Exposure method, exposure apparatus, and article manufacturing method

Abstract

[Problem] Provides a technology advantageous for improving the throughput of an exposure process that performs intermittent exposure on a single exposure area. [Solution] An exposure method for intermittently exposing a shot area of ​​a substrate multiple times intermittently comprises a first process of initiating a first exposure of a first shot area of ​​the substrate by changing a shutter for opening and closing the light path of the exposure light from a light-blocking state to a light-passing state, and a second process of terminating the first exposure by changing the shutter from the light-passing state to the light-blocking state, and then initiating a second exposure of the first shot area in which the first exposure was performed by changing the shutter back to the light-passing state, wherein in the second process, the shutter is not stopped.

Description

Technology Field

[0001] The present invention relates to an exposure method, an exposure apparatus, and a method for manufacturing an article. Background Technology

[0002] In the manufacture of devices (semiconductor devices, magnetic memory media, liquid crystal display elements, etc.), color filters, or hard disks, an exposure device is used to expose a substrate (glass plate, wafer, etc.). The exposure device exposes the substrate, for example, by irradiating light onto a patterned plate (reticle, mask) and irradiating the light from the plate onto the substrate through a projection optical system.

[0003] Patent Document 1 discloses an exposure method in which exposure is performed intermittently on an area to be exposed (shot area) on a substrate in order to prevent an effect on the optical system of an exposure device caused by a temperature rise of the lens due to exposure. Here, performing exposure intermittently on the shot area means repeating the exposure and interruption of the shot area. Prior art literature

[0004] Japanese Patent Publication No. 2844600 The problem to be solved

[0005] When exposure is performed intermittently on a shot area on a substrate, there is a period during which the exposure is stopped, which increases the duration of the exposure process and may suppress the improvement of throughput. Therefore, in an exposure process that performs intermittent exposure, it is required to improve throughput by shortening the period during which the exposure is stopped.

[0006] The present invention provides a technology advantageous for improving the throughput of an exposure process that performs intermittent exposure on a single shot area. means of solving the problem

[0007] According to a first aspect of the present invention, an exposure method for intermittently exposing a shot area of ​​a substrate multiple times is provided, comprising: a first step of initiating a first exposure of a first shot area of ​​the substrate by changing a shutter for opening and closing a light path of exposure light from a light-blocking state to a light-passing state; and a second step of terminating the first exposure by changing the shutter from a light-passing state to a light-blocking state, and then initiating a second exposure of the first shot area in which the first exposure was performed by changing the shutter again to a light-passing state, wherein the shutter is not stopped in the second step.

[0008] According to a second aspect of the present invention, an exposure device for performing intermittent exposure of a shot area of ​​a substrate intermittently a plurality of times is provided, comprising: a shutter having a light-passing part and a light-shielding part; a driving part for driving the shutter to set the shutter to a light-blocking state by positioning the light-shielding part on the light path of the exposure light and to set the shutter to a light-passing state by positioning the light-passing part on the light path; and a control part, wherein the control part is configured to perform a first process of initiating a first exposure of a first shot area by changing the shutter from the light-blocking state to the light-passing state, and a second process of terminating the first exposure by changing the shutter from the light-passing state to the light-blocking state, and then initiating a second exposure of the first shot area in which the first exposure was performed by changing the shutter again to the light-passing state, and wherein the control part controls the driving part so as not to stop the shutter during the first process.

[0009] According to a third aspect of the present invention, a method for manufacturing an article is provided, characterized by comprising a process of exposing a substrate according to an exposure method according to the first aspect and a process of developing the exposed substrate, thereby manufacturing an article from the developed substrate. Effects of the invention

[0010] According to the present invention, a technology advantageous for improving the throughput of an exposure process that performs intermittent exposure on a single shot area can be provided. Brief explanation of the drawing

[0011] Figure 1 is a diagram illustrating the configuration of an exposure device. Figure 2 is a drawing illustrating the configuration of a shading mechanism. Figure 3 is a drawing illustrating an example of a plurality of shot regions on a substrate. Figure 4 is a diagram illustrating the exposure treatment for Comparative Example 1. Figure 5 is a diagram illustrating an exposure treatment including intermittent exposure, relating to Comparative Example 2. FIG. 6 is a drawing illustrating the exposure treatment according to the first embodiment. FIG. 7 is a drawing illustrating the exposure treatment for Example 1 of a variation of the first embodiment. FIG. 8 is a drawing illustrating the exposure treatment for Example 2 of a variation of the first embodiment. FIG. 9 is a drawing illustrating the exposure treatment according to the second embodiment. FIG. 10 is a drawing illustrating an exposure treatment for a modified example of the second embodiment. Specific details for implementing the invention

[0012] Embodiments are described in detail below with reference to the accompanying drawings. Furthermore, the following embodiments are not intended to limit the invention covered by the claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the present invention, and multiple features may be combined arbitrarily. Additionally, in the accompanying drawings, the same reference numerals are assigned to identical or similar components, and redundant descriptions are omitted.

