High-temperature-resistant lens

Abstract

A high-temperature resistant lens structure includes a substrate, a substrate body, and a hardening layer covering the substrate body; at least one thin film layer group coated on one side of the substrate, the thin film layer group including at least two first refractive index thin film layers and at least one second refractive index thin film layer, the refractive index of the first refractive index thin film layer being lower than that of the second refractive index thin film layer, arranged sequentially from the substrate as the first refractive index thin film layer, the second refractive index thin film layer and the first refractive index thin film layer, such that at least one of the first refractive index thin film layers contains 5wt% to 15wt% Ta₂O₅ and 85wt% to 95wt% SiO₂; and a waterproof coating coated on the thin film layers; thereby reducing the difference in the coefficients of thermal expansion of the first refractive index thin film layer and the second refractive index thin film layer with respect to temperature, thereby making it difficult for the thin film layers to separate when there is a drastic temperature change such as an increase in temperature, and thus having the ability to resist large temperature changes.

Description

[Technical Field]

[0001] This invention relates to a lens structure, and more particularly to a high-temperature resistant lens structure. [Previous Technology]

[0002] In order to improve the light transmittance through the lens and reduce the light reflection, several layers of thin film with high refractive index and low refractive index are generally coated on the surface of the substrate to meet the optical characteristics of the lens.

[0003] However, due to the difference in thermal expansion coefficients between the substrate, high refractive index and low refractive index thin film layers in environments with large temperature changes, stress changes can easily occur between different materials, causing the thin film layer to be stretched and cracked.

[0004] Therefore, Chinese Patent Publication No. CN116047638A "Optical Lens and Manufacturing Method Thereof" includes: a lens substrate; a base layer, stacked on the lens substrate; an AR anti-reflective coating layer, stacked on the side of the base layer opposite to the lens substrate; wherein the base layer material includes at least one of silicon dioxide, a silicon-aluminum mixture, and aluminum oxide, and the stress range of the optical lens is 50-200 MPa.

[0005] The optical lens provided in the aforementioned case adds an underlayer between the lens substrate and the AR antireflective coating layer and controls the overall stress of the optical lens to 50-200 MPa. This results in a smaller strain driving force for the environmental reliability of the optical lens, thereby achieving the effect that the change in the surface shape of the coated lens before and after 120 hours of high temperature and high humidity is less than 0.2 μm.

[0006] This may refer to Chinese Patent Publication No. CN219842572U, "A High-Temperature Resistant Resin Lens." This high-temperature resistant resin lens includes a resin substrate. An anti-reflective layer, a reinforcing layer, a heat-resistant layer, and an anti-fog layer are sequentially disposed on both sides of the resin substrate. The surface of the anti-fog layer has a groove-like structure extending towards the resin substrate. The anti-reflective layer includes alternating low-refractive-index layers and high-refractive-index layers. The low-refractive-index layer is a mixture of silicon dioxide and aluminum oxide; the high-refractive-index layer is a mixture of titanium dioxide and tantalum pentoxide. This high-temperature resistant resin lens exhibits good light transmittance while also possessing excellent heat resistance.

[0007] However, the aforementioned cases all have an additional base layer, or an additional reinforcing layer and heat-resistant layer, which may reduce the transmittance of light when it passes through the lens, and may also increase the probability of light being reflected. [Summary of the Invention]

[0008] Therefore, in order to simultaneously consider the heat resistance of the lens and maintain the optical properties of the lens to reduce reflection, and without adding an additional thin film layer, the inventors have proposed a high-temperature resistant lens structure, comprising:

[0009] A substrate having a substrate body and a hardening layer covering the substrate body; at least one thin film layer group covering one side of the substrate, the thin film layer group comprising at least two first refractive index thin film layers and at least one second refractive index thin film layer, the refractive index of the first refractive index thin film layer being lower than that of the second refractive index thin film layer, arranged sequentially from the substrate as the first refractive index thin film layer, the second refractive index thin film layer and the first refractive index thin film layer, such that at least one of the first refractive index thin film layers comprises 5wt% to 15wt% Ta2O5 and 85wt% to 95wt% SiO2; a waterproof coating covering the thin film layer group.

[0010] Further, the aforementioned thin film layer group includes the aforementioned first refractive index thin film layer and the aforementioned second refractive index thin film layer that are sequentially and alternately coated multiple times, and the aforementioned first refractive index thin film layer is coated last.

[0011] Further, the refractive index of the aforementioned first refractive index thin film layer is between 1.4 and 1.5, and the refractive index of the aforementioned second refractive index thin film layer is between 1.8 and 2.5.

