Gas supply nozzle for semiconductor manufacturing

KR3013621420001SActive Publication Date: 2026-09-01엔지케이 가부시키가이샤
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Patent Information

Application Number
KR3020250051003
Authority / Receiving Office
KR · KR
Patent Type
Designs
Current Assignee / Owner
Priority Date
2025-06-09
Filing Date
2025-12-09
Publication Date
2026-09-01
Estimated Expiration
2045-12-09

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    Figure 112025139053787-M0010002
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    Figure 112025139053787-M0010003
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Description

Draw 15 The item that is the subject of the design Gas supply nozzle for semiconductor manufacturing Description of the design 1. The part indicated by the solid line is the part for which design registration is sought as a partial design, and the part indicated by the dotted line is not the part for which design registration is sought. 2. This article is a gas supply nozzle used in a semiconductor manufacturing device. It discharges gas used in the semiconductor manufacturing process from a spirally formed flow path. 3. This item is entirely transparent. 4. [Drawing 1] shows the front view of the design. 5. [Drawing 2] shows the rear view of the design. 6. [Drawing 3] shows the left side of the design. 7. [Drawing 4] shows the right side of the design. 8. [Drawing 5] shows the plan view of the design. 9. [Drawing 6] shows the bottom part of the design. 10. [Figure 7] is an enlarged view of section AB of [Figure 1]. 11. [Drawing 8] is a CC enlarged cross-sectional view of [Drawing 7]. 12. [Drawing 9] is an enlarged view of the DD section of [Drawing 5]. 13. [Drawing 10] is an enlarged perspective view of the FF portion of [Drawing 2].