Photosensitive resin composition, cured material, method for manufacturing cured material, semiconductor device and display device
TW202626822APending Publication Date: 2026-07-01TORAY INDUSTRIES INC
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Patent Information
- Application Number
- TW114148779
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-25
- Filing Date
- 2025-12-12
- Publication Date
- 2026-07-01
Abstract
The objective of this invention is to provide a photosensitive resin composition that yields a hardened material with good solvent solubility, high sensitivity, retention of pattern shape during heat treatment, and high elongation at break. The solution is a photosensitive resin composition comprising: a polyimide resin (A1) containing diamine residues having a specific structure, a phenolic resin (A2), a photosensitizer (B), and a solvent (C).
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