case (110) to a container (H) as the first chamber (C1). However, in the transfer process S05, it is also possible to transfer a substrate (W) from the case (110) to the second chamber (C2). Furthermore, the substrate return device (100) that completes the transfer process S05 proceeds to the next process. For example, the return mechanism (120) transfers the next substrate (W) from the processing device (54) as the second chamber (C2) to the container (H) as the first chamber (C1), or transfers the next substrate (W) from the container (H) as the first chamber (C1) to the processing device (54) as the second chamber (C2). The present invention is not limited thereto. Additionally, although the contents and sequence of each process of the above-described substrate transport method have been explained using the substrate transport device (100) illustrated in FIGS. 1 to 7 and FIG. 16 as an example, they are applied to the substrate transport devices (100A) to (100F) illustrated in FIGS. 10 to 15 or the substrate transport method of the present invention. The contents and sequence of each process of the substrate transport method can be adjusted according to structural differences between the substrate transport devices (100A) to (100F).

[0060] In summary, the substrate conveying device and the substrate conveying method can convey a substrate between a first chamber and a second chamber. In the substrate conveying device, a first conveying area and a second conveying area are formed inside a case where the substrate is conveyed, and a first detection unit forms a first detection area that extends in a direction intersecting the conveying direction from the first conveying area to the second conveying area of ​​the substrate, and the first conveying area and the second conveying area are located on opposite sides where the first detection area is positioned between them and the first detection area faces each other. Accordingly, when the conveying mechanism conveys the substrate along the conveying direction from the first conveying area to the second conveying area, the substrate passes through the first detection area and detects the state of the substrate by the first detection unit. Thus, the present invention provides a substrate conveying device and a substrate conveying method capable of improving control stability by detecting the state of the substrate while the substrate is being conveyed in a substrate conveying area set between the substrate extraction position and the substrate insertion position.

[0061] Finally, to clarify, the above embodiments are used only to describe the technical design of the present invention and are not limited thereto. Although the present invention has been described in detail with reference to the above embodiments, as will naturally be understood by those skilled in the art, modifications or equivalent substitutions of some or all technical features can still be made to the technical design described in the above embodiments, provided that such modifications or substitutions do not cause the essence of the corresponding technical design to deviate from the scope of the technical design of the embodiments of the present invention. Industrial applicability

[0062] The present invention provides a substrate transport device and a substrate transport method capable of improving control stability by detecting the state of a substrate while it is being transported in a substrate transport area set between a substrate extraction position and a substrate insertion position. Explanation of the symbols

[0063] 50 Substrate transport system, 52 Load port, 54 Processing device, 100~100F Substrate transport device, 110 Case, 112 Frame part, 114 Wall part, 114a First wall part, 114b Second wall part, 114c Third wall part, 114d Fourth wall part, 116 Moving body, 118 Guide structure, 120 Transport mechanism, 122 Main body part, 124 Arm part, 126 Robot hand, 126a Upper hand surface, 126b Lower hand surface, 128 Arm drive part, 129 Holding support part, 130 First detection part, 132 First light emitting part, 134 First light receiving part, 140 Second detection part, 142 Second light emitting part, 144 Second light receiving part, a Determined value, b Shielding amount, C Control part, C1 Room 1, C2 Room 2, D Return Direction, D1 Inbound Direction, D2 Outbound Direction, DR1 First Detection Area, DR2 Second Detection Area, E1 Peripheral Part, E2 Peripheral Part, H Container, L Detection Light, L1 Centerline of Robot Hand, L2 Centerline of Substrate, L3 Centerline of Opening, O1 Opening, O2 Opening, P Support, S Slot, S01 Inbound Process, S02 Return Process, S021 First Return Process, S022 Second Return Process, S03 First Detection Process, S04 Second Detection Process, S05 Outbound Process, SR1 Installation Range, SR2 Installation Range, T1 Height, T2 Thickness, T3 Warping Amount, TR1 First Return Area, TR2 Second Return Area, W Substrate, X Left / Right Direction, Y Front / Back Direction, Z Up / Down Direction

