Stage apparatus, exposure apparatus, and method of manufacturing article

Abstract

A stage device is provided for use in a scanning type exposure device that exposes a substrate while scanning a disc and a substrate relative to each other in a scanning direction, and the stage device for scanning the substrate in the scanning direction, the stage having a stage that holds and moves the substrate, a first unit including a first electromagnet and, with respect to the stage, a first unit that applies a force generated from the first electromagnet as a force to accelerate the stage in the scanning direction, a second unit including a second electromagnet and, with respect to the stage, a second unit that applies a force generated from the second electromagnet as a force to accelerate the stage in a direction intersecting the scanning direction, and a moving part that moves a structure in which the first unit and the second unit are installed, wherein the projection area obtained by projecting the core of the second electromagnet onto a plane whose normal is the direction intersecting the scanning direction is larger than the projection area obtained by projecting the core of the first electromagnet onto a plane whose normal is the scanning direction.

Description

Technology Field

[0001] The present invention relates to a stage device, an exposure device, and a method for manufacturing an article. Background Technology

[0002] When manufacturing articles such as semiconductor devices, liquid crystal display devices, imaging devices, and magnetic heads using photolithography technology, a step-and-scan type (scanning type) exposure device is used. This exposure device, also called a scanner, scans the original plate and the substrate relative to each other to transfer the pattern of the original plate to the shot area, and after the scanning exposure of one shot area is completed, the substrate is moved step-by-step to scan the next shot area.

[0003] In addition, as disclosed in Japanese Patent Publication No. 2005-109522 and Japanese Patent Publication No. Hei 8-130179, the exposure apparatus is equipped with a stage apparatus that includes a fine adjustment stage and a coarse adjustment stage, which is a stage apparatus capable of holding and moving a substrate. With this stage apparatus, during scanning exposure, the substrate is moved in a first direction in synchronization with the original plate, and when scanning exposure is finished, the substrate is U-turned in a second direction opposite to the first direction and is step-moved in a third direction orthogonal to the first and second directions. Furthermore, in the fine adjustment stage, acceleration is performed by an electromagnet and position control is performed by a linear motor, thereby achieving both high-precision position control and low heat generation. The problem to be solved

[0004] In order to achieve high productivity in a scanning exposure device, it is necessary to terminate the step movement of the substrate while the substrate is U-turned after the scanning exposure of one shot area is completed. Therefore, in a stage device, regarding the acceleration of the fine movement stage, it is required that the acceleration in the direction orthogonal to the scanning direction (hereinafter X-direction) be greater than the acceleration in the scanning direction (hereinafter Y-direction).

[0005] The acceleration of the fine motion stage depends on the force generated by the electromagnet (maximum generated force), and the maximum generated force of the electromagnet is determined by the projected area obtained by projecting the electromagnet's attraction area onto a plane normal to the direction of the propulsion force. Therefore, to increase the acceleration in the X-direction, the projected area of ​​the attraction area of ​​the electromagnet generating force in the X-direction (X-electromagnet) must be increased. However, conventionally, the X-electromagnet and the Y-electromagnet are configured such that the projected area of ​​the attraction area of ​​the X-electromagnet is equal to the projected area of ​​the attraction area of ​​the electromagnet generating force in the Y-direction (Y-electromagnet). Consequently, due to the increase in the size of the X-electromagnet, the size of the Y-electromagnet also increases, leading to an increase in the overall mass.

[0006] The present invention provides a stage device that is advantageous for increasing the productivity of a scanning exposure device without increasing the overall size or mass. means of solving the problem

[0007] A stage device as one aspect of the present invention is used in a scanning type exposure device that exposes a substrate while scanning a disc and a substrate relatively in a scanning direction, and as a stage device for scanning the substrate in the scanning direction, it comprises a stage that holds and moves the substrate, a first actuator that generates a propulsive force for moving the stage in the scanning direction, and a second actuator that generates a propulsive force for moving the stage in a cross direction that intersects the scanning direction, wherein the value obtained by dividing the maximum propulsive force generated by the second actuator by a second movable mass which is a movable mass in the cross direction is greater than the value obtained by dividing the maximum propulsive force generated by the first actuator by a first movable mass which is a movable mass in the scanning direction, and the second movable mass is smaller than the first movable mass.