[0012] Further, the hardened layer is provided with a far-infrared material or a far-infrared composite material, wherein the far-infrared material is one of the following: magnesium oxide (MgO), calcium oxide (CaO), barium oxide (BaO), zirconium dioxide (ZrO2), titanium dioxide (TiO2), chromium trioxide (Cr2O3), manganese dioxide (MnO2), ferric oxide (Fe2O3), aluminum oxide (Al2O3), carbides, silicates, borides, nitrides, tantalum (Ta), molybdenum (Mo), tungsten (W), iron (Fe), nickel (Ni), platinum (Pt), copper (Cu), and gold (Au), and the far-infrared composite material is a mixture of the far-infrared material and zinc monoxide (ZnO).

[0013] Further, the aforementioned second refractive index thin film layer is one of the following: zirconium dioxide thin film layer, titanium dioxide thin film layer, titanium trioxide thin film layer, titanium pentoxide thin film layer; and the remaining aforementioned first refractive index thin film layer is one of the following: silicon monoxide thin film layer, silicon dioxide thin film layer, silicon monoxide and silicon dioxide composite thin film layer.

[0014] The following effects can be achieved based on the above technical features:

[0015] 1. Adding Ta2O5 to the first refractive index thin film layer composed of silicon dioxide can reduce the difference in the coefficient of thermal expansion of the first and second refractive index thin film layers with respect to temperature. This makes it difficult for the thin film layers to separate when there is a drastic temperature change, such as an increase in temperature, and thus has the ability to resist large temperature changes.

[0016] 2. During the manufacturing process of the hardening layer, materials that can absorb far-infrared rays are added. Users can directly relieve eye fatigue through the mid-infrared rays released by the hardening layer inside the substrate.

Implementation Method

[0027] Based on the above technical features, the main functions of the high-temperature resistant lens structure of the present invention will be clearly demonstrated in the following embodiments.

[0028] Please refer to Figure 1, Figure 2, Figure 3 and Figure 4. The high-temperature resistant lens structure of the present invention includes a substrate 1, a thin film layer group 2 and a waterproof coating 3.

[0029] The substrate 1 has a substrate body 11 and a hardening layer 12, the hardening layer 12 covering the substrate body 11; specifically, when manufacturing the substrate 1, the substrate body 11 and a plurality of far-infrared radiation sources 4 are first placed in a heating space, the heating temperature is between 40 degrees Celsius and 115 degrees Celsius, and the time is between 1 and 3 hours, so that the substrate body 11 is irradiated by the aforementioned far-infrared radiation sources 4.

[0030] The heating process employs a gradual temperature increase, which is between 40 and 115 degrees Celsius, and the heating time is 1 to 3 hours. This includes a segmented temperature increase from low to high temperature, with each temperature increment maintained for a certain period. Specifically, for example, each temperature increment is maintained for a certain period; for instance, when the temperature is 115 degrees Celsius, the temperature can be increased by 10 degrees and maintained for 10 minutes until 115 degrees Celsius is reached. Alternatively, the temperature can be directly increased from low to high and maintained at the highest temperature for a certain period. Specifically, for example, the temperature can be directly increased to 115 degrees Celsius and maintained at 115 degrees Celsius for 1 to 3 hours. The above two heating embodiments are merely preferred embodiments of the present invention and should not be construed as limiting the scope of the present invention.

[0031] After heating, the substrate body 11 is immersed in a hardening liquid and the hardening liquid is applied to the substrate body 11. In addition to immersion, the hardening liquid can also be applied to the outer surface of the substrate body 11 by general spraying or centrifugal spin coating. The hardening liquid is then dried to form the hardening layer 12 and cover the substrate body 11.

[0032] Specifically, the curing liquid contains a silicone and any one of the following: isopropanol and methanol, wherein the silicone has a weight percentage of 19 to 33, and the isopropanol or methanol has a weight percentage of 62 to 76; furthermore, a far-infrared material or a far-infrared composite material is added to the curing liquid, the far-infrared material being one of the following: magnesium oxide (MgO), calcium oxide (CaO), barium oxide (BaO), zirconium dioxide (ZrO2). The far-infrared composite material is a mixture of the far-infrared material and zinc monoxide (ZnO). The far-infrared composite material contains: O2, titanium dioxide (TiO2), chromium trioxide (Cr2O3), manganese dioxide (MnO2), ferric oxide (Fe2O3), aluminum oxide (Al2O3), carbides, silicates, borides, nitrides, tantalum (Ta), molybdenum (Mo), tungsten (W), iron (Fe), nickel (Ni), platinum (Pt), copper (Cu), and gold (Au).

[0033] When drying the hardening liquid, it is placed in the heating space and the temperature is set between 80 degrees Celsius and 120 degrees Celsius. The drying time is between 1 and 10 hours, so that the hardening liquid forms the hardening layer 12. The thickness of the hardening layer 12 is between 1 and 3 micrometers.