Claims

Claim 1 A substrate conveying device for conveying a substrate between a first chamber and a second chamber comprises a case, a substrate conveying robot installed inside the case for conveying the substrate, and a first detection unit for detecting at least one of the height, thickness, and amount of warping of the substrate being conveyed by the substrate conveying robot in a first detection area, wherein the case has a first opening communicating with the first chamber and a second opening communicating with the second chamber, wherein the case has a first conveying area and a second conveying area formed inside the case for conveying the substrate, wherein each of the first conveying area and the second conveying area inside the case has a size that includes at least the entire substrate when viewed from a planar perspective, and the first detection area extends in a direction intersecting the conveying direction of the substrate from either the first conveying area or the second conveying area to the other of the first conveying area and the second conveying area, and the first conveying area and the second conveying A substrate transport device characterized in that the regions are positioned facing each other with the first detection region in between. Claim 2 delete Claim 3 A substrate transport device according to claim 1, wherein the size of the first transport area is such that the substrate transport robot can hold and support the substrate before it is transported from the first transport area to the second transport area without overlapping with the first detection area, and the size of the second transport area is such that the substrate transport robot can hold and support the substrate after it is transported from the first transport area to the second transport area without overlapping with the first detection area. Claim 4 A substrate conveying device according to claim 1, wherein the substrate conveying robot has a holding support member that holds and supports the substrate being conveyed, and the first detection member detects at least one of the height, thickness, and amount of bending of the substrate held and supported by the holding support member. Claim 5 A substrate transport device according to claim 1, further comprising a control unit for controlling the substrate transport robot, wherein the control unit corrects the transport operation of the substrate transport robot based on at least one of the height, thickness, and bending amount of the detected substrate. Claim 6 A substrate transport device according to claim 1, further comprising a control unit for controlling the substrate transport robot, wherein the substrate transport robot has a holding support member for holding and supporting the substrate to be transported, the first chamber is a container having a plurality of slots that are placed at a load port and can support the substrate, and after the substrate is brought into the case from the second chamber, the substrate passes through the first detection area while the substrate is being transported along the transport direction from the first chamber to the second chamber, and after the first detection unit detects the height of the substrate held and supported by the holding support member, the substrate is discharged from the case to the container, and while the substrate is being discharged to the container, the control unit adjusts the height position of the holding support member based on the detected height of the substrate. Claim 7 delete Claim 8 A substrate transport device according to claim 1, wherein the case comprises a first wall portion having a peripheral portion formed thereon for forming the first opening, and the first detection area is formed to extend from the first wall portion toward a wall portion opposite the first wall portion. Claim 9 delete Claim 10 delete Claim 11 delete Claim 12 A substrate transport device according to claim 8, wherein the first opening is provided in plurality, the peripheral portions forming each of the plurality of first openings are provided in the first wall portion, the first transport area and the second transport area are opposite to any one of the plurality of first openings, and the first detection area extends from between two adjacent first openings of the first wall portion toward the wall portion opposite the first wall portion. Claim 13 A substrate transport device according to claim 1, wherein, in the vertical direction of the case, the height position of the first opening is different from the height position of the second opening, and the first detection area is located between the first opening and the second opening in the vertical direction of the case. Claim 14 A substrate transport device according to claim 1, wherein the first detection unit comprises a first light-emitting unit that emits detection light forming the first detection area and a first light-receiving unit that receives the detection light, and at least one of the first light-emitting unit or the first light-receiving unit is fixed to a wall adjacent to the first chamber of the case. Claim 15 A substrate transport device according to claim 1, further comprising a second detection unit installed inside the case and detecting the position of the substrate to be transported by the substrate transport robot, wherein the second detection unit forms a second detection area extending in the vertical direction of the case and detects the position of the substrate in a horizontal direction intersecting the vertical direction. Claim 16 A substrate transport device according to claim 15, wherein the second detection unit comprises a second light-emitting unit that emits detection light forming the second detection area and a second light-receiving unit that receives the detection light, and at least one of the second light-emitting unit or the second light-receiving unit is installed on a wall adjacent to the second chamber of the case. Claim 17 A substrate transport device according to claim 15, wherein the second detection area is formed at a position that does not overlap with the second opening. Claim 18 A substrate conveying method for conveying a substrate between a first chamber and a second chamber by a substrate conveying device, wherein the substrate conveying device comprises a case, a substrate conveying robot installed inside the case for conveying the substrate, and a first detection unit for detecting at least one of the height, thickness, and warping amount of the substrate being conveyed by the substrate conveying robot, wherein a first conveying area and a second conveying area are formed inside the case for conveying the substrate, and the first detection unit forms a first detection area extending in a direction intersecting the conveying direction from the first conveying area to the second conveying area of ​​the substrate, and wherein the first conveying area and the second conveying area are positioned facing each other with the first detection area in between, and wherein the substrate conveying method comprises an receiving process for bringing the substrate into the case from one of the first chamber and the second chamber, a first conveying process for conveying the substrate along the conveying direction from the first conveying area to the second conveying area, and the height, thickness, and A substrate transport method comprising a first detection process for detecting at least one of the bending amounts, and a discharge process for discharging the substrate from the case to the other of the first chamber and the second chamber after the first detection process is completed, wherein in the first transport process, the first detection unit executes the first detection process when the substrate being transported along the transport direction from the first transport area to the second transport area passes through the first detection area. Claim 19 delete Claim 20 A substrate transport method according to claim 18, wherein detection by the first detection unit is performed by a strip-shaped detection light having a predetermined dimension, and the first detection process detects at least one of the height, thickness, and bending amount of the substrate based on the amount of detection of the strip-shaped detection light. Claim 21 delete Claim 22 In claim 18, the substrate conveying device further comprises a second detection unit installed inside the case and detecting the position of the substrate to be conveyed by the substrate conveying robot, wherein the second detection unit is installed on a wall adjacent to the second chamber of the case and forms a second detection area extending in the vertical direction of the case, and the substrate conveying method further comprises a second conveying process for conveying the substrate such that the substrate faces the second detection area, and a second detection process for detecting the position of the substrate in a horizontal direction intersecting the vertical direction in the second conveying process. Claim 23 A substrate transport method according to claim 18, wherein the substrate transport device comprises a control unit for controlling the substrate transport robot, the substrate transport robot has a holding support member for holding and supporting the substrate to be transported, the first detection unit detects the height of the substrate held and supported by the holding support member, the first chamber is a container having a plurality of slots that are placed in a load port and can support the substrate, and in the receiving process, the control unit adjusts the height position of the holding support member according to the height of the substrate detected in the first detection process and transports the substrate to the container. Claim 24 A substrate transport device according to claim 1, wherein the first chamber is a container having a plurality of slots that are placed in a load port and can support the substrate, and after the substrate transport robot brings the substrate from the second chamber into the case, the substrate transport robot transports the substrate along the transport direction from the first chamber to the second chamber so as to pass through the first detection area, and after the first detection unit detects at least one of the height, thickness, and amount of warping of the substrate, the substrate transport robot removes the substrate from the case to the container. Claim 25 A substrate transport method according to claim 18, wherein the first chamber is a container having a plurality of slots that are placed in a load port and can support the substrate, wherein in the loading process, the substrate is loaded from the second chamber into the case, wherein the first detection process is performed after the loading process, and wherein in the output process, the substrate is output from the case to the container after the first detection process.

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