[0013] <First Embodiment>

[0014] First, an exposure device (100a) according to the first embodiment will be described. FIG. 1 is a drawing illustrating an exposure device (100a) according to the first embodiment. The exposure device (100a) may be equipped with, for example, a light source unit (101), a light blocking mechanism (102) (switching unit), an illumination optical system (103), a disc holding unit (not shown), a projection optical system (105), a stage (108), and a control unit (110). In addition, in this specification and the accompanying drawings, the direction following the optical axis (109) of the projection optical system (105) is designated as the Z-axis direction, and two mutually orthogonal directions following a plane perpendicular to the Z-axis direction are designated as the X-axis direction and the Y-axis direction.

[0015] The light source unit (101) irradiates light to expose the substrate (107). It consists of a light source such as an ultra-high pressure mercury lamp, a solid-state light source such as an LED or LD, an ArF excimer laser, or a KrF excimer laser. Additionally, the light source unit (101) may be configured separately from the exposure device (100a).

[0016] The light-blocking mechanism (102) is a mechanism for switching between blocking and passing light from a light source unit (101), and may include, for example, a shutter. The shutter may include a light-blocking member (102a) as a light-shielding unit that blocks light from the light source unit (101), and a light-passing unit (102b) that passes light from the light source unit (101) (see FIG. 2). The light-blocking mechanism (102) further has a driving unit (102c) that drives the shutter. The driving unit (102c) drives the shutter to a light-blocking state by positioning the light-blocking member (102a) on the light path of the exposure light, and to a light-passing state by positioning the light-passing unit (102b) on the light path. Also, in the example of FIG. 1, the light-blocking mechanism (102) is placed on the light path between the light source unit (101) and the lighting optical system (103), but it may be placed in another location where it can block light from the light source unit (101).

[0017] Here, the movement of the light-blocking member (102a) is described. FIG. 2 is a diagram illustrating the positional relationship between the light-blocking member (102a) and the light flux (101a) of light from the light source unit (101) according to the present embodiment. In the example of FIG. 2, the driving unit (102c) switches between blocking and passing light from the light source unit (101) by rotating the light-blocking member (102a) (moving it in the rotational direction). In one example, three light-blocking members (102a) are arranged at 120-degree intervals, and the driving unit (102c) rotates the light-blocking member (102a) with the center of the light-blocking member (102a) as the rotation axis.

[0018] FIG. 2(a) illustrates a state in which a light-blocking member (102a) is positioned to block light from a light source unit (101). As shown in FIG. 2(a), light from the light source unit (101) is blocked by positioning one of the three light-blocking members (102a) to overlap with the light beam (101a). Additionally, FIG. 2(b) illustrates a state in which a light-passing member (102b) is positioned on the light path of the exposure light from the light source unit (101). As shown in FIG. 2(b), the light-passing member (102b) located between two light-blocking members (102a) is positioned on the light path, thereby allowing light from the light source unit (101) to pass through. That is, the light-blocking members (102a) are arranged so that all three light-blocking members (102a) do not overlap with the light beam (101a) of the light from the light source (101), thereby allowing the light from the light source (101) to pass through.

[0019] Here, an example of a light-blocking mechanism (102) that switches the passage and blocking of light by rotating the light-blocking member (102a) has been described, but it may also be a light-blocking mechanism that switches the passage and blocking of light by moving the light-blocking member back and forth along a predetermined path. In addition, the number of light-blocking parts of the light-blocking member (102a) and the arrangement of the light-blocking parts are not limited to the example of FIG. 2.

[0020] Returning to the description of FIG. 1. The illumination optical system (103) shapes the light beam from the light source unit (101) into a predetermined shape suitable for exposure and illuminates the disc (104). The illumination optical system (103) may include a lens, a mirror, an optical integrator, an aperture, etc., to achieve a function of uniformly illuminating the disc (104) or a polarized illumination function. The disc (104) is, for example, a disc (reticle, mask) made of quartz, and a circuit pattern to be transferred to a substrate (107) is formed thereon, and is held and moved in a disc holding unit (not shown).

