Shutter cocer drive and apparatus for treating substrate

Abstract

The present invention provides an apparatus for processing a substrate. The substrate processing apparatus comprises: a liquid processing module for processing a substrate by supplying a processing liquid to the substrate; a drying module for drying the substrate processed in the liquid processing module; and a return chamber provided between the liquid processing module and the drying module and provided with a return robot for returning the substrate, wherein the drying module may include an outer chamber having an internal space and an opening for entering or exiting the substrate on a front surface in contact with the return chamber; a shutter cover for opening and closing the opening; and a shutter driving unit for moving the shutter cover to a first position for closing the opening, a second position facing the opening but spaced apart from the front surface, and a third position not facing the opening.

Description

Technology Field

[0001] The present invention relates to a driving device for a shutter cover and a substrate processing device. Background Technology

[0002] To manufacture semiconductor devices, a desired pattern is formed on a substrate, such as a wafer, through various processes including photolithography, etching, ashing, ion implantation, and thin film deposition. Various processing liquids and processing gases are used in each process. In addition, a drying process is performed on the substrate to remove the processing liquid used to process the substrate.

[0003] Generally, a drying process for removing a processing liquid from a substrate includes a rotary drying process in which the substrate is rotated at high speed and the processing liquid remaining on the substrate is removed by centrifugal force from the rotation of the substrate, or a supercritical drying process in which the processing liquid remaining on the substrate is removed by using a supercritical fluid.

[0004] The supercritical drying process introduces a substrate into a high-pressure chamber capable of maintaining a high-pressure and high-temperature atmosphere, and then supplies a supercritical fluid onto the substrate to remove residual processing liquid (e.g., organic solvents, developer solvents, etc.) on the substrate.

[0005] In such supercritical drying processes, toxic gases such as ozone are used, and if these toxic gases leak from the high-pressure chamber, they can spread to other adjacent facilities through the return passage connected to the high-pressure chamber. Prior art literature

[65535] Korean Registered Patent 10-0994761 (2010.11.10) The problem to be solved

[0006] One objective of the present invention is to provide a driving device for a shutter cover capable of preventing the diffusion of toxic gases leaking from a high-pressure chamber, and a substrate processing device having the same.

[0007] In addition, the present invention has one objective of providing a driving device for a shutter cover with enhanced sealing properties and a substrate processing device having the same.

[0008] The objectives of the present invention are not limited thereto, and other unmentioned objectives will be clearly understood by a person skilled in the art from the description below. means of solving the problem

[0009] According to one aspect of the present invention, a substrate processing device may be provided, comprising: a liquid processing module for processing a substrate by supplying a processing liquid to the substrate; a drying module for drying the substrate processed in the liquid processing module; a return chamber provided between the liquid processing module and the drying module and provided with a return robot for returning the substrate, wherein the drying module comprises: an outer chamber having an internal space and an opening for entering or exiting the substrate on a front surface in contact with the return chamber; a shutter cover for opening and closing the opening; and a shutter driving unit for moving the shutter cover to a first position for closing the opening, a second position facing the opening but spaced apart from the front surface, and a third position not facing the opening.

[0010] In addition, the shutter cover can be continuously moved from the third position to the second position and the first position, or vice versa, by the shutter driving unit.

[0011] In addition, the shutter drive unit can move the shutter cover from the third position to the second position and the first position, or vice versa, by driving a cylinder installed on each side relative to the shutter cover.

[0012] Additionally, the shutter drive unit comprises: a cylinder; a movable body connected to the rod of the cylinder and provided to be movable along a guide rail installed in a direction parallel to the cylinder; a link bracket that moves together with the movable body and is connected to the shutter cover; a cam follower provided at one end of the link bracket; and a guide link having a cam hole into which the cam follower is fitted; wherein the cam hole may include a vertical movement groove and a sealed movement groove formed extending from one end of the vertical movement groove.

[0013] In addition, the shutter driving unit may be provided symmetrically on both sides with respect to the shutter cover.

[0014] Additionally, the vertical movement groove corresponds to a vertical movement section in which the shutter cover moves from the third position to the second position, and the sealed movement groove may correspond to a sealed movement section in which the shutter cover moves from the second position to the first position.

[0015] In addition, the movable body and the link bracket are interconnected by a pivot link; the pivot link may have a two-axis connection structure such that the link bracket tilts on the movable body when the shutter cover moves between the second position and the first position.

[0016] In addition, the pivot link may include a first bearing portion to which the pivot axis of the movable body is connected; and a second bearing portion to which the pivot axis of the link bracket is connected.

[0017] In addition, the shutter driving unit may be provided in a recessed form on both sides of the front surface relative to the opening.