[0008] Further objects or other aspects of the present invention will be revealed by embodiments described below with reference to the accompanying drawings. Effects of the invention

[0009] According to the present invention, for example, a stage device that is advantageous for increasing the productivity of a scanning exposure device without increasing the overall size or mass can be provided. Brief explanation of the drawing

[0010] FIG. 1 is a schematic diagram illustrating the configuration of an exposure apparatus as one aspect of the present invention. FIG. 2 is a drawing illustrating the overall configuration of a substrate stage in a first embodiment. FIG. 3 is a detailed drawing of the fine-moving electromagnet shown in FIG. 2. FIG. 4 is a top view of a fine-moving electromagnet in each of the comparative example and the first embodiment. FIG. 5 is a drawing illustrating the overall configuration of a substrate stage in a second embodiment. FIG. 6 is a detailed drawing of the fine adjustment stage illustrated in FIG. 5. FIG. 7 is a detailed drawing of an example of a modified fine movement stage shown in FIG. 5. FIG. 8 is a diagram illustrating the Y-velocity, Y-acceleration, X-acceleration, and X-position during the U-turn period of the substrate stage. FIG. 9 is a diagram illustrating the relationship between the Y acceleration of the substrate stage and the X acceleration of the required substrate stage. FIG. 10 is a diagram illustrating the overall configuration of a substrate stage as a comparative example. FIG. 11 is a diagram illustrating the overall configuration of a substrate stage as a comparative example. FIG. 12 is a schematic diagram illustrating the configuration of the fine motion stage shown in FIG. 10 and FIG. 11. FIG. 13 is a drawing showing the details of the fine movement YLM and fine movement ZLM illustrated in FIG. 12. FIG. 14 is a detailed drawing of the fine-moving electromagnet illustrated in FIG. 11. FIG. 15 is a drawing showing the details of the X slider, Y slider, and XY slider shown in FIG. 10. FIG. 16 is a detailed drawing of the coarse linear motor shown in FIG. 11. FIG. 17 is a diagram illustrating the short arrangement of a substrate. Specific details for implementing the invention

[0011] Embodiments are described in detail below with reference to the attached drawings. Furthermore, the following embodiments are not intended to limit the invention related to the claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined at will. Moreover, in the attached drawings, the same reference number is assigned to identical or identical components, and redundant descriptions are omitted.

[0012] FIG. 1 is a schematic diagram illustrating the configuration of an exposure apparatus (1) as one aspect of the present invention. The exposure apparatus (1) is a lithography apparatus used, for example, in a manufacturing process (lithography process) of a semiconductor device, and forms a pattern on a substrate. The exposure apparatus (1) exposes a substrate W through a plate R. In this embodiment, the exposure apparatus (1) is a step-and-scan type (scanning type) exposure apparatus (scanner) that exposes the substrate W (scanning exposure) while scanning the plate R and the substrate W relatively in a scanning direction, and transfers the pattern of the plate R onto the substrate.

[0013] As shown in FIG. 1, the exposure device (1) has a stage plate (692), a substrate stage (500), a glass tube plate (696), a damper (698), a projection optical system (697), an illumination optical system (699), a circular plate plate (694), and a circular plate stage (695). In this embodiment, the direction perpendicular to the surface of FIG. 1 is the scanning direction, and the horizontal direction within the surface of FIG. 1 is the step direction. Additionally, a coordinate system is defined in which the scanning direction is the Y-axis, the direction intersecting the scanning direction, specifically the step direction perpendicular to the scanning direction, is the X-axis, and the direction perpendicular to the X-axis and Y-axis is the Z-axis.

[0014] The stage plate (692) is supported on the floor (691) via a mount (not shown). A substrate stage (500) is installed on the stage plate (692). The glass tube plate (696) is supported on the floor (691) via a damper (698). A projection optical system (697) and a circular plate (694) are installed on the glass tube plate (696). A circular plate stage (695) is movably installed (slidably movable) on the circular plate plate (694). An illumination optical system (699) is installed on the circular plate stage (695).

[0015] In the exposure, light generated from a light source (not shown) illuminates the original plate R by an illumination optical system (699). The pattern of the original plate R is projected (imaged) onto the substrate W by a projection optical system (697). At this time, the original plate stage (695) and the substrate stage (500) each scan the original plate R and the substrate W relatively in the scanning direction. The substrate stage (500) used by the exposure device (1) can make the acceleration in the step direction orthogonal to the scanning direction greater than the acceleration in the scanning direction, as described below. Accordingly, the exposure device (1) can provide devices (such as semiconductor devices, liquid crystal display devices, imaging devices, magnetic heads, etc.) economically with high throughput.

[0016] Below, regarding the details of the substrate stage (500), before describing the first and second embodiments, the configuration and problems of a general substrate stage (500A) are described as a comparative example.