[0021] The disc holding unit holds the disc (104) and moves it in the X-axis direction, Y-axis direction, Z-axis direction, and rotational direction around each axis. The disc holding unit holds the disc (104) through a disc holding mechanism (not shown) that holds the disc (104) and is connected to a disc moving mechanism (not shown). The disc moving mechanism is composed of a linear motor, etc., and moves the disc (104) by driving the disc holding unit in the X-axis direction, Y-axis direction, Z-axis direction, and rotational direction around each axis.

[0022] The projection optical system (105) projects the pattern of the disc (104) illuminated by the illumination optical system (103) onto the substrate (107), thereby exposing the substrate (107). The projection optical system (105) has the function of forming a light beam from the object surface onto an image surface, and in this embodiment, forms a diffracted light that has passed through the pattern formed on the disc (104) onto the substrate (107). The projection optical system (105) may be a plurality of lens elements, an optical system including a plurality of lens elements and at least one concave mirror (catadiotropic optical system), an optical system having a plurality of lens elements and at least one diffracting optical element such as a kinoform, etc.

[0023] The stage (108) (moving part) holds the substrate (107) and moves in the X-axis direction, Y-axis direction, Z-axis direction, and rotational direction around each axis. The stage (108) is configured to hold the substrate (107) by means of a substrate holding mechanism (not shown) that holds the substrate (107), thereby enabling the position and orientation of the substrate (107) to be changed. Similar to the disc holding part, the stage (108) moves the substrate (107) in the X-axis direction, Y-axis direction, Z-axis direction, and rotational direction around each axis using a substrate moving mechanism (not shown) composed of a linear motor, etc. Additionally, a photosensitive material (106) (resist) is applied to the substrate (107).

[0024] The control unit (110) is composed of a computer (information processing device) connected to enable communication, such as a CPU or memory, for example, and comprehensively controls each part of the exposure device (100a) according to a program stored in the memory. In addition, the control unit (110) may be composed of a plurality of computers, such as a board computer, for individually controlling each part of the exposure device (100a).

[0025] The exposure device (100a) is a device that performs a process (exposure process) of forming a pattern on a substrate (107) according to, for example, a step-and-repeat method. Additionally, the exposure device (100a) may be a device that performs a process of forming a pattern on a substrate (107) according to a step-and-scan method or other methods.

[0026] Here, the case in which the exposure device (100a) performs exposure processing according to the step-and-repeat method is described. FIG. 3 is a drawing illustrating an example of a plurality of shot areas (exposure areas) on a substrate (107). In the example of FIG. 3, there are 21 exposure areas a to u on the substrate (107), but this example is not limited to this, and the size and number of exposure areas can be arbitrarily set. In addition, the exposure device (100a) starts exposure processing from exposure area a, for example, and performs exposure processing in the order of exposure areas a, b, c, ..., u. In addition, this order is an example, and exposure processing can be performed in any order.

[0027] First, the control unit (110) moves the stage (108) so that the exposure area a of the substrate (107) is positioned on the optical axis (109) of the projection optical system (105). Then, the control unit (110) moves the light-blocking member (102a) to a position that allows light from the light source unit (101) to pass through. Accordingly, light from the light source unit (101) illuminates the original plate (104) through the illumination optical system (103). Then, the pattern of the illuminated original plate (104) is projected onto the substrate (107) through the projection optical system (105), and the exposure area a is exposed. After the exposure area a is exposed with a predetermined amount of exposure, the control unit (110) moves the light-blocking member (102a) of the light-blocking mechanism (102) to a position that blocks light from the light source unit (101). As a result of the above, the exposure processing of exposure area a is completed. Next, the control unit (110) moves the stage (108) so that the exposure area b of the substrate (107) is positioned on the optical axis (109) of the projection optical system (105). After that, the exposure processing of exposure area b is performed in the same way as that of exposure area a. In addition, the exposure processing is performed in the same way for the exposure areas after exposure area c.

[0028] (Comparison Example 1)

[0029] Next, an exposure treatment for the case where the exposure area is continuously exposed as Comparative Example 1 will be described. FIG. 4 is a diagram illustrating the exposure treatment for Comparative Example 1. In FIG. 4(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 4(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light-blocking mechanism (102). State θ includes a light-blocking state θ1 in which the light-blocking mechanism (102) blocks all light from the light source unit (101), and a light-passing state θ2 in which the light-blocking mechanism (102) allows all light from the light source unit (101) to pass through. Additionally, state θ includes an intermediate state (θ1 < θ < θ2) in which the light-blocking mechanism (102) blocks some light from the light source unit (101) and allows the remaining light to pass through. The light-blocking state θ1 is a state in which the light-blocking member (102a) is in a position that blocks all of the light from the light source unit (101), as illustrated in FIG. 2(a). The light-passing state (θ2) is a state in which the light-blocking member (102a) is in a position that allows all of the light from the light source unit (101) to pass through, as illustrated in FIG. 2(b). The intermediate state is a state in which the light-blocking member (102a) blocks some of the light from the light source unit (101) and allows the rest of the light to pass through.