[0018] According to another aspect of the present invention, a substrate processing module may be provided, comprising: an outer chamber having an internal space and an opening for access to a substrate on the front surface; a high-pressure chamber provided in the internal space; a shutter cover for opening and closing the opening; and a shutter driving unit provided symmetrically on both sides of the front surface with respect to the shutter cover, and moving the shutter cover to a first position that closes the opening, a second position that faces the opening but is spaced apart from the front surface, and a third position that does not face the opening.

[0019] In addition, the shutter cover can be continuously moved from the third position to the second position and the first position, or vice versa, by the shutter driving unit.

[0020] In addition, the shutter drive unit can move the shutter cover from the third position to the second position and the first position, or vice versa, by driving a cylinder installed on each side relative to the shutter cover.

[0021] Additionally, the shutter drive unit comprises: a cylinder; a movable body connected to the rod of the cylinder and provided to be movable along a guide rail installed in a direction parallel to the cylinder; a link bracket that moves together with the movable body and is connected to the shutter cover; a cam follower provided at one end of the link bracket; and a guide link having a cam hole into which the cam follower is fitted; wherein the cam hole may include a vertical movement groove and a sealed movement groove formed extending from one end of the vertical movement groove.

[0022] Additionally, the vertical movement groove corresponds to a vertical movement section in which the shutter cover moves from the third position to the second position, and the sealed movement groove may correspond to a sealed movement section in which the shutter cover moves from the second position to the first position.

[0023] In addition, the movable body and the link bracket are interconnected by a pivot link; the pivot link may have a two-axis connection structure such that the link bracket tilts on the movable body when the shutter cover moves between the second position and the first position.

[0024] In addition, the pivot link may include a first bearing portion to which the pivot axis of the movable body is connected; and a second bearing portion to which the pivot axis of the link bracket is connected. Effects of the invention

[0025] According to one embodiment of the present invention, the diffusion of toxic gas leaking from a high-pressure chamber can be prevented.

[0026] According to one embodiment of the present invention, two-axis driving of the shutter cover is possible using a single cylinder.

[0027] The effects of the present invention are not limited to the effects described above, and unmentioned effects will be clearly understood by those skilled in the art from this specification and the attached drawings. Brief explanation of the drawing

[0028] FIG. 1 is a plan view schematically showing a substrate processing apparatus according to one embodiment of the present invention. Figure 2 is a side cross-sectional view of the substrate processing device shown in Figure 1. FIG. 3 is a cross-sectional view schematically showing one embodiment of the liquid treatment module of FIG. 1. FIG. 4 is a schematic diagram showing one embodiment of the drying module of FIG. 1. FIG. 5 is a cross-sectional view for explaining the body illustrated in FIG. 4. Figure 6 is a diagram schematically showing the opening and closing operation of the shutter cover in the drying module. FIG. 7 is a perspective view of the key parts showing a shutter drive unit installed on the front of the outer chamber. Fig. 8A is a front view of the outer chamber showing the opening in a closed state. FIG. 8B is a front view of the outer chamber showing the opening in an open state. Figures 9 and 10 are drawings for explaining the shutter drive unit. Figure 11 is a drawing showing a guide link. FIG. 12a is a drawing showing the state where the shutter cover is in the third position. FIG. 12b is a drawing showing the state where the shutter cover is in the second position. FIG. 12c is a drawing showing the state where the shutter cover is in the first position. Specific details for implementing the invention

[0029] Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement them. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in describing preferred embodiments of the present invention in detail, specific descriptions of related known functions or configurations are omitted if it is determined that such detailed descriptions would unnecessarily obscure the essence of the present invention. Additionally, the same reference numerals are used throughout the drawings for parts having similar functions and operations.

[0030] The term 'comprising' a component means that, unless specifically stated otherwise, it does not exclude other components but rather allows for the inclusion of additional components. Specifically, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0031] Singular expressions include plural expressions unless the context clearly indicates otherwise. Additionally, the shapes and sizes of elements in drawings may be exaggerated for clearer explanation.

[0032] Terms such as "first," "second," etc., may be used to describe various components, but said components should not be limited by said terms. These terms may be used for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be named the second component, and similarly, the second component may be named the first component.

[0033] When it is stated that one component is "connected" or "connected" to another component, it should be understood that while it may be directly connected or connected to that other component, there may also be other components in between. Conversely, when it is stated that one component is "directly connected" or "directly connected" to another component, it should be understood that there are no other components in between. Other expressions describing the relationships between components, such as "between" and "exactly between," or "adjacent to" and "directly adjacent to," should be interpreted in the same way.

[0034] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by those skilled in the art to which the present invention pertains. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in this application.

[0035] Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 12b.

[0036] FIG. 1 is a plan view schematically showing a substrate processing apparatus according to one embodiment of the present invention, and FIG. 2 is a side cross-sectional view of the substrate processing apparatus shown in FIG. 1.

[0037] Referring to FIGS. 1 and 2, the substrate processing device (1000) includes an index module (10), a processing module (20), and a controller (30).