[0034] The aforementioned thin film layer group 2 is deposited on one side of the substrate 1 by vapor deposition. In this embodiment, the aforementioned thin film layer group 2 comprises five thin film layers: three first refractive index thin film layers 21 and two second refractive index thin film layers 22. The refractive index of the aforementioned first refractive index thin film layer 21 is lower than that of the aforementioned second refractive index thin film layer 22. The aforementioned first refractive index thin film layer 21, the aforementioned second refractive index thin film layer 22, the aforementioned first refractive index thin film layer 21, the aforementioned second refractive index thin film layer 22, and the aforementioned first refractive index thin film layer 21 are arranged sequentially on the substrate 1. In this embodiment, one of the aforementioned first refractive index thin film layers 21 vapor-deposited on the substrate 1 comprises 5wt% to 15wt% Ta2O5 and 85wt% to 95wt% SiO2, but is not limited to this, and may also be based on... Two or three of the aforementioned first refractive index thin film layers 21 each contain 5 wt% to 15 wt% Ta2O5 and 85 wt% to 95 wt% SiO2; specifically, the refractive index of the aforementioned first refractive index thin film layer 21 is between 1.4 and 1.5, and the refractive index of the aforementioned second refractive index thin film layer 22 is between 1.8 and 2.5. The aforementioned first refractive index thin film layer 21 and the aforementioned second refractive index thin film layer 22 are sequentially deposited on the substrate 1 by vapor deposition. The aforementioned second refractive index thin film layer 22 is one of the following: a zirconium dioxide thin film layer, a titanium dioxide thin film layer, a titanium trioxide thin film layer, or a titanium pentoxide thin film layer; and the remaining of the aforementioned first refractive index thin film layers 21 are one of the following: a silicon monoxide thin film layer, a silicon dioxide thin film layer, or a silicon monoxide and silicon dioxide composite thin film layer.

[0035] The waterproof coating 3 is applied to the aforementioned thin film layer group 2, and the aforementioned thin film layer group 2 is located between the waterproof coating 3 and the substrate 1; specifically, the main component of the waterproof coating 3 is fluoride.

[0036] Please refer to Figures 5, 6, and 7. The completed high-temperature resistant lens structure of the present invention, along with a general lens without the added components of 5wt% to 15wt% Ta2O5 and 85wt% to 95wt% SiO2 mentioned in the present invention, are placed together in water and heated to boiling for more than 2 minutes. After being removed and cooled to room temperature, a light source 5 is used to irradiate and penetrate the lens, so that the image of the light source 5 penetrating the lens is projected onto a plane 8. The texture changes in different images are compared. Figure 6 shows a first image 6 generated by the light source 5 passing through the present invention. In the first image 6... As can be seen, no shadows or other textures are presented in the first image 6 when the light source 5 is irradiated. From the smooth first image 6, it can be seen that the high-temperature resistant lens structure of the present invention can maintain a smooth surface after being heated with boiling water for more than two minutes. The high temperature does not affect the light transmission function of the lens itself. In contrast, the seventh figure shows a second image 7 produced by the light source 5 passing through a general lens. In the second image 7, a grid-like shadow can be seen, indicating that the thin film in the lens is affected by temperature and cracks are generated. When the light source 5 passes through, it is blocked by the cracks, so the grid-like shadow is presented in the second image 7.

[0037] Please refer to Figure 8. In the second embodiment of the present invention, a thin film layer group 2A comprises three thin film layers, namely two of the aforementioned first refractive index thin film layers 21 and one of the aforementioned second refractive index thin film layers 22. In addition, the composition of any one or all of the aforementioned first refractive index thin film layers 21 may optionally include 5wt% to 15wt% of Ta2O5 and 85wt% to 95wt% of SiO2. Specifically, when depositing the three thin film layers, the aforementioned first refractive index thin film layer 21 and the aforementioned second refractive index thin film layer 22 are deposited sequentially, and the aforementioned first refractive index thin film layer 21 is deposited last.

[0038] Please refer to Figure 9. In the third embodiment of the present invention, a thin film layer group 2B comprises seven thin film layers, namely four of the aforementioned first refractive index thin film layers 21 and three of the aforementioned second refractive index thin film layers 22. In addition, the composition of any one, two, three or all of the aforementioned first refractive index thin film layers 21 may be 5wt% to 15wt% of Ta2O5 and 85wt% to 95wt% of SiO2. Specifically, when depositing the seven thin film layers, the aforementioned first refractive index thin film layer 21, the aforementioned second refractive index thin film layer 22, the aforementioned first refractive index thin film layer 21, the aforementioned second refractive index thin film layer 22, the aforementioned first refractive index thin film layer 21, the aforementioned second refractive index thin film layer 22 are deposited in sequence, and the aforementioned first refractive index thin film layer 21 is deposited last.