[0017] <Comparison Example>

[0018] FIG. 10 is a drawing illustrating the overall configuration of a substrate stage (500A) as a comparative example. An XY slider (504) is installed on the stage base (505) so as to be movable (sliding) in the X and Y directions. An X slider (502) is installed on the XY slider (504) so ​​as to be movable (sliding) in the X direction. A Y slider (503) is installed on the X slider (502) so as to be movable (sliding) in the Y direction. Additionally, a coarse linear motor (506) is installed on both sides of the X slider (502) and the Y slider (503). The coarse linear motor (506) moves the X slider (502) and the Y slider (503), respectively, in the X and Y directions. The X slider (502), Y slider (503), XY slider (504), and coarse linear motor (506) function as moving parts that move the fine base (501-2) as a structure.

[0019] FIG. 11 is a diagram illustrating the overall configuration of a substrate stage (500A) in a line of sight from near the Y-axis to far the Y-axis. FIG. 12 is a schematic diagram illustrating the configuration of a fine adjustment stage (501), showing the state with the fine adjustment upper plate (501-1) removed. The fine adjustment base (501-2) is installed on top of the XY slider (504). On top of the fine adjustment base (501-2), four fine adjustment ZLMs (linear motors) (501-6) are installed to perform precise positioning of the tilt in the Z direction. Furthermore, on the upper part of the fine adjustment base (501-2), two fine adjustment XLMs (501-4) that perform precise positioning in the direction around the X-axis and Y-axis, and two fine adjustment YLMs (501-5) that perform precise positioning in the direction around the Y-axis and Z-axis are installed. In other words, the fine adjustment XLMs (501-4) function as a unit (fourth unit) that controls the X-direction position of the fine adjustment stage (501), and the fine adjustment YLMs (501-5) function as a unit (third unit) that controls the Y-direction position of the fine adjustment stage (501). In addition, a fine adjustment electromagnet (501-3) for generating acceleration force in the X-direction and Y-direction is installed in the central part of the fine adjustment base (501-2).

[0020] FIG. 13 is a drawing showing the details of the fine yLM (501-5) and fine ZLM (501-6), and shows the state with part of the yoke removed. The fine yLM (501-5) is composed of a fine yLM coil base (501-52), a fine yLM coil (501-51), a fine yLM magnet (501-53), a fine yLM yoke (501-54), and a fine yLM spacer (501-70). In this configuration, a fine motion YLM coil base (501-52) is fixed on top of a fine motion base (501-2), and a fine motion YLM coil (501-51) is fixed on top of the fine motion YLM coil base (501-52).

[0021] The fine yLM coil (501-51) is an elliptical coil having a straight section extending in the vertical direction, and four fine yLM magnets (501-53) are installed through a gap to face this straight section. Behind the fine yLM magnets (501-53), two fine yLM yokes (501-54) are installed to allow magnetic flux to pass through. The magnetization direction of the fine yLM magnets (501-53) is the X direction, and the fine yLM magnets (501-53) adjacent to the Y direction have reverse polarity, and the fine yLM magnets (501-53) arranged in the X direction have the same polarity. The movable LM spacer (501-70) is used to counteract the attractive force acting on a pair of magnets and a yoke and to maintain their position.

[0022] The fine motion YLM magnet (501-53), fine motion YLM yoke (501-54), and fine motion LLM spacer (501-70) are installed on the fine motion upper plate (501-1). By flowing current through the fine motion YLM coil (501-51), a force proportional to the current can be generated in a direction perpendicular to the straight section, that is, in the Y direction. Additionally, by flowing current in the reverse direction through each of the two fine motion YLM coils (501-51), a moment around the Z-axis can be generated.

[0023] Meanwhile, the fine ZLM (501-6) is composed of a fine ZLM coil base (501-62), a fine ZLM coil (501-61), a fine ZLM magnet (501-63), a fine ZLM yoke (501-64), and a fine ZLM spacer (501-70). In this configuration, the fine ZLM coil base (501-62) is fixed on the fine base (501-2), and the fine ZLM coil (501-61) is fixed on the fine ZLM coil base (501-62).

[0024] The fine ZLM coil (501-61) is an elliptical coil having a straight section extending in the horizontal direction, and four fine ZLM magnets (501-63) are installed through a gap to face this straight section. Behind the fine ZLM magnets (501-63), two fine ZLM yokes (501-64) are installed to allow magnetic flux to pass through. The magnetization direction of the fine ZLM magnets (501-63) is the X direction, and the fine ZLM magnets (501-63) adjacent to the Z direction have reverse polarity, and the fine ZLM magnets (501-63) arranged in the X direction have the same polarity. The movable LM spacer (501-70) is used to counteract the attractive force acting on a pair of magnets and a yoke and to maintain their position.