[0038] When viewed from above, the index module (10) and the processing module (20) are arranged along one direction. Hereinafter, the direction in which the index module (10) and the processing module (20) are arranged is referred to as the first direction (X), the direction perpendicular to the first direction (X) when viewed from above is referred to as the second direction (Y), and the direction perpendicular to both the first direction (X) and the second direction (Y) is referred to as the third direction (Z).

[0039] The index module (10) returns the substrate (W) from the container (C) containing the substrate (W) to the processing module (20), and receives the substrate (W) that has been processed in the processing module (20) back into the container (C). The longitudinal direction of the index module (10) is provided in the second direction (Y). The index module (10) has a load port (12) and an index frame (14). The load port (12) is located on the opposite side of the processing module (20) relative to the index frame (14). The container (C) containing the substrates (W) is placed in the load port (12). Multiple load ports (12) may be provided, and multiple load ports (12) may be arranged along the second direction (Y).

[0040] As the container (C), a sealed container such as a Front Open Unified Pod (FOUP) may be used. The container (C) may be placed at the load port (12) by a transport means (not shown) such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle, or by a worker.

[0041] An index robot (120) is provided in the index frame (14). A guide rail (124) is provided within the index frame (14) with a longitudinal direction in the second direction (Y), and the index robot (120) can be provided to be movable on the guide rail (124). The index robot (120) includes a hand (122) on which a substrate (W) is placed, and the hand (122) can be provided to move forward and backward, rotate about the third direction (Z) as an axis, and move along the third direction (Z). A plurality of hands (122) are provided spaced apart in the vertical direction, and the hands (122) can move forward and backward independently of each other.

[0042] The controller (30) can control the substrate processing device. The controller (30) may be equipped with a process controller consisting of a microprocessor (computer) that executes control of the substrate processing device, a user interface consisting of a keyboard for an operator to perform command input operations to manage the substrate processing device, a display for visualizing and displaying the operating status of the substrate processing device, a control program for executing processing in the substrate processing device under the control of the process controller, and a memory unit storing a program for executing processing in each component according to various data and processing conditions, i.e., a processing recipe. Additionally, the user interface and the memory unit may be connected to the process controller. The processing recipe may be stored in a storage medium within the memory unit, and the storage medium may be a hard disk, a portable disk such as a CD-ROM or DVD, or a semiconductor memory such as a flash memory.

[0043] The controller (30) can control the substrate processing device to perform the substrate processing method described below. For example, the controller (30) can control the fluid supply unit (530) and the fluid discharge unit (550) to perform the substrate processing method described below.

[0044] The processing module (20) includes a buffer unit (200), a return chamber (300), a liquid treatment module (400), a drying module (500), and a post-processing chamber (600). The buffer unit (200) provides a space where a substrate (W) introduced into the processing module (20) and a substrate (W) removed from the processing module (20) temporarily stay. The liquid treatment module (400) performs a liquid treatment process by supplying liquid onto the substrate (W) to treat the substrate (W) with liquid. The drying module (500) performs a drying process to remove the liquid remaining on the substrate (W). The return chamber (300) returns the substrate (W) between the buffer unit (200), the liquid treatment module (400), the drying module (500), and the post-processing chamber (600).

[0045] The return chamber (300) may be provided with its length direction in the first direction (X). The buffer unit (200) may be positioned between the index module (10) and the return chamber (300). The liquid treatment module (400) and the drying module (500) may be positioned on the side of the return chamber (300). The liquid treatment module (400) and the return chamber (300) may be positioned along the second direction (Y). The drying module (500) and the return chamber (300) may be positioned along the second direction (Y). The buffer unit (200) may be located at one end of the return chamber (300).

[0046] According to one example, liquid treatment modules (400) may be positioned on both sides of the return chamber (300) and drying modules (500) may be positioned on both sides of the return chamber (300), and the liquid treatment modules (400) may be positioned closer to the buffer unit (200) than the drying modules (500). However, this is not limited thereto.

[0047] Liquid treatment modules (400) may be provided in an AXB arrangement (where A and B are each 1 or a natural number greater than 1) along the first direction (X) and the third direction (Z) on one side and / or the other side of the return chamber (300). Additionally, drying modules (500) may be provided in CXD arrangement (where C and D are each 1 or a natural number greater than 1) along the first direction (X) and the third direction (Z) on one side and / or the other side of the return chamber (300).

[0048] The return chamber (300) has a return robot (320). A guide rail (324) is provided within the return chamber (300) in a longitudinal direction in the first direction (X), and the return robot (320) can be provided to be movable on the guide rail (324). The return robot (320) includes a hand (322) on which a substrate (W) is placed, and the hand (322) can be provided to move forward and backward, rotate about a third direction (Z) as an axis, and move along the third direction (Z). A plurality of hands (322) are provided spaced apart in the vertical direction, and the hands (322) can move forward and backward independently of each other.