[0039] In addition to selecting different numbers of thin film layers to be deposited on the same side of the substrate 1 in the above embodiments, please refer to Figure 10. In the fourth embodiment of the present invention, the thin film layer group 2 of this case can be deposited on both sides of the substrate 1, and the waterproof coating 3 can be provided. The structure and configuration of the thin film layer group 2 and the waterproof coating 3 are the same as those of the first embodiment of this case, so they will not be described in detail.

[0040] In addition to being able to adapt to high-temperature environments, the high-temperature resistant lens structure of this case also has the function of releasing mid-infrared rays, blocking blue light, infrared light, and absorbing harmful ultraviolet rays with reflected light, which can protect the user's eyes and help blood circulation in the eyes and accelerate metabolism by releasing mid-infrared rays.

[0041] Based on the above description of the embodiments, the operation, use and effects of the present invention can be fully understood. However, the above embodiments are only preferred embodiments of the present invention and should not be used to limit the scope of the present invention. Simple equivalent changes and modifications made in accordance with the scope of the patent application and the description of the invention are all within the scope of the present invention. [Simplified Explanation of the Diagram]

[0017] [Figure 1] is a partial structural schematic diagram of the present invention.

[0018] [Figure 2] is a magnified view of a portion of Figure 1.

[0019] [Figure 3] is a flowchart of the manufacturing process of this invention.

[0020] [Figure 4] is a schematic diagram of the use of the substrate of the present invention, which is placed in a heat source for heating and surrounded by a plurality of far-infrared radiation sources.

[0021] [Figure 5] is a schematic diagram showing the operation of using a light source to illuminate a lens and displaying the light source passing through the lens on a plane.

[0022] [Figure 6] is a first image of the light source displayed on a plane by illuminating the heated high-temperature resistant lens structure of the present invention with a light source.

[0023] [Figure 7] is a second image of a light source that is shone on a heated ordinary lens and then passed through the lens and displayed on a plane.

[0024] [Figure 8] is a structural schematic diagram of the second embodiment of the present invention.

[0025] [Figure 9] is a structural schematic diagram of the third embodiment of the present invention.

[0026] [Figure 10] is a structural schematic diagram of the fourth embodiment of the present invention.

Claims

1. A high-temperature resistant lens structure, comprising: a substrate, a substrate body and a hardening layer, the hardening layer covering the substrate body; at least one thin film layer group coated on one side of the substrate, the thin film layer group comprising at least two first refractive index thin film layers and at least one second refractive index thin film layer, the refractive index of the first refractive index thin film layer being lower than that of the second refractive index thin film layer, the first refractive index thin film layer, the second refractive index thin film layer and the first refractive index thin film layer being arranged sequentially from the substrate, such that at least one of the first refractive index thin film layers comprises 5 wt% to 15 wt% Ta2O5 and 85 wt% to 95 wt% SiO2; and a waterproof coating coated on the thin film layer group.

2. The high-temperature resistant lens structure as described in claim 1, wherein, The aforementioned thin film layer group includes the aforementioned first refractive index thin film layer and the aforementioned second refractive index thin film layer alternately coated in sequence multiple times, and the aforementioned first refractive index thin film layer is coated last.

3. The high-temperature resistant lens structure as described in claim 1, wherein, The refractive index of the aforementioned first refractive index thin film layer is between 1.4 and 1.5, and the refractive index of the aforementioned second refractive index thin film layer is between 1.8 and 2.

5.

4. The high-temperature resistant lens structure as described in claim 1, wherein, The hardened layer contains a far-infrared material or a far-infrared composite material, wherein the far-infrared material is one of the following: magnesium oxide (MgO), calcium oxide (CaO), barium oxide (BaO), zirconium dioxide (ZrO2), titanium dioxide (TiO2), chromium trioxide (Cr2O3), manganese dioxide (MnO2), ferric oxide (Fe2O3), aluminum oxide (Al2O3), carbides, silicates, borides, nitrides, tantalum (Ta), molybdenum (Mo), tungsten (W), iron (Fe), nickel (Ni), platinum (Pt), copper (Cu), or gold (Au). The far-infrared composite material is a mixture of the far-infrared material and zinc monoxide (ZnO).

5. The high-temperature resistant lens structure as described in claim 1, wherein, The aforementioned second refractive index thin film layer is one of the following: zirconium dioxide thin film layer, titanium dioxide thin film layer, titanium trioxide thin film layer, titanium pentoxide thin film layer; and the remaining aforementioned first refractive index thin film layer is one of the following: silicon monoxide thin film layer, silicon dioxide thin film layer, silicon monoxide and silicon dioxide composite thin film layer.