[0030] During the period (movement (a)) in which the stage (108) moves so that the exposure area a is positioned on the optical axis (109), the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. During constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), the exposure period (exposure (a)) of the exposure area a is initiated. During the exposure period (exposure (a)), the light-blocking mechanism (102) becomes a light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0031] At the timing when the exposure period (exposure (a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To achieve this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. When the light-blocking member (102a) reaches a position where it completely blocks light from the light source (101), the exposure period (exposure (a)) ends.

[0032] After that, during the period (movement (b)) in which the stage (108) moves so that the exposure area b is positioned on the optical axis (109), the light-blocking mechanism (102) becomes a light-blocking state θ1. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0033] In accordance with the timing for initiating exposure of the exposure area b, the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. During constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), the exposure period (exposure (b)) of the exposure area b is initiated. During the exposure period (exposure (b)), the light-blocking mechanism (102) becomes the light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0034] Depending on the timing at which the exposure period (exposure (b)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To achieve this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. Subsequently, likewise, the stage (108) is moved to expose the exposure area c, and the exposure processing of the exposure area c is performed.

[0035] Here, the exposure of a substrate (107) coated with a photosensitive agent (106) containing a radical polymerization type curing resin is described. The photosensitive agent (106) containing a radical polymerization type curing resin is cured by absorbing light irradiated onto the photosensitive agent (106) and undergoing a radical reaction. Additionally, the concentration of radicals generated by the radical reaction in the photosensitive agent (106) is determined according to the illuminance of the light irradiated onto the photosensitive agent (106). Furthermore, since the irradiated light is absorbed by the photosensitive agent (106), a difference in radical concentration (concentration gradient) occurs between the upper layer and the lower layer of the photosensitive agent (106). Therefore, it is easy to cure in the upper layer of the photosensitive agent (106), but difficult to cure in the lower layer. Because of this, there is a difference in the amount of photosensitive material (106) that is cured between the upper and lower parts of the photosensitive material (106), and there is a possibility that the precision of the pattern profile of the pattern formed by the cured photosensitive material (106) will decrease.

[0036] Therefore, in order to suppress the deterioration of the precision of the pattern profile, it is considered to perform intermittent exposure on the exposure area of ​​the substrate (107). Here, performing intermittent exposure on the exposure area means stopping the exposure midway and repeating the exposure during the exposure process for one exposure area. Here, stopping the exposure may include not only not irradiating light onto the exposure area, but also irradiating light with a reduced illuminance so as not to sensitize the photosensitive material (106) on the exposure area. That is, performing intermittent exposure on the exposure area includes setting the following period during the exposure process for one exposure area.

[0037] (1) An exposure period during which light is irradiated onto an exposure area to perform exposure, and

[0038] (2) A period during which exposure is stopped without irradiating light to the exposure area (or by reducing the intensity of the light irradiated to the exposure area).

[0039] In addition, to increase the precision of the pattern profile, it is important to be able to control the interruption period according to the characteristics of the photosensitive material (106).

[0040] (Comparison Example 2)

[0041] As Comparative Example 2, an exposure treatment in which exposure is performed intermittently is described. First, an exposure treatment in which exposure is performed intermittently by a light-blocking mechanism (102) is described. FIG. 5 is a diagram illustrating an exposure treatment related to Comparative Example 2. The relationship between the horizontal axis and the vertical axis in FIG. 5 is the same as in FIG. 4. That is, in FIG. 5(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 5(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light-blocking mechanism (102). In addition, in the example of FIG. 5, an exposure treatment in which one exposure area is exposed intermittently twice is described, but the number of times one exposure area is exposed is not limited to two times.