[0049] The buffer unit (200) is provided with a plurality of buffers (220) on which a substrate (W) is placed. The buffers (220) may be spaced apart from each other along a third direction (Z). The front face and rear face of the buffer unit (200) are open. The front face is the side facing the index module (10), and the rear face is the side facing the return chamber (300). The index robot (120) can access the buffer unit (200) through the front face, and the return robot (320) can access the buffer unit (200) through the rear face.

[0050] FIG. 3 is a cross-sectional view schematically showing one embodiment of the liquid treatment module of FIG. 1.

[0051] Referring to FIG. 3, the liquid treatment module (400) has a housing (410), a cup (420), a support unit (440), a liquid supply unit (460), and a lifting unit (480).

[0052] The housing (410) may have an internal space where the substrate (W) is processed. The housing (410) may generally have a cuboid shape. For example, the housing (410) may have a rectangular shape. Additionally, an opening (not shown) for bringing in or taking out the substrate (W) may be formed in the housing (410). Additionally, a door (not shown) for selectively opening and closing the opening may be installed in the housing (410).

[0053] The cup (420) may have a tubular shape with an open top. The cup (420) has a processing space, and the substrate (W) may be liquid-processed within the processing space. The support unit (440) supports the substrate (W) in the processing space. The liquid supply unit (460) supplies the processing liquid onto the substrate (W) supported by the support unit (440). The processing liquid may be provided in multiple types and supplied sequentially onto the substrate (W). The lifting unit (480) adjusts the relative height between the cup (420) and the support unit (440).

[0054] According to one example, the cup (420) has a plurality of recovery containers (422, 424, 426). Each of the recovery containers (422, 424, 426) has a recovery space for recovering the liquid used in the substrate processing. Each of the recovery containers (422, 424, 426) is provided in a ring shape that surrounds the support unit (440). When the liquid processing process is performed, the processing liquid scattered by the rotation of the substrate (W) flows into the recovery space through the inlets (422a, 424a, 426a) of each recovery container (422, 424, 426). According to one example, the cup (420) has a first recovery container (422), a second recovery container (424), and a third recovery container (426). The first recovery container (422) is positioned to surround the support unit (440), the second recovery container (424) is positioned to surround the first recovery container (422), and the third recovery container (426) is positioned to surround the second recovery container (424). The second inlet (424a) for introducing liquid into the second recovery container (424) is located above the first inlet (422a) for introducing liquid into the first recovery container (422), and the third inlet (426a) for introducing liquid into the third recovery container (426) may be located above the second inlet (424a).

[0055] The support unit (440) has a support plate (442) and a drive shaft (444). The upper surface of the support plate (442) is generally provided in a circular shape and may have a diameter larger than that of the substrate (W). A support pin (442a) is provided in the central part of the support plate (442) to support the rear surface of the substrate (W), and the upper end of the support pin (442a) is provided to protrude from the support plate (442) so that the substrate (W) is spaced a certain distance from the support plate (442). A chuck pin (442b) is provided at the edge of the support plate (442). The chuck pin (442b) is provided to protrude upward from the support plate (442) and supports the side of the substrate (W) so that the substrate (W) does not detach from the support unit (440) when the substrate (W) is rotated. The drive shaft (444) is driven by the drive unit (446) and is connected to the center of the bottom surface of the substrate (W), and rotates the support plate (442) around its center axis.

[0056] According to one example, the liquid supply unit (460) may include a nozzle (462). The nozzle (462) may supply a processing liquid to a substrate (W). The processing liquid may be a chemical, a rinse liquid, or an organic solvent. The chemical may be a chemical having the properties of a strong acid or a strong base. Also, the rinse liquid may be pure water. Also, the organic solvent may be isopropyl alcohol (IPA). Additionally, the processing liquid supplied by the liquid supply unit (460) may be a developing liquid. For example, the developing liquid supplied by the liquid supply unit (460) may include N-butyl acetic acid.

[0057] Additionally, the liquid supply unit (460) may include a plurality of nozzles (462), and each nozzle (462) may supply different types of processing liquids. For example, one of the nozzles (462) may supply a chemical, another of the nozzles (462) may supply a rinse liquid, and yet another of the nozzles (462) may supply an organic solvent. Additionally, the controller (30) may control the liquid supply unit (460) to supply an organic solvent from another of the nozzles (462) after supplying a rinse liquid to the substrate (W) from another of the nozzles (462). Accordingly, the rinse liquid supplied on the substrate (W) may be replaced with an organic solvent having low surface tension. Additionally, a developer may be supplied from one of the nozzles (462).