[0025] The fine ZLM magnet (501-63), fine ZLM yoke (501-64), and fine ZLM spacer (501-70) are installed on the fine upper plate (501-1). By flowing current through the fine ZLM coil (501-61), a force proportional to the current can be generated in a direction perpendicular to the straight section, that is, in the Z direction. Additionally, since four fine ZLM coils (501-61) are installed, a moment around the X-axis and a moment around the Y-axis can be generated by combining the directions of the current.

[0026] The fine XLM (501-4) has the same configuration as the fine XYM (501-5) and is positioned rotated 90 degrees relative to the fine XYM (501-5). The fine XLM (501-4) can generate a force in the X direction and a moment around the Z axis.

[0027] FIG. 14 is a drawing illustrating the details of a fine motion electromagnet (501-3). The fine motion electromagnet (501-3) is composed of a first unit and a second unit that apply force to a fine motion stage (501). The first unit includes a first electromagnet and is a unit that applies the force generated from the first electromagnet to the fine motion stage (501) as a force that accelerates the fine motion stage (501) in the Y direction. Additionally, the second unit includes a second electromagnet and is a unit that applies the force generated from the second electromagnet to the fine motion stage (501) as a force that accelerates the fine motion stage (501) in the X direction. Specifically, the fine motion electromagnet (501-3) includes an E-core support member (501-30), an I-core support member (501-31), and an I-core (501-32). Additionally, the fine-moving electromagnet (501-3) includes an E-core X (501-33), an E-core X coil (501-34), an E-core Y (501-35), and an E-core Y coil (501-36).

[0028] An E-core support member (501-30) is fixed on the upper side of the fine movement base (501-2). Two E-core X (501-33), an E-core X coil (501-34), two E-core Y (501-35), and an E-core Y coil (501-36) are fixed on the four inner sides of the E-core support member (501-30). An I-core (501-32) is installed through a small gap in relation to these E-cores. The I-core (501-32) is installed on the fine movement upper plate (501-1) through the I-core support member (501-31). The four E-cores and I-cores have the same size, and the maximum force that can be generated from them is also the same.

[0029] FIG. 15 is a drawing showing the details of an X slider (502), a Y slider (503), and an XY slider (504). The XY slider (504) is composed of an XY slider lower section (504-3), an XY slider middle section (504-2), and an XY slider upper section (504-1). The XY slider lower section (504-3) is supported on a stage base (505) so as to be movable (slidable) in the X and Y directions. An XY slider middle (504-2) is installed on top of the XY slider lower (504-3), and an XY slider upper (504-1) is installed on top of the XY slider middle (504-2).

[0030] The X-slider (502) consists of an X-beam (502-1), an X-foot (502-2), and an X-yaw guide (502-3). Two X-yaw guides (502-3) are fixed to two sides of the stage base (505), and two X-foots (502-2) are connected to the X-beam (502-1).

[0031] One X-foot (502-2) is supported so as to be movable (sliding) in the X direction, facing the side of one X-yaw guide (502-3) and the upper surface of the stage base (505) through a gap. The other X-foot (502-2) is supported so as to be movable (sliding) in the X direction, facing the side of the other X-yaw guide (502-3) and the upper surface of the stage base (505) through a gap. Accordingly, the integral of the X-beam (502-1) and the two X-foots (502-2) is movable (sliding) in the X direction. Additionally, both sides of the X-beam (502-1) face the inner side of the XY slider (504-2) so as to be movable (sliding) through a small space, and restrain the XY slider (504) so ​​as to be movable (sliding) in the X and Y directions.

[0032] The Y slider (503) consists of a Y beam (503-1), a Y foot (503-2), and a Y yaw guide (503-3). Two Y yaw guides (503-3) are fixed to two sides of the stage base (505), and two Y feet (503-2) are connected to the Y beam (503-1).

[0033] One Y-foot (503-2) is supported through a gap facing the side of one Y-yaw guide (503-3) and the upper surface of the stage base (505), so as to be movable (sliding) in the Y direction. The other Y-foot (503-2) is supported through a gap facing the side of the other Y-yaw guide (503-3) and the upper surface of the stage base (505), so as to be movable (sliding) in the Y direction. Accordingly, the integrated body of the Y-beam (503-1) and the two Y-foots (503-2) can be moved (sliding) in the Y direction. Additionally, both sides of the Y-beam (503-1) face the inner surface of the XY slider (504-1) so as to be movable (sliding) through a small space, and restrain the XY slider (504) so ​​as to be movable (sliding) in the X and Y directions.