[0042] During the period (movement (a)) in which the stage (108) moves so that the exposure area a is positioned on the optical axis (109), the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. During constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), the first exposure period (exposure 1(a)) of the exposure area a is initiated. During the first exposure period (exposure 1(a)), the light-blocking mechanism (102) becomes a light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0043] At the timing when the first exposure period (exposure 1(a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. When the light-blocking member (102a) reaches a position where it completely blocks light from the light source (101), the first exposure period (exposure 1(a)) ends, and an interruption period (interruption (a)) during which the exposure area a is not exposed begins. During the interruption period (interruption (a)), the light-blocking mechanism (102) becomes the light-blocking state θ1. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0044] At the timing when the blocking period (interruption (a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. During constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), a second exposure period (exposure 2(a)) is initiated to expose the exposure area a for the second time. During the second exposure period (exposure 2(a)), the light-blocking mechanism (102) becomes the light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0045] At the timing when the second exposure period (exposure 2(a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To achieve this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. Subsequently, likewise, the stage (108) is moved to expose the exposure area b, and intermittent exposure processing of the exposure area b is performed.

[0046] In this way, in the example of FIG. 5, intermittent exposure is performed on one exposure area by moving the light-blocking member (102a) of the light-blocking mechanism (102). In this case, when driving the light-blocking mechanism (102), control is performed according to acceleration, constant speed, and deceleration driving, and there is a limit to shortening the interruption period for stopping exposure due to limitations regarding the performance of the light-blocking mechanism (102), such as speed constraints.

[0047] (Example)

[0048] As described below, in this embodiment, in an exposure device that performs intermittent exposure by intermittently exposing each of a plurality of shot regions of a substrate multiple times, driving control of a light-blocking mechanism (102) advantageous for shortening the interruption period is realized.

[0049] FIG. 6 is a drawing illustrating an exposure process according to the present embodiment. The relationship between the horizontal axis and the vertical axis in FIG. 6 is the same as that in FIG. 4 and FIG. 5. That is, in FIG. 6(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 6(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotational speed) v of the light-blocking mechanism (102). In addition, in the example of FIG. 6, an exposure process is described in which one exposure area is exposed intermittently twice, but the number of times one exposure area is exposed is not limited to two times.

[0050] During the period (movement (a)) in which the stage (108) moves so that the exposure area a (first shot area) is positioned on the optical axis (109), the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. During constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), the first exposure period (exposure 1(a)), which is the period of the first exposure of the exposure area a, is initiated (first process). During the first exposure period (exposure 1(a)), the light-blocking mechanism (102) becomes a light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0051] At the timing when the first exposure period (exposure 1(a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To facilitate this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. When the light-blocking member (102a) reaches a position where it completely blocks light from the light source (101), the first exposure period (exposure 1(a)) ends, and a suspension period (suspension (a)) during which the exposure area a is not exposed begins.

[0052] In this embodiment, during the interruption period (interruption (a)), even if the light-blocking mechanism (102) reaches the light-blocking state θ1, the light-blocking member (102a) is not stopped and constant speed driving continues. Due to this constant speed movement, the light-blocking mechanism (102) moves from the light-blocking state θ1 back to the light-passing state θ2. During this constant speed driving, when the light-blocking member (102a) reaches a position where it completely passes light from the light source (101), the interruption period (interruption (a)) ends, and the second exposure period (exposure 2(a)), which is the period of the second exposure of the exposure area a, begins (second process). During the second exposure period (exposure 2(a)), the light-blocking mechanism (102) becomes the light-passing state θ2. At this time, the light-blocking mechanism (102) performs deceleration driving to stop the light-blocking member (102a).

[0053] At the timing when the second exposure period (exposure 2(a)) is completed, the light-blocking mechanism (102) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. To achieve this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. When the light-blocking member (102a) reaches a position where it completely blocks light from the light source (101), the second exposure period (exposure 2(a)) ends.

[0054] After that, during the period of the movement process (movement (b)) in which the stage (108) moves so that the exposure area b (second shot area) is positioned on the optical axis (109), the light-blocking mechanism (102) becomes a light-blocking state θ1. Likewise, the exposure process after the exposure area b is performed.

[0055] As such, in this embodiment, the driving control method of the light-blocking mechanism (102) may differ during the period in which the stage (108) moves between the exposure processing of a plurality of exposure areas and during the period in which the exposure processing is performed intermittently for one exposure area. In particular, the exposure method for performing intermittent exposure in this embodiment may have the following process.

[0056] (1) A first process for initiating a first exposure of a first shot area of ​​a substrate by changing a shutter for opening and closing the light path of the exposure light from a light-blocking state to a light-passing state, and,

[0057] (2) A second process of starting a second exposure by turning the shutter from a light-passing state to a light-blocking state, and then turning the shutter back to a light-passing state to re-expose the first shot area where the first exposure was performed.