[0058] The lifting unit (480) moves the cup (420) in an up-and-down direction. The relative height between the cup (420) and the substrate (W) is changed by the up-and-down movement of the cup (420). As a result, the recovery containers (422, 424, 426) that recover the processing liquid are changed according to the type of liquid supplied to the substrate (W), so that the liquids can be separated and recovered. Unlike the above, the cup (420) is fixedly installed, and the lifting unit (480) can move the support unit (440) in an up-and-down direction.

[0059] FIG. 4 is a schematic drawing showing one embodiment of the drying module of FIG. 1, and FIG. 5 is a cross-sectional view for explaining the body shown in FIG. 4.

[0060] Referring to FIGS. 4 and 5, a drying module (500) according to one embodiment of the present invention can remove a processing liquid remaining on a substrate (W) using a processing fluid (SC) in a supercritical state. The processing liquid to be removed may be any one of the chemicals, rinse liquid, organic solvent, and developer liquid described above. Additionally, the processing fluid (SC) may include carbon dioxide (CO2). For example, the drying module (500) can remove a developer liquid, which is N-butylacetic acid remaining on the substrate (W), from the substrate (W) using carbon dioxide (CO2) in a supercritical state.

[0061] The drying module (500) may include an outer chamber (502), a body (510), a heating member (520), a fluid supply unit (530), a support member (540), a fluid discharge unit (550), and a lifting member (560).

[0062] The outer chamber (502) provides an internal space. An opening (505) for accessing a substrate is provided on the front (504) of the outer chamber (502). The front (504) of the outer chamber (502) is provided to be in contact with the return chamber. The opening can be opened and closed by a shutter cover (506).

[0063] The body (510) may be a high-pressure chamber that provides a space where a supercritical drying process is performed. The body (510) may provide a processing space (511) in which a substrate (W) is dried by a processing fluid (SC) in a supercritical state. The body (510) is provided with a material capable of withstanding high pressure above the critical pressure.

[0064] For example, the body (510) may include an upper body (512) and a lower body (514). The upper body (512) and the lower body (514) may be combined with each other to form the processing space (511). Either the upper body (512) or the lower body (514) may be coupled with a lifting member (560) and moved in an up-and-down direction. For example, the lower body (514) may be coupled with the lifting member (560) and moved in an up-and-down direction by the lifting member (560). Accordingly, the processing space (511) of the body (510) may be optionally sealed. In the example described above, the lower body (514) is coupled with the lifting member (560) and moved in an up-and-down direction, but it is not limited thereto. For example, the upper body (512) may be coupled with the lifting member (560) and moved in an up-and-down direction.

[0065] When the lower body (514) is separated from the upper body (512), the processing space (511) is opened, and at this time, the substrate (W) is brought in or taken out. During the process, the lower body (514) is in close contact with the upper body (512), and the processing space (511) is sealed from the outside. Here, the substrate (W) can be brought in after undergoing an organic solvent process in the liquid treatment module, with the organic solvent remaining therein.

[0066] The heating element (520) can heat the processing fluid (SC) supplied to the processing space (511). The heating element (520) can raise the temperature of the processing space (511) of the body (510). By raising the temperature of the processing space (511) by the heating element (520), the processing fluid (SC) supplied to the processing space (511) can be converted to a supercritical state or maintained in a supercritical state.

[0067] Additionally, the heating element (520) may be embedded within the body (510). For example, the heating element (520) may be embedded in either the upper body (512) or the lower body (514). For example, the heating element (520) may be provided within the lower body (514). However, it is not limited thereto, and the heating element (520) may be provided in various locations capable of raising the temperature of the processing space (511). Additionally, the heating element (520) may be a heater. However, it is not limited thereto, and the heating element (520) may be modified in various ways into a known device capable of raising the temperature of the processing space (511).

[0068] The fluid supply unit (530) can supply a processing fluid (SC) to the processing space (511) of the body (510). The processing fluid (SC) supplied by the fluid supply unit (530) may include carbon dioxide (CO2). The fluid supply unit (530) may include a fluid source (531), a first supply line (533), a first supply valve (535), a second supply line (537), and a second supply valve (539).

[0069] The fluid source (531) can store the processing fluid (SC) supplied to the processing space (511) of the body (510) or supply the processing fluid (SC) to the processing space (511). The fluid source (531) can supply the processing fluid (SC) to the processing space (511) via the first supply line (533) and / or the second supply line (537). Additionally, a first supply valve (535) may be installed in the first supply line (533). Additionally, a second supply valve (539) may be installed in the second supply line (537). The first supply valve (535) and the second supply valve (539) may be on / off valves, such as open / close valves. Optionally, the first supply valve (535) and the second supply valve (539) may be flow control valves. Depending on the opening and closing of the first supply valve (535) and the second supply valve (539), the processing fluid (SC) may flow selectively in the first supply line (533) or the second supply line (537).