[0034] FIG. 16 is a drawing illustrating the details of a coarse-wheeled linear motor (506). The coarse-wheeled linear motor (506) includes a coil (506-1), a coil support plate (506-2), a coil support (506-3), and a coil base (506-4). The coarse-wheeled linear motor (506) includes a magnet (506-5), a yoke (506-6), a spacer (506-7), and an arm (506-8).

[0035] The coil (506-1) is a two-phase coil unit in which the phase of adjacent coils is offset by 90 degrees. The coil (506-1) is fixed integrally to the coil support plate (506-2) and is fixed to the coil base (506-4) through the coil support (506-3). The coil base (506-4) may be fixed to the stage plate (692) or supported so as to be movable (slidable) in the direction of coil arrangement relative to the stage plate (692). By supporting the coil base (506-4) movably in this way, the recoil of acceleration can be absorbed.

[0036] The magnet (506-5) is a pair of four-pole magnet units. The magnet (506-5) is positioned to allow coils to be inserted from the top and bottom through a gap, and a yoke (506-6) is installed behind it. A spacer (506-7) is used to maintain the gap between the pair of magnets against the attractive force. The combined body of the magnet (506-5), yoke (506-6), and spacer (506-7) is fixed to the X-foot (502-2) or Y-foot (503-2) through an arm (506-8). Accordingly, an X-direction thrust or a Y-direction thrust can be applied to the combined body of the X-beam (502-1) and two X-foots (502-2) or the combined body of the Y-beam (503-1) and two Y-foots (503-2). In addition, in this configuration, a sinusoidal current according to position can be flowed to the coil facing the rear magnet of the two-phase coil, thereby continuously generating force.

[0037] FIG. 17 is a diagram illustrating a shot arrangement of substrate W. On substrate W, shot areas (701) with X-size x and Y-size y are arranged (layout), and scanning exposure is performed along a scan (Y-direction) and step (X-direction) trajectory indicated by an arrow in FIG. 17. At this time, during scanning exposure, the substrate stage scans in the Y-direction at a speed of 1 / magnification of the projection optical system (exposure magnification) in synchronization with the original plate stage, and when scanning exposure ends, it steps in the X-direction while making a U-turn in the Y-direction to perform scanning exposure of the next shot area.

[0038] FIG. 8 is a diagram illustrating the speed in the Y direction (Y speed), acceleration in the Y direction (Y acceleration), acceleration in the X direction (X acceleration), and position in the X direction (X position) during the time the substrate stage is U-turning (U-turn period). FIG. 8 illustrates the case where the exposure magnification is 4 times, the Y acceleration of the substrate stage is 30G, and the scanning speed of the substrate stage is 5 m / s. Referring to FIG. 8, in order to complete a step movement of 26 mm corresponding to the X size XY of the shot area (701) within the U-turn period of the substrate stage, a weak X acceleration of 10G is required. 10G is greater than 7.5G, which is 30G / exposure magnification, and this illustrates that the X acceleration of the substrate stage is greater than the Y acceleration.

[0039] FIG. 9 is a figure in which the Y acceleration of the substrate stage is plotted on the horizontal axis and the X acceleration of the required substrate stage is plotted on the vertical axis, and the relationship between them is illustrated by a solid line. FIG. 9 also illustrates the relationship when the X acceleration and Y acceleration of the substrate stage are the same by a dashed line. Referring to FIG. 9, it is illustrated that when the Y acceleration of the substrate stage exceeds 7G, ​​the X acceleration of the required substrate stage is above the dashed line; in other words, it is shown that in the substrate stage, it is required to make the X acceleration greater than the Y acceleration.

[0040] Therefore, in this embodiment, a stage device (substrate stage (500)) is provided that is advantageous for increasing the productivity of a scanning type exposure device by making the X acceleration greater than the Y acceleration without increasing the overall size or mass.

[0041] <First Embodiment>

[0042] With reference to FIGS. 2, 3, and 4, a substrate stage (500) in the first embodiment is described. FIG. 2 is a drawing showing the overall configuration of the substrate stage (500) in the first embodiment, and shows the state with the fine motion upper plate (101-1) removed. Referring to FIG. 2, a fine motion electromagnet (101-3) is installed in the center of the substrate stage (500). In the substrate stage (500) in the first embodiment, the configuration excluding the fine motion electromagnet (101-3) is the same as the comparative example, so in the first embodiment, the fine motion electromagnet (101-3) is described.

