Gasket for plasma etching equipment

KR301364154SActive Publication Date: 2026-09-15PLATEC
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Patent Information

Application Number
KR3020250050437
Authority / Receiving Office
KR · KR
Patent Type
Designs
Current Assignee / Owner
Filing Date
2025-12-05
Publication Date
2026-09-15
Estimated Expiration
2045-12-05

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    Figure 112025137831576-DES00003
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Description

Draw 15 The item that is the subject of the design Gasket for plasma etching equipment Description of the design 1. The article according to the present design is made of a composite material containing synthetic resin and carbon material. 2. The article according to this design is a gasket used in semiconductor etching equipment. 4. Drawing 1 is a drawing showing the front side of the article (front view). Drawing 2 is a drawing showing the back side of the article (rear view). Drawing 3 is a drawing showing the left side of the article (left side view). Drawing 4 is a drawing showing the right side of the article (right side view). Drawing 5 is a drawing showing the top side of the article (top view). Drawing 6 is a drawing showing the bottom side of the article (bottom view). Drawing 7 is a drawing showing the overall shape of the article (perspective view).