Apparatus and method for wetting substrate

KR103012910B1Active Publication Date: 2026-09-01SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
KR1020190145407
Authority / Receiving Office
KR · KR
Patent Type
Patents
Current Assignee / Owner
Filing Date
2019-11-13
Publication Date
2026-09-01
Estimated Expiration
2039-11-13

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Abstract

A substrate wetting device for pre-wetting a substrate according to an exemplary embodiment of the present disclosure comprises: a pre-wetting chamber configured to provide an internal space for pre-wetting the substrate; a substrate transfer unit configured to transfer the substrate within the pre-wetting chamber; and a wetting liquid application unit configured to apply a wetting liquid onto the substrate, comprising: a wetting liquid spraying unit configured to spray the wetting liquid; a processing gas spraying unit configured to spray a processing gas onto the substrate; and a spray angle adjustment unit configured to adjust the spray angle of the wetting liquid and the processing gas.
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Citation Information

Patent Citations

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    US20060121209A1

  • Coating film forming method and coating apparatus

    KR1020010049260A

  • Brush wetting apparatus

    KR1020070005803A

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    KR1020070040640A

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    KR1020110127538A