Plasma source using a cathodic vacuum arc with an improved magnetic field configuration and method of operation

Abstract

The present invention relates to a plasma source using a cathode vacuum arc and a method of its operation, which includes a target with a raised edge for better stabilization of the cathode spot in the edge zone, a water-cooled plate, which also serves as a target holder, an electrostatic screen separated from the target and the vacuum chamber wall by insulators in order to prevent arc burning on the side surface of the target and the plate, a resistance element mounted between the target and the electrostatic screen to trigger a vacuum arc discharge, an electromagnet system including two coils: a divergent coil located outside the vacuum chamber on a coaxial bushing behind the target and a convergent coil located in front of the front surface of the target outside the vacuum chamber, a coaxial cooling bushing, which also serves as a ferromagnetic core of an electromagnet creating an internal field, an additional grounded anode to enhance the stability of the arc discharge at low pressures, a water-cooled vacuum chamber surrounding the target mounted on a water-cooled plate, an electrostatic screen with a resistive arc trigger and an additional anode.