[0058] And, in the second process, the shutter is not stopped. By doing so, the number of acceleration / deceleration controls of the light-blocking mechanism (102) during the interruption period of exposure processing in one exposure area can be reduced. This leads to a reduction in the interruption period, and the throughput of the exposure processing that performs intermittent exposure can be improved.

[0059] (Variation Example 1)

[0060] FIG. 7 is a drawing illustrating an exposure process according to Example 1 of a variation of the present embodiment. The relationship between the horizontal axis and the vertical axis in FIG. 7 is the same as in FIG. 6. That is, in FIG. 7(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 7(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotational speed) v of the light-blocking mechanism (102). In the example of FIG. 7, an exposure process is described in which one exposure area is exposed intermittently twice, but the number of times one exposure area is exposed is not limited to two times.

[0061] The example of FIG. 7 is similar to FIG. 6 in that the shutter is not stopped during interruption (a). That is, in the example of FIG. 7, at the timing when the first exposure period (exposure 1(a)) is completed, acceleration driving and constant speed driving of the light-blocking member (102a) are performed to transition from the light-passing state θ2 to the light-blocking state θ1.

[0062] In Variation Example 1, a setting process may be provided for setting the drive profile of the shutter in the second process of starting the second exposure so that the length of the interruption period (interruption (a)) during which exposure is interrupted between the first exposure (exposure (a)) and the second exposure (exposure (b)) is adjusted. In the example of FIG. 7, the speed of constant speed drive in interruption (a) may be different from the speed of constant speed drive at the start of exposure 1 (a) or at the end of exposure 2 (a). The driving speed of constant speed drive in interruption (a) may be determined, for example, based on the following parameters.

[0063] (1) Driving distance required when transitioning from a light-passing state θ2 in the first exposure period (exposure 1(a)) to a light-blocking state θ1 in the interruption period (interruption(a)), and also transitioning to a light-passing state θ2 in the second exposure period (exposure 2(a)), and

[0064] (2) Timing for initiating a transition from a light-passing state θ2 toward a light-blocking state θ1 during the first exposure period (exposure 1(a)), and timing for transitioning to a light-passing state θ2 during the second exposure period (exposure 2(a)).

[0065] In addition, in the setting process, the duration of constant speed driving during interruption (a) can be set differently from the duration of constant speed driving at the start of exposure 1 (a) or the end of exposure 2 (a). For example, as shown in FIG. 7, in the setting process, the speed of constant speed driving during the interruption period can be made slower than the speed of constant speed driving during the moving process, and the duration of constant speed driving during the interruption period can be made longer than the duration of constant speed driving during the moving process.

[0066] Accordingly, according to the present example, it is possible to appropriately set the interruption period (interruption (a)) between the first exposure period (exposure 1(a)) and the second exposure period (exposure 2(a)) according to the pattern profile of the material, etc.

[0067] (Variation Example 2)

[0068] In the case where there are multiple interruption periods, the length of the first interruption period and the length of the second interruption period may be set independently. FIG. 8 illustrates an example of an exposure process in which one exposure area is exposed intermittently three times. In FIG. 8(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 8(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light-blocking mechanism (102). In the example of FIG. 8, the second exposure (exposure 2(a)) is terminated by changing the shutter from the light-passing state θ2 to the light-blocking state θ1. After that, the third exposure (exposure 3(a)) of the first shot area is initiated by changing the shutter to the light-passing state θ2 (third process (interruption 2(a))).

[0069] In the third process (interruption 2(a)), the shutter is not stopped. Additionally, the drive profile of the shutter may differ between the first interruption period (interruption 1(a)) regarding the second process and the second interruption period (interruption 2(a)) regarding the third process. For example, as shown in FIG. 8, the drive profile may be set so that the first interruption period (interruption 1(a)) is shorter than the second interruption period (interruption 2(a)). Or, conversely, the drive profile may be set so that the first interruption period (interruption 1(a)) is longer than the second interruption period (interruption 2(a)). Accordingly, the control profile can be determined from both the perspective of the interruption period optimal for the pattern profile and the realization of throughput improvement.

[0070] <Second Embodiment>

[0071] In the second embodiment, either the first exposure period (exposure 1(a)) or the second exposure period (exposure 2(a)) includes a period during which the shutter is stopped at a light passing state θ2, while the other includes an example where the shutter is not stopped. FIG. 9 is a drawing illustrating the exposure process according to the second embodiment. The relationship between the horizontal axis and the vertical axis in FIG. 9 is the same as that in FIG. 6, etc. That is, in FIG. 9(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 9(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light-blocking mechanism (102).

