Gas supply nozzle for semiconductor manufacturing
Patent Information
- Application Number
- KR3020250051003
- Authority / Receiving Office
- KR · KR
- Patent Type
- Designs
- Current Assignee / Owner
- Priority Date
- 2025-06-09
- Filing Date
- 2025-12-09
- Publication Date
- 2026-09-01
- Estimated Expiration
- 2045-12-09
Smart Images

Figure 112025139053787-M0010001 
Figure 112025139053787-M0010002 
Figure 112025139053787-M0010003
Description
Draw 15 The item that is the subject of the design Gas supply nozzle for semiconductor manufacturing Description of the design 1. The part indicated by the solid line is the part for which design registration is sought as a partial design, and the part indicated by the dotted line is not the part for which design registration is sought. 2. This article is a gas supply nozzle used in a semiconductor manufacturing device. It discharges gas used in the semiconductor manufacturing process from a spirally formed flow path. 3. This item is entirely transparent. 4. [Drawing 1] shows the front view of the design. 5. [Drawing 2] shows the rear view of the design. 6. [Drawing 3] shows the left side of the design. 7. [Drawing 4] shows the right side of the design. 8. [Drawing 5] shows the plan view of the design. 9. [Drawing 6] shows the bottom part of the design. 10. [Figure 7] is an enlarged view of section AB of [Figure 1]. 11. [Drawing 8] is a CC enlarged cross-sectional view of [Drawing 7]. 12. [Drawing 9] is an enlarged view of the DD section of [Drawing 5]. 13. [Drawing 10] is an enlarged perspective view of the FF portion of [Drawing 2].