[0070] One end of the first supply line (533) may be in communication with the processing space (511). The first supply line (533) may be an upper supply line that supplies a processing fluid (SC), which is a drying gas, from the upper part of the processing space (511) of the body (510). At least a portion of the first supply line (533) may be provided to the upper body (512). Additionally, the first supply line (533) may be configured so that the supply of the processing fluid (SC) is directed toward the upper surface of the substrate (W) supported by the support member (540). For example, the processing fluid (SC) supplied from the first supply line (533) may be supplied to the upper surface of the substrate (W). The processing fluid (SC) supplied from the first supply line (533) may flow in a direction from top to bottom. For example, the processing fluid (SC) supplied from the first supply line (533) can flow from the upper region of the substrate (W) supported in the processing space (511) toward the lower region of the substrate (W).

[0071] The second supply line (537) may be connected to the processing space (511) at one end. The second supply line (537) may be a lower supply line that supplies a processing fluid (SC), which is a drying gas, from the lower part of the processing space (511) of the body (510). At least a portion of the second supply line (537) may be provided to the lower body (514). Additionally, the second supply line (537) may be configured so that the supply of the processing fluid (SC) is directed toward the lower region of the substrate (W) supported by the support member (540). For example, the processing fluid (SC) supplied from the second supply line (537) may flow in a direction from bottom to top. For example, the processing fluid (SC) supplied from the second supply line (537) may flow from the lower region of the substrate (W) supported in the processing space (511) toward the upper region of the substrate (W).

[0072] In the example described above, a first supply line (533) and a second supply line (537) are connected to a single fluid supply source (531), but this is not limited thereto. For instance, multiple fluid supply sources (531) may be provided, and the first supply line (533) may be connected to one of the multiple fluid supply sources (531), and the second supply line (537) may be connected to another of the fluid supply sources (531).

[0073] In addition, various materials such as pressure sensors, temperature sensors, flow control valves, orifices, and heaters may be installed and arranged in the line between the first supply line (533), the second supply line (537), or the point where the first supply line (533) and the second supply line (537) are connected and the fluid supply source (531) as mentioned in the example above.

[0074] The support member (540) can support the substrate (W) in the processing space (511). The support member (540) can be configured to support the edge region of the substrate (W) in the processing space (511). For example, the support member (540) can be configured to support the lower surface of the edge region of the substrate (W) in the processing space (511).

[0075] The fluid discharge unit (550) can discharge a processing fluid (SC) to the outside from the processing space (511) of the body (510). The fluid discharge unit (550) may include a fluid discharge line (551) and a discharge valve (553). One end of the fluid discharge line (551) may be in communication with the processing space (511). At least a portion of the fluid discharge line (551) may be provided to the lower body (514). The fluid discharge line (551) may be configured so that when the processing fluid (SC) is discharged from the processing space (511), the processing fluid (SC) flows in a direction from top to bottom of the processing space (511).

[0076] Additionally, a discharge valve (553) may be installed in the fluid discharge line (551). The discharge valve (553) may be an on / off valve, such as an opening / closing valve. The discharge valve (553) may also be a flow control valve. Various materials such as an orifice, a pressure sensor, a temperature sensor, and a pump may be installed and arranged in the fluid discharge line (551).

[0077] FIG. 6 is a schematic diagram showing the opening and closing operation of the shutter cover in the drying module, FIG. 7 is a perspective view of a key part showing a shutter drive unit installed on the front of the outer chamber, FIG. 8A is a front view of the outer chamber showing the opening in a closed state, FIG. 8B is a front view of the outer chamber showing the opening in an open state. FIG. 9 and FIG. 10 are drawings for explaining the shutter drive unit.

[0078] Referring to FIGS. 6 through 10, the shutter drive unit (570) may be provided symmetrically on both sides of the front (504) of the outer chamber (502) with respect to the shutter cover (506). The front (504) of the outer chamber (502) has a recessed installation space (509) formed to mount the shutter drive unit (570). The shutter drive unit (570) may be provided in a buried form within the installation space (509).

[0079] The shutter drive unit (570) may be provided to move the shutter cover (506) to a first position (P1) where the opening (505) is closed, a second position (P2) facing the opening (505) but spaced apart from the front (504), and a third position (P3) not facing the opening (505). When the shutter cover (506) is closed, it is moved from the third position (P3) through the second position (P2) to the first position (P1) by the shutter drive unit (570). The movement from the second position to the first position is in a diagonal direction toward the inner direction of the outer chamber. And when the shutter cover (506) is opened, it may be moved from the first position (P1) through the second position (P2) to the third position (P3). That is, the shutter drive unit (570) can move the shutter cover (506) from the third position (P3) to the first position (P1) or from the first position (P1) to the third position (P3) through the lifting drive of one cylinder.

[0080] According to one example, the shutter drive unit (570) may include a cylinder (571), a moving body (576), a link bracket (580), a cam follower (588), a guide link (590), and a pivot link (584).