[0043] FIG. 3 is a drawing illustrating the details of a fine-motion electromagnet (101-3). The fine-motion electromagnet (101-3) includes an E-core support member (101-30), an I-core support member (101-31), an I-core X (101-38), and an I-core Y (101-37). Furthermore, the fine-motion electromagnet (101-3) includes an E-core X (101-33), an E-core X coil (101-34), an E-core Y (101-35), and an E-core Y coil (101-36).

[0044] An E-core support member (101-30) is fixed on the upper side of the fine movement base (101-2). Two E-core X (101-33) and E-core X coils (101-34), and two E-core Y (101-35) and E-core Y coils (101-36) are fixed on the four inner sides of the E-core support member (101-30). For these four E-cores, an I-core X (101-38) and an I-core Y (101-37) are installed through a small gap and are fixed to the fine movement upper plate (101-1) through the I-core support member (101-31).

[0045] FIG. 4 is a top view of the fine electromagnet (501-3) in the comparative example and the fine electromagnet (101-3) in the first embodiment, respectively. As shown in FIG. 4, the E-core support member (101-30) has the same size as the E-core support member (501-30).

[0046] Referring to FIG. 4, E-core X (101-33) has a different size from E-core X (501-33), and in this embodiment, has a size larger than that of E-core X (501-33). In other words, the projected area obtained by projecting E-core X (101-33) (width) onto a plane normal to the X direction is larger than the projected area obtained by projecting E-core X (501-33) onto a plane normal to the X direction. Therefore, in this embodiment, a large acceleration force can be generated in the X direction, and the X acceleration of the substrate stage (500) can be made larger than in the comparative example.

[0047] Meanwhile, E-core Y (101-35) has the same size as E-core Y (501-35). In other words, the projected area obtained by projecting E-core Y (101-35) (the width of) onto a plane with the Y direction as the normal is the same as the projected area obtained by projecting E-core Y (501-35) onto a plane with the Y direction as the normal. Therefore, in this embodiment, acceleration force in the Y direction can be generated as in the comparative example, and the X acceleration of the substrate stage (500) can be made greater than that of the comparative example without sacrificing the Y acceleration of the substrate stage (500).

[0048] Thus, in this embodiment, the projected area obtained by projecting the E-core X (101-33) (core of the second electromagnet) onto a plane with the X direction as the normal is made larger than the projected area obtained by projecting the E-core Y (101-35) (core of the first electromagnet) onto a plane with the Y direction as the normal. Accordingly, the X acceleration in the substrate stage (500) can be made greater than the Y acceleration without increasing the overall size or mass. Therefore, even if the acceleration in the scanning direction (Y direction) of the substrate stage (500) is increased to improve the productivity of the exposure device (1), the step movement (movement in the X direction) can be completed within the U-turn period of the substrate stage (500).

[0049] In addition, from the perspective of making the X acceleration greater than the Y acceleration, the aforementioned projection area obtained from the E-core X (101-33) should have a size of at least 1.1 times that of the aforementioned projection area obtained from the E-core Y (101-35). Accordingly, it is also advantageous to increase the productivity of the exposure device (1).

[0050] <Second Embodiment>

[0051] Referring to FIGS. 5, 6, and 7, a substrate stage (500) in a second embodiment is described. FIG. 5 is a drawing illustrating the overall configuration of the substrate stage (500) in a second embodiment, showing the state with the fine adjustment upper plate removed. Referring to FIG. 5, a fine adjustment stage (201) is installed in the central part of the substrate stage (500). In the substrate stage (500) in the second embodiment, the configuration excluding the fine adjustment stage (201) is the same as the comparative example, so in the second embodiment, the fine adjustment stage (201) is described.