[0072] In the movement period (movement (a)) during which the stage (108) moves so that the exposure area a is positioned on the optical axis (109), the light-blocking mechanism (102) initiates a transition from a light-blocking state θ1 to a light-passing state θ2. For this state transition, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. In the intermediate state, a first exposure period (exposure 1(a)) for exposing the exposure area a is initiated.

[0073] In the first exposure period (exposure 1(a)), the light-blocking mechanism (102) is driven at a constant speed toward the light-passing state θ2. In the second embodiment, even when the light-passing state θ2 is reached, the light-blocking mechanism (102) continues to drive at a constant speed without decelerating. Therefore, the light-passing state θ2 is terminated by constant speed rotational movement and moves back toward the light-blocking state θ1. At the timing when the light-blocking member (102a) completely blocks the light, the first exposure period (exposure 1(a)) ends and the interruption period (interruption (a)) begins. Afterwards, the light-blocking mechanism (102) becomes the light-blocking state θ1, but even at this time, the light-blocking mechanism (102) continues to drive at a constant speed without decelerating. Therefore, the light-blocking state θ1 is terminated by constant speed rotational movement and moves back toward the light-passing state θ2. At the timing when the light-blocking member (102a) completely passes light, the interruption period (interruption (a)) ends, and a second exposure period (exposure 2(a)) for exposing the exposure area a begins.

[0074] After that, during the second exposure period (exposure 2(a)), the light-blocking member (102a) becomes a light-passing state θ2. At this time, the light-blocking mechanism (102) drives the light-blocking member (102a) at a deceleration speed to stop it. At this time, in the first drive control of the light-blocking mechanism (102), the light-blocking member (102a) is rotated, for example, 180 degrees.

[0075] Next, the light-blocking mechanism (102) starts driving the light-blocking member (102a) from the light-passing state θ2 toward the light-blocking state θ1 at the timing when the second exposure period (exposure 2(a)) is completed. At this time, the light-blocking mechanism (102) performs acceleration driving and constant speed driving. When the light-blocking member (102a) reaches a position where it completely blocks light from the light source (101), the second exposure period (exposure 2(a)) ends. At this time, in the second driving control of the light-blocking mechanism (102), the light-blocking member (102a) is rotated, for example, 60 degrees.

[0076] Next, during the period (movement (b)) in which the stage (108) moves so that the exposure area b is positioned on the optical axis (109), the light-blocking member (102a) initiates a transition from a light-passing state θ2 to a light-blocking state θ1. At this time, the light-blocking mechanism (102) performs deceleration driving. Likewise, the exposure processing after the exposure area b is performed.

[0077] In this way, in the second embodiment, when intermittent exposure processing is performed on one exposure area, the driving of the light-blocking mechanism (102) in each exposure is controlled independently. Accordingly, the throughput of the exposure processing that performs intermittent exposure can be improved.

[0078] (Variation example)

[0079] In the case where there are multiple interruption periods, the driving amount of the light-blocking member (102a) that moves with a single drive control may be set independently. In a modified example of the second embodiment shown below, any one of the first exposure period (exposure 1(a)), the second exposure period (exposure 2(a)), and the third exposure period (exposure 3(a)) includes a period during which the shutter is stopped at the light passing state θ2. In addition, the shutter is not stopped during the remaining periods. FIG. 10 is a drawing illustrating an exposure process according to a modified example of the second embodiment. In FIG. 10(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light-blocking mechanism (102). In FIG. 10(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light-blocking mechanism (102). FIG. 10 illustrates an example of an exposure process in which one exposure area is intermittently exposed three times. In FIG. 10, the first driving of the light-blocking mechanism (102) is performed during the first exposure period (exposure 1(a)), the first interruption period (interruption 1(a)), the second exposure period (exposure 2(a)), the second interruption period (interruption 2(a)), and the third exposure period (exposure 3(a)). Meanwhile, the second driving of the light-blocking mechanism (102) is performed only during the third exposure period (exposure 3(a)) and the movement period (movement (b)). This is because, in the first driving by the light-blocking mechanism (102), the light-blocking member (102a) is rotated, for example, 300 degrees, whereas in the second driving by the light-blocking mechanism (102), the light-blocking mechanism (102a) is rotated, for example, 60 degrees. In this way, according to the present example, in an exposure process in which one exposure area is exposed intermittently multiple times, the driving amount of the light-blocking member (102) in each exposure process can be independently set.