[0081] The movable body (576) can be connected to the rod (572) of the cylinder (571) through a connecting bracket (573). The movable body (576) can be provided to be movable in an up-and-down direction along a guide rail (574) installed parallel to the cylinder (571).

[0082] A link bracket (580) is provided to move together with a movable body (576). The movable body (576) and the link bracket (580) are interconnected by a pivot link (584). The pivot link (584) has a two-axis connection structure so that the link bracket (580) tilts on the movable body (576) when the shutter cover (506) moves between a second position (P2) and a first position (P1). For example, the pivot link (584) may include a first bearing part (586) to which the fixed axis (579) of the movable body (576) is connected, and a second bearing part (585) to which the pivot axis (583) of the link bracket (580) is connected. Two such pivot links (584) may be installed to ensure smooth tilting of the link bracket (580).

[0083] Meanwhile, the link bracket (580) is connected to the shutter cover (506) via the shutter bracket (587). A cam follower (588) is provided at one end of the link bracket (580). The cam follower (588) is fitted into the cam hole (592) of the guide link (590).

[0084] The guide link (590) has a cam hole (592) into which the cam follower (588) is fitted.

[0085] Figure 11 is a drawing showing a guide link.

[0086] As shown in FIG. 11, the cam hole (592) of the guide link (590) includes a vertical movement groove (593) and a sealed movement groove (594) formed by extending from the top of the vertical movement groove (593). The sealed movement groove (594) is provided in a diagonal direction. The vertical movement groove (593) corresponds to a vertical movement section (K1) in which the shutter cover (506) moves from a third position (P3) to a second position (P2), and the sealed movement groove (594) corresponds to a sealed movement section (K2) in which the shutter cover (506) moves from a second position (P2) to a first position (P1).

[0087] FIG. 12a is a drawing showing the state where the shutter cover is in the third position, FIG. 12b is a drawing showing the state where the shutter cover is in the second position, and FIG. 12c is a drawing showing the state where the shutter cover is in the first position.

[0088] Referring to FIGS. 12a to 12c, the sealing operation of the shutter drive unit (570) is described as follows: when the cylinder (571) moves upward, the movable body (576) moves upward along the guide rail (574). At this time, the cam follower (588) located at the bottom of the vertical movement groove (593) moves straight upward along the vertical movement groove (593) of the cam hole (592) and moves to the top of the vertical movement groove (593). Then, the cam follower (588) moves diagonally inward along the sealing movement groove (594) toward the outer chamber (502). The link bracket (580) moving along the movement trajectory of the cam follower is tilted by the pivot link (584) in the sealing movement section, and the shutter cover (506) comes into close contact with the front (504) to seal the opening (505).

[0089] In this embodiment, the opening and closing structure of the shutter cover is described as being applied to a drying module, but it is not limited to a drying module; the opening and closing structure of the shutter cover described above can be equally applied to various processing modules that process substrates, such as a liquid treatment module.

[0090] The above detailed description is illustrative of the present invention. Furthermore, the foregoing describes preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, modifications or alterations are possible within the scope of the concept of the invention disclosed herein, the scope equivalent to the disclosed content, and / or the scope of the art or knowledge. The described embodiments describe the best state for implementing the technical concept of the present invention, and various modifications required for specific fields of application and uses of the present invention are possible. Accordingly, the above detailed description of the invention is not intended to limit the present invention to the disclosed embodiments. Additionally, the appended claims should be interpreted as including other embodiments. Explanation of the symbols

[0091] 500: Drying chamber 502: External chamber 505 : Opening 506 : Shutter cover 570: Shutter drive unit 571: Cylinder 576 : Moving body 580 : Link bracket 588 : Cam Follower 590 : Guide Link

