Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process

TW202626601APending Publication Date: 2026-07-01SHIN ETSU CHEMICAL CO LTD

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Patent Information

Application Number: TW114140363
Authority / Receiving Office: TW · TW
Patent Type: Applications
Current Assignee / Owner
Priority Date: 2024-10-23
Filing Date: 2025-10-20
Publication Date: 2026-07-01

Application Information

Patent Timeline

23 Oct 2024

Priority

20 Oct 2025

Application

TW114140363

01 Jul 2026

Publication

TW202626601A

IPC: C07C309/42; C07C309/43; C07C309/73; C07C381/00; C07D327/08; C07D333/76; C08F212/14; C08F212/32; C08F220/38; C09K3/00; G03F7/004; G03F7/039; G03F7/20; G03F7/32; H10P76/20

Inventors: 福島将大

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Abstract

A sulfonium salt monomer consists of a sulfonium cation having pentafluorosulfanyl and hydrocarbyloxycarbonyl groups and an aromatic sulfonic acid anion having a polymerizable group. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern having satisfactory lithography properties such as LWR, CDU, EL and DOF.

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