[0052] FIG. 6 is a detailed drawing of a fine adjustment stage (201). The fine adjustment stage (201) is composed of a fine adjustment upper plate (not shown), a fine adjustment base (201-2), one fine adjustment XLM (linear motor) (201-4), two fine adjustment YLMs (201-5), and four fine adjustment ZLMs (201-6). In this embodiment, acceleration in the X direction and Y direction of the substrate stage (500) is performed not by an electromagnet, but by a linear motor, that is, by the fine adjustment XLM (201-4) and the fine adjustment YLM (201-5). The fine motion XLM (201-4) (second linear motor) constitutes a second unit that provides a force to accelerate the fine motion stage (201) in the X direction. Additionally, the fine motion YLM (201-5) (first linear motor) constitutes a first unit that provides a force to accelerate the fine motion stage (201) in the Y direction. Furthermore, in this embodiment, the position within the XY plane of the substrate stage (500) or the position around the Z-axis is also controlled by the fine motion XLM (201-4) and the fine motion YLM (201-5). In other words, the fine adjustment XLM (201-4) and the fine adjustment YLM (201-5) also function as a fourth unit controlling the X-direction position of the fine adjustment stage (201) and a third unit controlling the Y-direction position of the fine adjustment stage (201), respectively.

[0053] In this embodiment, the configuration of the fine motion YLM (201-5) and fine motion ZLM (201-6) is the same as in the comparative example. Meanwhile, in the fine motion XLM (201-4), the combination of the fine motion XLM coil (201-41) and the fine motion XLM magnet (201-43) is installed in three rows in the X direction (three columns). Thus, in this embodiment, the total volume of each of the fine XLM coil (201-41) and fine XLM magnet (201-43) of the fine XLM (201-4) is greater than the total volume of each of the fine YLM coil and fine YLM magnet of the fine YLM (201-5). Accordingly, the X acceleration in the substrate stage (500) can be made greater than the Y acceleration without increasing the overall size or mass. Therefore, even if the acceleration in the scanning direction (Y direction) of the substrate stage (500) is increased to improve the productivity of the exposure device (1), the step movement (movement in the X direction) can be completed within the U-turn period of the substrate stage (500).

[0054] In addition, the total volume of each of the fine XLM coil (201-41) and fine XLM magnet (201-43) of the fine XLM (201-4) is at least 1.1 times the total volume of each of the fine XYM coil and fine XYM magnet of the fine XYM (201-5). Accordingly, it is advantageous from the perspective of making the X acceleration greater than the Y acceleration, and thus the productivity of the exposure device (1) can be increased. Also, as shown in FIG. 7, three fine XLMs (201-4) shown in FIG. 6 may be arranged in the Y direction. Accordingly, the X acceleration in the substrate stage (500) can be made even greater.

[0055] In addition, in the first and second embodiments, if the acceleration of the substrate stage (500) is set to SA [G] and the scanning speed of the substrate stage (500) is set to SV [m / s], SA / SV > 4.5 is satisfied. In other words, when such a relationship is established between the acceleration of the substrate stage (500) and the scanning speed of the substrate stage (500), it is necessary to make the X acceleration greater than the Y acceleration.

[0056] In the first and second embodiments, the acceleration transmission mechanism of the fine movement stage of the substrate stage (500) was described in detail. However, the important thing is that in the scanning type exposure device (1), the step movement of the substrate stage (500) is completed within the U-turn period. To achieve this, regardless of whether the substrate stage (500) is a fine movement separation type or a fine movement integration type, it is preferable that X acceleration > Y acceleration be realized in the substrate stage (500). In other words, it is preferable that the maximum thrust generated by the second actuator, which provides the thrust to move the substrate stage (500) in the X direction (non-scanning direction), be greater than the maximum thrust generated by the first actuator, which provides the thrust to move the substrate stage (500) in the Y direction (scanning direction). Additionally, the value obtained by dividing the maximum thrust in the X direction by the operating mass in the X direction may be greater than the value obtained by dividing the maximum thrust in the Y direction by the operating mass in the Y direction.

[0057] Specifically, it is preferable to make the volume of the coarse linear motor in the X-direction larger than the volume of the coarse linear motor in the Y-direction. Additionally, if the volumes of the coarse linear motor in the X-direction and the coarse linear motor in the Y-direction are equal, it is preferable to increase the number of coarse linear motors in the X-direction compared to the number of coarse linear motors in the Y-direction. However, in these cases, since the operating mass increases, it is necessary to verify that the ratio of the maximum thrust in the X-direction to the operating mass in the X-direction satisfies the ratio of the maximum thrust in the Y-direction to the operating mass in the Y-direction.

[0058] In addition, if the volume and number are the same between the X-direction coarse linear motor and the Y-direction coarse linear motor, the capacity of the X-direction current driver may be made larger than that of the Y-direction current driver, allowing a large current to be supplied to the X-direction coarse linear motor. In this case, as a heat dissipation measure, it is preferable to increase the refrigerant flow rate of the cooling mechanism of the X-direction coarse linear motor to be greater than the refrigerant flow rate of the cooling mechanism of the Y-direction coarse linear motor.

