Photosensitive resin composition, cured material, method for manufacturing cured material, semiconductor device and display device

TW202626822APending Publication Date: 2026-07-01TORAY INDUSTRIES INC
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Patent Information

Application Number
TW114148779
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-25
Filing Date
2025-12-12
Publication Date
2026-07-01
Patent Text Reader

Abstract

The objective of this invention is to provide a photosensitive resin composition that yields a hardened material with good solvent solubility, high sensitivity, retention of pattern shape during heat treatment, and high elongation at break. The solution is a photosensitive resin composition comprising: a polyimide resin (A1) containing diamine residues having a specific structure, a phenolic resin (A2), a photosensitizer (B), and a solvent (C).
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