[0080] <Effective form of method for manufacturing an article>

[0081] The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as microdevices, such as semiconductor devices, or devices having a microstructure, for example. The method for manufacturing an article according to the present embodiment includes a process of forming a latent image pattern on a photosensitive material coated on a substrate using the exposure device (a process of exposing the substrate), and a process of developing the substrate on which the latent image pattern is formed in the process. In addition, the manufacturing method includes other well-known processes (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article according to the present embodiment is advantageous compared to conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0082] The invention is not limited to the above embodiments, and various changes and modifications are possible without departing from the spirit and scope of the invention. Accordingly, claims are attached to clarify the scope of the invention. Explanation of the symbols

[0083] 100a: Exposure device, 101: Light source unit, 102: Light shielding mechanism, 103: Illumination optical system, 105: Projection optical system, 108: Stage, 110: Control unit

Claims

Claim 1 An exposure method for performing intermittent exposure, wherein a shot area of ​​a substrate is intermittently exposed multiple times, comprising: a first process of initiating a first exposure of a first shot area of ​​the substrate by changing a shutter for opening and closing the light path of the exposure light from a light-blocking state to a light-passing state; a second process of terminating the first exposure by changing the shutter from the light-passing state to the light-blocking state, and then initiating a second exposure to re-expose the first shot area where the first exposure was performed by changing the shutter back to the light-passing state; and a moving process of moving a stage holding the substrate to expose a second shot area of ​​the substrate after the first shot area after the second exposure, wherein in the second process the shutter is not stopped, and the driving profile of the shutter during a first interruption period in which exposure is interrupted between the first exposure and the second exposure is a second interruption period in which exposure is interrupted during the moving process. An exposure method characterized by being different from the driving profile of the shutter above in the period. Claim 2 An exposure method according to claim 1, further comprising a setting process for setting a driving profile of the shutter in the second process such that the length of the interruption period during which exposure is interrupted between the first exposure and the second exposure is adjusted. Claim 3 An exposure method according to claim 2, characterized by setting the speed of constant speed driving and the duration of constant speed driving during the interruption period in the setting process. Claim 4 An exposure method according to claim 3, characterized in that, in the setting process, the speed of constant speed driving during the interruption period is made slower than the speed of constant speed driving during the moving process, and the duration of constant speed driving during the interruption period is made longer than the duration of constant speed driving during the moving process. Claim 5 An exposure method according to claim 1, further comprising a third process of ending the second exposure by changing the shutter from the light-passing state to the light-blocking state, and then starting the third exposure of the first shot area by changing the shutter back to the light-passing state, wherein the shutter is not stopped in the third process, and the driving profile of the shutter is different in the second process and the third process. Claim 6 An exposure method according to claim 1, characterized in that the period during which the first exposure is performed and the period during which the second exposure is performed each include the period during which the shutter is stopped in the light passing state. Claim 7 An exposure method according to claim 5, wherein the period during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed each include a period during which the shutter is stopped in the light passing state. Claim 8 An exposure method according to claim 1, characterized in that either the period during which the first exposure is performed or the period during which the second exposure is performed includes a period during which the shutter is stopped in the light passing state, and the other period does not stop the shutter. Claim 9 An exposure method according to claim 5, wherein any one of the periods during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed includes a period during which the shutter is stopped in the light passing state, and during the remaining period, the shutter is not stopped. Claim 10 An exposure apparatus for performing intermittent exposure, which intermittently exposes a shot area of ​​a substrate multiple times, comprising: a shutter having a light-passing portion and a light-shielding portion; a driving portion for driving the shutter to set the shutter to a light-blocking state by positioning the light-shielding portion on the light path of the exposure light, and to set the shutter to a light-passing state by positioning the light-passing portion on the light path; and a control portion. The control portion comprises a first process of initiating a first exposure of a first shot area of ​​the substrate by shifting the shutter from the light-blocking state to the light-passing state; a second process of terminating the first exposure by shifting the shutter from the light-passing state to the light-blocking state, and then initiating a second exposure to re-expose the first shot area where the first exposure was performed by shifting the shutter back to the light-passing state; and a moving portion that moves a stage holding the substrate to expose a second shot area of ​​the substrate after the first shot area following the first shot area after the second exposure. An exposure apparatus configured to execute a process, wherein the control unit controls the drive unit so as not to stop the shutter in the first process, and the drive profile of the shutter in the first interruption period in which exposure is interrupted between the first exposure and the second exposure is different from the drive profile of the shutter in the second interruption period in which exposure is interrupted in the moving process. Claim 11 A method for manufacturing an article, characterized by comprising a process of exposing a substrate according to an exposure method described in any one of claims 1 to 9, and a process of developing the exposed substrate, thereby manufacturing an article from the developed substrate.

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