Chucking of high-warp substrates using multizonal chucks

TW202628184APending Publication Date: 2026-07-01APPLIED MATERIALS INC
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Patent Information

Application Number
TW114134866
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-10
Filing Date
2025-09-11
Publication Date
2026-07-01
Patent Text Reader

Abstract

Disclosed systems and techniques are directed to improving chucking of substrates in device manufacturing systems. The techniques include identifying deformation of a substrate and applying, based on the identified deformation, a plurality of time-dependent voltage signals to a multizonal chuck to attract the substrate to the multizonal chuck. Each voltage signal of the plurality of time-dependent voltage signals is applied to one or more electrodes of the multizonal chuck. The techniques further include performing one or more processing operations in association with the substrate attracted to the multizonal chuck.
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