Vacuum simulation for charged-particle microscopy grid receptacles

TW202628158APending Publication Date: 2026-07-01FEI CO
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Patent Information

Application Number
TW114126673
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-08-20
Filing Date
2025-07-15
Publication Date
2026-07-01
Patent Text Reader

Abstract

Systems / techniques are provided for facilitating vacuum simulation for charged-particle microscopy grid receptacles. In various embodiments, an apparatus can comprise a positioning mechanism configured to be coupled to a vacuum chamber of a charged-particle microscope. In various aspects, the apparatus can comprise an adjustable force applicator coupled to the positioning mechanism and configured to simulate a vacuum for a microscopy grid receptacle located on an inner surface of a load-lock door of the vacuum chamber by mechanically pressing against an outer surface of the load-lock door.
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