Claims

Claim 1 A substrate processing device comprising: a processing module for processing a substrate; a transfer chamber provided with a transfer robot for transferring a substrate to the processing module, wherein the processing module comprises: an outer chamber having an internal space and an opening for accessing a substrate on a front surface in contact with the transfer chamber; a shutter cover for opening and closing the opening; and a shutter drive unit for moving the shutter cover to a first position for closing the opening, a second position facing the opening but spaced apart from the front surface, and a third position not facing the opening; wherein the shutter drive unit moves the shutter cover from the third position to the second position and the first position, or vice versa, through the lifting and lowering drive of a cylinder installed on each side relative to the shutter cover. Claim 2 delete Claim 3 delete Claim 4 A substrate processing device comprising: a processing module for processing a substrate; a transfer chamber provided with a transfer robot for transferring a substrate to the processing module, wherein the processing module comprises: an outer chamber having an internal space and an opening for entering or exiting a substrate on a front surface in contact with the transfer chamber; a shutter cover for opening and closing the opening; and a shutter driving unit for moving the shutter cover to a first position for closing the opening, a second position facing the opening but spaced apart from the front surface, and a third position not facing the opening, wherein the shutter driving unit comprises: a cylinder; a movable body connected to the rod of the cylinder and provided to be movable along a guide rail installed in a direction parallel to the cylinder; a link bracket that moves together with the movable body and is connected to the shutter cover; a cam follower provided at one end of the link bracket; and a guide link having a cam hole into which the cam follower is fitted, wherein the cam hole comprises a vertical moving groove and a sealed moving groove formed extending from one end of the vertical moving groove. Claim 5 In paragraph 4, the shutter driving unit is a substrate processing device provided symmetrically on both sides with respect to the shutter cover. Claim 6 A substrate processing device according to claim 4, wherein the vertical movement groove corresponds to a vertical movement section in which the shutter cover moves from the third position to the second position, and the sealed movement groove corresponds to a sealed movement section in which the shutter cover moves from the second position to the first position. Claim 7 In claim 4, the movable body and the link bracket are interconnected by a pivot link; the pivot link has a two-axis connection structure such that the link bracket tilts on the movable body when the shutter cover moves between the second position and the first position. Claim 8 In claim 7, the above-mentioned pivot link comprises a first bearing portion to which the pivot axis of the movable body is connected; and a second bearing portion to which the pivot axis of the link bracket is connected, forming a substrate processing device. Claim 9 A substrate processing device according to claim 1 or 4, wherein the shutter driving unit is provided in a recessed form on both sides of the front surface based on the opening, and the processing module performs a process of drying the substrate. Claim 10 A substrate processing module comprising: an outer chamber having an internal space and an opening for accessing a substrate on the front; an inner chamber provided in the internal space; a shutter cover for opening and closing the opening; and a shutter driving unit provided symmetrically on both sides of the front with respect to the shutter cover, and moving the shutter cover to a first position that closes the opening, a second position that faces the opening but is spaced apart from the front, and a third position that does not face the opening; wherein the shutter driving unit moves the shutter cover from the third position to the second position and the first position, or vice versa, through the lifting and lowering drive of a cylinder installed on each side with respect to the shutter cover. Claim 11 delete Claim 12 A substrate processing module comprises: an outer chamber having an internal space and an opening on the front for access to a substrate; an inner chamber provided in the internal space; a shutter cover for opening and closing the opening; and a shutter driving unit provided symmetrically on both sides of the front with respect to the shutter cover, for moving the shutter cover to a first position that closes the opening, a second position that faces the opening but is spaced apart from the front, and a third position that does not face the opening; wherein the shutter driving unit comprises a cylinder; a movable body connected to the rod of the cylinder and provided to be movable along a guide rail installed in a direction parallel to the cylinder; a link bracket that moves together with the movable body and is connected to the shutter cover; a cam follower provided at one end of the link bracket; and a guide link having a cam hole into which the cam follower is fitted; wherein the cam hole comprises a vertical moving groove and a sealed moving groove formed extending from one end of the vertical moving groove. Claim 13 In claim 12, the vertical movement groove corresponds to a vertical movement section in which the shutter cover moves from the third position to the second position, and the sealed movement groove corresponds to a sealed movement section in which the shutter cover moves from the second position to the first position, in a substrate processing module. Claim 14 In claim 12, the movable body and the link bracket are interconnected by a pivot link; the pivot link is a substrate processing module having a two-axis connection structure such that the link bracket tilts on the movable body when the shutter cover moves between the second position and the first position. Claim 15 In claim 14, the above-mentioned pivot link comprises a first bearing portion to which the pivot axis of the movable body is connected; and a second bearing portion to which the pivot axis of the link bracket is connected, comprising a substrate processing module. Claim 16 A driving device for a shutter cover that opens and closes an opening on the front of a chamber, comprising: a shutter driving unit provided symmetrically on both sides of the front of the chamber with respect to the shutter cover, and moving the shutter cover to a first position that closes the opening, a second position that faces the opening but is spaced apart from the front, and a third position that does not face the opening; wherein the shutter driving unit comprises: a cylinder; a movable body connected to the rod of the cylinder and provided to be movable along a guide rail installed in a direction parallel to the cylinder; a link bracket that moves together with the movable body and is connected to the shutter cover; a cam follower provided at one end of the link bracket; and a guide link having a cam hole into which the cam follower is fitted; wherein the cam hole comprises a vertical moving groove and a sealed moving groove formed extending from one end of the vertical moving groove. Claim 17 In claim 16, the vertical movement groove corresponds to a vertical movement section in which the shutter cover moves from the third position to the second position, and the sealed movement groove corresponds to a sealed movement section in which the shutter cover moves from the second position to the first position, and the moving body and the link bracket are interconnected by a pivot link; the pivot link is a driving device for a shutter cover having a two-axis connection structure such that the link bracket tilts on the moving body when the shutter cover moves between the second position and the first position.

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