Systems and methods for optimizing plasma generation in an EUV light source

Abstract

Systems and methods for initializing an extreme ultraviolet (EUV) source are discussed. The EUV radiation source may include a droplet generator configured to generate a stream of droplets of a target material, a laser source communicatively coupled to a controller. The laser source is configured to generate a first pulsed beam of light, which upon interaction with a droplet, initiates a modification of a shape of the droplet, forming a modified droplet, and generate a second pulsed beam of light configured to substantially evaporate the modified droplet, thereby generating pulses of EUV light. The EUV radiation source comprises a first actuator communicatively coupled to the controller and configured to adjust a width of the second pulsed beam to minimize a variation of energy of the pulses of EUV light.