Method for detecting at least one defect on a support, device and computer program associated
MA65162B2Active Publication Date: 2026-06-30AQC IND LLC
Patent Information
- Application Number
- MA65162
- Authority / Receiving Office
- MA · MA
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2022-09-29
- Filing Date
- 2022-09-29
- Publication Date
- 2026-06-30
- Estimated Expiration
- 2042-09-29
Abstract
Method for detecting at least one defect on a support such as a fabric or a brick, the method comprising:▪ Acquiring (ACQ) at least one first image of the support;▪ Generating a second image that corresponds to the 2D spectrum space of the at least one first image;▪ Shifting at least one selected frequency range from at least a first area of the 2D spectrum space toward a second area of the 2D spectrum space;▪ Filtering at least one frequency range of the 2D spectrum space to remove at least one predefined pattern of the support;▪ Shifting at least a selected frequency range from a second area of the new 2D spectrum space toward a first area of the new 2D spectrum space;▪ Reversing (RVRS) the transformation of the frequency domain of the new 2D spectrum space to obtain a final image.
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Citation Information
Patent Citations
Fabric defect detection and classification method based on unsupervised segmentation and ELM (Extreme Learning Machines)
CN107341499A
A fabric defect detection method based on Fourier transform and image morphology
CN109934802B