[0059] In addition, the volume of the X-direction coarse linear motor may be made smaller than the volume of the Y-direction coarse linear motor, and the capacity of the X-direction current driver may be made larger than the capacity of the Y-direction current driver, so that a large current can be supplied to the X-direction coarse linear motor. In addition, as a heat dissipation measure, the refrigerant flow rate of the cooling mechanism of the X-direction coarse linear motor may be increased more than the refrigerant flow rate of the cooling mechanism of the Y-direction coarse linear motor. In this case, by making the operating mass in the X-direction smaller than the operating mass in the Y-direction, the X acceleration can be made larger.

[0060] The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing, for example, semiconductor devices, liquid crystal display devices, imaging devices, magnetic heads, MEMS, etc. Such a manufacturing method includes a process of exposing a substrate coated with a photosensitive material using the exposure device (1) described above, and a process of developing the exposed photosensitive material. In addition, using the developed photosensitive material pattern as a mask, an etching process or an ion implantation process is performed on the substrate, and a circuit pattern is formed on the substrate. These processes of exposure, development, etching, etc. are repeated to form a circuit pattern consisting of multiple layers on the substrate. In a subsequent process, dicing (processing) is performed on the substrate on which the circuit pattern is formed, and processes of chip mounting, bonding, and inspection are performed. In addition, such a manufacturing method may include other well-known processes (oxidation, film formation, deposition, doping, planarization, resist stripping, etc.). The method of manufacturing an article in this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article compared to the prior art.

[0061] The invention is not limited to the above embodiments, and various changes and modifications are possible without departing from the spirit and scope of the invention. Accordingly, claims are attached to clarify the scope of the invention.

Claims

Claim 1 A stage device used in a scanning type exposure device that exposes a substrate while scanning a disc and a substrate relative to each other in a scanning direction, and a stage device that scans the substrate in the scanning direction, comprising a stage that holds and moves the substrate, a first actuator that generates a propulsion force to move the stage in the scanning direction, and a second actuator that generates a propulsion force to move the stage in a cross direction that intersects the scanning direction, wherein the value obtained by dividing the maximum propulsion force generated by the second actuator by a second movable mass which is a movable mass in the cross direction is greater than the value obtained by dividing the maximum propulsion force generated by the first actuator by a first movable mass which is a movable mass in the scanning direction, and wherein the second movable mass is smaller than the first movable mass. Claim 2 A stage device according to claim 1, wherein the first actuator includes a first electromagnet and the second actuator includes a second electromagnet, and the area of ​​the core of the second electromagnet in a plane normal to the intersection direction is larger than the area of ​​the core of the first electromagnet in a plane normal to the scanning direction. Claim 3 A stage device according to claim 2, characterized in that the area of ​​the core of the second electromagnet in a plane normal to the intersection direction has a size of at least 1.1 times the area of ​​the core of the first electromagnet in a plane normal to the scanning direction. Claim 4 A stage device according to claim 1, further comprising a third unit for controlling the position of the scanning direction of the stage and a fourth unit for controlling the position of the intersection direction of the stage. Claim 5 A stage device according to claim 1, characterized in that the scanning direction and the intersection direction are orthogonal. Claim 6 A stage device according to claim 1, wherein the first actuator comprises a first coil and a first magnet, the second actuator comprises a second coil and a second magnet, and the total volume of each of the second coil and the second magnet is greater than the total volume of each of the first coil and the first magnet. Claim 7 A stage device according to claim 6, characterized in that the total volume of each of the second coil and the second magnet is at least 1.1 times the total volume of each of the first coil and the first magnet. Claim 8 A stage device according to claim 1, characterized in that the maximum thrust generated by the second actuator is greater than the maximum thrust generated by the first actuator. Claim 9 An exposure device of the scanning type that exposes a substrate while scanning a disc and a substrate relatively in a scanning direction, characterized by having a stage device described in any one of claims 1 to 8 that scans the substrate in the scanning direction, and a projection optical system that projects a pattern of the disc onto the substrate that is scanned in the scanning direction by the stage device. Claim 10 delete Claim 11 delete Claim 12 delete Claim 13 delete Claim 14 delete Claim 15 delete Claim 16 delete Claim 17 delete Claim 18 delete Claim 19 A method for manufacturing an article characterized by having a process of exposing a substrate using an exposure device described in claim 9, a process of developing the exposed substrate, and a process of manufacturing an article from the developed substrate.

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